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Propagation Properties of Gaussian-Shaped and Double-Side Unsymmetrical Metallic Nano-Corrugations 下载免费PDF全文
A Gaussian-shaped and double-side unsymmetrical groove structure is presented. Rigorous calculation of the optical properties of the structure is performed on the basis of a multiple multipole program. We analyse the effect of the grating period, the groove width and the film thickness on transmission and reflectance. Simulation results demonstrate that surface-plasmon-polariton resonance positions depend strongly on the structure period and can be changed slightly by the variation of incomplete perforation thickness, while the resonance peak values can be controlled by tuning the groove width. Our results not only give an insight into the physical mechanisms of the double-side unsymmetrical gratings, but also open a way to design novel nano-photonic devices. 相似文献
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We start from the intensity distribution of a standing wave (SW) laser field and deduce the classical equation of atomic motion.The image distortion is analyzed using transfer function approach. Atomic flux density distribution as a function of propagation distance is calculated based on Monte-Carlo scheme and trajectory tracing method.Simulation results have shown that source imperfection,especially beam spread, plays an important role in broadening the feature width,and the focus depth of atom lens for real atomic source is longer than that for perfect source.The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the laser field as a function of traveling distance. 相似文献
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提高亚半微米微细图形光刻分辨力的新技术(Ⅱ)罗先刚陈旭南姚汉民(中国科学院光电技术研究所,成都610209)4相移掩模技术[5]相移掩模(phaseshiftmask,PSM)最初由美国的M.D.Levenson于1982年提出,真正成为热点是在80... 相似文献
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介绍了目前用于提高亚半微米投影光刻机成像分辨力、增大焦深的新技术及主要研究方向.对大数值孔径和短波长技术、倾斜(离轴)照明技术、相移掩模技术、光瞳滤波技术、多焦面曝光技术以及表面成像技术的原理和现状作了较为详细的阐述,通过与现有技术及条件比较,提出了研制亚半微米光刻机应采用的技术途径. 相似文献
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微细光刻中部分相干系统成像研究 总被引:2,自引:1,他引:1
分析了投影光刻系统中部分相干成像的过程,结果表明部分相干成像的像强是相干成像的像强对光源上每一点互相干强度的权重和,得出了近年来改进照明条件提高分辨力的物理本质,部分相干成像系统是一个空间频率可变的系统,频率的调制是通过照明函数的变化来实现的提出了进一步提高光刻分辨力的新途径。 相似文献
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