共查询到20条相似文献,搜索用时 109 毫秒
1.
采用磁控溅射工艺,在Pt/Ti底电极上沉积锆钛酸铅(PZT)薄膜,研究了原位退火温度与底电极沉积温度对溅射PZT薄膜结晶取向、微观结构、介电性能、铁电性能及疲劳性能的影响。X射线衍射(XRD)和扫描电子显微镜(SEM)分析结果表明,随着电极沉积温度升高,Pt晶粒尺寸增大,随着退火温度升高,PZT薄膜致密性变差。对室温制备的Pt/Ti底电极进行200 ℃原位退火30 min后,易于促进PZT薄膜沿(100)择优取向,而高温制备或经高温退火处理的Pt/Ti底电极更有利于PZT薄膜的(111)晶向生长。电学性能分析表明,室温制备的Pt/Ti底电极在经200 ℃原位退火30 min后,其PZT薄膜介电性能最优,同时展现较高的剩余极化强度和最小的矫顽场强,经历108次极化翻转后,初始极化下降仅为11%。 相似文献
2.
3.
4.
在SiO2/Si基片上采用直流对靶溅射技术制备出Pt/Ti底电极;应用射频磁控溅射方法,利用快速热处理(RTA)工艺,制备出了具有良好铁电性能的Pb(Zr0.52Ti0.48)O3铁电薄膜.将样品进行10min快速热退火处理,退火温度700℃.测试分析表明:薄膜厚度比较均匀、表面基本平整、没有裂纹和孔洞、致密性好、薄膜样品的矫顽场强(Ec)为28.6kV/cm,剩余极化强度(Pr)为18.7μC/cm2,自发极化强度(Ps)为37.5μC/cm2,是制备铁电薄膜存储器的优选材料. 相似文献
5.
6.
《硅酸盐学报》2016,(7)
采用直流磁控溅射系统在玻璃衬底上制备了氧化铟锡(ITO)薄膜。通过X射线衍射仪、扫描电子显微镜、分光光度计、Hall效应测试系统研究了热退火与原位生长、衬底温度、直流溅射功率对薄膜结构、表面形貌以及光电性能的影响。结果表明:与室温生长并经410℃热退火后的薄膜相比,410℃原位生长可获得光电性能更好的薄膜;随着衬底温度的增加,电阻率单调减小,光学吸收边出现蓝移;在溅射功率为85 W时薄膜的光电性能达到最佳。在衬底温度为580℃、溅射功率为85 W的工艺条件下,可制备出电阻率为1.4×10~(–4)?·cm、可见光范围内平均透过率为93%的光电性能优异的ITO薄膜。 相似文献
7.
8.
9.
10.
11.
Huiting Chen Dawei Yu Xianling Dong Ning Duan Yongling Wang 《Ferroelectrics Letters Section》1995,20(1):35-40
The ferroelectric PZT thin films were prepared on Pt/Ti/SiO2/Si substrate by RF sputtering method followed by the rapid thermal annealing. The preparation of the Pt and Ti thin films as bottom electrode, and their influences on the PZT thin films were studied in details. The substrate temperature during sputtering was room temperature; the rapid thermal annealing temperature was 500°C-750°C and the annealing time was 30-70s. The influences of different preparation parameters on the structure and electric properties were studied with X-ray diffraction technique and RT66A Standardized Ferroelectric Test System. The electric properties of the prepared PZT thin film was: Pa=39μc/cm2, Pr = 9.3 μc/cm2, Ec=28KV/mm, ε=300, p=109ω⋅cm. 相似文献
12.
《Ceramics International》2016,42(5):5754-5761
AZO/Cu/AZO multilayer thin films produced under different annealing conditions are studied in this paper, to examine the effects of atmosphere and annealing temperature on their optical and electrical properties. The multilayer thin films are prepared by simultaneous RF magnetron sputtering (for AZO) and DC magnetron sputtering (for Cu). The thin films were annealed in a vacuum or an atmosphere of oxygen at temperatures ranging from 100 to 400 °C in steps of 100 °C for 3 min. High-quality multilayer films (at Cu layer thickness of 15 nm) with resistivity of 1.99×10−5 Ω-cm and maximum optical transmittance of 76.23% were obtained at 400 °C annealing temperature in a vacuum. These results show the films to be good candidates for use as high quality electrodes in various displays applications. 相似文献
13.
