铁磁/反铁磁双层膜系统中的磁畴动力学行为

比较了铁磁单层膜与铁磁/反铁磁双层膜结构中的磁畴演化行为, 发现由于反铁磁层膜对铁磁层膜的耦合作用使得系统的磁畴壁厚度、 磁畴壁等效质量、磁畴壁移动速度等发生了改变, 系统的矫顽场增强, 并出现了交换偏置场. 文章具体研究了反铁磁层耦合作用下其磁畴壁厚度、 等效质量以及磁畴壁移动速度等与反铁磁层的净磁化、 磁各向异性、界面耦合强度以及温度等的关系; 并研究了其对铁磁/反铁磁双层膜中的交换偏置场、矫顽场的影响. 进而 从磁畴结构的形成及其演化上揭示了铁磁/反铁磁双 层膜中出现交换偏置以及矫顽场增加的物理机制.     

引入纳米氧化层的CoFe/Pd双层膜结构中增强的垂直磁各向异性研究

制备了CoFe/Pd双层结构的界面处或CoFe层 内部引入纳米氧化层后的系列薄膜. 研究结果显示, 引入纳米氧化层后, 可以使薄膜的磁各向异性在退火后从面内转到垂直膜面方向. 并且对于在CoFe层内部引入纳米氧化层的这类样品, 其强烈的垂直磁性可以在相当宽的有效磁性层厚度范围内(1.2-2 nm)维持. 在保持垂直磁性的前提下, 这种特殊的双层膜结构中CoFe磁性层厚度比常规CoFe/Pd 多层膜中的CoFe层厚度至少多出1.4 nm. 本文的研究有助于制备出具有较高热稳定性的垂直磁性器件电极.     

BiFeO3/Ni81Fe19磁性双层膜中的交换偏置及其热稳定性研究

研究了磁场诱导生长的BiFeO₃/Ni₁₈Fe₁₉磁性双层膜中 的交换偏置及其热稳定性. 结果表明: BiFeO₃/Ni₁₈Fe₁₉双层膜中的交换偏置场H_ex未表现出明显的磁练习效应. 在负饱和磁场等待过程中, BiFeO₃/Ni₁₈Fe₁₉双层膜磁滞回线的前支和后支曲 线都随着在负饱和磁场中等待时间t_sat的增加向正场方向偏移. 交换偏置场H_ex的大小随着等待时间t_sat的增加而减小, 矫顽力H_c基本不变. 交换偏置场H_ex的大小随测量温度T_m的升高变化不明显, 表现出良好的热稳定性; 但矫顽力H_c随T_m的升高而显著减小. 良好的热稳定性应该来源于铁电性和反铁磁性间的共同耦合作用. 关键词： 多铁性 磁性薄膜 交换偏置 热稳定性     

FeCuCrVSiB单层和多层膜的横向巨磁阻抗效应

用射频溅射法制备了Fe_71.5Cu₁Cr_2.5V₄Si₁₂B₉单层膜和结构为(F/S)₃/M/(F/S)₃的多层膜，在制备过程中加72kA/m的纵向磁场.研究表明在制备过程中加磁场明显改善了材料的软磁性能，降低了材料的矫顽力.将样品经不同温度退火热处理后，发现经230℃退火1.5h的单层膜和多层膜具有最佳的软磁性能和最大的磁阻抗效应，单层膜最大横向磁阻抗比为37.5%，多层膜最大横向磁阻抗比高达277%.通过比较单层和多层膜磁阻抗效应随频率和磁场的变化，发现多层膜具有较低的磁阻抗效应的临界频率和峰值特征频率，和较大的磁阻抗变化率，而且有较低的横向磁阻抗效应的饱和场. 关键词： 铁基合金 多层膜 巨磁阻抗效应     

