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11.
The electronic structure of a series of phenylsilanes Ph4?n SiH n (n = 0?C3) is studied by X-ray emission spectroscopy and quantum chemical calculations by the density functional theory method. Based on the calculations theoretical X-ray emission SiK??1 spectra of phenylsilanes Ph4?n SiH n (n = 0?C4) are constructed and their energy structure and shape turn out to be well consistent with experiment. The distribution of the electron density of states with different symmetry of Si, C, H atoms are also constructed. An analysis of the obtained X-ray fluorescent SiK??1 spectra and the distribution of the electron density of states in Ph4Si and Ph3SiH compounds shows that their energy structure is mainly determined by a system of the energy levels of phenyl ligands weakly perturbed by interactions with valence AOs of silicon. In the energy structure of MOs of the PhSiH3 compound, energy orbitals related to t 2 and a 1 levels of tetrahedral SiH4 are mainly presented.  相似文献   
12.
A study has been made of the influence of the sulfide substrate on the rate and direction of thermal decomposition, in an argon atmosphere, of Fe3(CO)12 deposited on the surface of crystalline MoS2, TiS2, and Co0.5TiS2 in amounts K=0.5–10 monolayers. It has been shown that the decomposition rate increases in the series MoS20.5TiS22 and increases with decreasing K. The relationship between the electronic structure of the sulfide and the decomposition of Fe3(CO)12 has been examined. On the basis of it has been established that the Fe atoms in the surface compounds that are formed by thermolysis of Fe3(CO)12 are coordinated with sulfur atoms S-M-S and are in a +2 degree of oxidation.A. N. Nesmeyanov Institute of Heteroorganic Compounds, Russian Academy of Sciences, 117813 Moscow. Translated from Izvestiya Akademii Nauk, Seriya Khimicheskaya, No. 1, pp. 44–47, January, 1992.  相似文献   
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