微机在烧结自动配料中的应用

微机在烧结自动配料中的应用莫良智，涂吉良，聂秋平（涟源钢铁有限公司自动化湖南娄底４１７００９）１前言结合涟钢烧结自动配料系统的实现，按照分散控制、组合优化的设计思想，我们研制出了一套ＩＰＣ－６１０微机和ＡＲＣＮＥＴ网组成的微机控制系统，该系统由控制单...     

轮辐式薄壁钛合金机匣焊接变形控制技术研究

本文针对轮辐式薄壁机匣焊接工艺及变形控制技术作了探索性的总结。以进气机匣为典型件论述了焊接工艺实施全过程,通过对结构和材料分析,制定合理工艺路线,使用专用工装、预留焊接收缩量、摸索电子束焊、氩弧焊接试验过程变形规律,优化焊接工艺参数等措施,达到控制焊接变形目的以满足设计要求。为该类零件制造提供了一套完成的焊接变形控制工艺方法。     

某发动机燃烧室机匣焊接变形控制工艺研究

本文针对某发动机燃烧室机匣焊接工艺及变形控制技术作了探索性的总结。以高温合金燃烧室机匣为典型件论述了焊接工艺实施全过程,通过制定合理工艺路线,使用专用工装、预留焊接收缩量、摸索电子束焊、氩弧焊接试验过程变形规律,优化焊接工艺参数等措施,达到控制焊接变形目的以满足设计要求。为该类零件制造提供了一套完成的焊接变形控制工艺方法。     

上海交通大学CIM研究所

上海交通大学CIM研究所成立于1989年，她是“国家863／CIMS集成化工艺设计自动化工程实验室”、“国家863／CIMS培训中心（上海）”和“上海先进制造工程技术研究中心，座落于我国著名学府─—上海交通大学徐汇校园内。研究所成立后，得到了国家科委、上海市科委和国家教委211工程的投资。现占地100O多平方米，固定资产930万元。拥有一个分别由14种异种机工作站、30多套486／586微机组成的计算机联网运行环境，并配有丰富的UNIX、DOS和WINDOWS软件开发平台、SoftBenth、case软件、ORACLE、SYBASE数据库、PRO－ENGINEER…     

自动控制肋骨弯淬机床的设计与研究

介绍了一种新型自动肋骨弯淬机床，该机床为机、电、液一体化设计，采用中频加热，压型弯制并同步淬火的工作原理，综合了机械、液压、微机控制管理、中频加热成型、热处理工艺等方面技术，可将不同规格的钢料按要求弯制成各种曲率半径的高精度耐压肋骨，并在此过程中同步对肋骨进行均匀淬火处理。提高了生产效率、提升了产品成型精度、保证了淬火质量，降低了劳动强度和废品率，现已有多台机床应用于造船行业。     

5083铝合金厚板氩弧焊和氦弧焊

以厚度为40毫米的5083铝合金板材为基体合金分别进行钨极交流氩弧和钨极直流氦弧多道多层焊接工艺研究。在焊缝质量、接头机械性能以及防止焊接裂纹和控制焊接变形等方面都满足产品的设计和使用要求的基础上,对我国首制的0.6T磁共振成像超导磁体低温容器的主要部件——大型厚壁芯筒纵焊缝和其法兰环焊缝分别采用氩弧焊和氦弧焊工艺施焊,取得了圆满成功。     

48000m~3/h空分设备的流程选择

介绍了杭氧为中石化湖北化肥和安庆分公司设计的两套48000m3/h内压缩流程空分设备的技术方案选择,流程优化,主要配套部机的确定和工艺控制方案。     

微机自动化系统在铁路变配电所的应用

铁路供电系统具有负荷沿铁路分布、点多、容量小、故障频繁等特点，原有的故障查找方式已不能适应新形式的要求。因此建立一套先进、可靠、具有发展前途的微机自动化系统具有非常重要的意义。本文主要阐述变配电所微机保护改造设计理念，具体的论述了铁路供电段实现微机自动化时，系统的设计原则，结构，功能要求。     