CoFe/TiZr多层膜材料界面结构与性能的极化中子反射研究

利用极化中子反射技术较系统地研究了CoFe/TiZr复合多层膜材料界面结构,结果表明.1)从多层膜超镜传输特性角度考虑,等厚对层不如非等厚对层膜结构好.2)等厚对层的最佳退火温度约250℃,非等厚对层退火温度低于250℃影响不明显,等厚和非等厚对层经350℃退火后膜层变化严重.3)从布拉格峰位变化看,随着退火温度的升高,等厚对层膜的厚度先变小后变大;非等厚对层与之相反. 关键词： CoFe/TiZr多层膜 退火影响 膜层结构 极化中子反射     

CoFe_2O_4/空心微球复合体的制备与吸波性能

采用化学共沉淀法,在空心微球上包覆一层CoFe2O4,得到一种低密度的空心磁性微球.磁测量结果表明,磁场下退火制备的CoFe2O4样品反位缺陷减少,从而导致饱和磁化强度随退火磁场的增强而增大.吸波性能测试结果表明,包覆结构的CoFe2O4/空心球样品是一种轻质的微波吸收材料.     

CoFe2O4/空心微球复合体的制备与吸波性能

采用化学共沉淀法,在空心微球上包覆一层CoFe2O4,得到一种低密度的空心磁性微球．磁测量结果表明,磁场下退火制备的CoFe2O4样品反位缺陷减少,从而导致饱和磁化强度随退火磁场的增强而增大．吸波性能测试结果表明,包覆结构的CoFe2O4/空心球样品是一种轻质的微波吸收材料.     

具有纳米氧化层的磁性隧道结的热稳定性研究

研究发现在磁隧道结的反铁磁层和被钉扎铁磁层之间插入一层纳米氧化层，可以使磁隧道结的退火温度增加了40℃，即明显地提高了磁隧道结的温度稳定性.通过卢瑟福背散射实验直接观察到产生这一效应的原因是该纳米氧化层有效地抑制了Mn元素在退火过程中的扩散，从而使TMR值在较高的退火温度下得以保持. 关键词： 磁性隧道结 隧穿磁电阻 热稳定性 纳米氧化层     

Co-Ni/FeMn双层膜中磁化强度对交换偏置的影响

固定CoNiFeMn双层膜中反铁磁层的厚度,改变CoNi铁磁层的成分来调节磁化强度,从而研究铁磁层的饱和磁化强度对CoNiFeMn双层膜中交换偏置的影响.研究表明,CoNiFeMn界面的交换耦合能U不是一个常量,而是随(MFM)12的增加而线性增加.其原因是铁磁层磁矩通过界面相互作用在反铁磁层中形成的局域交换磁场,在磁场冷却时影响反铁磁层的自旋结构或磁畴结构及双层膜中的交换偏置 关键词： 交换偏置 磁化强度     

分子束外延生长Fe/Fe_(50)Mn_(50)双层膜的交换偏置

利用表面磁光克尔效应和铁磁共振对分子束外延生长的Fe/Fe50Mn50双层膜的交换偏置场和矫顽力进行了研究,实验结果表明,当反铁磁层厚度小于5.5!nm时,不出现交换偏置,而当大于这一厚度时,出现交换偏置;大约在7!nm时,达到极大值.随着反铁磁层厚度的继续增大,偏置场和矫顽力随Fe50Mn50膜厚的增大而下降.铁磁共振实验结果表明样品的磁性存在单向各向异性.并对上述结果进行了讨论.     

Thermally activated magnetization reversal in magnetic tunnel junctions

In this paper, the magnetization reversal of the ferromagnetic layers in the IrMn/CoFe/AlO_x/CoFe magnetic tunnel junction has been investigated using bulk magnetometry. The films exhibit very complex magnetization processes and reversal mechanism. Thermal activation phenomena such as the training effect, the asymmetry of reversal, the loop broadening and the decrease of exchange field while holding the film at negative saturation have been observed on the hysteresis loops of the pinned ferromagnetic layer while not on those of the free ferromagnetic layer. The thermal activation phenomena observed can be explained by the model of two energy barrier distributions with different time constants.     

