ITO导电膜红外发射率理论研究

根据红外辐射理论和薄膜光学原理计算了高品质ITO(indium tin oxide)导电膜的红外发射 率,其理论曲线与实测曲线基本符合. 并得出方块电阻小于30Ω时,ITO膜在红外波段8—14μ m的平均红外发射率理论值小于0.1.实际制备方块电阻小于10Ω的ITO膜具有优良的红外隐身 性能. 讨论了高品质ITO膜具有低红外发射率的物理机理,并提出了低红外发射率临界方块电 阻值,这有利於理论研究和工艺制备红外隐身ITO膜. 关键词： 红外发射率 ITO薄膜 理论计算 方块电阻     

ITO材料在减反射膜设计中的应用

改变ITO材料通常作为透明导电膜单独使用的状况,将其作为减反射膜系中的一层,能够在很大程度上增加ITO透明导电膜在可见光部分的透过率.通过使用将ITO材料置于膜系的内层和最外层两类不同的设计思想,可以使ITO透明导电膜达到相当优良的应用效果.使用低压反应离子镀方法制备了设计的两类减反射膜系,实验证明,膜层在可见光部分的透过率显著提高,剩余反射率明显下降,并得到了平均透过率为95.83%,最高透过率达到97.26%,方块电阻为13.2～24.6Ω/□的试验结果.     

低压反应离子镀方法制备ITO透明导电膜

溅射镀膜方法是制备ITO透明导电膜最常用也是实验研究最多的方法。实验使用一种不同于溅射方法的另一种制备工艺—低压反应离子镀方法—制备ITO透明导电膜。实验对不同沉积速率和不同氧气流量对ITO透明导电膜的方块电阻以及光学透过率的影响进行了详细地分析,并综合比较得到了当沉积速率为0.5nm/s,氧气流量为24cm3/min时,在波长为550nm处,方块电阻为20Ω,λ=550nm透过率为90.8%的优质ITO透明导电膜。     

薄膜光学 制膜技术与装置

O484.12006010529低压反应离子镀方法制备ITO透明导电膜=Preparationof ITOfil ms by reactive lowvoltageion plating[刊,中]/徐颖(中科院长春光机所光学技术研究中心.吉林,长春(130022)),高劲松…∥光学技术.—2005,31(5).—669-671使用一种不同于溅射方法的另一种制备工艺—低压反应离子镀方法制备ITO透明导电膜。实验对不同沉积速率和不同氧气流量对ITO透明导电膜的方块电阻以及光学透过率的影响进行了详细的分析,并综合比较得到了当沉积速率为0.5nm/s,氧气流量为24cm3/min时,在波长为550nm处,方块电阻为20Ω,λ=550nm,透过率为90…     

一种保护玻璃防水雾透明导电薄膜的设计与制备

为了使光学仪器能适应低温潮湿环境,设计了一种复合型的保护玻璃防水雾透明导电薄膜.采用非平衡闭合磁场反应溅射技术在K9玻璃基底上沉积了氧化铟锡(ITO)导电膜以及复合型的透明导电膜系.采用光谱仪、方阻仪测试了样品的透射光谱以及方块电阻,并对样品进行了环境试验.结果表明,样品的光学技术指标以及抗恶劣环境性能均达到了使用要求...     

柔性SrTiO_3/Ag/SrTiO_3复合结构透明导电薄膜的制备和性能研究

为获得高性能的柔性透明导电薄膜,采用磁控溅射技术在柔性PC衬底上制备出了STO(30nm)/Ag/STO(30nm)复合结构透明导电薄膜.分别对不同中间Ag层厚度薄膜的结构、光学和电学性质进行了研究.研究发现:随着中间Ag层厚度的增加,可见光区的平均透过率先增大后减小,电阻率和方块电阻持续减小;当中间Ag层厚度为11nm时,复合结构透明导电薄膜具有最佳的品质因子为14.23×10~(-3)Ω~(-1),此时,其可见光区平均透过率为82%,方块电阻为9.2Ω/sq..     

高阻紫外光阴极导电基底制备及性能

在MgF_2基片上,采用电子束蒸发镀膜法制备了掺锡氧化铟(ITO)导电基底,研究了充氧及退火对ITO薄膜电阻及紫外透射比的影响。并与传统的金属导电基底Au和Cr进行了性能比较。用光学显微镜、四探针测试仪、高阻计、X射线衍射仪(XRD)和分光光度计分别测试了薄膜的表面形貌、方块电阻、形态结构和190～800 nm波段范围内薄膜的透射比曲线,得到方块电阻为10~7Ω左右时薄膜在200～400 nm波段内透射比的变化范围。实验结果表明,厚度相同时,充氧会增大ITO薄膜电阻;退火则会降低薄膜电阻并提高紫外透射比,薄膜结构由非晶态变为多晶态。方块电阻同为10~7Ω时,在200～400 nm波段充氧退火后ITO薄膜的平均透射比比Au,Cr的高10%。     

