Cu掺杂对ZnO量子点光致发光的影响

通过溶液法合成了Cu掺杂ZnO量子点。X射线衍射(XRD)和高分辨电子透射电镜(HRTEM)图像显示Cu掺杂ZnO量子点具有六角纤锌矿结构,晶粒大小为4～5nm。Cu掺杂抑制了ZnO量子点颗粒长大。室温光致发光(PL)谱观察到紫外带边和可见区两个发射峰。随着Cu掺杂浓度的增大,紫外荧光峰位发生缓慢红移,由366nm移到370nm;可见区发射峰位发生蓝移,由525nm移到495nm;同时,两个发射峰强度降低。光谱结果表明:Cu的掺入,一方面抑制表面与O空位有关的缺陷,在495nm出现了与Cu1+有关的发射峰;另一方面,Cu离子掺入ZnO量子点引入一些非辐射中心,降低了自由激子发射。     

两步法生长ZnO纳米棒的结构及其发光特性

应用两步法在玻璃衬底上制备了高度取向的ZnO纳米棒,并研究了衬底和反应时间等参数对其结构及发光特性的影响。从样品的扫描电镜(SEM)图中发现,利用脉冲激光沉积(PLD)方法在玻璃衬底上生长一层ZnO薄膜作为修饰层,可以明显提高水热法生长的ZnO纳米棒的结晶质量。样品的SEM和光致发光(PL)谱表明,在有ZnO修饰层的玻璃衬底上生长的ZnO纳米棒分布均匀,排列致密,取向性好;缺陷发光的发光强度约是激子发光峰的2倍,且随着反应时间增长,样品的缺陷发光增强而激子发光减弱。     

Effect of annealing temperature on 1.5 μm photoluminescence from Er-lmplanted 6H-SiC

The effect of post-implantation anneal on erbium-doped 6H-SiC has been investigated. 6H-SiC has been implanted with 330 keV Er⁺ at a dose of 1 × 1013 /cm2. Er depth profiles were obtained by secondary ion mass spectrometry (SIMS). The as-implanted Er-profile had a peak concentration of∼1.3 × 10¹⁸/cm³ at a depth of 770Å. The samples were annealed in Ar at temperatures from 1200 to 1900°C. The photoluminescence intensity integrated over the 1.5 to 1.6 μm region is essentially independent of annealing temperature from 1400 to 1900°C. Reduced, but still significant PL intensity, was measured from the sample annealed at 1200°C. The approximate diffusivity of Er in 6H SiC was calculated from the SIMS profiles, yielding values from 4.5 × 10⁻¹⁶ cm²/s at 1200°C to 5.5 × 10⁻¹⁵ cm²/s at 1900°C.     

非晶SiO2纳米线的合成及其显微结构和光学性质的研究

本研究以硅片为衬底,热蒸发一氧化硅粉末在较低温度下合成了大量直径均匀的非晶SiO2纳米线.这些纳米线直径分布在15 nm～40 nm之间,长度几十微米.选区电子衍射(SAED)、能谱(EDS)、电子能量损失谱(EELS)分析结果表明这些纳米线为非晶SiO2纳米线.光致发光(PL)谱测试结果显示纳米线在波长550 nm处存在一个较强的PL峰.本文进一步指出了蒸发源SiO粉末的颗粒度和蒸发温度对纳米线生长有强烈的影响.     

High-resolution mapping of infrared photoluminescence

We report preliminary results of high-resolution scanning photoluminescence (PL) experiments in the near- and mid-infrared (IR) portions of the spectrum. The samples investigated were Hg_0.7Cd_0.3Te epilayers grown on Cd_0.96Zn_0.04Te and CdTe/Si substrates used in IR detectors and focal-plane arrays. To measure mid-IR PL, we modified a commercial, Fourier transform infrared (FTIR) spectrometer and designed a confocal microscope attachment. For near-IR PL mapping, we used a confocal microscope coupled to a grating spectrometer and a charge-couple device (CCD) camera. Diffraction-limited resolution was achieved in the near-IR setup (0.5 μm) and 22-μm resolution for the mid-IR setup.     

