Ion optics of RHIC electron beam ion source

RHIC electron beam ion source has been commissioned to operate as a versatile ion source on RHIC injection facility supplying ion species from He to Au for Booster. Except for light gaseous elements RHIC EBIS employs ion injection from several external primary ion sources. With electrostatic optics fast switching from one ion species to another can be done on a pulse to pulse mode. The design of an ion optical structure and the results of simulations for different ion species are presented. In the choice of optical elements special attention was paid to spherical aberrations for high-current space charge dominated ion beams. The combination of a gridded lens and a magnet lens in LEBT provides flexibility of optical control for a wide range of ion species to satisfy acceptance parameters of RFQ. The results of ion transmission measurements are presented.     

大尺寸衍射光学元件的扫描离子束刻蚀

总结了大尺寸衍射光学元件离子束刻蚀技术的研究进展。针对自行研制的KZ-400离子束刻蚀装置,提出了组合石墨束阑结构和多位置分步刻蚀策略来提高离子束刻蚀深度的均匀性,目前在450mm尺寸内的刻蚀深度均匀性最高可达±1%。建立了针对多层介质膜光栅的衍射强度一维空间分布在线检测系统以及用于透射衍射光学元件离子束刻蚀深度的等厚干涉在线检测系统,实现了对大尺寸衍射光学元件离子束刻蚀终点的定量、科学控制,提高了元件离子束刻蚀工艺的成功率。利用上述技术,成功研制出一系列尺寸的多层介质膜光栅、光束采样光栅、色分离光栅以及同步辐射光栅等多种衍射光学元件。     

Ion beam etching of large aperture diffractive optical elements

总结了大尺寸衍射光学元件离子束刻蚀技术的研究进展.针对自行研制的KZ-400离子束刻蚀装置,提出了组合石墨束阑结构和多位置分步刻蚀策略来提高离子束刻蚀深度的均匀性,目前在450 mm尺寸内的刻蚀深度均匀性最高可达±1％.建立了针对多层介质膜光栅的衍射强度一维空间分布在线检测系统以及用于透射衍射光学元件离子束刻蚀深度的等厚干涉在线检测系统,实现了对大尺寸衍射光学元件离子束刻蚀终点的定量、科学控制,提高了元件离子束刻蚀工艺的成功率.利用上述技术,成功研制出一系列尺寸的多层介质膜光栅、光束采样光栅、色分离光栅以及同步辐射光栅等多种衍射光学元件.     

同轴单棱镜整形研究

半导体激光器广泛地应用在国防、商业、工业等领域,对其光学准直是一项重要的工作。介绍一种新的半导体激光整形系统——同轴单棱镜整形系统,详细地叙述了单棱镜的设计原理。与其它整形系统比较,该棱镜具有设计、加工和装调简单等优点,最大的优点还能保证光束同轴。最后以一个θ⊥×θ∥=25°×11°半导体激光器为例子,设计一个2.5×单棱镜同轴整形系统,通过软件模拟计算与实际计算结果比较,结果基本相符,证明了设计方法的正确性。     

光学镜面离子束加工的材料去除效率

分析了离子束加工光学镜面的材料去除效率和不I司材料之间的相对去除效率与工艺参数的关系.基于Sigmund 溅射理论.建立了表征去除效率的指标一法向去除速率、体积去除速率和溅射产额与束能、束流以及入射角度之间的关系模型.以石英、微晶和K4玻璃等为样件,实验分析了去除效率与工艺参数的关系,验证了模型的正确性.分析结果表明,材料去除效率随束流线性增大,与束能平方根约呈线性关系;随着入射角度先缓慢增大,约在60～80°达到最大值.然后迅速降为0.不同材料之间的相对去除效率与束流无关;与束能的关系较弱,可以忽略;随角度变化较为明显.     

