Cu/Sn/Cu界面元素的扩散行为研究现状

从老化过程的界面作用和Cu/Sn/Cu界面元素扩散行为等方面,综述了国内外研究动态与进展。随后,着重介绍了老化过程Sn基钎料和Cu基板的界面反应和柯肯达尔孔洞形成的影响因素,并且柯肯达尔孔洞的形成与界面组分元素的扩散直接相关。最后指出了Cu/Sn/Cu焊点扩散行为研究中存在的问题,提出采用实验与分子动力学模拟相结合的方法开展研究,为以后界面元素扩散的研究起到启发作用。     

铜焊盘与锡合金焊点界面物相分析及可靠性探讨

Sn60Pb40焊料与铜焊盘的焊接界面中金属间化合物Cu6Sn5的形成与长大以及在热循环过程中的组织粗化是影响焊点可靠性的重要因素。作者根据SMT工艺的实际情况，使用Au—Sn共晶焊料、Sn60Pb40焊料分别涂覆在铜合金基板表面，并分别在320℃、240℃下保温1min，冷却形成焊点，利用X射线研究分析了两种不同焊盘基材与Sn60Pb40钎料、Au—Sn共晶钎料的钎焊界面的物相。运用经典相变理论、低周疲劳失效的机理以及“柯肯达尔”效应，就优异焊点的形成、物相产生、温度循环后组织粗化与增加Ni阻挡层，对提高焊接接点的温度循环可靠性的作用进行了分析与探讨。     

微连接技术在3D-WLP中可靠性的研究现状

为了研究新型技术对微连接可靠性的影响,阐述了微连接技术在倒装焊、热压力焊、硅通孔技术中的应用情况。对微连接技术在晶圆级封装(3D-WLP)中影响其可靠性的常见问题及主要因素进行了综述。分析表明,在常见的Sn基无铅焊料与Cu基板的反应过程中,金属间化合物层主要由Cu6Sn5和少量Cu3Sn组成。柯肯达尔孔洞、电迁移、金属间化合物的机械性能、锡须及尺寸效应是影响微连接可靠性的常见问题。在此基础上,归纳并探讨了焊料成分、微量合金、稀土元素、镀层及粉末精度等影响微连接可靠性主要因素的研究情况和发展趋势。     

ENIG焊点微观组织与失效模式关系研究

无铅有铅混装焊点可靠性问题是军工电子需面对的一个重要问题。随着板级电路组装密度的增大，化学镍金（ENIG）镀层工艺以其平整性好和可焊性好等优势而逐步地取代传统锡铅热风整平工艺。但无铅有铅/ENIG焊点的界面形貌、微观组织与可靠性的相互关系待进一步研究。从焊点界面微观组织、剪切强度、温度循环试验和振动试验等多个方面比较了Sn基焊料在ENIG焊盘和Cu焊盘上的差异，并结合实际案例分析ENIG焊点微观组织结构与Sn基焊料在ENIG焊盘上的脆性界面开裂、非典型黑盘故障和柯肯达尔空洞等多种失效模式的关联关系。     

基于热循环与跌落冲击的BGA焊点可靠性研究

研究了BGA焊点在受到热循环冲击与跌落冲击综合作用下的可靠性,研究了基于不同热循环冲击条件下的电子产品的板级跌落寿命、失效机理与失效模式、断裂行为与Kirkendall空洞的关系。结果表明,有铅焊点比无铅焊点可靠性略高,弹性模量低的BGA与PCB制造材料耐热不耐跌落冲击,并提出了改善电子产品可靠性的办法。     