Annealing effect of NiO/Co90Fe10 thin films: From bilayer to nanocomposite

Exchange-biased bilayers are widely used in the pinned layers of spintronic devices. While magnetic field annealing (MFA) was routinely engaged during the fabrication of these devices, the annealing effect of NiO/CoFe bilayers is not yet reported. In this paper, the transition from NiO/Co₉₀Fe₁₀ bilayer to nanocomposite single layer was observed through rapid thermal annealing at different temperatures under magnetic field. The as-deposited and low-temperature (<623 K) annealed samples had rock salt (NiO) and face center cubic (Co₉₀Fe₁₀) structures. On the other hand, annealing at 623 K and 673 K resulted in nanocomposite single layers composed of oxides (matrix) and alloys (precipitate), due to grain boundary oxidization and strong interdiffusion in the NiO/CoFe and CoFe/SiO₂ interfaces. The structural transition was accompanied by the reduction of grain sizes, re-ordering of crystallites, incensement of roughness, and reduction of Ni²⁺. When measured at room temperature, the bilayers exhibited soft magnetism with small room-temperature coercivity. The nanocomposite layers exhibited an enhanced coercivity due to the changes in the magnetization reversal mechanism by pinning from the oxides. At 10 K, the increased antiferromagnetic anisotropy in the NiO resulted in enhanced coercivity and exchange bias in the bilayers. The nanocomposites exhibited weaker exchange bias compared with the bilayers due to frustrated interfacial spins. This investigation on how the magnetic properties of exchange-biased bilayers are influenced by magnetic RTA provides insights into controlling the magnetization reversal properties of thin films.     

Annealing effect on tunneling magnetoresistance in MgO-based magnetic tunnel junctions with FeMn exchange-bias layer

MgO-based magnetic tunnel junctions were fabricated, with a thin pinned CoFeB layer in the unbalanced synthetic antiferromagnet part of the stack FeMn/CoFe/Ru/CoFeB. Inverted and normal tunneling magnetoresistance (TMR) values occur at low and high annealing temperatures (T_a), respectively. The TMR ratio remains inverted up to T_a=300 °C and it becomes normal around T_a=350 °C. The exchange bias of FeMn disappears at high T_a. The sign reversal of the TMR ratio is mainly attributed to the disappearance of the exchange bias due to manganese diffusion during the annealing process.     

Inverse TMR in a nominally symmetric CoFe/AlOx/CoFe junction induced by interfacial Fe3O4 investigated by STEM-EELS

We have found inverse tunneling magnetoresistance (TMR) with a non-symmetric bias voltage dependence in a nominally symmetric Si (001)/Ag/CoFe/AlO_x/CoFe/IrMn/Ag magnetic tunnel junction after field cooling. The O K edge fine structure extracted from electron energy loss spectroscopy spectrum images taken at the interfaces of junctions with inverse TMR shows a thin, discontinuous Fe₃O₄ layer at the CoFe/AlO_x interfaces. The Fe L_2,3 edge core level shifts are also consistent with those of Fe₃O₄. We find no Fe₃O₄ layer in junctions with normal TMR. We believe this Fe₃O₄ layer is responsible for the inverse TMR.     

Magnetotransport and interdiffusion characteristics of magnetic tunnel junctions comprising nano-oxide layers upon exposure to postdeposition annealing

Magnetic tunnel junction (MTJ) structures based on underlayer (CoNbZr)/bufferlayer (CoFe)/antiferromagnet (IrMn)/pinned layer (CoFe)/tunnel barrier (AlO_x)/free layer (CoFe)/capping (CoNbZr) have been prepared to investigate thermal degradation of magnetoresistive responses. Some junctions possess a nano-oxide layer (NOL) inside either in the underlayer or bufferlayer. The main purpose of the NOL inclusion was to control interdiffusion path of Mn from the antiferromagnet so that improved thermal stability could be achieved. The MTJs with NOLs were found to have reduced interfacial roughness, resulting in improved tunneling magnetoresistance (TMR) and reduced interlayer coupling field. We also confirmed that the NOL effectively suppressed the Mn interdiffusion toward the tunnel barrier by dragging Mn atoms toward NOL during annealing.     

