共查询到20条相似文献,搜索用时 78 毫秒
1.
2.
作者总结了铸造用木模在模样结构,起模装置和模样工艺设计方面如何适应冷硬呋喃树脂砂工艺的要求,从而为提高常温固化树脂砂铸件质量创造了条件。 相似文献
3.
4.
本文根据多年生产实际,总结了铸造用木模的模型结构、起模装置和模型工艺设计方面对冷硬呋喃树脂砂工艺的适用特点。从而在一个侧面为提高树脂砂铸件质量提供了新的可能性。 相似文献
5.
采用分解拆图法制作铸件木模山东铝业公司恒成机械厂(淄博255065)马贤昆目前,在铸件产品复杂多样的厂家,一般砂型铸造采用的模样仍以木模为多。对于这些厂家,木模制作是铸件生产的第一道工序,其进度直接影响到以后铸件的交货期和企业的信誉,因此保证木模的质... 相似文献
6.
木模材是一种需要量大的特种工业用材,具有严格的特殊技术要求。据初步调查,全国每年需木模材约50万立方米。传统的木模材树种主要是红松、柏木、梓木和楠木等珍贵树种。这些树种一般生长较缓慢,加上长期生产 相似文献
7.
8.
TN—80型/TN—110型拖拉机“大箱体”木模制作方法探讨 总被引:1,自引:0,他引:1
介绍了新产品轮式“铁牛”80马力拖拉机变速箱与后桥本体、“铁车”110马力拖拉机传动箱壳体的木模制做方法,以及用这种方法延长了木模使用寿命并带来可观的经济效果。 相似文献
9.
10.
浇道是木模不可缺少的组件之一,传统浇道制作的连接方式多采用手工扒槽镶嵌结构,制作比较费时.现采用等分角度对接结构,制作比较方便、省时,对于单件铸件的模型制作,选用泡沫型材进行等分角度对接结构制作浇道,更是方便. 相似文献
11.
12.
工艺因素对消失模铸造用聚苯乙烯模样收缩的影响 总被引:5,自引:2,他引:3
指出了对消失模铸造用聚苯乙烯模样收缩展开研究的必要性,研究了可发性聚苯乙烯(EPS)珠粒粒径、预发泡时间、预发泡珠粒熟化时间、成形蒸汽压力及模样的放置时间、贮存温度对模样收缩的影响,认为模样中发泡剂和水分的挥发以及应力的释放是引起模样收缩的主要原因,最后提出了在实际生产中为减少模样收缩应采取的措施。 相似文献
13.
14.
15.
对国内外消失模铸造泡沫模样和涂料的检测方法进行了论述。主要描述了目前检测技术的不足和发展趋势,X光透射、扫描电镜等先进技术开始应用于模样质量的评测。由于涂料的检测内容复杂且方法众多,行业内尚无统一标准,开发新的检测方法和标准是消失模铸造发展的迫切要求。 相似文献
16.
对低分子聚乙烯模料使用中出现的渣化现象进行了探讨,通过多次试验取得了理想的回收效果,证实了低分子聚乙烯模料没有皂化现象。 相似文献
17.
18.
The basic layer-based manufacturing mechanism of stereolithography is built upon a scanning pattern for the entire cross section for each layer. In this investigation, a new schema of scanning is proposed and its effects on dimensional accuracy and surface profile are benchmarked against an industry standard scanning pattern. Experimental results show that the new scanning pattern offers further improvements in terms of dimensional accuracy and geometrical profile as supported by a higher value of process capability index Cpk. The use of Finite Element method to simulate the new scanning pattern is also described in order to provide an analogous insight on process effects and residual stress distribution. 相似文献
20.
Test masks for characterizing pattern dependent variations in the thickness remaining after chemical-mechanical polishing
(CMP) were designed taking the experimentally obtained interaction distance into consideration. Polishing behaviors were characterized
with layout pattern density and pitch variations using these masks. The deposition profile effects were also compared between
PETEOS (Plasma Enhanced Tetra Ethyl Ortho Silicate) and HDP (High Density Plasma) oxide. Both measured post-CMP thickness
and the expected oxide pattern density from a consideration of the deposition profile effects showed good correlation with
respect to pitch variation for a constant layout pattern density. Also, the relationship between the remaining thickness and
true layout pattern density were deduced. Secondly, chip-level CMP modeling was investigated to obtain the post-CMP thickness
distributions across a die from its design layout and a few oxide film and CMP parameters. The experimental CMP results agreed
well with the modeling results. The effective dummy filling results were shown to achieve a smaller pattern density variation,
which resulted in uniformly better post-CMP thickness. Finally, whether the resulting oxide thickness can be predicted for
any location on a die for an arbitrary layout if the effective pattern density distributions are calculated is discussed. 相似文献