利用1 064 nm激光预处理提高pickoff镜损伤阈值

激光预处理是提高光学元件损伤阈值的有效方法之一。利用输出1 064 nm基频激光的SAGA激光器,采用光栅刻线式扫描的方式对镀多层高反物理膜的pickoff镜进行了能量周期递增的预处理,验证激光预处理对其损伤阈值的提高效果。结果表明：零几率损伤阈值平均提高38.8%,而50%几率损伤阈值提高了7.6%,经过激光预处理后pickoff镜抗损伤能力较处理前有了一定提高。     

利用1 064 nm激光预处理提高pickoff镜损伤阈值

 激光预处理是提高光学元件损伤阈值的有效方法之一。利用输出1 064 nm基频激光的SAGA激光器,采用光栅刻线式扫描的方式对镀多层高反物理膜的pickoff镜进行了能量周期递增的预处理,验证激光预处理对其损伤阈值的提高效果。结果表明：零几率损伤阈值平均提高38.8%,而50%几率损伤阈值提高了7.6%,经过激光预处理后pickoff镜抗损伤能力较处理前有了一定提高。     

1 064 nm高反射薄膜激光损伤阈值测量方法

 参照国际上对激光损伤阈值不同测量技术建立起来的相应检测规范和标准,分别采用1-on-1,S-on-1,R-on-1和光栅扫描共4种测量方式,在1 064 nm波长下对HfO₂/SiO₂周期性高反射薄膜进行了激光损伤阈值的测量研究。根据测量结果,比较并分析了这4种测量方式之间的差异,重点研究了R-on-1和光栅扫描测量方式中存在的激光预处理效应对薄膜损伤阈值的影响,以及辐照激光光斑尺寸与损伤阈值之间的联系,并讨论了光栅扫描方式中预处理效应与扫描间距和扫描能量密度梯度的关系。研究表明：R-on-1方式下测得的损伤阈值最高,光栅扫描和1-on-1次之,S-on-1最小;1 000个脉冲激光辐照下的累积效应不显著,并且在激光光斑尺寸的差异较小时,阈值与光斑尺寸的对应关系并不明显;光斑尺寸相同时,扫描光斑的间距越小,激光预处理效果越好。     

1 064 nm高反射薄膜激光损伤阈值测量方法

参照国际上对激光损伤阈值不同测量技术建立起来的相应检测规范和标准,分别采用1-on-1,S-on-1,R-on-1和光栅扫描共4种测量方式,在1 064 nm波长下对HfO2/SiO2周期性高反射薄膜进行了激光损伤阈值的测量研究。根据测量结果,比较并分析了这4种测量方式之间的差异,重点研究了R-on-1和光栅扫描测量方式中存在的激光预处理效应对薄膜损伤阈值的影响,以及辐照激光光斑尺寸与损伤阈值之间的联系,并讨论了光栅扫描方式中预处理效应与扫描间距和扫描能量密度梯度的关系。研究表明：R-on-1方式下测得的损伤阈值最高,光栅扫描和1-on-1次之,S-on-1最小;1 000个脉冲激光辐照下的累积效应不显著,并且在激光光斑尺寸的差异较小时,阈值与光斑尺寸的对应关系并不明显;光斑尺寸相同时,扫描光斑的间距越小,激光预处理效果越好。     

氧化物薄膜抗1064nm脉冲激光损伤的特性研究

对向种氧化物介质膜料的单层膜、增透膜及高反膜的激光损伤特性进行了实验研究,分别测试了单脉冲和多脉冲１０６４ｎｍ激光的损伤阈值,分析和讨论了实验的物理现象及其结果。研究表明ＳｉＯ２、Ｇｄ２Ｏ３、Ｅｒ２Ｏ３、Ｙ２Ｏ３具有激光损伤阈值高、损伤程度轻的特点,特别对１０Ｈｚ激光而言,更是明显;增透膜及高反膜加λ／２层ＳｉＯ２对其激光损伤程度和损伤几率。     

酸蚀与紫外激光预处理结合提高熔石英损伤阈值

采用HF酸刻蚀和紫外激光预处理相结合的方式提升熔石英元件的负载能力,用质量分数为1%的HF缓冲溶液对熔石英刻蚀1~100 min,综合透过率、粗糙度和损伤阈值测试结果,发现刻蚀时间为10min的熔石英抗损伤能力最佳。采用355 nm紫外激光对HF酸刻蚀10 min的熔石英进行预处理,结果表明:紫外预处理能量密度在熔石英零损伤阈值的60%以下时,激光损伤阈值单调递增;能量到达80%时,阈值反而低于原始样片的损伤阈值。适当地控制酸蚀时间和紫外激光预处理参数能有效提高熔石英的抗损伤能力。     