四脚针状ZnO纳米结构的制备及表征

采用以Zn粉、C粉为原料,采用热蒸发法,在没有任何载气和700℃下制备了四脚针状ZnO纳米结构。C粉起到了催化剂的作用但产物却不存在催化剂去除的问题,同时C粉氧化生成的CO/CO2还起到了载气的作用。扫描电镜(SEM)表明,四脚针状ZnO具有很细的尖端,直径为50 nm。X射线衍射(XRD)、微区拉曼图谱的特征峰表明,四脚针状ZnO是高纯的六角纤锌矿结构。光致发光(PL)谱在403 nm附近有微弱的紫光发射峰,而在510 nm附近出现了很强的绿光发射峰。     

Point defects in Cd1−xZnxTe: A correlated photoluminescence and EPR study

Cd_1−xZn_xTe (CZT) is an emerging material for room-temperature x-ray and gamma-ray detectors. The identification and control of point defects and charge compensators in the bulk material are currently important issues. We have used photoluminescence (PL), photoluminescence excitation, and electron paramagnetic resonance (EPR) to characterize point defects in a series of bulk CZT crystals grown by the high-pressure Bridgman technique. Luminescence peaks due to shallow donors, shallow acceptors, and deeper levels, such as V_Cd-D_Cd complexes (D = shallow donor), were monitored. This was followed by a detailed study of photo-induced EPR, using a tunable Ti:sapphire laser. There were no EPR signals in the “light off” condition; however, during illumination, an isotropic EPR spectrum due to neutral donors could be observed. The dependence of the donor g value on zinc molar fraction, x, has been determined for the range 0.07<x<0.14. We show that PL and EPR can be combined to give increased quantitative defect analysis in CZT. With resonant tuning of the Ti:sapphire laser, we detected donor concentrations as low as mid-10¹⁴cm⁻³ in detector-grade CZT crystals.     

ZnO growth on Si with low-temperature CdO and ZnO buffer layers by molecular-beam epitaxy

Low-temperature (LT) buffer-layer techniques were employed to improve the crystalline quality of ZnO films grown by molecular-beam epitaxy (MBE). Photoluminescence (PL) spectra show that CdO, as a hetero-buffer layer with a rock-salt structure, does not improve the quality of ZnO film grown on top. However, by using ZnO as a homo-buffer layer, the crystalline quality can be greatly enhanced, as indicated by PL, atomic force microscopy (AFM), x-ray diffraction (XRD), and Raman scattering. Moreover, the buffer layer grown at 450°C is found to be the best template to further improve the quality of top ZnO film. The mechanisms behind this result are the strong interactions between point defects and threading dislocations in the ZnO buffer layer.     

MO-PPV/ZnSe量子点复合材料的制备及光致发光特性研究

采用水相法制备了颗粒尺寸为3.75nm的硒化锌(ZnSe)量子点,采用表面活性剂将ZnSe量子点转移到有机相聚(2-甲氧基-5-辛氧基)对苯乙炔(MO-PPV)中,获得了MO-PPV/ZnSe复合材料。通过对MO-PPV和ZnSe量子点的吸收光谱(ABS)和光致发光(PL)光谱的研究发现,随着ZnSe量子点掺杂浓度的提高,复合材料的发光强度明显增强,发光峰位置出现了蓝移。当ZnSe∶MO-PPV的质量比为1∶0.181时,发光峰位置蓝移10nm。结果表明,MO-PPV与ZnSe量子点之间存在着能量传递,这是导致MO-PPV/ZnSe量子点复合材料具有PL增强的重要原因。     

Cd掺杂ZnO薄膜的光致发光性能研究

三元半导体Cd掺杂ZnO薄膜通过脉冲激光法沉积 在石英玻璃基底上,Gd含量x从0增加到0.23。X射线衍射(XRD)图谱表明,所有Zn1－xCd xO薄膜都具有c轴取向的六方纤锌矿结构,而且c轴 晶格常数随着 x的增加而增加。原子力显微镜(AFM)观察到,随着x的增加,Zn1－xCdxO 薄膜的晶粒尺寸逐渐减小。光致发光(PL)和透过率 测量都证实,随着x的增加,薄膜的禁带宽度Eg从3.27eV降低到了2.78eV,同时导致了PL峰半高 宽(FWHM)的变大。PL峰迁移到了可见光范围内,使得Zn1－xCdxO薄膜可以应用在可见光发光二极管及其它高效率的光电 子器件。     

