InGaAsP分别限制量子阱激光器

长波长InGaAsP量子阱激光器,以其低阈值、窄光谱线宽和高的调制频带宽等优良特性而成为大容量通信的基础。为此,我们利用低压MOVCD技术生长了1.62μm和1.3μm的InGaAsP材料,测得其77K光荧光(PL)谱线半峰高宽分别为18.7meV和28meV.利用X射线双晶衍射测得两种材料的晶格失配度不大于1×10^-3.并生长了四个不同阱宽的InGaAsP/InP量子阱结构,测得77K温度下的PL谱,分析了阱宽对发光波长及半峰宽的影响,并提出在量子阱激光器中减小界面层影响的方法。在此基础上,生长了分别限制量子阱激光器结构,并利用质子轰击制备出条形结构激光器,测得其最低阈值电流为100mA.直流工作光谱峰值波长为1.52μm左右,单面输出外微分量子效率约为36%.     

GaAs/GaAlAs异质NIPI超晶格的光荧光谱

异质NIPI超晶格结构的基本单元是由n型和p型的宽禁带材料薄层及插在它们中间的不掺杂窄禁带材料层组成,如nGaAlAs-不掺杂GaAs-pGaAlAs-不掺杂GaAs四层结构,其中Ⅰ代表不掺杂层.它是组分超晶格和掺杂超晶格结合,因而具有许多新的性质,例如空间电荷分离,载流子局域在未掺杂区内等.这个结构最早是由德国的Dõhler等所研究.     

P型掺杂剂对InGaAsP/InP双异质结发光管特性的影响

本文研究了限制层中掺杂剂对InGaAsP/InP双异质结发光管特性的影响。结果表明限制层掺In-Zn合金或掺Mg的器件不易发生p-n结偏位,器件具有单一的长波长光谱峰,正常的I-V特性以及暗结构出现率低的特性,而限制层掺Zn当浓度≥1×1018cm-3时,外延片易发生p-n结偏位,导致器件的异常特性。并观察到在扩散结器件中,在85℃长时间老化过程中,有p-n位置移动现象发生。     

1.5μm波长n-p-n型InGaAsP-InP晶体管激光器材料外延生长

基于器件模拟仿真,设计了一种1.5μm波长InGaAsP-InP晶体管激光器材料外延结构.其多量子阱有源区置于基区非对称波导中.仿真结果显示该外延结构能够获得较好的光场限制和侧向电流限制.对该材料MOCVD生长研究表明,基极重掺杂接触层中Zn2+扩散将导致量子阱严重退化.通过对其扩散过程的模拟仿真,采用平均掺杂浓度为1×1018cm-3的梯度掺杂,有效地抑制了Zn2+向量子阱区的扩散.所获得的外延材料在1.51μm呈现较强的PL峰值,具有卫星峰清晰的XRD谱.     

CdS_xSe_(1-x)/ZnS(核/壳)量子点的光谱截面及其掺杂光纤的传光特性

测量了不同组份比例x的CdS_xSe_(1-x)/ZnS(核/壳)量子点的吸收谱和发射谱,确定了量子点的吸收系数、吸收截面和发射截面.量子点吸收截面随粒径的增大而增大、随x的增大而减小.采用紫外固化胶,制备了掺杂浓度为0.1~5mg/mL的CdS_(0.4)Se_(0.6)/ZnS量子点光纤,测量了不同掺杂浓度量子点光纤中473nm泵浦功率的吸收衰减速率.吸收衰减速率和吸收截面弱关联于掺杂浓度.测量了光致荧光光谱强度随光纤长度和量子点浓度的变化.量子点光纤的光致荧光峰值强度随掺杂浓度和光纤长度变化而变化,且存在一个与最大峰值强度对应的饱和掺杂浓度和光纤长度.本文的实验结果有助于进一步构建新型的CdS_xSe_(1-x)/ZnS量子点增益型光电子器件.     

