Tuning zinc doping content to optimize optical and structural properties of Cd1-xZnxS buffer layers

In this paper, Cd_1-xZn_xS thin films were prepared by chemical bath deposition(CBD), and the effects of different zinc doping content on the morphological structure and optical properties of Cd_1-xZn_xS buffer layers are systematically discussed. The experimental results show that in the deposition process of different substrates, the crystal structure of the film is all hexagonal, and when the concentration of zinc sulfate(ZnSO₄) precursor is ...     

Cu(In,Ga)Se2太阳电池缓冲层ZnS薄膜性质及应用

在含有ZnSO4,SC(NH2)2,NH4OH的水溶液中采用CBD法沉积ZnS薄膜,XRF和热处理前后的XRD测试表明,ZnS沉积薄膜为立方相结构,薄膜含有非晶态的Zn(OH)2.光学透射谱测试表明,制备的薄膜透过率(λ＞500nm)约为90%,薄膜的禁带宽度约为3.51eV.ZnS薄膜沉积时间对Cu(In,Ga)Se2太阳电池影响显著,当薄膜沉积时间在25～35min时,电池的综合性能最好.对比了不同缓冲层的电池性能,采用CBD-CdS为缓冲层的电池转换效率、填充因子、开路电压稍高于CBD-ZnS为缓冲层的无镉电池,但无镉电池的短路电流密度高于前者,两者转换效率相差2%左右.ZnS可以作为CIGS电池的缓冲层,替代CdS,实现电池的无镉化.     

Influence of monomer concentration on optical properties of electrochemically synthesized polypyrrole thin films

Polypyrrole(PPy) thin films were deposited on stainless steel and ITO coated glass substrate at a constant deposition potential of 0.8 V versus saturated calomel electrode(SCE) by using the electrochemical polymerization method.The PPythin filmswere deposited at room temperatureat variousmonomer concentrations ranging from 0.1 M to 0.3 M pyrrole.The structural and optical properties of the polypyrrole thin films were investigated using an X-ray diffractometer(XRD),FTIR spectroscopy,scanning electron microscopy(SEM),and ultraviolet– visible(UV–vis) spectroscopy.The XRD results show that polypyrrole thin films have a semi crystalline structure.Higher monomer concentration results in a slight increase of crystallinity.The polypyrrole thin films deposited at higher monomer concentration exhibit high visible absorbance.The refractive indexes of the polypyrrole thin films are found to be in the range of 1 to 1.3 and vary with monomer concentration as well as wavelength.The extinction coefficient decreases slightly with monomer concentration.The electrochemically synthesized polypyrrole thin film shows optical band gap energy of 2.14 eV.     

溶胶-凝胶旋涂法制备In掺杂ZnO薄膜结构和光学性能的研究

采用溶胶-凝胶(sol-gel)旋涂法在常规玻璃衬底 上生长了In掺杂浓度分别为1at%、2at%、3at%、4at%、5at%的ZnO薄膜。借助X射线衍射仪(X RD)、扫描电子显微镜(SEM)、紫外- 可见分光光度计(UV-Vis)对样品的晶粒生长、结构以及光学性能进行表征。结果如下:所 制 备的薄膜均沿(002)方向择优生长,且随着In³⁺掺杂浓度增加 ,衍射峰的峰型及半高宽均呈 先降低后升高的趋势;In³⁺掺入后,ZnO薄膜晶粒由原来的六边形状发展成类似蠕虫 状,同 时粒径变小且大小不一;与本征样品相比,掺杂后的ZnO光透过率提高了10%,且吸收边向短 波长方向偏移,同时随着In³⁺的掺入,薄膜的光学带隙值从3.49 eV增加到3.80 eV。当In³⁺掺 杂浓度为4at%时,薄膜(002)峰的峰形最为尖锐、峰值最大,晶粒较为均匀、 晶格间距更小,光透过率最高,光学带隙值相对较大为3.77 eV。     

磁控溅射法制备的PZT非晶薄膜光学性质研究

采用磁控溅射方法在石英玻璃上制备了PbZrxTi1-xO3(PZT)(x=0．52)非晶薄膜,并测量了200～1100nm的紫外．可见．近红外透射光谱．基于薄膜的结构和多层结构的透射关系,发展了仅有6个拟合参数的光学常数计算模型．利用该模型,可以同时获得薄膜在宽波段范围内的光学常数和厚度,得到折射率的最大值为2．68,消光系数的最大值为0．562,拟合薄膜厚度为318．1nm．根据Tauc′s法则,得到PZT非晶薄膜的直接禁带宽度为3．75eV．最后,利用单电子振荡模型成功地解释了薄膜的折射率色散关系．     

