锑化铟晶片的电学均匀性研究

锑化铟焦平面探测器是红外成像系统的重要组成部分,对红外成像的成本和性能都有重要影响。锑化铟晶片的质量及均匀性决定了探测器的性能。通过霍尔效应测试、低温探针法以及微波光电导衰退法研究了锑化铟晶片的电学性能均匀性。结果表明,所制备的锑化铟晶片的载流子浓度和电子迁移率的面分布较均匀,但低温电阻率以及少子寿命的分布呈现较小的非均匀性变化,这主要与锑化铟生长过程中的杂质分凝有关。     

高温贮存寿命评估试验

元器件分别进行常温储存试验和高温贮存试验,通过常温储存试验累积试验数据并以此研究总结元器件长期储存性能参数变化规律和失效模式。通过高温贮存试验加速元器件常温储存过程累积试验数据,根据关键参数随加速试验的变化情况,得到高温贮存条件相对常温储存条件的加速因子,根据加速因子得到加速贮存试验的时间,在该高温点下进行相应时间的加速贮存试验。试验结果即为常温特定年限储存寿命的预计结果,从而在较短的时间内对元器件长期储存寿命做出评定。     

锑化铟抛光片表面粗糙度优化研究

锑化铟是中波红外探测应用较广的材料。抛光片的表面粗糙度是影响器件性能的关键指标。研究了锑化铟化学机械抛光(Chemical Mechanical Polishing, CMP)液的pH值、氧化剂比例以及抛光液流速对锑化铟抛光片表面粗糙度的影响,并结合原子力显微镜(Atomic Force Microscope, AFM)和表面轮廓仪测试对抛光片的表面粗糙度进行了表征和优化。结果表明,当pH值为8、氧化剂比例为0.75%、抛光液流速为200 L/min时,InSb晶片的表面粗糙度为1.05 nm (AFM),同时晶片的抛光宏观质量较好。     

高斯激光辐照焦平面探测器温度场分析与仿真

为了研究激光辐照焦平面探测器的温度效应,采用ANSYS有限元软件建立高斯脉冲激光辐照锑化铟红外焦平面探测器的3维结构分析模型,并对该探测器3维温度场效应进行了研究。结果表明,激光辐照下,探测器最大温度出现在最上层的锑化铟芯片上,探测器最大温度达到锑化铟芯片熔点温度798K时,将会引起探测器的热熔融损伤,且熔融损伤阈值受到脉宽、光斑半径等激光参量的影响;高斯脉冲激光辐照下,探测器中各层材料的温度场分布呈现出非连续的高温极值区域,其主要原因是位于锑化铟红外焦平面探测器中间层相间分布的铟柱和底充胶具有迥异的热学性质,并且造成探测器温度场云图中锑化铟芯片、底充胶与硅读出电路高温极值区域形成类似于互补的高温分布。这为进一步研究温升效应引起的应力场分布、提高探测器激光防护性能提供了重要的理论分析依据。     

一种新型CMOS器件长期贮存寿命评价试验方法

介绍了一种新型的可对CMOS元器件长期贮存寿命做出评价的试验方法。对CMOS元器件样品分别进行常温贮存试验和高温贮存试验,通过常温贮存试验累积试验数据,并以此研究总结CMOS元器件长期贮存性能参数变化的规律,通过高温贮存试验加速元器件常温贮存过程,在实验过程中定期对样品器件进行测试。通过对常温贮存数据和高温加速贮存数据进行比对分析,并利用阿伦尼斯模型进行数据处理,从而在较短的时间内对元器件长期贮存寿命做出评价。     

锑化铟离子注入退火技术研究

对锑化铟（InSb）铍离子（Be+）注入后的快速退火技术进行了研究,并对不同退火温度和时间的晶片进行了工艺实验,通过测试其PN结I-V特性,对比了不同快速退火条件对PN结特性的影响,确定在一定快速热退火条件下可以获得高质量的PN结,并对试验结果进行了分析。     

牛津型斯特林制冷机的加速寿命评价

分析了牛津型斯特林制冷机的主要失效模式和失效机理,针对蓄冷器污染的失效模式提出了高温工作加速寿命评价方法.对典型牛津型制冷机进行了不同温度下的动力学响应试验,确定了适合的加速寿命试验的应力条件.加速寿命试验已进行1200h,样机性能出现了退化.样机工作参数的走势显示,退化呈现由污染所致的典型特征,初步验证了高温工作加速污染退化的可行性.     