孔洞对BGA封装焊点热疲劳可靠性影响的概率分析

采用有限元分析、蒙特卡罗模拟和概率分析相结合的方法,研究了BGA(Ball Grid Array)封装焊点内部孔洞对焊点的热疲劳可靠性的影响规律。先用X-Ray检测仪对BGA封装进行无损检测,获得焊点内部孔洞尺寸及其分布规律,然后通过有限元软件建立BGA封装模型进行计算分析,针对危险焊点进行参数化建模,建立了含孔洞尺寸及位置呈随机分布的焊点有限元分析子模型。通过后处理获取塑性应变能密度作为响应值,构造随机孔洞参数与塑性应变能密度的代理模型,并运用蒙特卡罗随机模拟方法,研究了孔洞对焊点热疲劳可靠性的影响规律。结果表明,除了位于焊点顶部区域的小孔洞以外,大部分孔洞的出现都会提高焊点的热疲劳可靠性。     

热时效和焊点尺寸对SnAgCu微焊点强度的影响

针对高度为100～300μm的无铅钎料Sn-3.0Ag-0.5Cu微焊点,研究了等温热时效和焊点尺寸对其在100℃下拉伸强度的影响。结果表明,保持焊点直径不变时,高度为100,200和300μm微焊点未经热时效的平均拉伸强度分别为53.75,46.59和44.38MPa;热时效时间延长使微焊点内钎料合金显微组织明显粗化,导致焊点拉伸强度降低,前述三种高度的微焊点96h热时效后平均拉伸强度分别为44.13,38.38和33.48MPa,但96h热时效对IMC厚度无明显影响。     

微尺度BGA焊点拉伸过程有限元仿真分析

建立了微尺度 BGA焊点拉伸有限元分析模型,研究了拉伸加载条件下焊点高度、直径和焊盘直径对焊点拉伸应力应变的影响。结果表明：拉伸条件下,微尺度 BGA焊点顶端和底端的应力应变要大于焊点中间部分,焊点顶部和底部位置为高应力应变区域;在只单一改变焊点高度、直径和焊盘直径其中之一的前提下,随着焊点高度、直径和焊盘直径的增加,微尺度BGA焊点内的最大应力应变均相应减小;在置信度为90%的情况下,焊点直径对拉伸应力影响最大,其次是焊盘直径,最后是焊点高度;焊点直径对焊点拉伸应力具有显著影响,焊盘直径和焊点高度对焊点拉伸应力影响不显著。     

Sn晶粒取向对微焊点元素迁移及界面反应的影响

随着先进电子封装技术的不断发展,电子产品在服役时无铅微焊点内的元素迁移问题引起了广泛关注。由于先进封装互连尺寸的逐步缩小,微焊点扩散的各向异性问题日益凸显,即Sn晶粒取向显著影响元素的迁移行为,进而影响微焊点的界面反应。综述了在热时效、热循环、电流加载与温度梯度等条件下,Sn晶粒取向对焊点中元素迁移及界面反应的影响。现有研究结果表明,在热时效及热循环条件下,Sn晶粒取向对微焊点元素迁移及界面反应的影响较小,而Sn晶粒取向对微焊点的电迁移和热迁移有着相似的影响规律,并由此产生了界面金属间化合物（IMC）的非对称及非均匀生长现象。此外,还综述了基于数值模拟方法开展的微焊点元素扩散各向异性的相关研究,并对不同条件下的研究进展进行了总结。     

向后兼容混合焊点的可靠性分析

在从有铅向无铅转换过程中,电子产品制造商不可避免会碰到同一组装过程中有铅和无铅的混合情况.因此,有必要对形成的混合焊点进行可靠性分析.对混合焊点的失效形式和混合焊点的失效机理进行了分析,并进一步介绍了影响这类焊点可靠性的因素.     