Absorption and photoluminescence spectroscopy of diffusion-doped ZnSe:Cr2+

ZnSe:Cr²⁺ is an attractive candidate as a room-temperature tunable solid-state laser with output in the 2–3 μm range. Passive absorption losses in this emission range currently limit laser performance. In this study, we use absorption and photoluminescence spectroscopies at 5 and 296K to address the origin of these optical losses. A series of diffusion-doped ZnSe:Cr single-crystal samples with Cr²⁺ concentrations in the range from 2×10¹⁷ cm⁻³ to 9×10¹⁹ cm⁻³ were obtained using CrSe powder as the dopant source. We find that trace amounts of Fe²⁺ produce absorption in the 2–3 μm range. Also, we have obtained data on a 680 nm absorption band observed in ZnSe:Cr which has been assigned to an internal transition of Cr²⁺. In our series of samples, the relative intensities of the 680 nm absorption band do not track the relative intensities of the 1.8 μm band (known to be due to Cr²⁺), although excitation near 680 nm does produce weak Cr²⁺ luminescence. Our absorption data do not support the current assignment of the 680 nm absorption as being an internal transition of the Cr²⁺ ion.     

The Effect of Substrate Material and Postannealing on the Photoluminescence and Piezo Properties of DC-Sputtered ZnO

Abstact Zinc oxide (ZnO) thin films were deposited on various substrates by DC sputtering deposition. Thermal annealing was performed at up to 1,200°C in N₂ for 30 min. The effect was investigated using x-ray diffraction (XRD), photoluminescence (PL) spectra, scanning electron microscopy (SEM), and piezoresponse force microscopy (PFM). The influence on PL response depends both on substrate material and annealing temperature. The PFM images reveal that the ZnO films have inversion domains. While annealing improves the piezoresponse, the inversion domains still persist. The cross-sectional analysis of the inversion domains shows domain boundary widths of approximately 1.5 nm. (Received ...; accepted ...)     

自催化方式制备ZnO纳米线及光致发光特性

采用化学气相沉积法,不用催化剂,在Si(111)基片上制备了ZnO纳米线。扫描电子显微镜(SEM)表征发现ZnO纳米线的直径在100nm左右。X射线衍射(XRD)图谱上只存在ZnO的(002)衍射峰。室温下光致发光谱(PL)中出现了389nm和357nm的紫外峰以及五个蓝光峰(450,468,474,481和491nm)。389nm峰为自由激子复合发射357nm峰是在LO声子的参与下,自由载流子碰撞形成自由激子过程的发光行为;468nm峰系电子从氧空位形成的浅施主能级向价带跃迁发光;450nm峰系电子从导带向锌空位形成的浅受主能级跃迁发光;474,481和491nm峰是声子伴线。     

溶液浓度对ZnO纳米棒形貌和发光的影响

为了获取高质量、高取向排列规则的ZnO纳米棒,玻璃衬底预先用脉冲激光沉积方法制备一层ZnO薄膜作为籽晶层,应用水热法在玻璃衬底上生长ZnO纳米棒。探究了籽晶层及不同溶液浓度对ZnO纳米棒结构和发光的影响,用扫描电子显微镜和X射线衍射仪测量样品的形貌和结构,用组建的光致发光测试系统对样品的室温光致发光光谱进行测定。结果表明,ZnO纳米棒具有高度取向且分布致密均匀;光致发光光谱显示ZnO的近带边发射比深能级发光略低;随着溶液浓度的增加,近带边发光和深能级发光相对强度的比值依次降低。     

ZnO/(Ni)薄膜的制备与发光性能的研究

采用直流磁控溅射法制备了ZnO/(Ni)薄膜.研究了氧分压及Ni掺杂对ZnO薄膜的结构、光致发光特性及薄膜中的几种本征缺陷如氧空位(VO)、锌空位(VZn)、氧位锌(OZn)、锌位氧(ZnO)、间隙氧(Oi)、间隙锌(Zni)等浓度变化的影响.实验结果表明,随着氧分压的增大,466nm处的蓝色发光峰增强,掺Ni后蓝色发光峰也增强.通过分析,推测出蓝色发光峰可能是由ZnO薄膜中的间隙锌(Zni)点缺陷引起的.     

