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纳米电子器件与纳米电子技术 总被引:3,自引:0,他引:3
介绍了纳米电子器件与纳米电子技术的概念以及纳米电子器件的分类;综述了现有的光刻、外延、SPM、特种精细加工等相关的纳米电子器件制备与加工技术;阐述了纳米电子技术中急需解决的若干关键问题。 相似文献
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对基于Top-Down加工技术的纳米电子器件如:单电子器件、共振器件、分子电子器件等的研究现状、面临的主要挑战等进行了讨论.采用CMOS兼容的工艺成功地研制出单电子器件,观察到明显的库仑阻塞效应;在半绝缘GaAs衬底上制作了AlAs/GaAs/In0.1 Ga0.9As/GaAs/AlAs双势垒共振隧穿二极管,采用环型集电极和薄势垒结构研制的共振隧穿器件,在室温下测得其峰谷电流比高达13.98,峰电流密度大于89kA/cm2;概述了交叉阵列的分子存储器的研究进展. 相似文献
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对基于Top-Down加工技术的纳米电子器件如:单电子器件、共振器件、分子电子器件等的研究现状、面临的主要挑战等进行了讨论. 采用CMOS兼容的工艺成功地研制出单电子器件,观察到明显的库仑阻塞效应;在半绝缘GaAs衬底上制作了AlAs/GaAs/In0.1Ga0.9As/GaAs/AlAs双势垒共振隧穿二极管,采用环型集电极和薄势垒结构研制的共振隧穿器件,在室温下测得其峰谷电流比高达13.98,峰电流密度大于89kA/cm2;概述了交叉阵列的分子存储器的研究进展. 相似文献
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对基于Top-Down加工技术的纳米电子器件如:单电子器件、共振器件、分子电子器件等的研究现状、面临的主要挑战等进行了讨论.采用CMOS兼容的工艺成功地研制出单电子器件,观察到明显的库仑阻塞效应;在半绝缘GaAs衬底上制作了AlAs/GaAs/In0.1 Ga0.9As/GaAs/AlAs双势垒共振隧穿二极管,采用环型集电极和薄势垒结构研制的共振隧穿器件,在室温下测得其峰谷电流比高达13.98,峰电流密度大于89kA/cm2;概述了交叉阵列的分子存储器的研究进展. 相似文献
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主要介绍纳米技术领域里纳米电子学/纳米光电子学的基本概念、纳米电子学的分类、纳米电子器件、纳米光电子器件、纳米电子学和纳米光电子学的发展模式以及纳米高技术群。 相似文献
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6单电子晶体管的集成单电子晶体管的集成化将依赖于各元器件的无线耦合[3],这与传统的大规模集成电路原理不同.基于这种单电子器件的集成原理,Nakazato等人[4,5]实现了有存储功能的单电子存储器和单电子逻辑电路.它们通过单电子晶体管间的隧穿耦合和电容耦合来实现单电子器件的集成. 相似文献
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光刻技术作为制备半导体器件的关键技术之一将制约着半导体行业的发展和半导体器件的性能。随着半导体工业的发展,集成电路的特征尺寸越来越小,光刻技术将面临新的挑战。分析了激光光刻技术,包括投影式光刻和激光无掩膜光刻技术的研究现状,着重介绍了极紫外光刻(EUVL)作为下一代光刻技术的发展前景和技术难点、激光无掩膜光刻技术的发展,特别是激光近场扫描光刻、激光干涉光刻、激光非线性光刻等新技术的最新进展及其在高分辨率纳米加工领域的应用前景。 相似文献
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本文先扼要回顾电子技术的进展历程,从晶体管至微电子集成电路,并引伸至光电子器件,近来又有倾向从微米尺度缩小至纳米尺度,即从微电子技术向纳电子技术进化。文中估测大规模集成电路发展遇到的极限,又说明光电子器件激光管和开关管及集成的现状和趋向,以及超级计算机硅和砷化镓集成芯片的现状和推测。最后,简单叙述微加工技术现状和纳加工技术的开端,包括薄膜形成、版图制备、刻蚀工艺和测试仪器等技术,从而看出纳电子技术有可能开始起步。 相似文献
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157 nm光刻技术的进展 总被引:1,自引:0,他引:1
概述了作为下一代光刻技术之一的157nmF2准分子激光光刻技术的进展及各公司157nm曝光设备的开发现状。介绍了157nm光刻中各种制约因素,如CaF2材料的双折射现象、真空环境的排气及污染控制、保护薄膜的选择、折反射光学系统的选择与设计及新型抗蚀剂的开发等问题随着时间的推进已基本得到解决。最后讨论了157nm光刻技术在45nm及以下节点器件图形曝光引入的可能性和采用浸液式157nm光刻进入32nm技术节点器件图形曝光的潜力。 相似文献
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Ishan Wathuthanthri Yuyang Liu Ke Du Wei Xu Chang‐Hwan Choi 《Advanced functional materials》2013,23(5):608-618
Using the vertical standing wave phenomena commonly regarded as a deterrent in holographic lithography, multifaceted three‐dimensional (3D) nanostructures are fabricated on polymeric photoresist materials using a simple two‐beam interferometer. Large‐area 3D nanostructures with high aspect ratios (greater than 10) are readily produced using this methodology, including grating, pillar and pore patterns. Furthermore, manipulation of the lithography process conditions results in unique sidewall profiles of the nanostructures. Such 3D holographic control even produces