面内双轴应力作用下单层黑磷能带性质研究

通过第一性原理对平面内双轴应力作用下的单层黑磷能带结构进行了计算.双轴拉伸应力作用下单层黑磷始终保持直接带隙性质,双轴压缩应力作用下的单层黑磷则发生了直接带隙转变为间接带隙的现象,当双轴压缩应力增加到7%时单层黑磷带隙闭合.     

应力调控下二维硒化锗五种同分异构体的第一性原理研究

采用第一性原理计算方法,研究了二维单层硒化锗(GeSe)的5种同分异构体结构的稳定性和在应力调控下的电子性质变化规律.计算结果表明:5种同分异构体结构都具有热力学稳定性; a-GeSe是直接带隙半导体, b-GeSe, g-GeSe, d-GeSe和e-GeSe都是间接带隙半导体. a-GeSe在应力调控下出现了直接到间接带隙的转变和半导体到金属性质的转变. b-GeSe和g-GeSe在应力的作用下具有可调节的间接带隙范围.当沿dGeSe双轴方向施加压缩应力为1%和4%时, d-GeSe的能带从间接带隙转变成直接带隙.通过沿e-GeSe的扶手椅形方向施加10%的拉伸应变,出现了从间接带隙到直接带隙的转变;继续增加拉伸应变到20%,能带结构一直保持直接带隙的特征,其可调范围为1.21—1.44 eV.沿d-GeSe双轴方向施加10%拉伸应变时,也出现了从间接带隙到直接带隙的转变;该直接带隙在双轴拉伸应变增加到19%前一直保持,可调范围为0.61—1.19 eV.     

多层黑磷中厚度和应力依赖的能隙变化研究

采用基于密度泛函理论的第一性原理方法研究了单层及多层黑磷晶体的能隙随层数和外加应力的变化.计算结果表明,体系能隙随着层数的增加而减小,当层数增加到10时,二维黑磷的能隙非常接近于其体材料值.层间的相互作用导致的能带劈裂是能隙减小的直接原因.应力对10层黑磷电子结构的影响也被研究.计算表明,压缩应力可以使10层黑磷从半导体转变为金属,而拉伸应力仅对能隙大小产生影响.     

多层黑磷中厚度和应力依赖的能隙变化研究

采用基于密度泛函理论的第一性原理方法研究了单层及多层黑磷晶体的能隙随层数和外加应力的变化.计算结果表明,体系能隙随着层数的增加而减小,当层数增加到10时,二维黑磷的能隙非常接近于其体材料值.层间的相互作用导致的能带劈裂是能隙减小的直接原因.应力对10层黑磷电子结构的影响也被研究.计算表明,压缩应力可以使10层黑磷从半导体转变为金属,而拉伸应力仅对能隙大小产生影响.     

基于锡组分和双轴张应力调控的临界带隙应变Ge_(1-x)Sn_x能带特性与迁移率计算

能带工程通过改变材料的能带结构可以显著提升其电学和光学性质,已广泛应用于半导体材料的改性研究.双轴张应力和Sn组分共同作用下的Ge_(1-x)Sn_x合金,不仅可以解决直接带隙转变所需高Sn组分带来的工艺难题,而且载流子迁移率会显著提升,在单片光电集成领域有很好的应用前景.根据形变势理论,分析了(001)面双轴张应变Ge_(1-x)Sn_x的带隙转变条件,并给出了在带隙转变临界点Sn组分和双轴张应力的关系;采用8κ·p方法,得到了临界带隙双轴张应变Ge_(1-x)Sn_x在布里渊区中心点附近的能带结构,进而计算得到电子与空穴有效质量;基于载流子散射模型,计算了电子与空穴迁移率.计算结果表明:较低Sn组分和双轴张应力的组合即可得到直接带隙Ge_(1-x)Sn_x合金,且直接带隙宽度随着应力的增大而减小;临界带隙双轴张应变Ge_(1-x)Sn_x具有极高的电子迁移率,空穴迁移率在较小应力作用下即可显著提升.考虑工艺实现难度和材料性能两个方面,可以选择4%Sn组分与1.2 GPa双轴张应力或3%Sn组分与1.5 GPa双轴张应力的组合用于高速器件和光电器件的设计.     

