Electroptic diffraction modulation in ZnO film on sapphire

An electrooptic Bragg diffraction modulator with high diffraction efficiency which utilizes a low-loss epitaxial ZnO optical waveguide on a sapphire substrate is discussed. An interdigital electrode with a spatial period of 20 μm and an aperture of 3 mm was fabricated directly on the film surface using a photolithographic technique. For the TE₀ mode at 6328 Å, a maximum diffraction efficiency of 98% has been obtained from DC to 100 kHz with an applied voltage of about 31 V. The unclamped electrooptic coefficient r ₃₃ is estimated to be 5.8×10^-12 m/V which is much larger than the clamped value of 2.6×10^-12 m/V in the literature     

Determination of nonlinear gain coefficient of semiconductor lasersfrom above threshold spontaneous emission measurement

The measurement of spontaneous emission power above threshold has shown a nearly linear increase with biasing current in a 1.55-μm InGaAs/InGaAlAs multiple quantum-well laser. Based on this measurement, we propose a novel experimental method to determine the nonlinear gain coefficient. The obtained value is 1.2×10^-17 cm³ for the laser used. This value corresponds reasonably to that obtained by chirp-to-modulated-power ratio method, confirming the validity of this new measurement method     

Electrooptic effect in CdTe at 23.35 and 27.95 microns

The unlamped electrooptic coefficient r41of high-purity CdTe has been measured at 23.35 and 27.95 micros in the far infrared. The values obtained for n0³r41are 9.4 × 10^-11m/V at 23.35 µ and 8.1 × 10^-11m/V at 27.95 µ. Using previously reported values for n0, the electrooptic coefficients are found to be 5.5 × 10^-12m/V at 23.35 µ and 5.0 × 10^-12m/V at 27.95 µ. These measurements extend the region of observed electrooptic effect from 16 µ, previously obtained using GaAs, to 28 µ using CdTe.     

Electroabsorption and electrooptic effect in SiGe-Si quantum wells:realization of low-voltage optical modulators

We have calculated the behavior of the band-to-band absorption coefficient in square, coupled, and graded bandgap Si_0.6Ge _0.4-Si quantum wells as a function of the transverse electric field. It is seen that due to the weak confinement of the electrons (ΔE_c⩽20 meV) the absorption of photons with energy equal to the interband transition energy can be reduced at very small values of the transverse electric field. This phenomenon lends itself to the design of efficient amplitude modulators. In addition, the resulting change in the refractive index is also large and the corresponding linear electrooptic coefficient is calculated to be as large as 1.9×10^-10 m/V in square wells. This effect could prove to be the basis for the realization of efficient Si-based electrooptic modulators. Device designs are discussed     

Measurement of gain saturation coefficients in strained-layermultiple quantum-well distributed feedback lasers

Gain saturation coefficients of unstrained- and strained-layer multiple-quantum-well lasers were measured experimentally. These coefficients were higher in lasers that had compressive strain in their active-layer wells: 2.45×10^-17 cm³ with unstrained wells and 12.6×10^-17 cm³ with strained wells. The higher gain saturation coefficient in lasers with strained active-layer wells is related to their higher linear TE mode gain coefficient. The linearity factor (K factor) between a laser's damping constant and the square of the laser's resonant frequency decreased slightly with the introduction of the strain in the laser's active layer wells. This factor, however, took the value of about 0.2×10^-9 s for each of these lasers     

Measurement of nonlinear coefficient and phase matchingcharacteristics of AgGaS2

The nonlinear optical characteristics of AgGaS₂ were investigated by measuring visible parametric fluorescence with a pump wavelength of 600 nm. A value of d₃₆ [AgGaS₂ ]=31±5×10^-12 m/V for the nonlinear coefficient was determined. The temperature dependence of phase matching up to 100°C was studied. A significant temperature effect, although much smaller than for LiNbO₃, was found and results in a change in the infrared difference frequency generated of ~0.6 cm^-1 -°C^-1     