衬底对V_2O_5薄膜微观结构的影响

在常温下,用sol-gel法在普通玻璃和单晶Si衬底上制备了V2O5薄膜,并将样品在空气中于500℃进行热处理。通过XRD和SEM对比分析了不同衬底上样品的微观结构,用分光光度计测试了玻璃衬底上样品在350~850nm的光学特性。结果表明:在玻璃和Si衬底上分别得到了β-V2O5和α-V2O5薄膜,两种样品的纯度高、相结构单一和结晶度好。β-V2O5薄膜的光学带隙Eg为2.33eV。     

Na-Bi共掺对Cu2ZnSnS4薄膜性能的影响

Cu₂ZnSnS₄(CZTS)薄膜因其元素储量高、较佳的光学带隙、优异的电学性能等优势而得到广泛关注。以硝酸铋为铋源、乙酸钠为钠源,采用溶胶-凝胶法制备Na-Bi掺杂的CZTS薄膜。研究Na-Bi共掺对CZTS薄膜的物相结构、微观形貌、光学性能以及光电性能的影响。结果表明,制备的薄膜为锌黄锡矿结构。Na和Bi元素的掺入对薄膜的微观形貌影响较大。固定Na的原子数分数为1%,随着Bi元素原子数分数的增加,薄膜的晶粒尺寸先增大后减小,均匀性逐渐提高,光敏性先增大后减小,光学带隙逐渐增大。当Na和Bi原子数分数分别为1%和0.5%时,薄膜的光学带隙为1.42 eV,光敏性最佳为1.17。     

碲锌镉晶体Zn组分的光致发光实用化研究

利用激光显微光致发光光谱仪测试了碲锌镉晶片的室温显微光致发光谱,对测得的光致发光谱进行拟合得到碲锌镉材料带隙的Eg值,根据实验总结出的Eg与Zn组分的室温计算公式,结合自主开发的Zn组分计算程序得到碲锌镉晶片上的Zn组分。所得的Zn组分结果用X射线双晶衍射进行验证,结果显示,室温下显微光致发光测得的Zn组分是相对准确可信的,可作为大量常规工艺测定Zn组分的有效工具,并且获得的Zn组分可成为外延碲镉汞薄膜时筛选匹配衬底的重要依据,同时还为研究和优化碲锌镉晶体生长工艺提供重要帮助。     

ZnO薄膜的结构与光学性能研究

采用sol-gel法在石英衬底上制备了ZnO薄膜,通过改变溶胶浓度、涂敷层数及退火温度,研究了ZnO薄膜的形貌、结构性能及光学性能。结果表明,薄膜具有六方纤锌矿结构,表面均匀致密,晶粒大小在25～35nm之间,Zn含量为0.8mol/L的溶胶经旋涂并在500℃下退火1h后可获得最高的可见光透射率,平均透射率约为94%。获得的ZnO薄膜的光学带隙在3.27～3.29eV之间。     

Synthesis and characterization of CdSe nanocrystalline thin films deposited by chemical bath deposition

Cadmium selenide (CdSe) nanocrystalline thin films were prepared by chemical bath deposition (CBD) using ammonia and triethanolamine (TEA) as complexing agents, cadmium chloride and sodium selenosulphate as the sources of Cd²⁺ and Se^2? ions, respectively. The structural and optical properties of CdSe nanocrystalline thin films were investigated as a function of the sodium selenosulphate concentrations or ammonia concentrations in precursors using scanning electron microscopy (SEM), energy dispersive spectrometer (EDS), X-ray diffraction (XRD) measurements, transmission electron microscopy (TEM) and UV–visible spectrophotometer measurements. The results reveal that the CdSe thin films are in the pure cubic phase, which composed of a large number of uniform spherical particles. Each spherical particle contains many nanocrystals 3–10 nm in crystallite size. An increase in both the average diameter of the spherical particles and the crystallite size of the nanocrystals occurs with an increase in ammonia concentrations. The Se/Cd atom ratios of CdSe thin films firstly increase and then decrease with an increase in ammonia concentration or sodium selenosulphate concentration. The optical band gap of CdSe thin films decrease with an increase in ammonia concentrations. The kinetics and reaction mechanism of the CdSe nanocrystalline thin films during deposition are discussed.     