高密度LED焊点微空洞的X射线检测和分析

利用高精度X射线检测设备分别对用Sn37Pb焊膏和Sn3.0Ag0.5Cu焊膏组装的高密度LED灯板进行焊后和老化后的微空洞检测,观察了焊点的微空洞缺陷,并计算微空洞尺寸。结果表明:老化前微空洞面积与焊点面积比在10%~25%的,Sn3.0Ag0.5Cu焊点中约含25.5%,略大于Sn37Pb焊点的23.5%,且明显小于Sn3.0Ag0.5Cu焊点老化后的31.4%。两种焊点老化前后微空洞所占面积比都在<25%的合格范围内,但Sn3.0Ag0.5Cu焊点更易形成微空洞。     

BGA混合焊点热循环负载下的可靠性研究

焊料从有铅向无铅转换中,不可避免会遇到二者混合使用的情况,有必要对生成的混合焊点进行可靠性研究。通过对不同工艺参数下形成的混合焊点和无铅焊点进行了外观检测、X射线检测和温度循环测试。结果显示,只要工艺参数控制得当,混合焊点是可行的。在焊球合金、焊料合金、峰值温度、液相线以上时间和焊接环境五个关键因素中,前四项对焊点可靠性比较重要,焊接环境对焊点可靠性的影响不很显著。     

Assessment of mechanical reliability of surface mounted capacitor by an accelerated shear fatigue test technique

In this study mechanical reliability of Sn3.5Ag0.75Cu solder joints in SMD capacitors has been investigated. Tensile response of the solder joint with respect to thicknesses and aging conditions was studied by using Cu/SnAgCu/Cu model samples. Isothermal lifetime curves of SMD devices subjected to high strain vibrational loading were obtained by using an ultrasonic fatigue testing set-up. Mechanical reliability and the failure modes of solder joints in the SMD capacitors were found to be highly dependent on the microstructure of the solder and the intermetallic compound layer and the testing temperature. Testing at elevated temperature resulted in a clear change of crack path and fracture mode of the solder joints.     

微量Ni对Sn-3.0Ag-0.5Cu钎料及焊点界面的影响

研究了Ni的含量对无铅钎料Sn-3.0Ag-0.5Cu润湿性、熔点、重熔及老化条件下界面化合物(IMC)的影响。结果表明:微量Ni的加入使SnAgCu润湿力增加6%;使合金熔点略升高约3℃;重熔时在界面形成了(Cu,Ni)6Sn5IMC层,且IMC厚度远高于SnAgCu/Cu的Cu6Sn5IMC厚度。在150℃老化过程中,SnAgCuNi/Cu重熔焊点IMC随着时间的增加,其增幅小于SnAgCu/Cu的增幅,此时Ni对IMC的增长有一定抑制作用。     

陶瓷封装倒装焊器件Sn-Pb微焊点的电迁移行为

高密度陶瓷封装倒装焊器件的焊点尺寸已降低至100μm以下,焊点电流密度达到10~4 A/cm~2以上,由此引发的电迁移失效成为不可忽视的问题。以陶瓷封装菊花链倒装焊器件为研究对象,开展了Sn10Pb90、Sn63Pb37焊点热电环境可靠性评估试验,通过电连接检测及扫描电子显微镜(SEM)等方法对焊点互连情况进行分析。结果表明,Sn63Pb37焊点阴极侧金属间化合物(IMC)增长明显,表现出明显的极化现象,IMC厚度的平方与通电时间呈线性关系。通电时间达到576 h后Sn63Pb37焊点阴极侧产生微裂纹,而Sn10Pb90焊点在通电576 h后仍未出现异常,表现出优异的电迁移可靠性。研究结果对于直径100μm微焊点的陶瓷封装倒装焊器件的应用具有重要的意义。     

Computational analysis of the interfacial effect on electromigration in flip chip solder joints

Recent experiments have shown failure in flip chip micro solder joints induced by electromigration. This paper proposes a three-dimensional computational model to simulate the evolution of micro and sub-micro scale solder joints due to electromigration induced diffusion. The evolving morphology of the solder joint related with multiple mechanisms causes a computational challenge. This is addressed by employing a diffuse interface model with multiple concentrations. To efficiently resolve complications, a semi-implicit Fourier spectral scheme and a biconjugate-gradient method are adopted. Results have demonstrated rich dynamics and solder breakage at the interface on the cathode side. Furthermore, the effect of the designed interface region on the reliability of solder joints has been investigated with the developed model.     

