GaN外延材料中持续光电导的光淬灭

研究了非故意掺杂和掺Si的n型GaN外延材料持续光电导的光淬灭.实验发现,非故意掺杂GaN的持续光电导淬灭程度远大于掺Si的n型GaN;撤去淬灭光后前者的持续光电导几乎没有变化,后者却明显减小;稍后再次加淬灭光,前者的持续光电导仍无变化,而后者却明显增加.作者认为两者持续光电导的形成都与空穴陷阱有关,用空穴陷阱模型解释了非故意掺杂GaN持续光电导的形成以及淬灭过程;掺Si的n型GaN的持续光电导是电子陷阱(杂质能级)和空穴陷阱共同作用的结果,并且在持续光电导发生的不同阶段其中一种陷阱的作用占主要地位.     

非故意掺杂n型GaN的负持续光电导现象

研究了MOCVD方法制备的非故意掺杂n型GaN薄膜的持续光电导现象.实验发现样品的光电导与入射光强有密切的关系,当入射光强由弱到强变化时,样品会依次出现正常持续光电导(PPC)、负光电导(NPC)和负持续光电导(NPPC)现象.据知,这是首次在一个样品中仅仅通过改变入射光强就可以依次产生以上现象的实验报道.通过系统的实验分析和理论研究认为,该现象形成的主要原因是材料中深能级电子陷阱和空穴陷阱共同作用的结果.     

非故意掺杂n型GaN的负持续光电导现象

研究了MOCVD方法制备的非故意掺杂n型GaN薄膜的持续光电导现象.实验发现样品的光电导与入射光强有密切的关系,当入射光强由弱到强变化时,样品会依次出现正常持续光电导(PPC)、负光电导(NPC)和负持续光电导(NPPC)现象.据知,这是首次在一个样品中仅仅通过改变入射光强就可以依次产生以上现象的实验报道.通过系统的实验分析和理论研究认为,该现象形成的主要原因是材料中深能级电子陷阱和空穴陷阱共同作用的结果.     

立方相GaN的持续光电导

研究了金属有机物化学气相外延(MOVPE)方法生长的非故意掺杂的立方相GaN的持续光电导效应.在六方相GaN中普遍认为持续光电导效应与黄光发射有关,而实验则显示在立方GaN中,持续光电导效应与其中的六方相GaN夹杂有关系,而与黄光发射没有关系.文中提出,立方相GaN与其中的六方相GaN夹杂之间的势垒引起的空间载流子分离是导致持续光电导现象的物理原因.通过建立势垒限制复合模型,解释了立方相GaN的持续光电导现象的物理过程,并对光电导衰减过程的动力学作了分析.对实验数据拟合的结果证明以上的模型和推导是与实验相符的.     

立方相GaN的持续光电导

研究了金属有机物化学气相外延 (MOVPE)方法生长的非故意掺杂的立方相 Ga N的持续光电导效应 .在六方相 Ga N中普遍认为持续光电导效应与黄光发射有关 ,而实验则显示在立方 Ga N中 ,持续光电导效应与其中的六方相 Ga N夹杂有关系 ,而与黄光发射没有关系 .文中提出 ,立方相 Ga N与其中的六方相 Ga N夹杂之间的势垒引起的空间载流子分离是导致持续光电导现象的物理原因 .通过建立势垒限制复合模型 ,解释了立方相 Ga N的持续光电导现象的物理过程 ,并对光电导衰减过程的动力学作了分析 .对实验数据拟合的结果证明以上的模型和推导是与实验相符的 .     

N型GaN的持续光电导

本文报道了金属有机物化学气相外延（ＭＯＶＰＥ）生长的未人为掺杂和掺Ｓｉｎ－ＧａＮ的持续光电导（ＰｅｒｓｉｓｔｅｎｔＰｈｏｔｏｃｏｎｄｕｃｔｉｖｉｔｙ——ＰＰＣ）．在不同温度下观察了光电导的产生和衰变行为．实验结果表明,未人为掺杂和掺Ｓｉｎ－ＧａＮ的持续光电导和黄光发射可能起源于深能级缺陷,这些缺陷可以是ＶＧａ空位、ＮＧａ反位或者ＶＧａ－ＳｉＧａ络合物．和未人为掺杂样品Ａ相比,样品Ｂ中因Ｓｉ的并入导致ＧａＮ中的深能级缺陷增加,提高了ＧａＮ中黄光发射,使持续光电导衰变减慢,但实验未发现黄光的加强和光电导衰变特     

EL2光淬灭过程中光电导增强现象原因新探

本文用光电导的实验方法对ＬＥＣＳＩ－ＧａＡｓ单晶中ＥＬ２能级的光淬灭过程进行了研究．通过对实验结果的分析，提出了一种解释ＥＬ２淬灭过程中ＥＰＣ现象起因的模型：光照前因补偿受主而已经电离的一部分ＥＬ２中心在近红外光照射下可通过从价带和其它深能级得到电子而被淬灭，使材料的费米能级下降，在价带中留下大量寿命很长的空穴，使光电导出现再上升．我们还发现ＥＰＣ的饱和值与材料的电子补偿度及热稳定性有一定的联系．     

中子辐照GaN中持续光电导现象的研究

Unintentionally doped GaN films grown by MOCVD were irradiated with neutrons at room temperature. In order to investigate the influence of neutron irradiation on the optical properties of GaN films, persistent photoconductivity(PPC) and low temperature photoluminescence(PL) measurements were carried out. Pronounced PPC was observed in the samples before and after neutron irradiation without the appearance of a yellow luminescence(YL) band in the PL spectrum, suggesting that the origin of PPC and YL are not related. Moreover, PPC phenomenon was enhanced by neutron irradiation and quenched by the followed annealing process at 900 C. The possible origin of PPC is discussed.     

