Room Temperature Ferromagnetism in III–V-Based Diluted Magnetic Semiconductor GaCrN Grown by ECR Molecular-Beam Epitaxy

A new III–V nitride-based diluted magnetic semiconductor GaCrN has been successfully synthesized for the first time. X-ray diffraction measurement showed no existence of secondary phase in the GaCrN layers. They showed a ferromagnetic behavior with the Curie temperature of higher than 400 K, and clear saturation and hysteresis were observed in the magnetization versus magnetic field curves at all measuring temperatures (10–400 K). Specially, GaCrN magnetization data show no paramagnetic component at low temperature, which are superior characteristics over GaMnN. Photoluminescence emission from GaCrN layer was observed at around 3.29 eV at 10–300 K.     

Magnetic Behaviors of Ferromagnetic Semiconductor Zn1?xCrxTe Grown by MBE

The magnetic and structural properties of MBE-grown films of Zn_1–xCr_xTe were investigated. The magnetization versus magnetic field (M–H) measurement of Zn_1–xCr_xTe (x = 0.01–0.17) showed clear hysteresis loop at low temperatures. The ferromagnetic transition temperature (T_C) estimated from the Arrott-plot analysis increased almost linearly with the Cr composition (x) up to 275 K at x = 0.17. However, in the magnetization versus temperature (M–T) measurement, the irreversibility between the zero-field-cooled (ZFC) and field-cooled (FC) processes was observed. This is typically observed in the magnetic random system such as spin-glass or superparamagnetic phase. In the high resolution transmission microscopy (HRTEM) observations, structural defects such as stacking faults and polycrystalline-like structure were observed at high Cr compositions, whereas any apparent precipitates of different phases were not seen in all the range of Cr compositions examined. The correlation of the observed magnetic randomness with the local structural defects was discussed.     

(Ga,Mn)N : Sn Epilayers

We have prepared (Ga,Mn)N : Sn epilayers on sapphire(0001) substrates by RF-plasma assisted molecular beam epitaxy. We found that codoping with Sn enhances the incorporation of Mn into a GaN host crystal. With increasing the Sn content, the offset ferromagnetic magnetization component tends to disappear and the epilayers become completely paramagnetic. The effective spin number is S 2.5 without Sn, whereas it decreases to S 2.0 when Sn is incorporated. n-type conduction starts to take place when Sn contents exceed beyond the Mn contents.     

Electric Field Effect on the Magnetic Properties of III–V Ferromagnetic Semiconductor (In,Mn)As and ((Al),Ga,Mn)As

We have investigated the magnetotransport properties of field-effect transistors (FET) having a III–V ferromagnetic semiconductor channel layer. One can control not only the ferromagnetic transition temperature T _C but also the magnetization and the coercive force of (In,Mn)As channel layers isothermally and reversibly by gate electric fields. A small change of the magnetization upon application of gate electric fields is also observed in FETs with a (Ga,Mn)As channel. Results on a (Al,Ga,Mn)As channel FET are also presented.     

(Ga,Mn)As稀磁半导体的杂质动力学模拟研究

结合第一性原理计算和动力学蒙特卡罗模拟研究了稀磁半导体(Ga,Mn)As中Mn杂质的沉积动力学规律。利用第一性原理计算和爬坡弹性带方法计算了Mn杂质的跃迁势垒和结合能,并把这些能量作为动力学蒙特卡罗模拟(Ga,Mn)As微观结构演化的输入数据。结果表明在外延生长退火下长时间的微观结构演化的背后机制是Ga空位调节Mn原子在Ga子晶格上进行扩散。这种扩散会导致Mn原子的聚集,进而降低了居里温度。此外,随着退火温度的升高Mn团簇聚集的速率也更快。在高温退火下容易导致相分离。     

Temperature Peculiarities of Magnetic Anisotropy in (Ga,Mn)As: The Role of the Hole Concentration

It is demonstrated by SQUID measurements that (Ga,Mn)As films can exhibit perpendicular easy axis at low temperatures, even under compressive strain, provided that the hole concentration is sufficiently small. In such films, the easy axis assume a standard in-plane orientation when the temperature is increased towards the Curie temperature. The findings are shown to corroborate the predictions of the mean-field Zener model for strained (III,Mn)V ferromagnetic semiconductors.     

Spin Carrier Exchange Interactions in (Ga,Mn)N and (Zn,Co)O Wide Band Gap Diluted Magnetic Semiconductor Epilayers

(Ga,Mn)N and (Zn,Co)O wide band gap diluted magnetic semiconductor epilayers have been investigated by magneto-optical spectroscopy. In both cases, absorption bands observed below the energy gap allow us to study the nature of the valence and spin state of the incorporated magnetic element. Exchange interactions between magnetic ions and carriers can be observed by analyzing the magnetic circular dichroism in transmission or the exciton Zeeman splitting in reflection for (Zn,Co)O. A first estimation of the exchange integrals can be given for both materials.     

