氮化铝纳米锥有序阵列的低温制备及场发射特性研究

由于氯化铝纳米锥拥有低电子亲和势和高长径比,因而可以在低电场下实现场发射.制备成纳米锥阵列后可能在低电场下使电子逸出表面而实现场电子发射,我们通过热蒸发三氯化铝粉末的方法,在600℃下在硅片和ITO玻璃上沉积生长出大面积纳米锥阵列.纳米锥的平均长度为500 nm.顶端直径为10 nm,我们获得的氮化铝纳米锥为六方晶体结构,生长方向为[001].场发射测试的结果表明,AlN纳米锥的开启电场(电流密度为10μA/cm21约为5 V/μ m.阈值电场(电流密度为lmA/cm21,约为9 V/μ m,最高电流密度可达3 mA/cm2,这表明其在未来的冷阴极材料中有着很大的应用前景.     

ZnO纳米锥光致发光性及印刷ZnO纳米锥场发射性能研究

利用物理热蒸发法制备大规模的蒲公英状的ZnO纳米锥,利用荧光光谱仪对ZnO纳米锥进行了光致发光性能测试.针对现有的丝网印刷碳纳米管(CNTs)薄膜需要各种后处理工艺后才能改善其场发射特性的问题,提出了一种不需任何后处理丝网印刷ZnO纳米锥的浆料配制工艺.用该工艺制备的丝网印刷ZnO纳米锥的场发射特性测试表明,ZnO纳米锥与制浆剂质量比为3∶5的薄膜的开启场强最低为2.25V/μm(电流密度为1μA/cm2),在4.6V/μm场强下,阳极荧光粉的发光点亮度高且分布均匀.说明该方法成本低,工艺简单,无需任何后处理,在ZnO纳米锥场发射显示器的制作中有很好的实际应用价值.     

钴钝化多孔硅的制备及其场发射特性研究

采用化学染色腐蚀法在Co(NO3)2 和HF酸组成的腐蚀液中制备了钴钝化多孔硅,其表面形貌由垂直于表面分布的尺度为0.5~1.5μm 的硅尖组成,部分硅尖顶端还有0.1~0.5μm的圆形孔洞,硅尖的面密度约为1.0×108 个/cm2,多孔硅层厚度约为2μm。XPS分析结果表明,钴原子仅存在于多孔硅表面非常薄的一层内。其场发射具有较好的可靠性和可重复性,开启场强一般为2.3V/μm 左右,场强为5.4V/μm时,亮点均匀而且密集,发射电流密度达到30μA/cm2 左右。     

超高真空电子束蒸发在多孔硅上外延单晶硅

采用超高越空电子束蒸发的方法在用阳极氧化制备的多孔硅衬底上外延单晶硅,研究了不同多孔硅衬底对外延质量的影响。采用高能电子衍射表征外延层的晶体结构,截面透射电镜上材料的微结构,原子力镜表征外延层表面的粗糙度,卢瑟福背散射／沟道表征外延层晶体质量,扩展电阻表征材料的电学性能。一系列的测试结果表明对在5mA／cm^2电流密度下阳极氧化10min形成的多孔硅衬底,可用超高真空电子束蒸发的方法外延出质量良好的单晶硅。     

硅锥场发射阴极电热状态的数值模拟

用有限差分法求解相互耦合的电流连续方程和导热方程 ,对硅锥阴极的电热状态进行了数值模拟。模拟中采用了与温度、电场相关电导率模型以及和温度相关的热导率模型。模拟的结果表明 ,锥体顶端的电位变化比较突出 ,在较小的电流下其内部电场即可以达到临界场强 ,使载流子漂移速度开始饱和 ,并表现出饱和的发射特性。在尖锥顶端内部电场达到临界场强直至发生碰撞电离时 ,温升不显著     

多孔硅的场发射特性研究

多孔硅是一种很有前途的场发射材料,研究多孔硅的场发射有着实际的意义.模仿制备了具有弹道电子发射的特殊结构的多孔硅,测试了其场发射性能,比较了腐蚀电流逐渐变小所制备的多孔硅与腐蚀电流不变所制备的多孔硅的场发射性能,发现前者是提高场发射性能的一种有效方法.     