双轴应变条件下单层MoSe2电子结构和拉曼光谱的第一性原理计算

二硒化钼的层间相互作用强,单层结构具有更低的带隙和更好的稳定性.由于独特的光学性质和优异的电学性能受到研究人员的广泛关注.本文基于密度泛函理论的第一原理,计算和分析了在双轴拉伸压缩应变条件下单层MoSe₂能带结构,拉曼光谱和声子谱的变化规律以及性质产生的原因.在拉伸压缩应变作用下,直接带隙转变为间接带隙.当拉伸应变达到12%时,材料发生半导体-金属相变.当压缩应变达到6%时,声子谱中开始出现虚频率,表明结构开始变得不稳定.     

应力作用下吸附过渡金属原子的蓝磷单层中的拓扑转变（英文）

本文通过第一性原理计算方法研究了被第四B族过渡金属吸附原子(Cr,Mo,W)修饰的蓝磷单层的电子结构性质,发现Cr修饰的蓝磷单层为磁性半金属,而Mo或W修饰的蓝磷单层为半导体,其带隙均小于0.2 eV.对Mo或W修饰的蓝磷单层施加双轴压应力使得带隙先闭合再打开,且在此过程中发生了能带反转的现象,说明Mo或W修饰的蓝磷单层发生了拓扑转变.Mo和W修饰的蓝磷单层的拓扑转变压应力分别为-5.75%和-4.25%,其拓扑绝缘带隙分别为94 meV和218 meV.如此大的拓扑绝缘带隙意味着在较高温度条件下有可能在蓝磷单层中通过吸附过渡金属原子实现拓扑绝缘态.     

二维黑磷的光学性质

黑磷是继石墨烯、过渡金属硫族化合物(TMDCs)之后又一个备受关注的二维材料.黑磷从单层到块材都是直接带隙半导体,且带隙从单层的1.7 eV一直随着层数的增加而减小,到块材则变为0.3 eV,涵盖了可见光到中红外波段,恰好填补了石墨烯和过渡金属硫族化合物的带隙在该波段的空白.同时,黑磷还具有很高的载流子迁移率、良好的调控性、面内各向异性等优异特性,很快便引起了人们广泛的研究兴趣.本论文主要介绍了当前有关二维黑磷光学性质方面的研究进展,包括黑磷的本征光学性质,如带间跃迁吸收、激子、光致发光、光学性质的稳定性;外界微扰,如应变、电场等对黑磷光学性质的影响;最后做了总结与展望.希望本文对黑磷光学性质研究的综述,能够引起对黑磷研究的更广泛兴趣.     

应力作用下吸附过渡金属原子的蓝磷单层中的拓扑转变

本文通过第一性原理计算方法研究了被第四B族过渡金属吸附原子(Cr，Mo，W)修饰的蓝磷单层的电子结构性质，发现Cr修饰的蓝磷单层为磁性半金属，而Mo或W修饰的蓝磷单层为半导体，其带隙均小于0.2 eV. 对Mo或W修饰的蓝磷单层施加双轴压应力使得带隙先闭合再打开，且在此过程中发生了能带反转的现象，说明Mo或W修饰的蓝磷单层发生了拓扑转变. Mo和W修饰的蓝磷单层的拓扑转变压应力分别为-5.75%和-4.25%，其拓扑绝缘带隙分别为94 meV和218 meV. 如此大的拓扑绝缘带隙意味着在较高温度条件下有可能在蓝磷单层中通过吸附过渡金属原子实现拓扑绝缘态.     