AZO透明导电薄膜的制备技术、光电特性及应用

AZO透明导电薄膜是一种半导体氧化物薄膜材料,具有高的载流子浓度和较大的光学禁带宽度,因而具有优异的光电性能,极具应用价值.本文介绍了AZO透明导电薄膜的晶体结构和光电特性,综述了国内外对AZO薄膜所开展的研究工作,并简要地介绍了AZO薄膜的实际应用.     

不同的制作方法对ZnO-TTFT光学特性的影响

采用磁控溅射和电子束热蒸发方法制备了ZnO-TTFT(ZnO基透明薄膜晶体管)器件,通过XRD和透射光谱对两种不同制作方法的样品性质进行分析比较,得出采用溅射法制备的ZnO-TTFT器件有源层的ZnO薄膜从结晶化程度、表面粗糙度及透过率都较采用电子束蒸发制得的ZnO薄膜优异,制得器件的有源层有较好的c-axis(002)方向择优取向,器件的平均透过率在85%以上。研究了退火处理对器件性能的影响,发现快速热退火有利于改善薄膜的晶化,降低缺陷态密度,提高器件的透光性。     

AZO透明导电薄膜的结构与光电性能

采用射频溅射工艺制备了Zn1-xAlxO透明导电薄膜。通过XRD、UV透射和电学性能测试等分析手段,研究了Al浓度对薄膜的组织结构和光电性能的影响规律。结果表明:薄膜具有c轴择优取向,随着Al浓度的增加,(002)衍射峰向高角度移动,峰强度逐渐减弱,x(Al)为15%掺杂极限浓度。x(Al)为2%时,薄膜电阻率是3.4×10–4Ω.cm。随着掺杂量x(Al)从0增加到20%,薄膜的禁带宽度从3.34 eV增加到4.0 eV。     

梯度掺杂生长绒面结构ZnO:B-TCO薄膜及其特性研究

采用新的金属有机化学气相淀积(MOCVD)-ZnO镀膜工艺技术-梯度掺杂技术生长绒面结构。研究ZnO:B-TCO薄膜。结果表明,梯度掺杂技术可有效增加薄膜晶粒尺寸和提高光散射作用。并且,梯度掺杂技术有效地提高了薄膜在近红外区域的光学透过率,有利于应用于宽谱域薄膜太阳电池。生长获得的MOCVD-ZnO薄膜,其薄膜电子迁移率为24 cm2/V,电阻率为2.17×10-3Ω.cm,载流子浓度为1.20×1020cm-3,且在小于1 000 nm波长范围内的平均透过率大于85%。     

电解液中Cu2+浓度对CuInS2薄膜的影响

采用硫化Cu-In-S预制层方法制备出CuInS2、CuIn11S17及两相混合共存的薄膜,其中Cu-In-S预制层通过在含有不同Cu2+浓度的电解液中电化学沉积制得.通过对薄膜的XRD、SEM及EDS的表征,发现当In3+ 和S2O32-浓度不变时,Cu2+浓度的改变对薄膜的性质有很大的影响.在最优的Cu2+浓度下,制备出了单一的、具有理想化学计量比的、禁带宽度为1.5eV的CuInS2薄膜.这种薄膜在后续工作中有望被用作太阳能电池的吸收层.     

氮气流量对磁控溅射AlN薄膜光学性能的影响

AlN薄膜因其具有优异的物理化学性能而有着广阔的应用前景,采用反应磁控溅射法在低温条件下制备AlN薄膜是近些年科研工作的热点.采用直流磁控溅射法,于室温下通入不同流量的氮气在p型硅(100)和载玻片衬底上沉积了AlN薄膜.利用傅里叶变换红外(FTIR)光谱仪、X射线衍射仪(XRD)、扫描电子显微镜(SEM)和分光光度计等分析薄膜的组分、结构、形貌和光学性能.结果表明随着氮气流量的增加,AIN薄膜质量变好,N2流量为8 cma/min时制备的AlN薄膜为六方纤锌矿结构,在680 cm-1处具有明显的FTIR吸收峰,进一步说明成功制备了AlN薄膜.在300～ 900 nm的波长范围内,薄膜透过率最高可达94％;薄膜带隙随着氮气流量的增加而增大,最大带隙约为4.04 eV.     