GdFeCo磁光薄膜中RE-TM反铁磁耦合与激光感应超快磁化翻转动力学研究

使用飞秒时间分辨抽运-探测磁光克尔光谱技术,研究了激光加热GdFeCo磁光薄膜跨越铁磁补偿温度时稀土-过渡金属(RE-TM)反铁磁交换耦合行为和超快磁化翻转动力学. 实验观察到由于跨越铁磁补偿温度、净磁矩携带者交换而引起的磁化翻转反常克尔磁滞回线以及在同向外磁场下,反常回线上大于和小于矫顽力部分的饱和磁化强度不同,显示出GdFeCo中RE与TM之间的非完全刚性反铁磁耦合. 在含有Al导热底层的GdFeCo薄膜上观测到饱和磁场下激光感应磁化态翻转及再恢复的完整超快动力学过程. 与剩磁态的激光感应超快退磁化过 关键词： 补偿温度 磁化翻转 反铁磁耦合 GdFeCo     

Influence of Ga+ ion irradiation on thermal relaxation of exchange bias field in exchange-coupled CoFe/IrMn bilayers

This paper reports that the CoFe/IrMn bilayers are deposited by magnetron sputtering on the surfaces of thermallyoxidized Si substrates.It investigates the thermal relaxations of both non-irradiated and Ga + ion irradiated CoFe/IrMn bilayers by means of holding the bilayers in a negative saturation field.The results show that exchange bias field decreases with the increase of holding time period for both non-irradiated and Ga + ion irradiated CoFe/IrMn bilayers.Exchange bias field is also found to be smaller upon irradiation at higher ion dose.This reduction of exchange bias field is attributed to the change of energy barrier induced by ion-radiation.     

Thermal relaxation of exchange bias field in an exchange coupled CoFe/IrMn bilayer

This paper reports that a CoFe/IrMn bilayer was deposited by high vacuum magnetron sputtering on silicon wafer substrate; the thermal relaxation of the CoFe/IrMn bilayer is investigated by means of holding the film in a negative saturation field at various temperatures. The exchange bias decreases with increasing period of time while holding the film in a negative saturation field at a given temperature. Increasing the temperature accelerates the decrease of exchange field. The results can be explained by the quantitative model of the nucleation and growth of antiferromagnetic domains suggested by Xi H W et al. [2007 Phys. Rev. B 75 014434], and it is believed that two energy barriers exist in the investigated temperature range.     

Exchange bias like effect induced by domain walls in FeGd/FeSn bilayers

A study of exchange bias phenomenon in ferrimagnetic /ferromagnetic FeGd/ FeSn bilayers is presented. The amorphous FeSn and FeGd alloys have been grown by co-evaporation. Specific growth conditions allow to induce an uniaxial anisotropy in both alloys in a parallel direction. After saturation of the bilayers under a positive field, the hysteresis loop of one of the layer is shifted towards a positive field H _E . The sign of the exchange bias field H _E is shown to be due to the antiferromagnetic coupling between the net magnetizations of both alloys. The field H _E is studied as a function of the thickness of each layer and of the temperature. Using ac-susceptibility measurements and polarized neutron reflectometry, it is shown that the reversal of magnetization of the bilayers is dominated by the presence of a domain wall at the interface. This exchange bias system is shown to act as a potential well for the magnetic domain wall. Within this assumption and thanks to a precise magnetic characterization of each alloy, the evolution of H _E with the thickness of the layers is well reproduced using simple one-dimensional analytical models for the domain wall or a more elaborate numerical approach.Received: 20 February 2003, Published online: 9 September 2003PACS: 75.60.Ch Domain walls and domain structure - 75.70.-i Magnetic properties of thin films, surfaces, and interfaces - 75.25.+z Spin arrangements in magnetically ordered materials (including neutron and spin-polarized electron studies, synchrotron-source X-ray scattering, etc.)