(Ni0.81Fe0.19)66Cr34缓冲层对Ni74Co26薄膜各向异性磁电阻的影响

用磁控溅射方法制备了以Ta和非磁性(Ni0.81Fe0.19)66Cr34为缓冲层的Ni74Co26薄膜,研究了它们的各向异性磁电阻效应.结果表明用厚度为4.5nm的非磁性(Ni0.81Fe0.19)66Cr34做缓冲层的Ni74Co26薄膜,其各向异性磁电阻(AMR)值比用10nm的Ta做缓冲层的同样厚度的Ni74Co26薄膜的AMR有较大的提高.比如,当Ni74Co26薄膜的厚度为12.5nm时,AMR值能提高43%.X射线衍射(XRD)研究表明缓冲层(Ni0.81Fe0.19)66Cr34与磁性层Ni74Co26有非常接近的晶格常数,因此产生了较大的AMR值.     

超薄Ni81Fe19薄膜的各向异性磁电阻及磁性能

利用磁控溅射方法制备了一系列超薄Ta(5nm)/Ni81Fe19(20nm)/Ta(3nm)磁性薄膜。着重研究了基片温度、缓冲层厚度对Ni81Fe19薄膜各相异性磁电阻(AMR)及磁性能的影响。利用X射线衍射仪分析了薄膜结构、晶粒取向;用四探针技术测量了薄膜的电阻率和各向异性磁电阻;用FD-SMOKE-A表面磁光克尔效应试验系统测量了薄膜的磁滞回线。结果表明:在基片温度为400℃时制备的Ni81Fe19薄膜具有较大的各向异性磁电阻效应和较低的磁化饱和场,薄膜最大各向异性磁电阻为3.5%,最低磁化饱和场为739.67A/m。基片温度为500℃制备的薄膜,饱和磁化强度Ms值最大。随着缓冲层厚度x的增加,坡莫合金薄膜的AMR值先变大后减小,在x=5nm时达到最大值。     

非均匀退磁场对NiFe薄膜AMR元件性能的影响

采用磁控溅射制备了NiFe各向异性磁电阻(AMR)薄膜,经过光学曝光及离子刻蚀将NiFe薄膜制成了宽度w=20μm、厚度t=20nm、长度l=2.5mm的AMR元件.测量了NiFe元件的磁电阻效应.考虑沿宽度方向退磁场的非均匀性,计算了磁电阻比率.结果表明,理论和实验符合.     

较薄坡莫合金薄膜的磁性能和结构

基于辉光放电原理在不同的溅射气压下制备的NiFe薄膜,发现较低溅射气压下比较高溅射气压下制备的NiFe薄膜的磁性能要好得多.较低溅射气压下制备的NiFe(12nm)薄膜,各向异性磁电阻(AMR)值达到1.2%,而其矫顽力却只有127.4A/m.结构分析表明较低溅射气压下制备的NiFe薄膜结构缺陷较少,内应力小;而较高溅射气压下制备的NiFe薄膜结构缺陷较多,内应力大.     

基片表面粗糙度对坡莫合金AMR以及磁性能的影响

利用霍尔离子源轰击Si基片获得了不同表面粗糙度的基片,然后利用磁控溅射方法制备了一系列Ta(5nm)/Ni 80Fe 20(12nm)/Ta(2nm)薄膜样品,重点研究了基片表面粗糙度对薄膜结构和各向异性磁阻效应的影响。采用AFM测量基片的表面粗糙度,采用四探针法测量薄膜的各向异性磁阻效应。研究结果表明,随着基片表面粗糙度的增加,坡莫合金的AMR值显著降低,且ΔH显著增加。     

溶液pH对液相沉积氢氧化镍薄膜的影响

采用液相沉积法在不同pH值溶液中制备了多孔氢氧化镍(Ni(OH)₂)薄膜. 当溶液pH值在7.5～8.8之间变化时, 能在基片上形成均匀连续的由Ni(OH)₂纳米棒搭接组成的多孔薄膜, 主要晶型为β-Ni(OH)₂. 溶液pH值的微小变化会引起薄膜中棒状Ni(OH)₂尺寸的显著改变: 当pH=7.5时, Ni(OH)₂纳米棒的长度约为80nm, 直径约为50nm; 当pH=7.8时, Ni(OH)₂纳米棒的长度增大到180nm, 直径约为60nm; 当pH=8.0时, Ni(OH)₂纳米棒的长度显著增大约为300nm, 直径约为70nm. 然而, 当pH=8.3时, Ni(OH)₂纳米棒的长度减小约为230nm, 直径约为80nm; 当pH=8.8时, 纳米棒长度迅速减小约为110nm, 直径减小约为55nm. 结合Ni(OH)₂成核、生长过程和β-Ni(OH)₂晶体结构特点讨论了溶液pH值对Ni(OH)₂薄膜微观形态的影响机制.     

