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DRIE(Deep Reactive Ion Etching)工艺加工的高深宽比梳齿电容不能保证绝对平行.本文在考虑低真空空气阻尼力的同时,研究了梳齿电容倾斜的MEMS传感器对脉冲惯性信号的响应,并分析了DRIE工艺因素对器件性能的影响.研究结果表明,当传感器为没有静电力反馈的双边电容结构时,梳齿电容的不平行对传感器的响应位移、惯性脉冲响应线性度范围影响明显,且随着封装真空度增加而加重.若传感器有静电力反馈,惯性脉冲响应的灵敏度降低,但DRIE工艺因素的影响程度降低.为了抑制DRIE工艺导致的梳齿电容不平行因素的影响,文中还设计了一个新型的变电容面积的MEMS惯性传感器,并用ANSYS初步分析了其性能,设计了其详细的制作工艺流程. 相似文献
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The comb capacitances fabricated by deep reactive ion etching (RIE) process have high aspect ratio which is usually smaller than 30 : 1 for the complicated process factors, and the combs are usually not parallel due to the well-known micro-loading effect and other process factors, which restricts the increase of the seismic mass by increasing the thickness of comb to reduce the thermal mechanical noise and the decrease of the gap of the comb capacitances for increasing the sensitive capacitance to reduce the electrical noise. Aiming at the disadvantage of the deep RIE, a novel capacitive micro-accelerometer with grid strip capacitances and sensing gap alterable capacitances is developed. One part of sensing of inertial signal of the micro-accelerometer is by the grid strip capacitances whose overlapping area is variable and which do not have the non-parallel plate's effect caused by the deep RIE process. Another part is by the sensing gap alterable capacitances whose gap between combs can be reduced by the actuators. The designed initial gap of the alterable comb capacitances is relatively large to depress the effect of the maximum aspect ratio (30 : 1) of deep RIE process. The initial gap of the capacitance of the actuator is smaller than the one of the comb capacitances. The difference between the two gaps is the initial gap of the sensitive capacitor. The designed structure depresses greatly the requirement of deep RIE process. The effects of non-parallel combs on the accelerometer are also analyzed. The characteristics of the micro-accelerometer are discussed by field emission microscopy (FEM) tool ANSYS. The tested devices based on slide-film damping effect are fabricated, and the tested quality factor is 514, which shows that grid strip capacitance design can partly improve the resolution and also prove the feasibility of the designed silicon-glass anodically bonding process. 相似文献
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设计了一个新型的结构完全对称的双向MEMS电容式惯性传感器.该传感器主要由可动质量块、栅形条、支撑梁、连接梁、阻尼调整梳齿组成.设计的结构采用变电容面积的检测方式,在降低空气阻尼的同时也降低了对DRIE工艺的要求,并通过加大测试信号电压来降低电路噪声,从而提高传感器的分辨率.用有限元工具ANSYS详细讨论了传感器的参数和性能,并模拟验证了设计的双向传感器的交叉效应近似为零.制作了滑膜阻尼测试器件,在大气压下,测得的品质因子可达514,验证了该结构设计可以提高传感器的分辨率和该工艺设计的可行性. 相似文献
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以有限元分析法为理论基础并搭配ANSYS软件,建立圆盘式压电双晶片振子的模型,研究压电振子半径、压电层厚度和支撑层厚度对其发电能力的影响。并在此基础上探讨压电-电路的导纳阻抗及输出功率特性。着重研究压电双晶片在串联和并联两种连接方式之间的差异。研究结果表明,在保证可靠度和固有频率的前提下,应尽量增加压电振子半径,减小振子的基板厚度,以获得最大的输出电压。串联方式的输出电压大,内部阻抗高,适用于后续负载阻抗较高的能量采集系统;并联方式的内部阻抗较串联式低,适用于后续负载阻抗适中的能量采集系统。而当在两种电路连接方式下的外部电阻达到最佳电阻值时,两者最佳输出功率相同。 相似文献
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为解决纺织业中纱线张力难以实时控制的问题,基于模糊PID控制器的自身优势,将参数自整定模糊PID控制技术应用于纱线张力控制中.通过Matlab构建了参数自整定模糊PID与传统PID相对比的仿真模型,运用QuartusII开发环境,利用原理图设计与VHDL设计相结合的方式,在现场可编程门阵列(FPGA)中完成了参数自整定模糊PID控制器,并对输入数据进行了测试.实验结果表明,参数自整定模糊PID控制器可更快的达到稳定状态,超调量小,顶层电路系统设计稳定可靠,可用于纱线张力控制. 相似文献
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