色分离光栅镀膜减反技术研究

 根据惯性约束聚变系统技术要求，提出一种镀膜减反方案，以解决现有光栅由于元件表面反射影响衍射效率的问题。对色分离光栅镀膜减反技术进行了详细的分析，根据标量理论给出了镀膜光栅的各项技术要求，优化了光栅结构参数。模拟计算结果发现，光栅表面反射几乎完全消除，表明可以通过色分离光栅镀膜减反提高衍射效率的目的。该镀膜光栅刻槽深度的优化值为2.84μm，膜厚为等效1/4波长，即71.2nm。     

取样光栅镀膜减反技术研究

 根据惯性约束聚变系统技术要求，提出了镀膜减反方案，以解决现有光栅由于元件表面反射影响零级透过率的问题。使用严格耦合波理论分析了镀sol-gel减反膜的取样光栅特性，详细地分析了仿形膜和平面膜的减反情况和取样效率的变化。结果发现，镀平面膜是一种可行的技术方案，光栅表面反射几乎完全消除，表明可以通过取样光栅镀膜减反来达到提高透射率的目的；裸光栅的深度为12 nm时，平面减反膜厚为60 nm，即光学厚度为等效1/4波长：72 nm。此时的透射率为99.8%，取样效率为0.241‰。     

光栅减反层太阳能电池光电转换效率的研究

运用时域有限差分方法,研究了光栅减反层结构对太阳能电池光电转换效率及储能效果的影响.具体从光栅形状、高度以及光栅表面金属薄膜厚度出发.结果表明经光栅减反层优化表面结构的太阳能电池的光电转换效率显著增大,储能效果大大得到提升.尤其是三角形光栅太阳能电池.随着镀层厚度的增加,储能效果增加,但当薄膜厚度过厚时,储能效果反而降低.     

薄膜光学 薄膜材料与器件

TB43 2005021300 用耦合波法分析平面镀膜分频光栅的特性=Coupled-wave analysis of color separation grating with planarizing AR coating[刊,中]／杨春林(成都精密光学工程研究中心．四 川,成都(610041)),许乔…//光子学报．-2004,33 (6)．-751-754 使用严格的耦合波理论分析了ICF系统的色分离光 栅(CSG)特性,特别针对平面镀膜减反后的情况进行了详     

镀膜长周期光纤光栅的折射率传感特性

基于严格的光栅三包层模型及其色散方程,对镀膜长周期光纤光栅的折射率传感特性进行了详细的研究.研究发现,镀膜长周期光纤光栅的谐振波长随环境折射率的变化而变化,而且这种变化有一个跳跃,跳跃后的变化与跳跃前相同:如跳跃前向短波方向漂移,则跳跃后也向短波方向漂移.镀膜后,长周期光纤光栅的折射率探测范围得到拓宽,而且探测的灵敏度...     

基于光纤光栅传感的化学镀膜过程本征应力监测

为了研究化学镀膜过程中本征应力的演变过程,建立了基于光纤光栅传感的本征应力计算模型,提出了一种监测化学镀膜过程本征应力演变的方法.通过记录光纤光栅中心波长的偏移量,结合裸光栅进行补偿,实现了在线监测化学镀膜过程产生的本征应力.使用光纤光栅传感器对化学镀Cu过程中本征应力进行监测.结果表明:在化学镀Cu过程中,光纤光栅中心波长蓝移,本征应力表现为压应力,且本征应力随时间的增加而增大;监测光栅的压力灵敏度为4.10 pm/MPa,监测准确度可达到0.24 Mpa.     

大面积化学镀宽带减反膜

一、前言为了完成对角线为2.4m的梯形平板平面的镀膜,由十位同志组成了化学镀膜组,在老科学家龚祖同的领导下,经过半年努力,在大面积梯形平板上镀出了低反射的三层减反膜,在化学镀膜技术中突破了国际水平,并为开展大面积化学镀膜开创了新路,提供了经验和数据。一般国外生产的大面积减反射玻璃均采用     

基于传输矩阵法的多层介质膜反射特性研究

薄膜干涉是大学物理波动光学教学的重要内容,也是薄膜光学的理论基础.薄膜干涉的一个重要应用是用于设计减反膜和高反膜.本文基于传输矩阵法,定量计算了多层介质膜的反射率.以BK7玻璃为例,无镀膜时在可见光范围内,其反射率约为4%.利用薄膜的相消干涉可以减少表面的反射率.镀一层减反膜时,对设计波长550 nm其反射率下降为1.3%,一旦偏离设计波长减反效果变差;镀两层减反膜时,在470 nm～670 nm范围内,减反效果明显改善,反射率均低于1.3%.利用薄膜的相长干涉可以增加表面的反射率.以熔石英为例,镀一层薄膜时,对设计波长1500 nm其反射率可由未镀膜时的3.3%提高到30%;镀七组薄膜时在1360 nm～1660 nm范围内其反射率均可达99%以上.通过这些定量计算,让学生更加深刻地理解所学理论知识在实际中的应用,培养工程意识,提高学习兴趣.     

纳米线减反层的解析设计法

本文通过分析比较给出了常用二维等效介质理论解析解的适用条件并 且将有效介质理论的适用范围推广至零级衍射边界处, 并通过FDTD模拟验证了该解析方法的准确性. 这不仅解决了长期以来没有精确二维有效介质理论(2D-EMT)解析解的困境, 而且使得直接用解析公式设计和定量解释减反微结构的减反效果变得可能, 有着广泛的应用前景. 关键词： 零级衍射光栅 有效介质理论 太阳能电池减反 纳米线阵列     

宽带镀金正弦光栅

为了满足强激光系统中大尺寸镀金光栅对糟深均匀性的要求,采用梯形光栅-涂胶-离子束溅射镀膜和全息光刻-离子束溅射镀膜两种方法,分别制作了线密度为1 740线/mm,槽深为210 nm的宽带镀金正弦光栅.测得其TM波、-1级自准值平均衍射效率在750～850 nm范围内大于87％,最高可达90％.这两种方法易控制光栅槽深,去掉光刻胶后基底可继续使用,且制作的光栅的衍射效率和带宽能满足国内一般宽带镀金脉冲压缩光栅的使用要求.     