Lasing mode behavior of a single-mode MQW laser injected with TMpolarized light

The lasing mode behavior of a multiple quantum well (MQW) distributed feedback (DFB) laser was measured when intensity-modulated orthogonally polarized transverse magnetic (TM) mode light was injected. The 3-dB bandwidth of the frequency response shows a trend different from that observed with conventional bias current modulation: at high bias currents, it decreases with increasing bias current. The maximum bandwidth of 3 dB was observed when the normalized bias current was 4, and it reached 16 GHz at this bias current. The gain saturation coefficients for the transverse electric (TE) and TM modes estimated from these results were ∈_p^E; 2.5×10^-17 cm³ and ∈_q^E 5.7×10^-18 cm³ for the TE mode, and ∈_p^M: 6.0×10^-17 cm³ and ∈_q^M: 2.0×10^-14 cm³ for the TM mode     

Measurement of mode couplings and extinction ratios inpolarization-maintaining fibers

Polarization mode couplings in the axial direction are evaluated for polarization-maintaining fibers using optical heterodyne detection. To verify the validity of this approach for fibers with various coupling constants, the method is applied to three fibers with modal birefringence values of 3.0×10^-4, 1.1×10^-4 , and 1.5×10^-4, respectively. The coupling constants in the 1.7×10^-4 m^-1 to 6.4×10^-7 m^-1 range are evaluated with a length resolution of 1 m. The extinction ratios are obtained from the coupling constants averaged over the fiber lengths. These values are in good agreement with the values measured directly from power ratios between the orthogonally polarized modes     

Experimental determination of electron drift velocity in 4H-SiC p+-n-n+ avalanche diodes

4H-SiC p⁺-n-n⁺ diodes of low series resistivity (<1×10^-4 Ω·cm²) were fabricated and packaged. The diodes exhibited homogeneous avalanche breakdown at voltages U_b=250-270 V according to the doping level of the n layer. The temperature coefficient of the breakdown voltage was measured to be 2.6×10^-4 k^-1 in the temperature range 300 to 573 K. These diodes were capable of dissipating a pulsed power density of 3.7 MW/cm² under avalanche current conditions. The transient thermal resistance of the diode was measured to be 0.6 K/W for a 100-ns pulse width, An experimental determination of the electron saturated drift velocity along the c-axis in 4H-SIC was performed for the first time, It was estimated to be 0.8×10⁷ cm/s at room temperature and 0.75×10⁷ cm/s at approximately 360 K     

Bi1.5Zn1.0 Nb1.5O7栅绝缘层的SiO2修饰对ZnO-TFTs性能的影响

具有高介电常数的栅绝缘层材料存在某种极化及耦合作用,使得ZnO-TFTs具有高的界面费米能级钉扎效应、大的电容耦合效应和低的载流子迁移率.为了解决这些问题,本文提出了一种使用SiO₂修饰的Bi_1.5Zn_1.0Nb_1.5O₇作为栅绝缘层的ZnO-TFTs结构,分析了SiO₂修饰对栅绝缘层和ZnO-TFTs性能的影响.结果表明,使用SiO₂修饰后,栅绝缘层和ZnO-TFTs的性能得到显著提高,使得ZnO-TFTs在下一代显示领域中具有非常广泛的应用前景.栅绝缘层的漏电流密度从4.5×10^-5A/cm²降低到7.7×10^-7A/cm²,粗糙度从4.52nm降低到3.74nm,ZnO-TFTs的亚阈值摆幅从10V/dec降低到2.81V/dec,界面态密度从8×10¹³cm^-2降低到9×10¹²cm^-2,迁移率从0.001cm²/（V·s）升高到0.159cm²/（V·s）.     

Diamond cold cathode

Diamond cold cathodes have been formed by fabricating mesa-etched diodes using carbon ion implantation into p-type diamond substrates. When these diodes are forward biased, current is emitted into vacuum. The cathode efficiency (emitted current divided by diode current) varies from 2×10^-4 to 1×10^-10 and increases with the addition of 10^-2-torr partial pressure of O₂ into the vacuum system. Current densities of 0.1 to 1 A-cm^-2 are estimated for a diode current of 10 mA. This compares favorably with Si cold cathodes (not coated with Cs), which have efficiencies of ~2×10^-5 and current densities of ~2×10^-2 A-cm^-2. It is believed that higher current densities and efficiencies can be obtained with more efficient cathode designs and an ultrahigh-vacuum environment     

Excellent low-pressure-oxidized Si3N4 filmson roughened poly-Si for high-density DRAMs