较薄坡莫合金薄膜的磁性能和结构

基于辉光放电原理在不同的溅射气压下制备的NiFe薄膜,发现较低溅射气压下比较高溅射气压下制备的NiFe薄膜的磁性能要好得多。较低溅射气压下制备的NiFe(12nm)薄膜,各向异性磁电阻（AMR）值达到1．2％,而其矫顽力却只有127．4A／m。结构分析表明：较低溅射气压下制备的NiFe薄膜结构缺陷较少,内应力小;而较高溅射气压下制备的NiFe薄膜结构缺陷较多,内应力大。     

不同催化剂作用下生长的碳纳米管和碳纳米纤维复合膜的电吸附性能(英文)

采用低压低温气相沉淀法在不同催化剂(Fe和Ni)作用下制备碳纳米管-碳纤维复合薄膜,并研究其电容去离子行为,结果表明:在Ni催化作用下石墨上生长的碳纳米复合薄膜电极的去离子能力比Fe催化作用下生长的碳纳米复合薄膜电极的强;并且碳纳米复合薄膜的电吸附遵循langmuir单层等温吸附.     

电沉积铁镍纳米合金薄膜的结构和性能研究

采用电沉积方法从硫酸盐体系镀液中沉积得到Fe18Ni82合金薄膜.运用扫描电子显微镜(SEM),原子力显微镜(AFM),透射电子显微镜(TEM)和X射线衍射分析(XRD)以及磁测量设备分别对薄膜的表面形貌、显微结构和磁性能进行表征和测量.同时利用万能材料试验机和显微硬度计测量了薄膜的力学性能.结果表明:电沉积制备的Fe18Ni82合金薄膜成分均匀,表面平整、光亮、致密,晶粒大小为40～50 nm.薄膜是以Ni为溶剂原子,Fe为溶质原子的置换型固溶体,只存在单一的fcc相,Fei8Ni82合金薄膜沿(111)面有较强的择优取向.镀态Fei8Ni82合金薄膜在50 Hz交流磁场下,测得其饱和磁感应强度为1.08 T,最低矫顽力为20 A/m.19 μm厚的纳米晶薄膜的断裂应力达到785MPa,显微硬度达到605Hv.     

具有优异力敏特性的纳米Fe50Ni50粉体/丁基橡胶复合材料薄膜

为开发力敏性能更为优异的复合材料薄膜,首先,通过液相还原法制备了粒径约为100 nm的纳米Fe50Ni50粉体,并通过液态混合分散工艺将纳米粉体与丁基橡胶(IIR)混合分散;然后,通过机械混炼及压制得到了粉体分布均匀、含量为65wt%的纳米Fe50Ni50粉体/IIR复合材料薄膜;最后,研究了在连续加载/卸载速度为0.10 mm/min、测试频率为1 kHz的条件下,纳米Fe50Ni50粉体/IIR复合材料薄膜的力敏特性。结果表明:液态混合分散工艺可使Fe50Ni50粉体在复合材料薄膜中达到纳米级均匀分散效果;当压应力为0.20~0.90 MPa时,薄膜越厚,其标准偏差越大,力敏稳定性越差;随压应力增大,厚度为185μm的薄膜在加载阶段的阻抗近似线性下降,力敏灵敏度稳定在40~60范围内,标准偏差约为1~2。所得结论表明在压应力为0.20~0.90 MPa时,制备的薄膜具有优异的力敏特性。      

氢对Fe基和Fe-Ni基金属玻璃磁性和杨氏模量的影响

使用大角转动张力磁化法研究了金属玻璃 Fe_(80)Si_4B_4C_7,Fe_(39)Ni_(39)Si_8B_(12)Mn_2和(Fe_(30)Ni_(20))_(78)Si_(?)B_(14)三种样品渗氢及室温时效中磁化曲线和磁致伸缩系数λ_s 的变化,用动态测量方法研究了以上样品杨氏模量的变化。结果表明,含氢的金属玻璃饱和磁化强度 M:下降,而各向异性常数增大,相应饱和磁致伸缩系数λ(?)减小,同时杨氏模量降低。     