用瞬态电容谱法研究GaAs1-xPxLED深能级及其对发光的影响

本文利用瞬态电容潜(DLTS)法测量了不同效率的GaAsxPxLED的深能级浓度、深度、俘获截面.发现效率高LED仅有一个明显的电子深能级△En=0.15eV和一个很弱的△En=0.33eV电子深能级,它们的俘获截面都小于1.5×10-14cm2,总的能级浓度小,约为1.4×1015cm-3.效率差的两只LED一般除有两个以上的电子能级还有两个空穴能级,它们的俘获截面甚至大到2.2×10-12和1.3×10-13cm2;从DLTS图还可以发现谱峰高而宽,说明杂质浓度大,总浓度分别为6.3×1015cm-3和3.4×1015cm-3.讨论了深能级对发光效率的影响.     

量子限制受主远红外电致发光器件的制备与测量

采用分子束外延技术生长GaAs/AlAs三量子阱,并在中间的GaAs阱中δ-掺杂浅受主杂质Be原子,制作出量子限制受主远红外Teraherz原型电致发光器件.实验上测量得到4.5 K时器件的电致发光谱（EL）和电传输特性（I-V曲线）.在EL发射谱中清楚地观察到222 cm^-1处宽的尖峰,这来源于Be受主奇宇称激发态到其基态的辐射跃迁,而非辐射弛豫过程则使发射谱的信号很弱.另外在I-V曲线中072和186 V的位置出现两个共振隧道贯穿现象,分别对应于中间δ-掺杂量子阱受主能级1s_3/2(Γ₆+Γ₇)到左边非掺GaAs量子阱中HH带,及右边非掺杂GaAs量子阱中HH重空穴带到中间掺杂GaAs量子阱中Be受主杂质原子奇宇称激发态2p_5/2(Γ₆+Γ₇)能级的共振隧穿.     

Eu3+掺杂CaWO4红色荧光粉发光性质的浓度依赖关系研究

采用共沉淀法制备了不同Eu³⁺掺杂浓度的CaWO₄荧光粉材料.通过X射线衍射和场发射扫描电镜技术对样品的结构和形貌进行了表征.测量了各样品的激发光谱、发射光谱和荧光衰减曲线, 计算了各样品的部分Judd-Oflet (J-O)参数和^5D_0 (Eu³⁺)能级量子效率,以及荧光粉的色坐标, 讨论了样品电荷迁移带相对强度、J-O参数、量子效率与掺杂浓度的依赖关系.对Eu³⁺掺杂的CaWO₄ 发光材料的光致发光性质的研究表明,在CaWO₄: Eu³⁺中⁵D₀→⁷F₂跃迁的616~nm 红色发光能被394.5~nm和465~nm的激发光有效激发,具有近紫外(或蓝光)激发效率高和猝灭浓度大的优点, 有潜力成为高效的近紫外(或蓝光)激发白光发光二极管用红色荧光粉材料.     

注入Si中的稀土离子Er3+的光学特性

用离子注入方法,将稀土离子Er3+注入到n-Si单晶中,通过对其低温(77K)光致发光光谱的测量,研究其光学特性.结果表明,注入剂量控制在1×1012cm-2～1×1015cm-2范围,退火温度控制在900℃～1100℃时,样品的主要发光峰值位于1.54μm左右.研究了样品的光致发光光谱随注入剂量、退火温度的变化关系,给出峰值在1.54μm附近的未分辨开的谱线的半宽为16.4meV.     

利用梯度掺杂获得高量子效率的GaAs光电阴极

获得高量子效率且稳定性良好的阴极一直是近年来发展GaAs光电阴极的重要方向。对晶面为(100),掺杂Be,厚度为1μm分子束外延生长的反射式GaAs发射层,设计了一种从体内到表面掺杂浓度由高到低分布的新型梯度掺杂结构。掺杂浓度的范围从1×1019cm-3到1×1018cm-3,并利用(Cs,O)激活技术制备了GaAs光电阴极。光谱响应测试曲线显示,与传统均匀掺杂的GaAs光电阴极相比,梯度掺杂的GaAs光电阴极的量子效率在整个波段都有提高,积分灵敏度可达1580μA/lm,且具有更好的稳定性。讨论了这种新型GaAs光电阴极获得更高量子效率的内在机理。该设计结构是现实可行的,且具有很大发展潜力,它为国内发展高性能GaAs光电阴极提供了一条重要途径。     