反应离子镀制备ITO膜

采用反应离子镀新工艺成功地在K9玻璃上制备了ITO(Indium Tin Oxide)透明导电膜,所制备的ITO膜在550～600nm波长范围内,典型的峰值透过率为89%,面电阻为34Ω/□。     

具有石墨烯/铟锑氧化物复合透明电极的GaN发光二极管

近年来,石墨烯材料由于优异的光电性能获得了广泛关注,并应用于发光二极管的透明电极以取代昂贵的铟锑氧化物(indium tin oxide, ITO)透明电极,但由于石墨烯与p-GaN功函数不匹配,二者很难形成好的欧姆接触,因而造成器件电流扩展差和电压高等问题.本文将ITO薄层作为石墨烯透明电极与p-Ga N间的插入层,以改善石墨烯与p-Ga N层的欧姆接触.所制备的石墨烯透明电极的方块电阻为252.6?/□,石墨烯/ITO复合透明电极的方块电阻为70.1?/□;石墨烯透明电极与p-Ga N层的比接触电阻率为1.92×10~(–2) ?cm~2,ITO插入之后,其比接触电阻率降低为1.01×10~(–4) ?cm~2;基于石墨烯透明电极的发光二极管(light emitting diode, LED),在20 m A注入电流下,正向电压为4.84 V,而石墨烯/ITO复合透明电极LED正向电压降低至2.80 V,且光输出功率得到提高.这归因于石墨烯/ITO复合透明电极与p-Ga N界面处势垒高度的降低,进而改善了欧姆接触;另外,方块电阻的降低,使得电流扩展均匀性也得到了提高.所采用的复合透明电极减少了ITO的用量,得到了良好的欧姆接触,为LED透明电极提供了一种可行方案.     

薄膜光学 薄膜光学理论与膜系设计

O484.1 2006043345钛酸铋基铁电薄膜研究进展=Progress in study on BIT-based ferroelectric thin fil ms[刊,中]/张端明(华中科技大学物理系.湖北,武汉(430074)) ,杨斌…∥功能材料.—2006 ,37(3) .—351-354 ,357钛酸铋基铁电薄膜具有优良的铁电、介电性能,在非挥发性存储器件方面有很好的应用前景。分别从制备工艺、掺杂改性、疲劳特性的研究等方面综述了最新的研究进展,并对当前研究中存在的问题进行了讨论。图3参38(严寒)O484.1 2006043346有ITO透明导电膜的平面分层介质系统的电磁波性能理论研究=Electromagnetic performance of…     

Transparent conductive ITO/Ag/ITO multilayer electrodes deposited by sputtering at room temperature

ITO/Ag/ITO multilayers have been prepared onto conventional soda lime glass substrates by sputtering at room temperature. The optical and electrical characteristics of single layer and multilayer structures have been investigated as a function of the Ag and ITO film thicknesses. Transmittance and sheet resistance values are found mainly dependent on the Ag film thickness; whereas the wavelength range at which the maximum transmittance is achieved can be changed by adjusting the ITO films thickness. ITO/Ag/ITO electrodes with sheet resistance below 6 Ω/sq have been obtained for Ag film thickness above 10 nm and ITO layers thickness in the 30-50 nm range. These multilayers also show high transmittance in the visible spectral region, above 90% by discounting the glass substrate, with a maximum that is located at higher wavelengths for thicker ITO.     

Highly flexible transparent and conductive ZnS/Ag/ZnS multilayer films prepared by ion beam assisted deposition

ZnS/Ag/ZnS (ZAZ) multilayer films were prepared on polyethene terephthalate (PET) by ion beam assisted deposition at room temperature. The structural, optical and electrical characteristics of ZAZ multilayers dependent on the thickness of silver layer were investigated. The ZAZ multilayers exhibit a low sheet resistance of about 10 Ω/sq., a high transmittance of 92.1%, and the improved resistance stabilities when subjected to bending. When the inserted Ag thickness is over 12 nm, the ZAZ multilayers show good resistance stabilities due to the existence of a ductile Ag metal layer. The results suggest that ZAZ film has better optoelectrical and anti-deflection characteristics than conventional indium tin oxide (ITO) single layer.     

Transparent conductive and near-infrared reflective Cu-based Al-doped ZnO multilayer films grown by magnetron sputtering at room temperature

Cu-based Al-doped ZnO multilayer films were deposited on glass substrates by DC magnetron sputtering at room temperature. Three kinds of multilayer structures (AZO/Cu, AZO/Cu/AZO, and Cu/AZO) were designed for comparison, and the effects of the Cu layer thickness on photoelectrical properties of the multilayer films were investigated. The results revealed that the transparent-conductive property and near-infrared reflectance of the films are closely correlated with the Cu layer thickness, and among the three structures, AZO/Cu bi-layer films exhibited preferable photoelectrical properties. The AZO/Cu bi-layer film with a Cu layer thickness of 7 nm displayed the highest figure of merit of 4.82 × 10⁻³ Ω⁻¹, with a low sheet resistance of 21.7 Ω/sq and an acceptable visible transmittance of 80%. The near infrared reflectance above 50% can be simultaneously obtained. The good performance of the coatings indicates that they are promising for coated glasses, thin film solar cells and heat-reflectors.     