电子束再结晶法制备的纳米硅薄膜室温光致发光特性

用电子束再结晶的方法对非晶硅氢材料进行快速退火,成功地制备出纳米硅薄膜,在室温下观察到光致红、蓝发光带,峰位约在１．７ｅＶ和２．５ｅＶ处,ＸＲＤ和ＰＬ谱结果表明：晶化程度的变化引起红、蓝光带强度及在整个发光谱中所占比例的改变,在我们的实验中,电子束能量密度２．７Ｗ／ｃｍ＾２的晶化样品具有强的发光带。     

硅尖上纳米金刚石膜场发射性质的研究

本文采用热灯丝CVD法在硅尖上制备了纳米金刚石膜，并研究了硅尖上纳米金刚石膜的场发射性质，实验结果表明，硅尖上纳米金刚石膜的场发射特性与硅平面上生长的多晶金刚石膜比较，有了极大的提高，硅尖上纳米金刚石膜场发射开启电场最小为2.7V/μm，而多晶金刚石膜为4.5V/μm。利用电子隧穿模型对实验结果进行了理论分析，研究表明实验结果与理论分析相符合。     

定向碳纳米管的制备及其场发射性能研究

定向碳纳米管的制备方法是碳纳米管场发射显示器技术领域一项十分关键的技术.简要介绍了定向碳纳米管的制备方法、结构检测技术,并综合评述了影响定向碳纳米管场发射性能的因素.     

电子束蒸发与磁控溅射镀铝的性能分析研究

通过对半导体器件电极制备的两种方法即电子束蒸发与磁控溅射镀铝的比较，详细分析了两种方法的膜厚控制、附着力，致密性、电导率和折射率等重要性能指标，测试结果分析表明磁控溅射铝膜的综合性能优于电子束蒸发。     

Growth of silicon nanowires by electron beam evaporation using indium catalyst

For the first time silicon nanowires have been grown on indium (In) coated Si (100) substrates using e-beam evaporation at a low substrate temperature of 300 °C. Standard spectroscopic and microscopic techniques have been employed for the structural, morphological and compositional properties of as grown Si nanowires. The as grown Si nanowires have randomly oriented with an average length of 600 nm for a deposition time of 15 min. As grown Si nanowires have shown indium nanoparticle (capped) on top of it confirming the Vapor Liquid Solid (VLS) growth mechanism. Transmission Electron Microscope (TEM) measurements have revealed pure and single crystalline nature of Si nanowires. The obtained results have indicated good progress towards finding alternative catalyst to gold for the synthesis of Si nanowires.     

Low-temperature epitaxy of silicon by electron beam evaporation

In this paper we report on homoepitaxial growth of thin Si films at substrate temperatures T_s = 500-650 °C under non-ultra-high vacuum conditions by using electron beam evaporation. Si films were grown at high deposition rates on monocrystalline Si wafers with (100), (110) and (111) orientations. The ultra-violet visible reflectance spectra of the films show a dependence on T_s and on the substrate orientation. To determine the structural quality of the films in more detail Secco etch experiments were carried out. No etch pits were found on the films grown on (100) oriented wafers. However, on films grown on (110) and (111) oriented wafers different types of etch pits could be detected. Films were also grown on polycrystalline silicon (poly-Si) seed layers prepared by an Aluminum-Induced Crystallisation (AIC) process on glass substrates. Electron Backscattering Diffraction (EBSD) shows that the film growth proceeds epitaxially on the grains of the seed layer. But a considerably higher density of extended defects is revealed by Secco etch experiments.     

Properties of polycrystalline silicon grown on insulating substrates by electron beam gun evaporation

Growth of polycrystalline silicon on insulating substrates such as glass, silicon dioxide and fused quartz was studied using an electron beam gun evaporation technique. Growth characteristics were studied as a function of substrate temperature. The results of scanning electron microscopy, secondary ion mass spectrometry and X-ray diffraction studies on various films are presented. Hall mobility, resistivity and carrier concentration measurements are also presented. Growth of polycrystalline films (as determined by X-ray diffraction studies) on glass substrates at as low a temperature as 525 °C were observed. Below this substrate temperature, films became amorphous. The grain size increased with the increase in the substrate temperature. The highest value of the Hall mobility measured was about 10 cm² V⁻¹ s⁻¹. Both n-type and p-type films were obtained.     