光折变晶体的光电导及陷阱密度

通过分析体全息光栅的读取过程,得到光折变晶体CuKNSBN的光电导在入射光强为5×104W/m2时的典型值为σph=3.01×10-10 A·m-2.实验得到光电导与入射光强是指数约为b=0.8的亚线性关系,从而得到满陷阱与空陷阱之密度比的定量表示式为(CCu+/CCu2+)=αIb-1.在观测的波长范围内,b随着波长缩短而增大.     

外延电阻淬灭型硅光电倍增器的最新研究进展

北京师范大学新器件实验室（NDL）一直致力于研制结构紧凑、工艺相对简单的外延电阻淬灭型硅光电倍增器(silicon photomultiplier with epitaxial quenching resistor, EQR SiPM)。近期为了满足硅光电倍增器(silicon photomultiplier, SiPM)在核医学成像方面的需要,NDL通过优化器件设计和制作工艺,成功研制出微单元尺寸为15 μm、有效面积为9 mm2的EQR SiPM。相较以往同类型器件,实现了器件暗计数率(dark count rate, DCR)的进一步降低同时保持了较高的光子探测效率(photon detection efficiency, PDE),在环境温度为20 ℃、过偏压为7 V时,DCR的典型值为226 kHz/mm2、峰值PDE为46%。另外,为了进一步提升EQR SiPM的动态范围,NDL还研制出微单元尺寸为6 μm、有效面积为9 mm2、微单元数目为244720的EQR SiPM,在环境温度为20 ℃、过偏压为7 V时,DCR的典型值为240 kHz/mm2、峰值PDE为28%,其较大的动态范围特别适合高能宇宙射线的测量、强子量能器等应用。     

Persistent Photoconductivity in n-type GaN

The persistent photoconductivity（PPC） phenomena in n-type GaN Films grown by metalorganic chemical vapor deposition（MOCVD） have been studied. After using some testing and analysis methods, such as the double crystal X-ray diffraction（DCXRD）, the photolumineseence（PL） spectra, etc, it is found that the issue which influences PPC in n-type GaN is not relative to the dislocations and yellow band （YB）, and is caused by the doping level of Si most likely.     

非掺杂n型氮化镓外延层的光致发光

研究了热处理对非掺杂 n型氮化镓外延层光致发光谱的影响和光谱中各发光带强度与温度之间的关系 .热处理后 ,光谱中的带边峰和黄光峰的强度较热处理前都有明显降低 .黄光峰强度随温度升高的衰减速度要比带边峰慢得多 .由这些实验结果得出结论 :光谱中的带边峰是由自由激子和束缚在一浅施主能级的束缚激子的谱线重合而成 ,这个浅施主能级很有可能是由氮空位产生 ;黄色荧光的机制应为自由电子或施主能级向深受主能级的跃迁 ,并且黄色荧光肯定和氮化镓中的一内部缺陷产生的深受主能级有关 ,该内部缺陷很有可能是镓空位 .     

The hall mobility and its relationship with persistent photoconductivity of undoped GaN

Temperature-variable Hall effect measurements have been used to investigate the electrical properties of undoped GaN, which have the electron densities on the order of mid-10¹⁶ cm⁻³ and a Hall mobility varying from <50 cm²/sV to >500 cm²/sV. We found that very strong ionized impurity scattering limits the Hall mobility of GaN. Illumination even at 77 K has very little effect on the electron density but can lead to a noticeable persistent increase of the Hall mobility. The induced persistent photoconductivity (PPC) effect is therefore related to the Hall mobility through intrinsic electrically active defects. The properties of those defects were further investigated by monitoring a transient change of resistivity after removal of illumination at different temperatures. It reveals that the recapturing process of excited electrons into illumination-neutralized defects is the mechanism responsible for the PPC effect of undoped GaN.     

Unraveling the Mechanism of the Persistent Photoconductivity in Organic Phototransistors

Persistent photoconductivity (PPC) in organic phototransistors provides an opportunity and broad prospects to achieve many emerging applications in optoelectronic devices. However, a fundamental understanding of PPC behavior is still a key challenge impeding its practical applications. In this study, for the first time, a mechanism for electron trapping is presented in oxygen‐induced deep levels in organic semiconductors for the clarification of PPC behavior with solid evidence. Both theoretical simulation and experimental investigation unveil that oxygen in air atmosphere plays a decisive role in determining the PPC behavior. Oxygen molecules can induce deep defect levels in the energy bandgap of organic semiconductors, which will act as deep traps for photogenerated electrons. The trapped electrons will be maintained in the traps and undergo a very slow releasing process after light illumination, thus leading to a noticeable PPC behavior for the organic phototransistors. The proposed mechanism shows good universality and can be applicable to a host of organic semiconductors for explaining the PPC behaviors. This work reveals the significant role of oxygen in PPC behavior and also provides guidelines for controlling the unique PPC behavior toward device applications.