二维BC2 N薄片的结构稳定性和电子性质

采用基于密度泛函理论的第一性原理方法,对二维BC₂N薄片的结构稳定性和电子性质进行了系统的研究.计算了BC₂N化合物16种可能的二维单层结构.对它们的能带结构分析发现,对称性最高的构型与石墨烯一样是一种半金属,而其他二维结构则为有不同带隙的半导体,其中最稳定的构型是带隙值为1.63 eV的直接带隙半导体.对最稳定构型的差分电荷密度分析和Bader分析发现:在最稳定的构型中,C–C键、C–N键、C–B键和B–N键主要以共价键的形式呈现,也具有比较明显的离子性.在应力作用下最稳定构型的单层BC₂N的带隙宽度会发生变化,压缩时带隙变宽,而拉伸时带隙变窄,但仍然为直接带隙半导体. 关键词： 2N')" href="#">BC₂N 单层原子薄片 电子结构 从头计算     

单层金属卤化物CoX_2(X=Cl、Br、I)可调能隙和磁性研究

本文采用密度泛函理论系统的研究了二维单层金属卤化物CoX_2(X=Cl,Br,I)的结构稳定性、电子性质和磁性质.三种卤化物的束缚能分别是9.01、8.04和6.95 eV,表明Co原子和卤素原子间存在强相互作用.三种材料的能带结构都显示了间接带隙半导体特性.三种材料的总磁矩都是3 μ_B,主要来源于Co原子的磁矩.为了实现对材料物性的调控,我们考虑了双轴应变.发现压缩应变不仅可以显著增强铁磁态的稳定性,还可以实现体系从间接带隙半导体向直接带隙半导体的转变.     

Strain Effects on Properties of Phosphorene and Phosphorene Nanoribbons: a DFT and Tight Binding Study

We perform comprehensive density functional theory calculations of strain effect on electronic structure of black phosphorus(BP) and on BP nanoribbons. Both uniaxial and biaxial strain are applied, and the dramatic change of BP's band structure is observed. Under 0-8% uniaxial strain, the band gap can be modulated in the range of 0.55-1.06 eV, and a direct-indirect band gap transition causes strain over 4% in the y direction. Under 0-8% biaxial strain, the band gap can be modulated in the range of 0.35-1.09 eV, and the band gap maintains directly.Applying strain to BP nanoribbon, the band gap value reduces or enlarges markedly either zigzag nanoribbon or armchair nanoribbon. Analyzing the orbital composition and using a tight-binding model we ascribe this band gap behavior to the competition between effects of different bond lengths on band gap. These results would enhance our understanding on strain effects on properties of BP and phosphorene nanoribbon.     

二维MoSi2N4WSe2异质结的第一性原理研究

实验上新合成的MoSi2N4（MSN）由于其独特的七原子层结构和电子特性引起了人们的广泛关注。本文搭建了一种由二维MSN与二维WSe2（WS）垂直堆垛而成的二维MSN/WS异质结,其表现出直接间隙半导体和I型能带排列的特性,具有1.46 eV的带隙。在异质结界面处存在一个由电荷耗尽层MSN指向电荷积累层WS微弱的内建电场。最后,通过施加双轴应变对二维MSN/WS异质结进行调控。发现在正双轴应变的作用下,MSN/WS异质结保持了原来直接带隙半导体和I型能带排列特性;在负双轴应变作用下,MSN/WS异质结由原来的直接带隙半导体转变为间接带隙半导体,当施加的负双轴应变达到-6%与-8%时,I型能带排列转变为Ⅱ型能带排列。     

Biaxial strain-induced enhancement in the thermoelectric performance of monolayer WSe_2

The effects of biaxial strain on the electronic structure and thermoelectric properties of monolayer WSe_2 have been investigated by using first-principles calculations and the semi-classical Boltzmann transport theory. The electronic band gap decreases under strain, and the band structure near the Fermi level of monolayer WSe_2 is modified by the applied biaxial strain. Furthermore, the doping dependence of the thermoelectric properties of n-and p-doped monolayer WSe_2 under biaxial strain is estimated. The obtained results show that the power factor of n-doped monolayer WSe_2 can be increased by compressive strain while that of p-doping can be increased with tensile strain. Strain engineering thus provides a direct method to control the electronic and thermoelectric properties in these two-dimensional transition metal dichalcogenides materials.     