氮分压对多弧离子镀TiN涂层相结构及性能影响的研究

本文利用多弧离子镀设备沉积了 ＴｉＮ薄膜，对不同工艺条件下沉积ＴｉＮ的薄膜用 Ｘ射线衍射方法进行了研究，给出了薄膜相结构随氮分压变化的实验结果，测定了薄膜 的显微硬度．用ＳＥＭ方法观察了 ＴｉＮ涂层的组织形貌。指出：氮分压为多弧离子镀 的一个重要工艺参数，我们适当地控制氮分压，可以制作出性能良好的ＴｉＮ薄膜。     

TIG焊弧光传感弧长控制的研究

通过对ＴＩＧ焊接光辉光强σ弧长之间关系的研究，建立了微机控制的弧长调节系统。实现结果表明，该系统的控制精度为±０．１ｍｍ而且该系统具有自动适应工件表面的变化而无需发迹硬件结构的特点。     

A study on the growth kinetics of CeO2-modified aluminide coating and its computer fitting

A CeO₂-modified aluminide coating was obtained by composite electro-deposition Ni and CeO₂ particles on 20 steel with different holding time using pack cementation. The growth kinetics curve was given with computer fitting by measuring the thickness of the layer. Scanning electronic microscopy and X-ray energy dispersive spectrometry were used to analyze the microstructure and components of the layer. The results showed that the content of CeO₂ was up to 5.21 wt.% in the rich area of NiAl coatings, which restrain the interdiffusion between the coating and the base during the oxidation process at high temperature. Meanwhile, the growth curve obtained could offer an important basis to forecasting and controlling the depth of the coating.     

激光多层熔覆纳米陶瓷层工艺参数优化

为了深入了解激光多层熔覆工艺与涂层性能之间的关系,采用压片预置式激光多层熔覆工艺制备了纳米Al2O3-13%TiO2(质量分数)陶瓷层;通过3因素3水平正交试验分析了激光熔覆熔池闭环控制温度、超声振动频率及保温箱预热温度对涂层结合强度的影响,并对激光熔覆工艺参数进行了优化;通过扫描电镜(SEM)和结合强度测试研究了最优工艺下所得涂层的形貌和性能。结果表明:影响涂层结合强度的因素主次顺序依次为熔池闭环控制温度、保温箱预热温度、超声振动频率;激光多层熔覆纳米Al2O3-13%TiO2涂层最佳工艺参数为熔池闭环控制温度2 500℃,超声振动频率50 kHz,保温箱预热温度400℃;优化工艺熔覆的涂层各层之间无明显界面,涂层内部致密、连续,基本无孔隙及贯穿性大裂纹,涂层结合强度明显提高,达66.3 MPa。     

控制爆破对工业控制计算机硬件结构的影响

通过对工业控制计算机的硬件结构分析,结合室内基坑控制爆破开挖工程实例,阐述控制爆破对工业控制计算机硬件结构的影响。指出通过选择适当的爆破方法、最小抵抗线方向,控制爆破药量,加强对飞石的防护等措施,可以在工业控制计算机附近进行控制爆破。     

自动涂布机微机控制系统

密封装量和密封胶在许多行业得到广泛应用．但一般采用手工或简单机械涂胶．不但效率低、均匀性差．而且对材料的浪费也较大．本文介绍了一种采用微机控制的自动涂布机．解决了上述问题．大大提高了涂胶的效率和质量．并减轻了劳动强度．文中重点介绍其控制部份．     

Mineralized collagen coatings formed by electrochemical deposition

Understanding and controlling the process of electrochemical deposition (ECD) of a mineralized collagen coating on metallic orthopedic implants is important for engineering highly bioactive coatings. In this work, the influence of different ECD parameters was investigated. The results showed that the mineralization degree of the coatings increased with deposition time, voltage potential and H₂O₂ addition, while chitosan addition led to weakening of mineralization, heavy mineralization resulted in a porous coating morphology. Furthermore, two typical coatings, dense and porous, were analyzed to investigate their microstructure and evaluated for their cytocompatibility; the dense coating showed better osteoblast adhesion and proliferation. Based on our understanding of how the different coating parameters influenced the coating, we proposed an ECD process in which the pH gradient near the cathode and the collagen isoelectric point were suggested to play crucial roles in controlling the mineralization and morphology of the coatings. The proposed ECD process may offer a guide for controlled deposition of a desired bioactive coating.     