Ion beam capture and charge breeding in electron cyclotron resonance ion source plasmas

Beam capture of injected ions and charge breeding in electron cyclotron resonance (ECR) charge breeder ion source plasmas has been investigated utilizing an ECR plasma modeling code, the generalized ECR ion source model, and a Monte Carlo beam capture code. Beam capturing dynamics, charge breeding in the plasma, and the extracted charged ion states are described. Optimization of ion beam energy is performed for (1) high beam capture efficiency and (2) high charge state ion beam extractions. A sample case study for ANL-ECR has been performed. Ions entering ECR ion source plasma are slowed down mostly by the background ions. Assuming Maxwellian plasma ions, maximum beam energy loss occurs when the beam velocity is around the background thermal velocity in magnitude. It is also found that beam capture location affects charge state distribution. For instance, with a majority of beam ions captured near the middle of the device higher currents for higher charge states are obtained. The beam ions captured near the entry have a higher probability of backstreaming after they are captured. For this reason, the optimum beam energy of the injected Ar(+) beam ions for charge breeding is generally higher than the optimum input beam energy for maximum beam energy loss.     

时间监控离子束溅射沉积光学薄膜的厚度修正

通过单层和多层膜的实验模拟,研究了离子束溅射沉积速率和沉积时间的关系。在溅射镀膜的初始阶段,对于Ta2O5,沉积速率随时间增加而增大;对于SiO2,沉积速率随时间先显著地增加,随后逐渐地减小。结果表明,通过对高、低折射率各层的监控时间进行补偿,即可实现光学薄膜厚度的精确监控。     

用于光学相干层析系统的三反射镜光束整形扫描机构的光学设计

为了实现高斯圆斑向平顶线斑的转化,提出了一种用于高斯光束整形的三反射镜光学系统。利用环形面对两个相互垂直方向的光线会聚、发散作用不同,标准球面具有旋转对称性质,以及二次曲面系数、非球面系数可以实现高斯分布转化为平顶分布的原理,采用ZPL语言与自动优化结合的方法完成了系统设计。设计得到了一个方向平顶的矩形光斑以及平顶线斑,整形效果良好,并结合在光学相干层析(OCT)系统中对样品照明或扫描的实际要求,通过小角度(±2°)旋转系统第一个反射镜对所得线斑进行扫描,在扫描角度内可以实现线性扫描(扫描范围约为10mm×11mm)。结果表明,该三反射镜系统满足轻量化、结构紧凑、不受工作波长影响的要求,是一种可行、有效的方案。     

Ion source for tests of ion behavior in the Karlsruhe tritium neutrino experiment beam line

An electron-impact ion source based on photoelectron emission was developed for ionization of gases at pressures below 10(-4) mbar in an axial magnetic field in the order of 5?T. The ion source applies only dc fields, which makes it suitable for use in the presence of equipment sensitive to radio-frequency (RF) fields. The ion source was successfully tested under varying conditions regarding pressure, magnetic field, and magnetic-field gradient, and the results were studied with the help of simulations. The processes in the ion source are well understood, and possibilities for further optimization of generated ion currents are clarified.     

光学镀膜用大束密均匀区离子源

介绍一个适用于光学镀膜用的直径为120mm的大束密均匀区离子源的结构设计及性能参数,并对影响束密均匀性的因素进行了讨论.     

光学镀膜用大束密均匀区离子源

介绍一个适用于光学镀膜用的直径为120mm的大束密均匀区离子源的结构设计及性能参数,并对影响束密均匀性的因素进行了讨论.     

光学镀膜用大束密均匀区离子源

介绍一个适用于光学镀膜用的直径为1 2 0 mm的大束密均匀区离子源的结构设计及性能参数 ,并对影响束密均匀性的因素进行了讨论     

离子束溅射氧化钽薄膜的光学带隙特性

Ta_2O_5薄膜是可见光到近红外波段中重要的高折射率薄膜材料之一。本文针对离子束溅射制备Ta_2O_5薄膜的光学带隙特性开展了实验研究工作,基于Cody-Lorentz模型表征了薄膜的光学带隙特性,重点针对薄膜的禁带宽度和Urbach带尾宽度与制备参数之间的相关性进行研究。研究结果表明:在置信概率95%以上时,对Ta_2O_5薄膜禁带宽度影响的制备参数,权重大小依次为氧气流量、基板温度、离子束电压;而对Ta_2O_5薄膜Urbach带尾宽度影响的制备参数,权重大小依次为基板温度和氧气流量。对于Ta_2O_5薄膜在超低损耗激光薄膜和高损伤阈值激光薄膜领域内应用,本文的研究结果给出了同步提高薄膜的禁带宽度和降低带尾宽度的重要工艺参数选择方法。     

