共查询到18条相似文献,搜索用时 78 毫秒
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超短脉冲强激光大气传输在光学遥感、电子对抗、以及人工放电等方面具有重要的应用.例如,利用超短脉冲强激光使得远距离处的大气局域电离,其所产生的紫外辐射可以为大气组分主动荧光光谱学研究提供光源。对短脉冲强激光在大气中的传输进行了理论分析,对超短脉冲强激光大气传输中的各种线性效应及非线性效应,诸如色散效应、非线性自聚焦效应、受激拉曼散射效应、多光子电离及隧道电离效应、电离引起的能量损耗效应、相对论聚焦、有质动力激发的等离子体尾波场等效应进行了讨论,给出了一组描述超短脉冲强激光大气传输的三维非线性传输方程,为此类问题的进一步研究提供了理论基础。 相似文献
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为探究毫秒脉冲激光辐照单晶硅的热损伤规律和机理,利用高精度点温仪和光谱反演系统对毫秒脉冲激光辐照单晶硅的温度进行测量。分析温度演化过程,研究毫秒脉冲激光对单晶硅热损伤全过程的温度状态和对应的损伤结构形态。研究表明:脉冲宽度固定时,激光诱导的单晶硅的峰值温度随能量密度的增加而增加;当脉冲宽度在1.5~3.0 ms之间时,温度随脉冲宽度的增加而降减小。温度上升曲线在熔点(1 687 K)附近时出现拐点,反射系数由0.33增加为0.72。在气化和凝固阶段,出现气化和固化平台期。单晶硅热致解理损伤先于热致熔蚀损伤,在低能量密度激光作用条件下,应力损伤占主导地位,而在大能量密度条件下,热损伤效应占主导地位。损伤深度与能量密度成正比,随脉冲个数增加迅速增加。 相似文献
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针对超短激光辐照单晶硅材料制备光栅结构存在表面裂纹的缺陷,采用双温模型数值模拟出热积累效应,并且实验验证不同加工参数下制备的单晶硅表面光栅结构的表面质量。数值模拟出不同超短激光功率下电子温度和晶格温度的变化规律,通过调节不同的加工参数制备出单晶硅表面光栅结构沟槽,采用超景深三维显微镜对其表面形貌分析。结果表明:当超短激光的输出功率增大时,激光热驰豫时间变大,增大了非平衡状态下激光的烧蚀强度。单晶硅表面的不平整凹坑造成超短激光的反射和散射,从而使得烧蚀后存在凹坑,造成单晶硅表面的损伤溶蚀。当加工速度和加工次数一定时,增大激光的输出功率可以提高超短激光制备光栅结构的加工效率,但过大的激光功率反而造成光栅结构沟槽两侧出现溶蚀凹坑。 相似文献
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工业激光材料加工,常使用空间和时间上均密集的激光能量来作材料的烧蚀,诸如钻孔,切割、焊接或其它加工.激光已经成为一种独立的工业加工方法,激光的新应用领域正迅速发展.激光微细加工是激光材料加工的一个分支,一般是指那些特征尺寸小于100μm的加工. 相似文献
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采用1064 nm纳秒脉冲激光辐照单晶Si、单结G As太阳能电池,针对不同强度激光辐照太阳能电池的损伤特性进行了实验研究,得出激光光斑聚焦在电池栅线上时,电池更易损伤,单晶Si电池的栅线打断之后仍能很好工作,单结GaAs电池却完全失效,这是由于高掺杂的基底锗熔融凝固连接栅线,导通电池正负极.实验结果还表明,激光辐照在电池表面时,对单晶Si电池基本没有影响,而GaAs电池输出性能也没有很大幅度的下降.理论分析了纳秒激光对电池的损伤主要是热、力效应共同作用的结果.热效应使材料熔化、气化,力效应主要沿着激光传输的方向,垂直于材料表面.常温下Si材料对1 064 nm有较强的本征吸收,GaAs电池的GaAs层透过1 064 nm,Ge基底本征吸收1 064 nm,Ge材料的熔点低于Si材料且其禁带宽度更窄,故其初始损伤阈值略低.通过SEM扫描电镜、激光拉曼材料分析及X射线光电子能谱仪等分析手段对实验结果进行了验证. 相似文献
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John S. Renshaw Ajay Upadhyaya Vijaykumar Upadhyaya Ian B. Cooper Ajeet Rohatgi 《Progress in Photovoltaics: Research and Applications》2013,21(2):141-147
This paper reports on the use of ultraviolet laser for forming segmented selective emitters on POCl 3 n + –p–p + solar cells. Laser scan speed, pulse power, and repetition rate are optimized to minimize laser‐induced defects, which are found to enhance recombination and reduce the local open‐circuit voltage. Laser‐doped selective emitters formed by locally driving in additional phosphorous from the diffusion glass are well suited for an etchback process without the need for a mask. In this paper, we show a novel selective emitter design that is segmented instead of continuous, combined with an emitter etchback process gives an efficiency improvement of about 0.3% absolute over a standard industrial type solar cell and 0.2% absolute improvement over a non‐segmented selective emitter solar cell. Copyright © 2012 John Wiley & Sons, Ltd. 相似文献