High-reliability and good-performance stacked storage capacitors with high capacitance value of 17.8 fF/μm² has been realized using low-pressure-oxidized thin nitride films deposited on roughened poly-Si electrodes. These novel electrodes are fabricated by H ₃PO₄-etching and are RCA-cleaned. The leakage current density at +2.5 and -2.5 V are 0.07×10^-9 and -2.4×10^-8 A/cm², respectively, fulfilling the requirements of 256 Mb DRAM's. Weibull plots of time-dependent-dielectric-breakdown (TDDB) characteristics under constant current stress and constant voltage stress also show tight distribution and good electrical properties. Hence, this easy and simple technique is promising for future high-density DRAM's applications     

Modulation characteristics of high speed (f-3 dB=20 GHz)tunneling injection InP/InGaAsP 1.55 μm ridge waveguide lasersextracted from optical and electrical measurements

High-performance multiquantum-well 1.55 μm InP-based tunneling injection lasers are fabricated using a conventional single mode ridge waveguide fabrication process and characterized. The lasers consist of an eight quantum-well strain-compensated gain region and a 30-Å InP tunneling barrier. The bandwidth of these lasers is measured to be 20 GHz with a damping limited bandwidth extracted from the K-factor (determined from optical modulation measurements) of 26 GHz. To our knowledge, this is the highest measured bandwidth recorded for an InP-based simple ridge waveguide structure. The differential gain is measured to be as high as 1×10^-15 cm², with a measured gain compression coefficient ϵ of 5×10^-17 cm³. It is shown that the K-factor can also be extracted solely from measurements of the small signal electrical impedance. The carrier escape time τ_esc is determined to be 0.5 ns, independent of bias. This high frequency performance is achieved with a very simple device structure at room temperature under constant drive currents     

Minority-carrier transport parameters in degenerate n-type silicon

Direct measurements of the minority-hole transport parameters in degenerate n-type silicon were done by analyzing transient photocurrent in the frequency domain. Minority-hole mobility is found to increase with doping for dopings larger than 4×10¹⁹ cm^-3 . The ratio of minority-hole to majority-hole mobility is found to be about 2.8 at N_D=7.2×10¹⁹ cm^-3. The measured lifetime shows a strongly Auger-dependent mechanism. The extracted Auger coefficient at 296 K is C_n =2.22×10^-31 cm⁶-s^-1, and is in agreement with that reported on other works. Self-consistent checking is used to validate the accuracy of the measured results     

Formation of 0.05-μm p+-n and n+-pjunctions by very low (<500 eV) ion implantation

The current-voltage (I-V) characteristics of ultrashallow p⁺ -n and n⁺-p diodes, obtained using very-low-energy (<500-eV) implantation of B and As, are presented. the p⁺-n junctions were formed by implanting B⁺ ions into n-type Si (100) at 200 eV and at a dose of 6×10¹⁴ cm^-2, and n⁺-p junctions were obtained by implanting As⁺ ions into p-type (100) Si at 500 eV and at a dose 4×10¹² cm^-2. A rapid thermal annealing (RTA) of 800°C/10 s was performed before I-V measurements. Using secondary ion mass spectrometry (SIMS) on samples in-situ capped with a 20-nm ²⁸Si isotopic layer grown by a low-energy (40 eV) ion-beam deposition (IBD) technique, the depth profiles of these junctions were estimated to be 40 and 20 nm for p⁺-n and n⁺-p junctions, respectively. These are the shallowest junctions reported in the literature. The results show that these diodes exhibit excellent I-V characteristics, with ideality factor of 1.1 and a reverse bias leakage current at -6 V of 8×10^-12 and 2×10^-11 A for p⁺-n and n⁺-p diodes, respectively, using a junction area of 1.96×10^-3 cm²     

Modulation of 10.6-micron laser readiation by CuCl

Electrooptic properties of cuprous chloride (CuCl) have been measured at 10.6 µ. The measured electrooptic and absorption coefficients were 3.2×10^-12m/V and 0.02 cm^-1, respectively. These results indicate that CuCl will be used as a low-loss electrooptic material at 10.6 µ as well as in the visible range.     