宽带减反射膜的一种简便设计方法

本文根据等效界面和等效光纳概念,推导出宽带减反膜的减反射限定公式。研究表明,按限定公式确定的折射率参数可有效地进行规整膜厚的三层宽带减反膜设计。     

Comparison of nano-structured solar cell anti-reflection coating based on graded-index or mode coupling approach

Solar cell nano-structured anti-reflection coatings based on graded index (GI) and mode coupling are all proposed to significantly reduce the reflection from semiconductor–air interface. In this work, it is shown that purely graded index approach can lead to degradation of long wavelength absorption by eliminating quasi-guided mode excitation. The reason is that the physically graded layer not only provides low reflectance path from air to semiconductor, but also from semiconductor to air, leading to photon escape. This results in out-coupling of photons from the semiconductor to air. On the other hand, anti-reflection coating based on mode coupling does not suffer from degraded long wavelength absorption and it is capable of acting as one-way photon pass coating. It is found that the sidewall thickness of mode coupling anti-reflection coating has significant impact on its effectiveness for anti-reflection, and therefore the selection of process methods is critical for its low reflectance. It is proposed that the purely graded index coating is more suitable for wafer-based photovoltaics where full absorption is possible by two photon traces. The mode coupling coating is suitable for both wafer-based photovoltaics and thin-film photovoltaics since it provides not only low reflectance but also long wavelength quasi-guided mode excitations. In the end, new types of anti-reflection coating and light trapping structure are proposed to further enhance the performance.     

具有彩色还原特性的长焦距镜头增透膜的设计

本文以我厂生产的长焦距镜头为例,介绍了满足彩色还原特性的长焦距镜头增速膜的设计思想,设计方法和结果。这种具有彩色还原性能的镜头现已批量生产。     

Influence of Phase-Shift on Side-Mode Suppression Ratio in Fiber Grating External Cavity Semiconductor Lasers

Effects of system parameters on the side-mode suppression ratio of the fiber grating external cavity semiconductor laser are investigated by the numerical method, and the variation of the side-mode suppression ratio is discussed. It is found that an excellent anti-reflection coating provides the significant reduction of the variation due to the phase shift and the change of the internal cavity length. The laser with the low anti-reflection coating, the high coupling efficiency and the short cavity will exhibit the excellent side-mode suppression ratio.     

The effect of anti-reflection coating of porous silicon on solar cells efficiency

Anti-reflection coatings of solar cells have been fabricated using different techniques. The techniques used include SiO₂ thermal oxidation, ZnO/TiO₂ sputtering deposition and porous silicon prepared by electrochemical etching. Surface morphology and structural properties of solar cells were investigated by using scanning electron microscopy and atomic forces microscopy. Optical reflectance was obtained by using optical reflectometer. I-V characterizations were studied under 80 mW/cm² illumination conditions. Porous silicon was found to be an excellent anti-reflection coating against incident light when it is compared with another anti-reflection coating and exhibited good light-trapping of a wide wavelength spectrum which produced high efficiency solar cells.     

Low-threshold performance of fiber Bragg grating external-cavity semiconductor lasers using genetic algorithms

The lowest threshold current of the external-cavity semiconductor laser with fiber Bragg grating using genetic algorithms is investigated. Effects of the external cavity length, coupling efficiency and anti-reflection coating reflectivity on static characteristics, such as L-I curves and side mode suppression ratios (SMSR) are investigated by using multi-mode rate equation. It is found that the reflectivity of the anti-reflection coating for low-threshold performance needs to be increased at the cost of the stability of the fiber grating external-cavity semiconductor laser. The optimal external cavity length obtained by genetic algorithms can be used to obtain the lowest threshold current for sacrificing a little SMSR. However, with the decrease of AR-coating reflectivity, output powers and SMSRs are slightly dependent on the external cavity length.     

Anti-reflection layer formed by monolayer of microspheres

In this study, we demonstrate a cost-effective method to deposit an anti-reflection coating on glass. Hexagonally arranged layers are formed by a monolayer of microspheres deposited by a dip-coating method. After the deposition of the microspheres with diameter of 200 nm, the forward transmission of the glass substrate is enhanced from 88.8% to 97.2% at an incident wavelength of 600 nm, demonstrating that the nano-scale monolayer coating of microspheres can be used as an anti-reflection layer. This method can be applied to organic light emitting diodes and solar cells in order to enhance the forward transmission of the light at the interface of the optoelectronic devices.     

基于ZF6基底的可见光宽谱带高性能增透膜

以ZF6为基底,采用电子束蒸发物理气相沉积方法设计并制备了一种增透波长为0.4～0.8μm的宽谱带可见光区增透膜。薄膜材料仅含有TiO2和SiO2两种材料,分别作为高低折射率材料。利用Edinburgh光谱仪对双面镀制该膜系样品的透过率进行测量,测试结果表明：薄膜平均透过率达98.15%,实际样品的光学特性与设计结果基本相符,具有宽带的增透特性,减少了表面剩余反射。机械强度与环境测试表明：制备的薄膜具有良好的稳定性和牢固度,可以应用于可靠性要求较高的光学系统中。