Cadmium(1−x)zinc(x)telluride thin films deposited by sequential pulsed laser deposition

In this work, sequential pulsed laser deposition was used for the deposition of cadmium zinc telluride (CZT) thin films. CZT is a ternary II–VI compound semiconductor with a tunable band gap between 1.51 and 2.26 eV. In this work, three different CZT film compositions were achieved at room temperature by sequential deposition of nanometric layers with a precise number of laser shots on the cadmium telluride (CdTe) and zinc telluride (ZnTe) targets. XPS, XRD and UV–vis transmittance techniques were used to characterize the CZT films. The atomic content of zinc ranged from 60% down to 13%. This represents an enlargement of the lattice constant from 6.19 to 6.41 Å, and a band gap decrement from 1.94 to 1.55 eV. In addition, the CZT film resistivity can be modulated between the CdTe (4.1×10⁷ Ω-cm) and ZnTe (2.8×10⁵ Ω-cm) values. Our results demonstrated that the sequential pulsed laser deposition can be used to obtain several CZT film compositions with precise control of its stoichiometry and can be extended to the production of other ternary compounds.     

磁控反应溅射直接生长绒面H化Ga掺杂ZnO-TCO薄膜及其特性研究

采用直流磁控溅射技术,在玻璃衬底上直接生长出了具有绒面结构的H化Ga掺杂ZnO(HGZO)薄膜。研究了H2流量对薄膜结构、表面形貌及光电特性的影响。实验表明,在溅射过程中引入H2明显改善HGZO薄膜电学性能,并且能够直接获得具有绒面结构的薄膜。在H2流量为2.0sccm时,所制备的HGZO薄膜具有特征尺寸约200nm的类金字塔状表面形貌,同时薄膜方阻为4.8Ω,电阻率达到8.77×10-4Ω.cm。H2的引入可以明显改善薄膜短波区域的光学透过,生长获得的HGZO薄膜可见光区域平均透过率优于85%,近红外区域波长到1 100nm时仍可达80%。为了进一步提高薄膜光散射能力和光学透过率,根据不同H2流量下HGZO薄膜性能的优点,提出了梯度H2技术生长HGZO薄膜;采用梯度H2工艺生长获得的HGZO薄膜长波区域透过率有了一定的提高,薄膜具有弹坑状表面形貌,并且其光散射能力有了明显提高。     

空芯带隙型光子晶体光纤残余双折射特性研究

采用磁控溅射法, 在玻璃基底上一步沉积In₂S₃薄膜。研究了溅射功率对In₂S₃薄膜的成分、结构、表面形貌和光电性能的影响。结果表明: 所制备的所有薄膜均为β-In₂S₃, 无杂相存在, 且具有(222)面择优生长特性。溅射功率对薄膜的成分、厚度和结晶度具有明显的影响, 并因此影响薄膜的光学和电学性能。薄膜在100W沉积时最接近化学计量比, 薄膜的透过率随着溅射功率增大在500nm波段附近显著提高, 禁带宽度达到2.45eV, 同时电流密度增大两个数量级。     

Influence of oxygen flow rate on microstructural,electrical and optical properties of indium tin tantalum oxide films

Indium tin oxide (ITO) and indium tin tantalum oxide (ITTO) films were deposited on glass substrates by magnetron sputtering technology with one or two targets. Properties of ITO and ITTO films deposited at different oxygen flow rates were contrastively studied. Ta-doping strengthens along the orientation of (400) plane and leads to better crystalline structure as well as to a decrease in surface roughness. The increase in oxygen flow rate increases sheet resistance and reduces carrier concentration, and ITTO films show higher carrier concentration. Certain oxygen flow rates can improve the visible light transmittance of films, but excessive oxygen can worsen the optical properties. The carrier concentration has an important influence on near-IR reflection, near-UV absorption and optical band gap. The optical band gap decreases with the increasing of oxygen flow rate, and ITTO films show wider optical band gap than ITO films. ITTO films prepared by co-sputtering reveal better optical–electrical properties and chemical and thermal stability than ITO films.