ZnO纳米棒水热法制备及其发光特性研究

采用氢氧化钾(KOH)和二水醋酸锌(Zn(CH3COO)2.2H2O)配制不同浓度的反应溶液,反应过程中加入表面活性剂聚乙二醇(HO(CH2CH2O)13H),在80℃水热反应条件下制备出了优异的ZnO纳米材料。采用扫描电镜(SEM)、X射线衍射(XRD)、荧光光谱仪等测试方法研究了样品的成分、表面形貌和微结构。SEM研究结果显示:样品沿c轴择优生长,径粒分布均匀,长径比高,为六方纤锌矿结构的ZnO纳米棒和菊花状ZnO纳米棒。光致发光谱性能分析显示样品在392 nm附近具有很强的紫外光发射能力,随着反应物浓度的增加,紫外峰发生约3 nm的蓝移,同时,样品还在绿光535 nm附近有较弱的光致发光现象。以上结果表明所制备的ZnO纳米材料具有优异的紫外光发射能力。     

ZnO nanotips grown on Si substrates by metal-organic chemical-vapor deposition

The ZnO nanotips are grown on silicon and silicon-on-sapphire (SOS) substrates using the metal-organic chemical-vapor deposition (MOCVD) technique. The ZnO nanotips are found to be single crystal and vertically aligned along the c-axis. In-situ Ga doping is carried out during the MOCVD growth. The ZnO nanotips display strong near-band edge photoluminescence (PL) emission with negligible deep-level emission. Free excitonic emission dominates the 77-K PL spectrum of the as-grown, undoped ZnO nanotips, indicating good optical properties and a low defect concentration of the nanotips. The increase of PL intensity from Ga doping is attributed to Ga-related impurity band emission. Photoluminescence quenching is also observed because of heavy Ga doping. ZnO nanotips grown on Si can be patterned through photolithography and etching processes, providing the potential for integrating ZnO nanotip arrays with Si devices.     

Spatially resolved photoluminescence and transmission spectra of HgCdTe

We report new high-resolution scanning photoluminescence (PL) experiments in the mid-infrared (IR) portion of the spectrum. The samples investigated were Hg_0.7Cd_0.3Te epilayers grown on Cd_0.96Zn_0.04Te substrates. The influence of macrodefects and the annealing of samples on the PL signal were studied. Transmission spectra were used to map the optical path variations of the epilayer.     

Ag掺杂浓度对ZnO纳米花荧光增强的影响

采用水浴与光照相结合的方法制备了Ag/ZnO纳米复 合结构,研究了不同Ag掺杂浓度对 ZnO发光强度的影响。通过X射线衍射(XRD)、扫描电子显微镜(SEM)和光致发光 (PL)光谱对Ag/ZnO纳米复合物的结构、形貌和光学性能进行了研究。SEM表明,由水浴法制 得的ZnO纳米花结构长约1.0μm,直径为200nm左右。XRD结果显示,Ag掺杂后Ag/ZnO 纳米复合结构衍射峰的强度都增强,当掺杂浓度为0.153wt%时,在38.28°出现了Ag₂O的衍射峰。PL表明,Ag浓度极大影响了ZnO紫外发光强度。当Ag的掺杂 浓度为0.051wt% 时,Ag/ZnO纳米复合结构具有最强的紫外发射强度,同未掺杂的ZnO相比,紫外发光强度提 高了11倍。研究结果表明,利用Ag纳米颗粒的局域表面等离子共振(LSPR)特性增强了ZnO纳 米结构的荧光强度,从而提高了荧光检测的灵敏度。     

Annealing studies of photoluminescence spectra from multiple Er3+ centers in er-implanted GaN

A study of selectively excited photoluminescence (PL) at ∼ 6K in Er-im planted GaN as a function of annealing temperature (400–1000°C) has detected nine different Er³⁺ centers with distinct ∼ 1540 nm ⁴I_13/2 → ⁴I_15/2 Er³⁺ PL spectra and different activation temperatures. However, most of the optically active implanted Er atoms are incorporated at annealing temperatures as low as 400°C on a single type of center for which PL can only be excited efficiently by direct intra-4f shell absorption and is not strongly pumped by either above-gap or broad-band below-gap absorption. This strongly suggests that this high-concentration Er³⁺ center is an isolated, isoelectronic center consistent with Er³⁺ substituted on a Ga site. In contrast, a very small fraction of the Er atoms that form a variety of Er-defect/impurity complexes dominate the Er³⁺ emission spectra excited by above-gap and broad-band below-gap absorption because of their larger cross sections for both carrier capture and optical absorption.