酸蚀与紫外激光预处理结合提高熔石英损伤阈值

采用HF酸刻蚀和紫外激光预处理相结合的方式提升熔石英元件的负载能力,用质量分数为1%的HF缓冲溶液对熔石英刻蚀1~100 min,综合透过率、粗糙度和损伤阈值测试结果,发现刻蚀时间为10 min的熔石英抗损伤能力最佳。采用355 nm紫外激光对HF酸刻蚀10 min的熔石英进行预处理,结果表明：紫外预处理能量密度在熔石英零损伤阈值的60%以下时,激光损伤阈值单调递增;能量到达80%时,阈值反而低于原始样片的损伤阈值。适当地控制酸蚀时间和紫外激光预处理参数能有效提高熔石英的抗损伤能力。     

光学元件激光预处理技术

国外学者用1064 nm激光对pickoff镜进行预处理,发现损伤阈值平均提高38.8%。国内研究者用CO2激光中度抛光后,熔石英基片的损伤阈值提到了30%左右,激光波长、扫描方式等对处理效果影响也比较明显。介绍了三种公认的预处理机制,将离线与在线处理方式做了简单地比较,并对国内外激光预处理技术的发展和前景进行了展望。     

实时测量308 nm 激光对薄膜的损伤阈值

用散射光法, 建立了一套实时监视与测量308nm 激光对全反膜和增透膜的损伤的实验装置。实时观察到了损伤从起始、加深直至饱和的整个过程的波形。用这一装置测量了全反膜和增透膜在308nm 激光作用下的损伤阈值。测得全反膜在0°与45°入射角时的损伤阈值分别为1.7与1.0J/cm2。而增透膜的阈值为1.3J/cm2。     

实时测量308 nm 激光对薄膜的损伤阈值

 用散射光法, 建立了一套实时监视与测量308nm 激光对全反膜和增透膜的损伤的实验装置。实时观察到了损伤从起始、加深直至饱和的整个过程的波形。用这一装置测量了全反膜和增透膜在308nm 激光作用下的损伤阈值。测得全反膜在0°与45°入射角时的损伤阈值分别为1.7与1.0J/cm²。而增透膜的阈值为1.3J/cm²。     

用1064nm激光增强HfO2/SiO2薄膜的抗激光损伤能力的实验研究

 用1 064nm激光实验研究了HfO₂/SiO₂薄膜的激光损伤增强效应，实验以薄膜激光损伤阈值70%的激光能量开始，采用N-ON-1方式处理薄膜，激光脉冲的能量增量为5J/cm²。实验结果表明，激光处理薄膜表面能使激光损伤阈值平均提高到3倍左右，并且薄膜的损伤尺度也明显减小。对有缺陷的薄膜，其缺陷经低能量激光后熔和消除，其抗激光损伤能力得到增强，但增强得并不显著，而薄膜本身的激光预处理，可以使其激光损伤阈值大大提高。     

1 319和1 338 nm双波长Nd:YAG脉冲激光输出实验研究

 根据计算得到的双波长激光振荡的阈值条件,激光实验中对全反镜镀制1 319和1 338 nm的全反膜（其反射率大于99.73%,而对1 064 nm激光的反射率约为7%）;输出镜采用对1 064 nm强谱线95%的高透过率,而对1 319和1 338 nm谱线的透过率分别为34.7%,32.5%,有效抑制了强线1 064 nm振荡,成功实现了1 319和1 338 nm Nd:YAG同时双波长激光脉冲输出。当输入能量为125 J时,1 319和1 338 nm脉冲双波长激光的单脉冲总输出能量为0.89 J,电-光转换效率为0.71%,斜率效率为0.89%。输出的双波长激光的中心波长分别在1 318.8和1 338.2 nm处,谱线宽度（FWHM）分别为0.35和0.48 nm,强度之比为36:44。     

Advances in vanadate laser crystals at a lasing wavelength of 1 micrometer

Sapphire, garnet and vanadate crystals are the most prominent optical materials, and vanadates play important roles in optics, especially in lasers and nonlinear optics. Neodymium‐doped yttrium vanadate (Nd:YVO₄) is representative and available commercially. Based on Nd:YVO₄, several vanadate crystals are being developed with the goal of fulfilling the need for differential applications and improvement of certain operational aspects, such as with pulsed lasers or high‐power continuous‐wave lasers. In recent years, some important effects, including energy enhancement, bistability of output performance, self‐Raman frequency shifting, etc., and some novel applications, such as quantum optics, pulsed lasers modulated by the two‐dimensional crystals, etc., have been discovered with vanadates as gain materials. In this paper, the preparation, characterization and laser applications of vanadate laser crystals at the lasing wavelength of 1 micrometer, including YVO₄, GdVO₄, LuVO₄, Gd_xY_1–xVO₄ and Lu_xGd_1–xVO₄ (0 < x < 1) doped with Nd³⁺ and ytterbium (Yb³⁺) are systematically reviewed by highlighting the most recent research progress. Their specific properties are presented, generation mechanisms of novel physical effects are discussed, new applications are given and possible future applications proposed by focusing on some potential strengths.     