Molecular Beam Epitaxy and Properties of Cr-Doped GaSb

Molecular beam epitaxy of GaSb films, with several percents of Cr, and their characterization are reported. Their electric and magnetic properties depend on their growth temperature and Cr composition. Although magnetization measurements reveal that all the films are ferromagnetic even at room temperature, this is most probably due to the precipitation of ferromagnetic zincblende CrSb. The magnetotransport measurements show that Cr spins may couple antiferromagnetically in GaSb host matrix.     

图形化衬底对高In组分InGaN材料分子束外延(MBE)生长的影响

研究了不同衬底上MBE技术生长的InGaN的光学和结构特征。结果表明,在相同生长条件下,用图形化衬底生长的InGaN材料比用普通衬底生长的材料有较低的表面粗糙度和背景载流子浓度及较强的发光强度。通过透射电子显微镜(TEM)观察,发现普通衬底生长的InGaN内部原子错排现象严重,而采用图形化衬底生长的InGaN原子排列清晰规则。这主要是因为图形化衬底材料外延初期为横向生长模式,这种生长模式可有效地抑制穿透位错在GaN材料体系中的纵向延伸,降低GaN缓冲层中的位错密度,进而抑制外延InGaN材料中穿透位错和V型缺陷的产生。     

Channel Thickness Dependence of the Magnetic Properties in (Ga,Mn)As FET Structures

We have fabricated a series of field-effect transistor structures with a thin (Ga,Mn)As channel with thickness t of 3.5, 4.0, 4.5, and 5.0 nm, and investigated the effect of electric-field E on their magnetic properties. The Curie temperature T _C showed a clear dependence on the magnitude of E, and its controllable range became larger with decreasing t and reached 15 K for the device with t=3.5 nm, which corresponded to 32% of T _C of the layer.     

Electrical Properties and Ferromagnetism in (Ga,Cr)As

MBE-grown (Ga,Cr)As has interesting electric and magnetic properties. Ga_1–x Cr _x As with x = 0.1 exhibits short-range ferromagnetic behavior at low temperatures. This is manifest in several anomalous properties: magnetization does not scale with B/T; fitting M(B) requires a model of distributed magnetic cluster or polarons; and inverse susceptibility is nonliner in T (non-Curie–Weiss) at low fields. At room temperature, the conductivity is activated and Hall measurements yield a hole concentration of 10²⁰ cm^–3, indicating that chromium acts as an acceptor similar to Mn in GaAs. For decreasing temperature, the conductivity decreases by eight orders of magnitude and follows exp(1/T ^1/2).     

磁控溅射法制备Zn_(1-x)Co_xO薄膜的磁性能

采用磁控溅射工艺,在玻璃基片上制备了Zn1-xCoxO(x=0.02~0.15)稀磁半导体薄膜。采用X-射线衍射(XRD)、X射线光电子能谱(XPS)、原子力显微镜(AFM)、振动样品磁强计(VSM)研究了薄膜的相结构、化学成分及价态、表面形貌和磁性能。结果表明,本实验条件下,薄膜不存在Co及Co的氧化物相,薄膜中Zn的化学价为+2,Co则以+2和+4价的形式存在;薄膜晶体结构为c轴取向生长的六方纤锌矿结构;薄膜表面平整致密。在温度为300 K时,Zn0.9Co0.1O薄膜呈铁磁效应,在M-H曲线中观测到明显的磁滞回线特征。     

Hanle Effect Measurements of Spin Lifetime in Zn0.4Cd0.6Se Epilayers Grown on InP

We use the Hanle effect to study spin relaxation in Zn_xCd_1–xSe epilayers grown on lattice-matched InP substrates. We study three samples with a fixed composition (x = 0.4) and with varying levels of n-doping, as well as an undoped sample with x = 0.5. Our measurements show that the spin relaxation time changes non-monotonically as a function of carrier density, with a maximum transverse spin lifetime of ~10.5 ns at low temperatures for a sample doped near the metal–insulator transition.     