Mechanical reliability evaluation of Sn-37Pb solder joint using high speed lap-shear test

This study utilized a high speed lap-shear test to evaluate the mechanical behavior of Sn-37Pb/Cu under bump metallization (UBM) solder joints under high speed loading and hence the drop reliability. The samples were aged for 120 h at different temperatures (150 °С, 180 °С) and then tested at different displacement rates in the range of 0.01 mm/s to 500 mm/s to examine the effects of aging on the drop reliability. The combination of the stress-strain graphs captured from the shear tests and the fracture morphology analysis discloses that the aging at high temperatures has influenced critically the deformation behavior of the solder joints and the effects appears more significant at high strain rates. This study demonstrates a unique capability of a drop reliability evaluation method that utilizes a high speed lap-shear test.     

片式电阻混合焊点热循环负载可靠性研究

对在不同工艺参数下形成的、并且经过不同周数热循环负载的片式电阻混合焊点、有铅焊点和无铅焊点进行了外观检测和剪切测试。结果显示,在不同工艺参数下形成的混合焊点的剪切力,随热循环周数的变化趋势有所不同,但是在保证片式电阻焊端和焊料充分熔融的情况下,部分混合焊点的平均剪切力比有铅焊点高,热循环1 000周后,为9.1～11.1 N。     

Effect of Cu stud microstructure and electroplating process onintermetallic compounds growth and reliability of flip-chip solder bump

In electroplating-based flip-chip technology, the Cu stud and solder deposition processes are two of the most important factors affecting the reliability of solder joints. The growth of Cu-Sn intermetallic compounds (IMC) also plays a critical role. In this paper, the effect of Cu stud surface roughness and microstructures on the reliability of solder joint was studied. The surface roughness of the Cu stud was increased as the Cu electroplating current density increased. The microstructural morphology of the Cu-Sn IMC layer was affected by Cu stud surface structure. We found the growth rate of IMC layer increased with the increasing of Cu stud grain size and surface roughness during aging test. The growth kinetics of Cu-Sn intermetallic compound formation for 63Sn/37Pb solder followed the Arrhenius equation with activation energy varied from 0.78 eV to 1.14 eV. The ratios of Cu₃ Sn layer thickness to the total Cu-Sn IMC layer thickness was in the range of 0.5 to 0.15 for various Cu microstructures at 150°C during thermal aging test. The shear strength of solder bump was measured after thermal aging and temperature/humidity tests. The relationship between electroplating process and reliability of solder joints was established. The failure mode of solder joints was also analyzed     

Refinement of the Microstructure of Sn-Ag-Bi-In Solder,by Addition of SiC Nanoparticles,to Reduce Electromigration Damage Under High Electric Current

The trends of miniaturization, multi-functionality, and high performance in advanced electronic devices require higher densities of I/O gates and reduced area of soldering of interconnections. This increases the electric current density flowing through the interconnections, increasing the risk of interconnection failure caused by electromigration (EM). Accelerated directional atomic diffusion in solder materials under high current induces substantial growth of intermetallic compounds (IMCs) at the anode, and also void and crack formation at the cathode. In the work discussed in this paper, addition of SiC nanoparticles to Sn-Ag-Bi-In (SABI) lead-free solder refined its microstructure and improved its EM reliability under high current stress. Electron backscattering diffraction analysis revealed that the added SiC nanoparticles refined solder grain size after typical reflow. Under current stress, SABI joints with added nano-SiC had lifetimes almost twice as long as those without. Comparison of results from high-temperature aging revealed direct current affected evolution of the microstructure. Observations of IMC growth indicated that diffusion of Cu in the SiC composite solder may not have been reduced. During current flow, however, only narrow voids were formed in solder containing SiC, thus preventing the current crowding caused by bulky voids in the solder without SiC.