牛津型斯特林制冷机的加速寿命评价

分析了牛津型斯特林制冷机的主要失效模式和失效机理，针对蓄冷器污染的失效模式提出了高温工作加速寿命评价方法。对典型牛津型制冷机进行了不同温度下的动力学响应试验，确定了适合的加速寿命试验的应力条件。加速寿命试验已进行1200h，样机性能出现了退化。样机工作参数的走势显示，退化呈现由污染所致的典型特征，初步验证了高温工作加速污染退化的可行性。     

P/P~+外延片制备过程中应力变化的研究

通过研究P/P+外延片制备过程中衬底加工、背损背封、化学机械抛光、外延生长等各主要工艺对晶片总厚度变化、弯曲度、翘曲度等几何参数的影响,来分析晶片内应力的变化。重点研究了衬底片加工和外延生长各工序中内应力不断累积,晶片几何参数变化较大的现象,以便解决在器件研制的快速变温过程容易产生形变等问题。     

牛津型斯特林制冷机的加速寿命评价

分析了牛津型斯特林制冷机的主要失效模式和失效机理，针对蓄冷器污染的失效模式提出了高温工作加速寿命评价方法。对典型牛津型制冷机进行了不同温度下的动力学响应试验，确定了适合的加速寿命试验的应力条件。加速寿命试验已进行1200h，样机性能出现了退化。样机工作参数的走势显示，退化呈现由污染所致的典型特征，初步验证了高温工作加速污染退化的可行性。     

Large scale production of indium antimonide film for position sensors in automobile engines

We use low pressure MOVPE to grow indium antimonide films on groups of eight 3 inch GaAs wafers per run. The films are used for the production of magnetoresistive position sensors for the car industry. To meet the narrow specifications for automotive components, the standard deviation of the sheet resistivity, and the thickness of the films have been reduced below 1.5%. This uniformity is the result of an optimization process encompassing the determination of the best susceptor temperature and the optimum flow. The gas velocity was found to have a large impact on the uniformity of the layers. Rotation of the wafers and the use of an optimum gas velocity results in extremely uniform layers.     

On the local injection of emitted electrons into micrograins on the surface of A<Superscript>III</Superscript>–B<Superscript>V</Superscript> semiconductors

The characteristics of the injection of electrons into a semiconductor from a microprobe–micrograin nanogap are investigated with a tunneling microscope in the mode of field emission into locally selected surface microcrystals of indium antimonide, indium arsenide, and gallium arsenide. The current mechanisms are established and their parameters are determined by comparing the experimental I–V characteristics and those calculated from formulas of current transport. The effect of limitation of the current into the micrograins of indium antimonide and indium arsenide which manifests itself at injection levels exceeding a certain critical value, e.g., 6 × 10¹⁶ cm^–3 for indium antimonide and 4 × 10¹⁷ cm^–3 for indium arsenide, is discovered. A physical model, i.e., the localization of electrons in the surface area of a micrograin due to their Coulomb interaction, is proposed.     

锑化铟晶体空位缺陷的正电子湮灭研究

锑化铟晶体材料的电学性能是影响最终制备的红外探测器件性能的关键因素。材料内部的杂质以及点缺陷特别是空位缺陷会极大的影响材料的电学性能,有时甚至会导致材料反型。本文利用正电子湮灭谱对锑化铟晶体材料的空位缺陷类型进行了研究,同时还对不同晶体生长拉速、导电类型晶体材料的正电子湮灭寿命进行分析。结果表明其内部主要为VIn型空位缺陷,且在一定拉速范围内,正电子湮灭寿命基本无变化,此外空位缺陷也不是导致N型锑化铟晶体材料导电类型反型的主要原因。     

锑化铟红外焦平面器件信号分层问题研究

锑化铟红外焦平面器件在杜瓦测试中常常会出现信号分层问题,由此影响器件制造的成品率。通过对器件杜瓦测试电平图、管芯电流电压测试结果及衬底掺杂浓度进行研究,找到了导致探测器信号分层的原因。进一步的理论分析表明,锑化铟衬底上局部的高浓度掺杂区域会对器件性能造成影响。基于此研究,在芯片的制备过程中可采取相应的措施,最大限度地避免后道工序中的无效工作,从而提高锑化铟焦平面器件工艺线的流片效率。     

Indium antimonide transistors

The design, fabrication, and electrical characteristics of an n-p-n indium antimonide transistor which operates at 77°K are discussed. An analysis of the expected high-frequency performance is presented and a comparison made to a p-n-p germanium transistor. Because of its high electron mobility, the indium antimonide transistor should have a base transit time 1/26 that of a similar germanium transistor. Although these ultimate capabilities have not been approached, transistors with f_t as high as 300 Mc/s and β's of 500 have been observed. Switching speeds approaching those of the best state-of-the-art germanium transistors have been measured.     