Ho Young Park Sang Cheol Nam Young Chang Lim Kyu Gil Choi Ki Chang Lee Gi Back Park Heesook Park Kim Sung Baek Cho 《Korean Journal of Chemical Engineering》2006,23(5):832-837
LiCoO2 thin film cathodes were prepared by RF magnetron sputtering and post-annealing. The surface morphological change of the LiCoO2 thin film wasin-situ measured by hot stage SEM with increasing temperature. The effects of sputtering gas pressure and post-annealing at low temperature
(400 °C) were investigated by XRD, AFM, ICP-AES and RBS. The electrochemical characteristics of LiCoO2 thin films were changed with variation of sputtering gas pressure. A difference of micro-structural evolution after post-annealing
was observed, which related to the thin film properties. The electrochemical analysis revealed that the optimal sputtering
gas pressure with the low temperature annealing step increases cell capacity and rate capability. 相似文献
14.
Transparent ZnO and Al-doped ZnO (AZO) thin films have been prepared by radio frequency sputtering deposition at room temperature. The optical, electrical, and structural characteristics of the obtained films have been extensively investigated as a function of sputtering and annealing parameters. Spectrophotometry, X-ray diffraction (XRD), atomic force microscopy (AFM), four-point probe and Hall-effect measurements were employed. The ZnO films generally exhibited excellent crystalline properties, while providing a UV cut-off in the absorption spectrum for optical filtration. AZO thin films exhibited an average transparency (larger than 85%) over the visible region of the spectrum, and resistivity of the order of 10?3 Ω cm was obtained. The carrier concentration and electron mobility values proved to be dependent on the deposition parameters and annealing temperature. The obtained results showed that annealing temperatures higher than 400 °C were not necessary and potentially degraded the electronic properties of the AZO thin films. 相似文献
15.
16.
17.
Effects of NIR annealing on the characteristics of al-doped ZnO thin films prepared by RF sputtering
Aluminum-doped zinc oxide (AZO) thin films have been deposited on glass substrates by employing radio frequency (RF) sputtering method for transparent conducting oxide applications. For the RF sputtering process, a ZnO:Al2O3 (2 wt.%) target was employed. In this paper, the effects of near infrared ray (NIR) annealing technique on the structural, optical, and electrical properties of the AZO thin films have been researched. Experimental results showed that NIR annealing affected the microstructure, electrical resistance, and optical transmittance of the AZO thin films. X-ray diffraction analysis revealed that all films have a hexagonal wurtzite crystal structure with the preferentially c-axis oriented normal to the substrate surface. Optical transmittance spectra of the AZO thin films exhibited transmittance higher than about 80% within the visible wavelength region, and the optical direct bandgap (Eg) of the AZO films was increased with increasing the NIR energy efficiency. 相似文献
18.
《Diamond and Related Materials》1999,8(6):993-995
Atomic force microscopy is used to study the effects of thermal annealing on the surface topography and the tribological properties of amorphous carbon nitride thin films deposited by r.f. magnetron sputtering. The results show that the surface roughness decreases with increasing annealing temperature. The friction coefficients at the interface between a Si3N4 tip and the amorphous carbon nitride films surface decrease with increasing smoothness of the surface. 相似文献
19.
《Ceramics International》2020,46(9):13365-13371
In this work, n-type Bi2Te3 based thin films were prepared in 300 °C via DC magnetron sputtering, and influences of sputtering power and annealing time on thermoelectric properties of films were investigated. The raise of sputtering power brings about the improvement of deposited rate and enhancement of grain size. Taking the consideration that the large-sized grains are to phonon scattering, we determine the medial power of 30 W as the basic technical parameters for the purpose of further optimizing performance through an in situ annealing process. Subsequently, thin-film treated by in situ annealing process acts out an obvious reduction in electrical conductivity attributed to the decrease in carrier concentration. Especially, the film annealed for 40 min shows an enhancement in the Seebeck coefficient and leads to a maximum power factor 0.82 m W m−1 K−2 at 543 K. 相似文献
20.
Arun Vijayakumar Ravi M. Todi Andrew P. Warren Kalpathy B. Sundaram 《Diamond and Related Materials》2008,17(6):944-948
Optical properties of amorphous thin films of silicon carbon boron nitride (Si–C–B–N) obtained by reactive sputtering has been studied. Compositional variations were obtained by changing the nitrogen and argon gas mixture ratio in the sputtering ambient. The effect of gas ratios and annealing on the optical properties was investigated. It was found that the transmittance of the films increases with nitrogen incorporation. Annealing at higher temperatures leads to considerable increase in transmittance. Optical energy gap (Tauc gap) calculated from absorption data is influenced by annealing temperatures and reactive process gas mixture. Changes in optical properties were correlated to the chemical modifications in the films due to annealing, through X-ray photoelectron spectroscopy. Studies reveal that the carbon and nitrogen concentrations in the films are highly sensitive to temperature. Annealing at higher temperatures leads to broken C–N bonds which results in the loss of C and N in the films. This is believed to be the primary cause for variations in optical properties of the films. 相似文献