镀锌层无铬钝化工艺的研究

研究了用于锌镀层彩色钝化的无铬钝化液最佳配方及工艺.以钼酸盐为主要原料,通过加入协同缓蚀剂,控制工艺条件可得到呈亮丽彩虹色的钝化膜,并开发了一种封闭处理工艺以提高膜层的耐蚀性.通过电化学测试手段比较了铬酸盐钝化膜、钼酸盐钝化膜及镀锌层的耐蚀性能.     

Control of the quantum size effect of TiO2-SiO2 hybrid particles

This paper describes the control of the quantum size effect by controlling the coating layer thickness in TiO₂-SiO₂ core-shell hybrid particles obtained by the liquid phase deposition (LPD) method. The coating layer thickness of TiO₂ on SiO₂ nano-particles was controlled by changing the [Ti]/[Si] ratio. The titania coating thickness and crystallite size were estimated by transmission electron microscope (TEM) and X-ray diffraction (XRD), respectively. The quantum size effect of the obtained nano-hybrid particles was estimated by the band gap energy shift, using ultraviolet-visible spectroscopy (UV-vis). As a result, we successfully controlled the degree of the quantum size effect by controlling the coating layer thickness in core-shell TiO₂-SiO₂ hybrid particles.     

Computer simulation and control of plasma spraying processes

An integrated technological system for modeling, experimental study, and practical realization of plasma spraying process was devised. The system provided simulation of the main plasma spraying process stages (heating and acceleration of particles in a plasma jet, coating structure formation, heat transfer, and stress-strain state in a coating-substrate system); experimental measurement of the main plasma spray characteristics and entering them in a computer in a real time mode; computer control of the spraying process; and plasma spray coating corresponding with the devised technological process.

This integrated system was upon the basis of vacuum plasma spraying “Plasmatechnik” equipment. An original opto-electronic system was used for experimental measurement of temperature, particle velocity, and coating temperature.     

Numerical simulation of coating growth and pore formation in rapid plasma spray tooling

Rapid plasma spray tooling (RPST) is a process that can quickly make molds from rapid prototyping or nature patterns without limitation of pattern's size or material. In this paper, the process of coating growth and pore formation in RPST has been analyzed by numerical simulation. The objective of this work was to determine the porosity in plasma sprayed coatings and verify the developed computer model, which might serve for future thermal residual stress studies of plasma sprayed coatings. The analysis was divided into two steps: particle flattening and coating growth. In the analysis, a ballistic model was used for modeling the in-flight powder particles. The method allows for the calculation of off-normal spray angle, which is common in plasma spraying of engineering components. Also, a set of rules for coating growth as well as pore formation in the coating has been proposed. Based on these works, a computer program was developed to calculate the effects of process parameters, such as gun scanning velocity, spray angle, etc., on the porosity of the coating. Finally, an experiment was carried out to verify the effects of spray parameters on the porosity. The results agree with the prediction of the model.     

Druckregelung in Vakuumsystemen

In reactive processes a process gas is fed into the process chamber after evacuation. The most important precondition for a reproceable process is a stable process pressure. Pressure control is carried out either by controlling the gas flow on the gas inlet side or by regulating the effective pumping speed on the chamber output side. The application of the user determines, which of the two sysstms is best suited. Plasma enhanced etching and coating processes encounter a growing importance in the semiconductor industry. At the same time applications have expanded to improvement procedures of metallic surfaces and production of computer hard discs, based on plasma processes as reactive vapour deposition and sputtering. For many of these applications pressure control via the gas input is sufficient. But the increasing demands on the quality of the micro structures with modern surface processes can only be satisfied by independent control of the gas flow and the process pressure. Pressure control independent of the gas flow is achieved by controlling the effective pumping speed of the vacuum pump. The presented paper starts with the general theory of pressure control, and deals with the various aspects of pressure control, including downstream pressure control with throttle valvê, adaptive controller and sensor.