Spin–Orbit Interaction and Carrier Mobility in a Longitudinal InSb Autosoliton under a Magnetic Field

Semiconductors - A version of the spin–orbit interaction of orbitally moving and spin-oriented electrons in a longitudinal autosoliton in indium antimonide under a longitudinal magnetic field...     

锑化铟焦平面器件背面减薄后的表面处理方法研究

经传统的背面减薄工艺处理后,锑化铟焦平面器件的表面上经常会有细微划道;采用传统的表面清洗方式时也容易对器件表面造成划道,导致工艺重复性差。因此,当器件经过背面减薄后,利用腐蚀液去除划道,并采用基于石油醚和无水乙醇的非接触式清洗方法,有效降低了器件表面产生划道的几率,同时避免了由于表面腐蚀速率不均匀导致测试时部分区域电平较高、在测试图像上出现亮斑等情况;另外还提高了工艺的重复性,使锑化铟器件的红外成像均匀且没有划道,从而提高了该器件的成品率。     

Growth of tin-doped indium antimonide for magnetoresistors

Magnetoresistors made from n-type indium antimonide are of interest for magnetic position sensing applications. In this study, tin-doped indium antimonide was grown by the metalorganic chemical vapor deposition technique using trimethylindium, trisdimethylaminoantimony, and tetraethyltin in a hydrogen ambient. Using a growth temperature of 370°C and a pressure of 200 Torr, it was found that the electron density in tin-doped films varied from 3.3×10¹⁶ cm⁻³ to 4.0×10¹⁷ cm⁻³ as the 5/3 ratio was varied from 4.8 to 6.8. From secondary ion mass spectroscopy (SIMS) studies, it was found that this variation is not caused by a change in site occupancy of the tin atoms from antimony to indium lattice sites, but rather to a change in the total tin concentration incorporated into the films. This dependence of tin incorporation on stoichiometry could be used to rapidly vary the doping level during growth. Undoped films grown under similar conditions had electron densities of about 2×10¹⁶ cm⁻³ and electron mobilities near 50,000 cm²V⁻¹s⁻¹ at room temperature for films that were only 1.5 μm thick on a gallium arsenide substrate. Attempts to grow indium antimonide at 280°C resulted in p-type material caused by carbon incorporation. The carbon concentration as measured with SIMS increased rapidly with increasing growth rate, to above 10¹⁹ cm⁻³ at 0.25 μm/h. This is apparently caused by incomplete pyrolysis of a reactant at this low growth temperature. Growth at 420°C resulted in rough surface morphologies. Finally, it was demonstrated that films with excellent electron mobility and an optimized doping profile for magnetoresistors can be grown.     

Low-noise In-Sb photodetector preamp for the infrared

A low-noise, cryogenically cooled preamplifier has been designed and built for indium antimonide detectors used in IR astronomy. General noise and frequency response equations for the transimpedance amplifier are derived. The effects of finite open-loop gain and bandwidth and of photodetector parameters on circuit performance are shown. A current-injecting background cancellation scheme based on optical feedback and synchronous filtering is described. Total electrical NEP figures as low as 10/SUP -16/ W (at 5 /spl mu/m) and background rejection ratios higher than 3000:1 have been measured using a 0.5 mm diameter detector.     

基于磷化铟、砷化铟和锑化铟的光栅型超宽带远红外线吸收器

设计了一种由磷化铟（InP）、砷化铟（InAs）和锑化铟（InSb）3种半导体材料复合而成的槽深线性渐变的光栅型超宽带远红外线吸收器。其吸收机理是表面等离子共振效应和电介质腔共振效应。利用频域有限差分法（Finite-Difference Frequency-Domain,FDFD）计算的结果表明,凹槽个数的改变对吸收率的影响相对较大,而凹槽深度、凹槽宽度、涂层厚度和光栅周期的变化对吸收率的影响相对较小。在采用优化的结构参数条件下,以及入射角为0~80°和入射波长为28~75 m的范围内,此吸收器的平均吸收率可达到92%以上。本文所设计的吸收器有望在远红外探测等方面得到应用。