Characterization of yttria-stabilized zirconia thin films deposited by electron beam evaporation on silicon substrates

Structure, phase composition and electrical conductivity of thin yttria-stabilized zirconia (YSZ) films deposited by electron beam evaporation on a silicon (1 0 0) substrate at different temperatures i.e. room temperature (r.t.), 700 and 830°C, as well as the quality of the YSZ–Si interface have been investigated. The phase composition was verified by Raman spectroscopy and by infrared (i.r.) transmission measurements. The structure of films changed in agreement with their electrical conductivity depending on the deposition temperature. Both structure and thereby electrical conductivity were influenced by the high concentration of Y2O3 stabilizer used and by the post-deposition thermal treatment of films. The deposition temperature was also important in determining the quality of the YSZ–Si interface and hence the accessible sweep of the surface potential. The capacitance–voltage characteristics of the metal–insulator–semiconductor (MIS) structures incorporating YSZ films measured at r.t. showed hysteresis and positive shifts of the flat-band voltages. © 1998 Chapman & Hall     

Production of silver nano-powders by electron beam evaporation

Evaporation of metallic silver was performed in Ar, N₂ and He using the ELV-6 electron accelerator. The obtained ultra-dispersed powders with a particle size of 70-80 nm were investigated by XRD, HREM and UV-Vis spectroscopy. The structure of Ag(Ar) powder was shown to differ substantially from that of Ag(N₂) by the presence of small oxide-like species of 10-20 nm on the particle surface. Catalytic activity of the powders in the reaction of ethylene epoxidation was also studied.     

硅纳米孔柱阵列的场致电子发射

测试了用水热技术制备的硅纳米孔柱阵列(silicon nanoporous pillar array(简称Si-NPA))的场致发射性能.测试结果显示,Si-NPA的开启电场为约1.48V/μm;在5V/μm的外加电场下,其发射电流密度为28.6μA/cm~2;在外加电场4.4V/μm时,其电流浮动率为13%.Si-NPA发射性能增强的原因是由于其独特的表面形貌和结构所致.     

Nanosecond laser-induced thermal evaporation of silicon carbide

Excimer (XeCl) laser pulses, 15 ns in duration and with fluences up to 10 J · cm^–2, have been employed to induce melting and evaporation of 6H-SiC thin layers in vacuum. Sample surface modification in the nanosecond time scale have been tnonitorizedin situ by optical probing. Eventually, the ablation product was collected on silicon single-crystal substrates placed in front of the SiC target. Modeling of the heating and the thermal evaporation processes resulted in estimation of surface temperatures as high as 10,000 K, evaporation rates of the order of 10²⁵ molecules · cm^–2 · s^–1 and recoil pressures of the order of 1 GPa. Comparison with experiments showed that the simple mechanism of purely thermal evaporation is able to describe the process of particle removal from a surface by short laser pulses only in the low-energy density range. Above a certain threshold the model breaks down and other mechanisms have to be considered.Paper presented at the Fourth International Workshop on Subsecond Thermophysics, June 27–29, 1995, Köln, Germany.     

Growth and characterization of germanium nanowires by electron beam evaporation

Germanium nanowires were grown on Au coated Si substrates at 380 °C in a high vacuum (5 × 10^− 5 Torr) by e-beam evaporation of Germanium (Ge). The morphology observation by a field emission scanning electron microscope (FESEM) shows that the grown nanowires are randomly oriented with an average length and diameter of 600 nm and 120 nm respectively for a deposition time of 60 min. The nanowire growth rate was measured to be ∼ 10 nm/min. Transmission electron microscope (TEM) studies revealed that the Ge nanowires were single crystalline in nature and further energy dispersive X-ray analysis (EDAX) has shown that the tip of the grown nanowires was capped with Au nanoparticles, this shows that the growth of the Ge nanowires occurs by the vapour liquid solid (VLS) mechanism. HRTEM studies on the grown Ge nanowire show that they are single crystalline in nature and the growth direction was identified to be along [110].