交换耦合双层膜NiO/Ni81Fe19的基片温度效应研究

用射频磁控溅射方法在不同基片温度下玻璃基片上分别制备NiO单层膜、NiFe单层膜和NiO／NiFe双层膜,研究了不同基片温度对膜的磁性能的影响．用振动样品磁强计（VSM）分析了膜的磁特性,结果表明：基片温度260℃时淀积的NiFe膜矫顽力Hc为184A·m^－1,小于室温淀积NiFe膜的H_c（584A·m^－1）,且磁滞回线的矩形度更好．室温下淀积NiO（50nm）／NiFe（15nm）双层膜的Hc为4000A·m^－1,交换耦会场（H_EX）仅为1600A·m^－1,磁滞回线的短形度很差,而260℃时淀积的双层膜的Hc下降到3120A·m^－1,H_EX却增大为4640A·m^－1,同时磁滞回线的矩形度也得到改善,其截止温度T_B高达230℃．X射线衍射（XRD）分析了膜的织构,结果表明：室温下淀积NiO膜呈现（220）织构,而260℃时淀积NiO膜呈现（111）织构;室温和260℃淀积的NiFe膜都呈（111）织构,但后者晶粒比前者大．     

Natural Passivity of Amorphous Fe_(40)Ni_(40)P_(14)B_6 and Fe_(54.6)Ni_(38)Si_(4.1)B_(2.3)V_1 Alloys

The natural passive films forrned on Fe_(40)Ni_(40)P_(14)B_6 and Fe_(54.6)Ni_(38)Si_(4.1)B_(2.3)V_1 amorphous alloys long-term exposed in air have been studied by X-ray photoelectron spectroscopy (XPS) and Auger electron (including Ar+ ion depth profiling) spectroscopy (AES). The following aspects have been investigated: (1) chemical states of the elements in the films. binding energies and the chemical shifts measured by XPSf (2) structure and composition of the films fand (3) thickness of the passive films determined by AES depth profiling and XPS analysis.     

Surface Characterization of Ni_(64)P_(20)Fe_(16)Amorphous Alloy by X-ray Photoelectron Spectroscopy and Auger Electron Spectroscopy

The nature of the native oxides formed on thesurface layer of amorphous alloy Ni_(64)P_(20)Fe_(16)hasbeen studied by X-ray photoelectron spectroscopy(XPS)and Auger electron spectroscopy(AES)withdepth profiling by ion bombardment.There aregreat distinctions in compositions and chemicalstates between the surface layer and the bulk.Themain constituents Ni,P and Fe are lower in the sur-face layer,and they are mostly in oxidized states,whereas C,O and N are enriched in the surface lay-er.The thickness of surface oxide layer isapproximately 20 nm,this layer was assumed to beof great significance to various properties of amor-phous alloy Ni_(64)P_(20)Fe_(16),expecially to the chemicaland catalytic properties.Experiments proved thattransitional element Fe cannot improve oxidationresistance of the amorphous Ni-P system.     

Ni0.5Zn0.5Fe2O4粉末化学镀铜前后的电磁性能

本文用溶胶-凝胶自燃烧法制备了Ni0.5Zn0.5Fe2O4粉末颗粒,以甲醛为还原剂在Ni0.5Zn05Fe2O4颗粒表面进行了化学镀铜,制备了Cu/Ni0.5Zn0.5Fe2O4复合粉体.用扫描电镜(SEM)、能谱仪(EDS)和X射线衍射仪(XRD)对镀铜前的Ni0.5Zn0.5Fe2O4颗粒以及镀铜后的复合纳米颗粒进行了表征.对镀铜前的Ni0.5Zn0.5Fe2O4粉体和不同镀铜量的Cu/Ni0.5Zn0.5Fe2O4复合粉体进行了电磁性能的研究,结果表明镀铜后镍锌铁氧体的吸波性能明显提高,增重量为65%的Cu/Ni0.5Zn0.5Fe2O4复合粉体在频率为11GHz处反射率可达-12dB左右.     