Effects of Ag layer and ZnO top layer thicknesses on the physical properties of ZnO/Ag/Zno multilayer system

Two groups of transparent conductive ZnO/Ag/ZnO, ZAZ, multilayer coatings were successively deposited by direct current (DC) magnetron sputtering. Sputtering was carried out from zinc (Zn) and silver (Ag) metallic targets. The effects of Ag layer thickness and ZnO top layer thickness on the properties of the ZAZ multilayer system were examined using different analytical methods. The influences of the Ag layer thickness and ZnO top layer thickness on structural properties were studied using X-ray diffraction. The thicknesses of ZAZ multilayer system were determined using X-ray reflectometry. A sheet resistance of 2.3 Ω/sq at an Ag layer thickness of 17.7 nm was obtained. The sheet resistance changes slightly with ZnO top layer thickness. The optical properties of the films were analyzed. Both Ag layer thickness and ZnO top layer thickness affect transmittance. The optical constants of the ZAZ multilayer system were calculated from transmittance and reflectance measurements. The figure of merit was applied on the ZAZ coatings and the most suitable films for the application as transparent conductive electrodes were determined.     

ITO-free inverted organic solar cells fabricated with transparent and low resistance ZnO/Ag/ZnO multilayer electrode

Inverted organic solar cells (OSCs) based on poly (3-hexylthiophene) (P3HT):[6,6]-phenyl-C61 butyric acid methyl ester (PCBM) bulk heterojunctions (BHJ) were fabricated with optimized ZnO/Ag/ZnO multilayer and conventional indium–tin oxide (ITO) cathode electrodes and their performance was compared. The ZnO/Ag/ZnO multilayer films showed sheet resistances in the range 3.6–3.9 Ω/sq, while ITO exhibited 14.2 Ω/sq. On the one hand, the carrier concentration gradually decreased from 1.74 × 10²² to 4.33 × 10²¹ cm⁻³ as the ZnO thickness increased from 8 to 80 nm, respectively. The transmittance of the ZnO(40 nm)/Ag(19 nm)/ZnO(40 nm) films was ∼95% at 550 nm, which is comparable to that of ITO (∼96%). The multilayer films were smooth with a root mean square (RMS) roughness of 0.81 nm. OSCs fabricated with the ZnO(40 nm)/Ag(19 nm)/ZnO(40 nm) film showed a power conversion efficiency (2.63%) comparable to that of OSCs with a conventional ITO cathode (2.71%).     

Thickness Dependence of Resistivity and Optical Reflectance of ITO Films

Indium-tin-oxide （ITO） films deposited on crystalline silicon wafer and Corning glass are prepared by directcurrent magnetron sputtering method at room temperature with various thicknesses. The thickness dependences of structure, resistance and optical refectance of ITO films are characterized. The results show that when the film thickness is less than 40 nm, the resistivity and optical reflectance of the ITO film changes remarkably with thickness. The optoelectrical properties trend to stabilize when the thickness is over 55 nm. The GXRD result implies that the ITO film begins to crystallize if only the thickness is large enough.     

Thickness dependence of structural, electrical and optical properties of indium tin oxide (ITO) films deposited on PET substrates

Without intentionally heating the substrates, indium tin oxide (ITO) thin films of thicknesses from 72 nm to 447 nm were prepared on polyethylene terephthalate (PET) substrates by DC reactively magnetron sputtering with pre-deposition substrate surfaces plasma cleaning. The dependence of structural, electrical, and optical properties on the films thickness were systematically investigated. It was found that the crystal grain size increases, while the transmittance, the resistivity, and the sheet resistance decreases as the film thickness was increasing. The thickest film (∼447 nm) was found of the lowest sheet resistance 12.6 Ω/square, and its average optical transmittance (400-800 nm) and the 550 nm transmittance was 85.2% and 90.4%, respectively. The results indicate clearly that dependence of the structural, electrical, and optical properties of the films on the film thickness reflected the improvement of the film crystallinity with the film thickness.     

Characteristic difference between ITO/ZrCu and ITO/Ag bi-layer films as transparent electrodes deposited on PET substrate

The metallic-glass film of ZrCu layer deposited by co-sputtering was utilized as the metallic layer in the bi-layer structure transparent conductive electrode of ITO/ZrCu (IZC) deposited on the PET substrate using magnetron sputtering at room temperature. In addition, the pure Ag metal layer was applied in the same structure of transparent conductive film, ITO/Ag, in comparison with the IZC film. The ZrCu layer could form a continuous and smooth film in thickness lower than 6 nm, compared with the island structure of pure Ag layer of the same thickness. The 30 nm ITO/3 nm ZrCu films could show the optical transmittance of 73% at 550 nm wavelength. The 30 nm ITO/12 nm ZrCu films could show the better sheet resistance of 20 Ω/sq, but it was still worse than that of the ITO/Ag films. It was suggested that an alloy system with lower resistivity and negative mixing heat between atoms might be another way to form a continuous layer in thickness lower than 6 nm for metal film.