MBE技术蓝宝石衬底上生长VO2薄膜及其太赫兹和金属-绝缘体相变特性研究

采用分子束外延(MBE)技术在单晶蓝宝石衬底上生长了高质量化学计量比二氧化钒(VO₂)薄膜, 通过该技术实现薄膜厚度15~60 nm精确控制。对于优化条件下VO₂薄膜, 实现了电阻率变化超过4个数量级的优异金属-绝缘体相变, 近似于之前报道高质量单晶VO₂相变特性。特别是通过太赫兹时域光谱分析了不同厚度的VO₂薄膜在太赫兹波段的光学特性。结果表明: VO₂薄膜的厚度对其在太赫兹波段的光学特性有很大影响。因此, 为了获得更优的可靠性和重复性能, VO₂薄膜的厚度必须得到精确控制。本研究结果对于下一步VO₂基太赫兹器件研究具有重要意义。     

Effect of GaAs Intermediary Layer Thickness on the Properties of (Ga,Mn)As Tri-Layer Structures

We have investigated the magnetic properties, current–voltage characteristics, and tunnel magnetoresistance of (Ga,Mn)As/GaAs/(Ga,Mn)As tri-layers having different thickness of the intermediary GaAs layer (1–7 nm). When the thickness of GaAs layer is less than 6 nm, the two (Ga,Mn)As layers couples ferromagnetically. For the tri-layers with thicker GaAs, the GaAs acts as an effective barrier for the carrier transport and decouples the two (Ga,Mn)As layers, which results in tunnel magnetoresistance ratio as high as 100% at 5 K.     

In0.53Ga0.47As/InP(001)薄膜表面重构的研究

通过扫描隧道显微镜(STM)以及反射式高能电子衍射(RHEED)对在不同As4等效束流压强(As4BEP)下生长的In0.53 Ga0.47 As薄膜表面重构进行研究.研究发现在两种As4 BEP条件下,样品表面重构都以(4×3)/(n×3)为主,并存在c(6×4)、β2(2×4)以及α2(2×4)三种重构类型.和低As4 BEP条件相比,高As4 BEP条件下反射式高能电子衍射仪图像更加清晰,高分辨率的STM扫描图片也能够分辨出各种重构类型.对高分辨率的STM扫描图像进行进一步分析得到,随着As4 BEP的升高,β2(2×4)重构类型明显减少,这是由于高As4 BEP减少In偏析,从而抑制β2(2×4)重构的产生.     

Synthesis,characterization and kinetic of a surfactant-modified bentonite used to remove As(III) and As(V) from aqueous solution

In this study, organobentonites were prepared by modification of bentonite with various cationic surfactants, and were used to remove As(V) and As(III) from aqueous solution. The results showed that the adsorption capacities of bentonite modified with octadecyl benzyl dimethyl ammonium (SMB3) were 0.288 mg/g for As(V) and 0.102 mg/g for As(III), which were much higher compared to 0.043 and 0.036 mg/g of un-modified bentonite (UB). The adsorption kinetics were fitted well with the pseudo-second-order model with rate constants of 46.7 × 10⁻³ g/mg h for As(V) and 3.1 × 10⁻³ g/mg h for As(III), respectively. The maximum adsorption capacity of As(V) derived from the Langmuir equation reached as high as 1.48 mg/g, while the maximum adsorption capacity of As(III) was 0.82 mg/g. The adsorption of As(V) and As(III) was strongly dependent on solution pH. Addition of anions did not impact on As(III) adsorption, while they clearly suppressed adsorption of As(V). In addition, this study also showed that desorbed rates were 74.61% for As(V) and 30.32% for As(III), respectively, after regeneration of SMB3 in 0.1 M HCl solution. Furthermore, in order to interpret the proposed absorption mechanism, both SMB3 and UB were extensively characterized using scanning electron microscopy (SEM), X-ray diffraction (XRD) and Fourier transform infrared (FTIR) analyses.     

Magnetic Properties of (Ga,Fe)N

Wurtzite (Ga,Fe)N bulk crystals were, for the first time, successfully grown by AMMONO and chemical transport methods. The magnetization measurements of (Ga,Fe)N crystals revealed the coexistence of paramagnetic and ferromagnetic contributions. The paramagnetic component was shown to be growth condition dependent. The Brillouin-type behavior was observed in the samples obtained by both methods. Some (Ga,Fe)N samples (especially those codoped with Si) grown by the chemical transport method show a Van Vleck–type paramagnetic behavior.     

Electrical Electron Spin Injection with a p+-(Ga,Mn)As/n+-GaAs Tunnel Junction

We demonstrate electrical electron spin injection in a p⁺-(Ga,Mn)As/n⁺-GaAs tunnel junction with an n-GaAs/(In,Ga)As/p-GaAs light emitting diode (LED). By applying a reverse bias to the p⁺-(Ga,Mn)As/n⁺-GaAs junction (forward bias to the LED), we observed clear hysteresis in electroluminescence (EL) polarization. The magnitude of the EL polarization, which does not depend critically on the spacer layer thickness up to 800 nm, is found to be about five times greater than that of the hole spin injection.