1 064 nm与532 nm激光对电子束蒸发制备的HfO2/SiO2高反膜损伤比较

 研究了电子束蒸发制备的HfO₂/SiO₂高反膜在1 064 nm与532 nm激光辐照下的损伤行为。基频激光辐照时损伤形貌主要为节瘤缺陷喷溅留下的锥形坑,当能量密度较大时出现分层剥落;二倍频激光损伤主要是由电子缺陷引起的平底坑,辐照脉冲能量密度稍高时也会产生吸收性缺陷引起的锥形坑,但电子缺陷的损伤阈值更低;随着辐照脉冲能量密度的增大分层剥落逐渐成为主要的损伤形貌。分析认为,辐照激光波长的变化,引起吸收机制的变化从而导致了损伤阈值及损伤机制的差异。     

532和1 064 nm激光的水下LIBS探测对比研究

海洋是国家可持续发展的战略要地,迫切需要海洋探测技术的快速发展,光谱类的化学传感器由于具有原位、非接触和长期探测的优势日益成为研究热点。为了将激光诱导击穿光谱（LIBS）技术应用于海洋原位探测,采用532和1 064 nm波长激光在能量分别为3和40 mj附近进行烧蚀,对比实验研究了532和1 064 nm激光作用下的LIBS击穿特性,并重点探讨了水下激光传输距离对LIBS信号的影响。结果显示,采用1 064 nm的激光能够获得更高的谱线强度和信背比,以及更长的等离子体寿命,但LIBS信号稳定性较差;受水体对不同波长激光能量衰减不同的影响,在水下传输距离2～5 cm范围内,随着1 064 nm激光能量的衰减LIBS信号衰减也很明显,而位于海水“透射窗口”的532 nm的激光LIBS信号基本保持不变。为今后LIBS海洋原位探测系统的开发提供了有价值的设计依据。     

Ultra-low loss laser communications technique using smart beamforming optics

Theory and design is presented for a technique for ultra-low loss laser communication that uses a combination of strong and weak thin lens optics, hence obeying the paraxial approximation. As opposed to conventional laser communication systems, the Gaussian laser beam is prevented from diverging at the receiving station by using a weak thin lens that places the transmitted beam waist mid-way between a symmetrical transmitter-receiver link design. The weak lens can be a fixed optic for static link distances or programmable for mobile scenarios. The programmable weak optic can be a single pixel or multi-pixel lens made by liquid crystal or mirror technologies. The proposed link design is appropriate for low air turbulence links such as short-range or indoor links and space based links.     

ALD氧化铝单层膜1 064 nm激光损伤特性研究

 采用原子层沉积技术(atomic layer deposition,ALD)在熔石英和BK7玻璃基底上镀制Al2O3单层膜。利用小口径损伤在线测试平台对膜层的1 064 nm激光损伤特性进行了实验测量,获得膜层损伤阈值约为10.3 J/cm2,对比了其与BK7基底损伤阈值之间的差异;利用Nomarski显微镜和原子力显微镜分析讨论了损伤形态的特点,结果表明损伤主要表现为膜层脱落和基片小孔烧蚀,其中小孔深度集中在70 nm～95 nm范围;讨论了损伤发生的诱因,得出膜基界面可能存在吸收源先驱的推断。     

Comparison of nanosecond laser ablation at 1064 and 308 nm wavelength

To study the solid Cu ablation in vacuum, two different laser sources operating at 1064 and 308 nm wavelength are employed at similar values of laser fluences. The infrared laser is a Q-switched Nd:Yag having 9 ns pulse width (INFN-LNS, Catania), while the ultraviolet one is a XeCl excimer having 20 ns pulse width (INFN-LEA, Lecce). Both experiments produced a narrow angular distribution of the ejected material along the normal to the target surface. The ablation showed a threshold laser power density, of about 7 and 3 J/cm² at 1064 and 308 nm, respectively, below which the ablation effect was negligible. The laser interaction produces a plasma at the target surface, which expands very fast in the vacuum chamber. Time-of-flight (TOF) measurements of the ion emission indicated an average ion velocity of the order of 4.7×10⁴ and 2.3×10⁴ m/s for the infrared and ultraviolet radiation, respectively. We also estimated approximately the corresponding temperature of the plasma from which ions originated, i.e. about 10⁶ and 10⁵ K for IR and UV wavelength, respectively. A discussion of the analysis of the ablation mechanism is presented. At the used laser power densities the produced Cu ions showed ionisation states between 1+ and 5+ in both cases.