Spectroscopic studies of real space indirect symmetric GaAs/AlAs short period superlattices

The band structure and the optical transitions of symmetric ultra-short period (GaAs) _m /(AlAs) _n superlattices (n=m is the number of monolayers) have been studied using different spectroscopic techniques, namely photoacoustic spectroscopy, reflectivity and luminescence, photoluminescence excitation and high excitation intensity time-resolved luminescence. Direct observation of the transition from type I to type II energy band alignment is reported for superlattices whose configuration consists of more than 12 monolayers (i.e. m=n>12). The radiative recombination processes associated with the real space indirect transitions have been investigated as a function of the density of photogenerated electron-hole pairs, revealing an unusual density-dependent behaviour. A tentative interpretation in terms of a condensed electron-hole state at the indirect gap is given, which accounts for the long decay time of the type II luminescence at high excitation rate.     

Photoluminescence as a tool for the study of the electronic surface properties of gallium arsenide

Electronic surface parameters of GaAs have been determined from a qualitative and quantitative analysis of the relative photoluminescence intensity at 300 K. Characteristics of etched (100) surfaces ofn- andp-type liquid phase epitaxial GaAs have been found to be governed by negative surface charges. A density of charged surface states of about 10¹² cm⁻² and a band bending of 0.59 eV have been found forn-type material with an electron concentration of 1.1×10¹⁷ cm⁻³. Forp-type samples with hole densities ranging from 6×10¹⁵ to 4.3×10¹⁸ cm⁻³ the estimated density of negatively charged surface states was below 2×10¹¹ cm⁻², and the band bending was not more than a few kT.     

Photoluminescence of Mn doped epitaxial GaAs

We have measured the near band edge photoluminescence of Mn doped liquid phase epitaxially grown GaAs. The photoluminescence spectra at 2°K shows, at low excitation intensities, a structure of up to eight sharp peaks (widths .2 to 1.0 meV) between 1.517 and 1.512 eV, besides the lower energy bands near 1.41 eV due to the deep Mn acceptor level and the usual donor-acceptor bands around 1.47 eV. Attempts to relate the sharp lines to the Mn electronic states, introduced by doping, were unsuccessful. It is our belief that the presence of this particular impurity in our samples allows for whatever states are responsible for the sharp line structure, to reveal themselves in the emission spectrum. A most unespected result is that near band edge sharp line luminescence is observed for impurity concentration as high as 10¹⁸cm^-3.     

GaInAsP/InP LED透镜的研制

带有透镜结构的发光管有利于提高器件的外量子效率和耦合效率。InP衬底对1.3μm波长范围的光发射是透明的,因而可制造带透镜结构器件。本文研究了4%CH3COOH体系腐蚀液和H3PO4:HCI体积比为1:3腐蚀液的腐蚀特性,比较了二者的活化能和腐蚀液的温度,状态和衬底晶向等对腐蚀速率的影响。并用二步腐蚀法在外延片的InP衬底上制成了带有透镜的InAsP/InP发光管。其曲率半径为160—170μm。该器件在彩色录像传输系统中的应用效果良好。     

Electron-hole liquid in GaS

Photoluminescence spectra of “pure” GaS are recorded under high excitation levels and low temperatures between 1.9 and 10K. This work reports a new and broad band which dominates the spectrum at high excitation intensities and temperatures near 1.9K. Its dependence on the excitation level is highly superlinear. When temperature is raised from 1.9 to 10K the spectrum observed of low excitation levels is recovered. We interpret the band here observed as due to radiative recombination from electron-hole droplets. From best fitting between experimental spectrum and calculated theoretical curves the critical density and the condensation energy are estimated as, n_c = 4.5 × 10²⁰ cm^?3 and φ = 9.0 meV.     