Two dimensional GeO2/MoSi2N4 van der Waals heterostructures with robust type-II band alignment

Constructing two-dimensional (2D) van der Waals heterostructures (vdWHs) can expand the electronic and optoelectronic applications of 2D semiconductors. However, the work on the 2D vdWHs with robust band alignment is still scarce. Here, we employ a global structure search approach to construct the vdWHs with monolayer MoSi₂N₄ and wide-bandgap GeO₂. The studies show that the GeO₂/MoSi₂N₄ vdWHs have the characteristics of direct structures with the band gap of 0.946 eV and type-II band alignment with GeO₂ and MoSi₂N₄ layers as the conduction band minimum (CBM) and valence band maximum (VBM), respectively. Also, the direct-to-indirect band gap transition can be achieved by applying biaxial strain. In particular, the 2D GeO₂/MoSi₂N₄ vdWHs show a robust type-II band alignment under the effects of biaxial strain, interlayer distance and external electric field. The results provide a route to realize the robust type-II band alignment vdWHs, which is helpful for the implementation of optoelectronic nanodevices with stable characteristics.     

Stress and strain effects on the electronic structure and optical properties of ScN monolayer

Based on the density functional theory, electronic and optical properties of a monolayer scandium nitride structure have been studied under different strain conditions. Our results indicate that both biaxial compressive and tensile strain effects lead to change the band gap of this structure with different rates. Also, optical absorption spectrum peaks experience an obvious red and blue shifts with the exerting of tensile and compressive strains, respectively. Our results express that ScN monolayer can be the promising candidate for the future nano-base electrical and optical devices.     

Tuning of the electronic and optical properties of single-layer indium nitride by strain and stress

Using first principles calculations, electronic and optical properties of indium nitride graphene-like structure have been studied under various stress and strain values. The results exhibit that this compound in the range of ±6 applied biaxial strain remains a direct band gap semiconductor. Also, exerting stress and strain reduces the energy band gap of the considered materials. The optical calculations illustrate that applying stress and strain on system results in blue and red shift in optical spectra. All obtained results presented that we can tune the optoelectronic properties of indium nitride by applying stress and strain.     

Strain-tunable electronic,elastic, and optical properties of CaI2 monolayer: first-principles study

ABSTRACT

The effects of biaxial strain on the electronic structure and the elastic and optical properties of monolayer CaI₂ were studied using first-principles calculations. The two-dimensional (2D) equation of state for monolayer CaI₂ as fit in a relative area of 80–120% is more accurate. The band gap can be tuned under strain and reached a maximum at a tensile strain of 4%. Under compressive strains, the absorption spectrum showed a significant red shift at higher strains. The static reflectance and static refractive index decreased in the strain range of ?10% to 10%.     

Strain effect on the electronic properties of 1T-HfS2 monolayer

We perform first-principles based on the density function theory to investigate electronic and magnetic properties of 1T-HfS₂ monolayer with biaxial tensile strain and compressive strain. The results show that HfS₂ monolayer under strains doesn’t display magnetic properties. When the strain is 0%, the HfS₂ monolayer presents an indirect band gap semiconductor with the band gap is about 1.252 eV. The band gap of HfS₂ monolayer decreases quickly with increasing compressive strain and comes to zero when the compressive strain is above −7%, the HfS₂ monolayer system turns from semiconductor to metal. While the band gap increases slowly with increasing tensile strain and comes to 1.814 eV when the tensile strain is 10%. By comparison, we find that the compressive strain is more effective in band engineering of pristine 1T-HfS₂ monolayer than the tensile strain. And we notice that the extent of band gap variation is different under tensile strain. The change of band gap with strain from 1% to 5% is faster than that of the strain 6–10%. To speak of, the conduction band minimum (CBM) is all located at M point with different strains. While the valence band maximum (VBM) turns from Γ point to K point when the strain is equal to and more than 6%.