The prospects of a subnanometer focused neon ion beam

The success of the helium ion microscope has encouraged extensions of this technology to produce beams of other ion species. A review of the various candidate ion beams and their technical prospects suggest that a neon beam might be the most readily achieved. Such a neon beam would provide a sputtering yield that exceeds helium by an order of magnitude while still offering a theoretical probe size less than 1-nm. This article outlines the motivation for a neon gas field ion source, the expected performance through simulations, and provides an update of our experimental progress.     

Generation of an ion beam in a glow-discharge source

A mechanism of ion extraction from a glow-discharge ion source based on a hollow cathode and used for elemental analysis of solids, is considered Experiments have shown that two oppositely directed ion flows are formed from ions produced in the region of negative glow-discharge fluorescence. One flow has an ion energy ≥ 100 eV, is directed to the cathode, and bombards and sputters the analyzed sample. The sputtered atoms diffuse into the negative-glow region and are ionized. The second flow (low-energy ions) is extracted from the same negative-glow region and transported from the cathode to the surface of the anode chamber owing to an ambipolar diffusion. These ions are extracted from a hole in the anode chamber of a standard ion source by an electric field and are used for mass-spectrum analysis. The energy-distribution width for these ions is ∼5 eV. The intensity of the ion beam extracted from the anode hole is an order of magnitude higher than the intensity of the ion beam extracted from the cathode region. Original Russian Text ? G.G. Sikharulidze, 2009, published in Pribory i Tekhnika Eksperimenta, 2009, No. 2, pp. 105–109.     

Concepts for the magnetic design of the MITICA neutral beam test facility ion accelerator

The megavolt ITER injector concept advancement neutral injector test facility will be constituted by a RF-driven negative ion source and by an electrostatic Accelerator, designed to produce a negative Ion with a specific energy up to 1 MeV. The beam is then neutralized in order to obtain a focused 17 MW neutral beam. The magnetic configuration inside the accelerator is of crucial importance for the achievement of a good beam efficiency, with the early deflection of the co-extracted and stripped electrons, and also of the required beam optic quality, with the correction of undesired ion beamlet deflections. Several alternative magnetic design concepts have been considered, comparing in detail the magnetic and beam optics simulation results, evidencing the advantages and drawbacks of each solution both from the physics and engineering point of view.     

Ion source with longitudinal ionization of a molecular beam by an electron beam in a magnetic field

A high-efficiency ion source for a mass-spectrometer’s detector of molecular beams and their scattering products is described. The ion source is designed according to a scheme of impact ionization of a beam particle by a longitudinal electron beam in a magnetic field with a strength of up to 130 mT. The design of the source developed is very flexible and has no limitations for use in any experiments with molecular beams. An ionization efficiency of particles of an atomic helium beam of 10^?3 ions/atom has been achieved. The useful signal-to-background ratio in the detector’s chamber is 3 × 10⁴ during detection of ions with mass-to-charge ratio m/q = 4 amu.     

Liquid metal alloy ion source based metal ion injection into a room-temperature electron beam ion source

We have carried out a series of measurements demonstrating the feasibility of using the Dresden electron beam ion source (EBIS)-A, a table-top sized, permanent magnet technology based electron beam ion source, as a charge breeder. Low charged gold ions from an AuGe liquid metal alloy ion source were injected into the EBIS and re-extracted as highly charged ions, thereby producing charge states as high as Au(60 +). The setup, the charge breeding technique, breeding efficiencies as well as acceptance and emittance studies are presented.     

法布里-珀罗型光纤应变干涉仪

光纤传感技术是现代通信的产物,是随着光纤及通信技术的发展而逐步发展起来的一门崭新技术。光在传输过程中,光纤易受到外界环境的影响,如温度、压力等,从而导致传输光的强度、相位、频率、偏振态等光波量发生变化。通过监测这些量的变化可以获得相应的物理量。详细介绍了一种常用的干涉型光纤传感器——法布里-珀罗（F-P）光纤应变干涉仪。