highly porous polymer membranes composed of 3D interconnected pore networks, which resembles the 3D photonic crystal compound nanostructures that were previously attainable only with limited pattern coverage area using complex multibeam holographic lithography processes. Such well‐tailored high‐aspect‐ratio 3D nanostructures with large pattern coverage area further enable the fabrication of novel nanostructures for functionalized materials via various additive and subtractive pattern transfer techniques such as etching, deposition, and molding. In particular, direct molding followed by thermal decomposition process leads to the synthesis of hierarchical titanium oxide nanostructures of tunable 3D geometry, which would be of great significance in applications of photonic crystals, photovoltaic solar cells, and photocatalyst in water decontamination. 相似文献
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Yaokun Pang Yunteng Cao Yihang Chu Minghong Liu Kent Snyder Devin MacKenzie Changyong Cao 《Advanced functional materials》2020,30(1)
Additive manufacturing, i.e., 3D printing, is being increasingly utilized to fabricate a variety of complex‐shaped electronics and energy devices (e.g., batteries, supercapacitors, and solar cells) due to its excellent process flexibility, good geometry controllability, as well as cost and material waste reduction. In this review, the recent advances in 3D printing of emerging batteries are emphasized and discussed. The recent progress in fabricating 3D‐printed batteries through the major 3D‐printing methods, including lithography‐based 3D printing, template‐assisted electrodeposition‐based 3D printing, inkjet printing, direct ink writing, fused deposition modeling, and aerosol jet printing, are first summarized. Then, the significant achievements made in the development and printing of battery electrodes and electrolytes are highlighted. Finally, major challenges are discussed and potential research frontiers in developing 3D‐printed batteries are proposed. It is expected that with the continuous development of printing techniques and materials, 3D‐printed batteries with long‐term durability, favorable safety as well as high energy and power density will eventually be widely used in many fields. 相似文献
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A GaAs metal–semiconductor field-effect transistor (MESFET) has been realized based on mix-and-match fabrication using optical lithography for the ohmic contacts and imprint lithography for the gate. The gate length and width are 1.2 and 80 μm, respectively, the channel length is 4 μm. For the gate definition a Si-mold is embossed into a thin polymer film located on top of an n-doped GaAs layer. The gate is fabricated by metal evaporation and lift-off. 相似文献
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简述了光学光刻技术在双重图形曝光、高折射率透镜材料及浸没介质、32nm光刻现状及22nm浸没式光刻技术的进展,指出了光学光刻技术的发展趋势及进入22nm技术节点的前景。 相似文献
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