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Jia Chen Jan Deckers Patrick Choulat Izabela Kuzma‐Filipek Monica Aleman Angel Uruena De Castro Zhe Ren Du Filip Duerinckx Bram Hoex Jozef Szlufcik Jef Poortmans Armin G. Aberle 《Progress in Photovoltaics: Research and Applications》2015,23(12):1706-1714
n‐type silicon wafer solar cells are receiving increasing attention for industrial application in recent years, such as the n‐type rear‐junction Passivated Emitter Rear Totally‐diffused (PERT) solar cells. One of the main challenges in fabricating the n‐PERT solar cells is the opening of the rear dielectric for localized contacts. In this work laser ablation is applied to locally ablate the rear dielectric. We investigate the laser damage to the emitter at the laser‐ablated regions using the emitter saturation current density, J0e,laser, extracted by two approaches. J0e,laser is observed to be injection dependent due to high J02 recombination caused by laser damage to the space charge region. By using the optimized laser ablation parameters, n‐PERT solar cells with an efficiency of up to 21.0% are realized. Copyright © 2015 John Wiley & Sons, Ltd. 相似文献
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Yoshinori Tanaka Kenji Ishizaki Menaka De Zoysa Takami Umeda Yosuke Kawamoto Shoya Fujita Susumu Noda 《Progress in Photovoltaics: Research and Applications》2015,23(11):1475-1483
Enhancing the absorption of thin‐film microcrystalline silicon solar cells over a broadband range in order to improve the energy conversion efficiency is a very important challenge in the development of low cost and stable solar energy harvesting. Here, we demonstrate that a broadband enhancement of the absorption can be achieved by creating a large number of resonant modes associated with two‐dimensional photonic crystal band edges. We utilize higher‐order optical modes perpendicular to the silicon layer, as well as the band‐folding effect by employing photonic crystal superlattice structures. We establish a method to incorporate photonic crystal structures into thin‐film (~500 nm) microcrystalline silicon photovoltaic layers while suppressing undesired defects formed in the microcrystalline silicon. The fabricated solar cells exhibit 1.3 times increase of a short circuit current density (from 15.0 mA/cm2 to 19.6 mA/cm2) by introducing the photonic crystal structure, and consequently the conversion efficiency increases from 5.6% to 6.8%. Moreover, we theoretically analyze the absorption characteristics in the fabricated cell structure, and reveal that the energy conversion efficiency can be increased beyond 9.5% in a structure less than 1/400 as thick as conventional crystalline silicon solar cells with an efficiency of 24%. © 2015 The Authors. Progress in Photovoltaics: Research and Applications published by John Wiley & Sons Ltd. 相似文献