1．55μmInGaAsP及其相应量子阱结构的LP-MOCVD生长

本文研究了用低压金属有机化合物汽相外延(LP-MOCVD)技术在(100)InP衬底上生长InGaAsp体材料及InGaAP/InP量子阱结构材料的生长条件。三甲基镓(TM63)、三甲基铟(TMh)和纯的砷烷(A8H3)、磷烷(PH3)分别用作Ⅲ族和Ⅴ族源,在非故意掺杂情况下,InGaAsP材料的载流子浓度为3.6×10¹⁵cm^-3;在液氦温度和室温下,与InP晶格匹配的InGaAsP光致发光半峰宽分别为19.2meV和63meV;对外延层的组分及厚度均匀性分别进行了转靶X光衍射仪,低温光致发光和扫描电子显微镜分析,对不同阱宽的量子阱结构材料测出了由于量子尺寸效应导致光致发光波长随阱宽增加而红移现象。     

Magnetooptical properties of PbTe doping superlattices

Magnetotransmission experiments are performed with PbTe doping superlattices using far infrared laser lines. The data are interpreted with a model dielectric function. The quasi parabolic band gap variation causes a lifetime enhancement of non-equilibrium carriers generated by 300 K background radiation. Both electrons and holes contribute to the observed cyclotron resonances. Dedicated to Professor Karlheinz Seeger on the occasion of his 60th birthday     

Influence of material design parameters on radiative recombination in GaAs doping superlattices grown by MBE

The specific luminescence process in GaAs doping superlattices arises from recombination of electrons populating low-index conduction subbands with holes in the acceptor impurity band across the indirect gap in real space. The luminescence peak energy thus directly reflects the actual value of the tunable gap for the photoexcited state of the superlattice. We have studied the tunability of the effective gap, the recombination rate, and the relative quantum efficiency on superlattice specimen of different material design parameters by means of low-temperature photoluminescence measurements. For optimized design parameters the ratio between luminescence and excitation intensity remains nearly constant over the entire tunability range of the effective gap.     

InGaAsP/InGaAs tandem cells for a solar cell configuration with more than three junctions

Currently, triple‐junction solar cells realized from III–V semiconductor compounds hold the solar energy conversion efficiency world record. To improve the efficiency significantly, it is necessary to increase the number of junctions and to involve a sub‐cell with an absorber layer in the band gap range of 1 eV. For the realization of a stacked four‐junction device with optimised band gaps, we have grown InGaAsP/InGaAs tandem cells lattice matched to InP substrates, and investigated properties of the absorber bulk material. Time‐resolved photoluminescence of the low band gap In_0.53Ga_0.47As absorber embedded between InP barriers was measured. The InGaAs/GaAsSb tunnel diode structure used in the tandem has been processed into a separate device and I –V curves were measured. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Photoluminescence properties of thin nitrogen- and phosphorus-doped ZnO films fabricated using pulsed laser deposition

The production of n- and p-type high-quality film structures is a foreground task in tackling the problem of growing the light-emitting p-n junctions based on zinc oxide. The ZnO:N and ZnO:P thin-film samples are produced from ceramic targets using the pulsed laser deposition. Zn₃N₂, MgO, and Zn₃P₂ are introduced in the ZnO ceramic targets for the fabrication of the p-type ZnO films. Gases O₂ and N₂O are used as buffer gases. The thermal annealing of the ZnO films is employed. The resistance and photoluminescence (PL) spectra of the ZnO films are measured prior to and after annealing. The dependence of the ZnO PL peak amplitude and position prior to and after annealing on the level of doping with nitrogen and phosphorus is established. The PL characteristics of the films are studied at cw optical excitation using a He-Cd laser with a radiation wavelength of 325 nm. The PL spectra in the interval 300–700 nm are recorded by an HR4000 Ocean Optics spectrometer in the temperature range 10–400 K. The effect of the conditions for the film deposition on the PL spectra is analyzed. The effect of the N- and P-doping level of the ZnO films on the PL intensity of the films and the position of the PL bands in the UV region is investigated. The short-wavelength (250–400 nm) transmission spectra of the ZnO:P films are measured. The effect of the P-doping level on the band gap of the ZnO films is studied.