ZnO包覆Fe0.7Ni0.3对电磁参数的影响

为了降低Fe0.7Ni0.3的介电常数,采用机械合金化方法制备了以ZnO为外壳,具有核壳结构的Fe0.7Ni0.3颗粒,利用SEM、XRD对Fe0.7Ni0.3包覆前后样品的形貌和相组成进行了分析,并用矢量网络分析仪研究了ZnO包覆、ZnO包覆量、包覆时间对Fe0.7Ni0.3电磁参数的影响.结果表明:ZnO包覆可明显降低Fe0.7Ni0.3的介电常数,同时降低磁导率虚部;磁导率实部随频率先降后升;ZnO包覆量、包覆时间均对Fe0.7Ni0.3的电磁参数有明显影响.     

Nanostructured amorphous Fe_(29)Co_(27)Ni_(23)Si_9B_(12) high-entropy-alloy:an efficient electrocatalyst for oxygen evolution reaction

Proximal configu ration of dissimilar metal atoms in amorphous high-entropy-alloys(HEAs) always re sult in interatomic d-band ligand effect,dense defect distribution,coordinatively unsaturated sites,high potential energy,and loose atom bonding.Herein,nanostructured amorphous Fe₂₉Co₂₇Ni₂₃Si₉B₁₂ HEA ribbon is fabricated via a melt spinning method combined with electrochemical corrosion etching process,which is applied as the potential oxygen evolution reaction electrocatalyst.It is found that there are micro/nano pits on the surface of etched amorphous Fe₂₉Co₂₇Ni₂₃Si₉B₁₂ ribbons.Various elements of HEAs bond with each other to form a highly disordered configu ration,which could result in an optimized bonding energy and enhanced intrinsic catalytic activity.The electrocatalysis activity measurements indicate that the amorphous HEA endows a much higher activity than the crystalline one,which is further improved by the electrochemical etching treatment.Especially,the HEA ribbon etched for 3 h requires a low overpotential of 230 mV to afford 10 mA cm^-2 current density.In addition,density functional theory calculations demonstrate that the amorphous structure can weaken the interaction between the surface of Fe₂₉Co₂₇Ni₂₃Si₉B₁₂ alloy and the intermediates,leading to an optimized adsorption Gibbs free energy.     

Influence of Metalloid Elements on the Magnetic Properties and Anisotropy of FeNi-based Amorphous Alloys

The magnetic properties and anisotropy of amor-phous(Fe_(80)Ni_(20))_(78)Si_xB_(22-x).alloys have been investigatedsystematically.The maximum permeability,coercive forceand remanence have been determined for as-prepared andannealed samples,The results on the technical magneticproperties of this alloy system have been discussed andcompared with Masumoto's.     

Fe+Ni+C体系合成粗颗粒金刚石单晶的生长特征

在配备有高精密化控制系统SPD6×1670T型国产六面顶压机上,采用Fe80Ni20粉末触媒和高纯石墨开展粗颗粒金刚石单晶的生长特征研究。在粉末触媒技术合成金刚石的基础上,引入旁热式组装,以及采用优选粒度的触媒,特别是通过优化合成工艺严格地控制了合成腔体内晶体的成核量及生长速度。最终,在高温高压条件下(约5.4GPa、1435℃)成功合成出尺寸达到0.95mm(18/20目)的优质的粗颗粒金刚石单晶,分析了粗颗粒金刚石的生长特征和晶体缺陷,期待研究的结果有助于我国高品级粗颗粒金刚石的发展。     

Effect of annealing on magnetic properties of Ni80Fe20 permalloy nanoparticles prepared by polyol method

Ni80Fe20 permalloy nanoparticles with narrow size distribution and homogeneous composition have been prepared by the polyol processing at 180 degrees C for 2 h and their particle sizes can be tunable in the size range of 20-440 nm by proper addition of K2PtCI4 agent. X-ray diffraction results show that the NiFe nanoparticles are of face centered cubic structure. The addition of K2PtCl4 does not affect the composition of NiFe NPs but decreases the particle size remarkably. Both saturation magnetization and coercivity of the as-prepared NiFe nanoparticles decrease with decreasing particle size. Annealed at 280 degrees C, however, the saturation magnetization of various sized NiFe nanoparticles increases drastically and approaches to the bulk for the -440 nm NiFe particles, and a maximum coercivity (-270 Oe) happens at a critical size of -50 nm. The magnetic property dependency of these NiFe nanoparticles on annealing has been discussed by considering the surface chemistry.