Diamond grit-based field emission cathodes

This letter describes the fabrication and operation of diamond grit gated cathodes. The structure is similar to Spindt-type cathode, but the field emission cone is replaced with a more planar diamond grit layer 50 to 200 nm thick. Although the minimum lithographic dimension of these cathodes is from 1 to 5 μm, these devices have exceptionally low turn-on voltages, 5 to 7 V. Cathode current noise is less than 2.5% rms with a maximum absolute current variation of 6.7% over a 6 h period. These devices can operate in pressures of nitrogen above 133 Pa (1 Torr). Although operation in 6.6×10^-2 Pa (5×10 ^-4 Torr) with more reactive gasses, O₂ or H₂ S, degrades performance, the cathodes recover when the pressure is reduced to ⩽1.3×10^-4 Pa (1×10^-6 Torr). Gate current varies from 0.2 to 100 times the emitted current and depends on the technique used to deposit the diamond grit. High current densities (>10 A cm^-2), low gate voltages (<50 V), low emission noise, excellent longevity, temporal uniformity, and ease of fabrication make these devices potential cathodes for flat panel displays. However, excessive gate current and unsatisfactory processing reproducibility at present limit their general application     

High performance poly-Si TFTs fabricated using pulsed laserannealing and remote plasma CVD with low temperature processing

Key technologies for fabricating polycrystalline silicon thin film transistors (poly-Si TFTs) at a low temperature are discussed. Hydrogenated amorphous silicon films were crystallized by irradiation of a 30 ns-pulsed XeCl excimer laser. Crystalline grains were smaller than 100 nm. The density of localized trap states in poly-Si films was reduced to 4×10¹⁶ cm^-3 by plasma hydrogenation only for 30 seconds. Remote plasma chemical vapor deposition (CVD) using mesh electrodes realized a good interface of SiO ₂/Si with the interface trap density of 2.0×10¹⁰ cm^-2 eV^-1 at 270°C. Poly-Si TFTs were fabricated at 270°C using laser crystallization, plasma hydrogenation and remote plasma CVD. The carrier mobility was 640 cm²/Vs for n-channel TFTs and 400 cm²/Vs for p-channel TFTs. The threshold voltage was 0.8 V for n-channel TFTs and -1.5 V for p-channel TFTs. The leakage current of n-channel poly-Si TFTs was reduced from 2×10^-10 A/μm to 3×10^-13 A/μm at the gate voltage of -5 V using an offset gate electrode with an offset length of 1 μm     

Light-soaking effects on a-Si:H photodiodes deposited by thelaminar-flow photo-CVD method

A 2/3-in, 2-Mpixel, STACK-CCD imaging sensor has been developed for HDTV solid-state imagers. A new a-Si:H photo-conversion layer, fabricated by the laminar-flow photo-chemical-vapor-deposition method, is overlaid on the vertical CCD scanning circuitry in the sensor. The photodegradation behavior of a-Si:H photodiodes is investigated in terms of dark-current density, electron μτ product and transient photocurrent. These properties are degraded as a result of light-induced defects in the a-Si:H layer. The Staeblar-Wronski constants, C_sw , are estimated to be 7.5×10^-7 at no voltage and 1.1×10^-7 at a reverse voltage of 6 V applied to the photodiode during light-soaking with an AM-1 lamp. The lifetime of the photodiode is determined by the degradation of the transient photocurrent, and is estimated to be about 2.2×10⁸ h for 1 lx light exposure. The lifetime is considered to be improved compared with that of previous-type photodiode reported before (1.5×10⁷ h for 1.5 lx light exposure) and clearly satisfies the needs for practical use of the device     

Low-frequency noise behavior of 0.15-μm gate-lengthlattice-matched and lattice-mismatched MODFETs on InP substrates

Experimental data are presented on equivalent gate noise voltage from 1 to 10⁵ Hz obtained from lattice-matched and strained InGaAs quantum-well modulation-doped field effect transistors (MODFETs). In both types of devices excess generation-recombination (g-r) noise is observed at or below 100 Hz above an `apparent' background 1/f noise with spectral intensity ranging from 0.5×10^-17 to 2×10^-17 V²-Hz^-1-cm² at 1 Hz. These results are comparable to those reported by S.M.J. Liu et al. (1986) for the pseudomorphic MODFETs