AlGaAsSb/InGaAsSb多量子阱结构的光致发光谱

用固态源ＭＢＥ技术生长了ＡｌＧａＡｓＳｂ／ＩｎＧａＡｓＳｂ多量子阱材料,研究了通过改变多量子阱ＡｌＧａＡｓＳｂ／ＩｎＧａＡｓＳｂ中的结构参数,如多量子阱中ＩｎＧａＡｓＳｂ的阱宽,ＡｌＧａＡｓＳｂ的垒宽及垒层中Ａｌ组分和阱层中的Ｉｎ组分,多量子阱中的阱数等,来提高ＡｌＧａＡｓＳｂ／ＩｎＧａＡｓＳｂ多量子阱的ＰＬ强度。     

InGaAs/InP中离子注入和新型HPT

ＩｎＧａＡｓ／ＩｎＰ是制作光电器件与微波器件的重要材料。离子注入ＩｎＧａＡｓ／ＩｎＰ做掺杂或制作高阻层是人们十分关注的研究课题。采用Ｆｅ＾＋注入ＩｎＧａＡｓ／ＩｎＰ得到了电阻率升高的好结果。用Ｂｅ＾＋注入制作了新结构ＨＰＴ的基区。研制成功了在１．５５μｍ波长工作的ＩｎＧａＡｓ／ＩｎＰ新结构光电晶体管,在０．３μＷ入射光条件下,光电增益为３５０。     

InGaAsP／InP PFBH激光器

采用Ｎ－ＩｎＰ衬底研制ＩｎＧａＡｓＰ／ＩｎＰ激光器和ＤＦＢ激光器在国内已报导过多次，本文介绍用Ｐ－ＩｎＰ衬底研制ＩｎＧａＡｓＰ／ＩｎＰ平面埋层异质结构激光器和ＤＦＢ－ＰＦＢＨ激光器，同时利用晶体生长和晶向的依赖关系，改进埋区的结构，使器件最高激射温度大于１００℃。     

国产金属有机化合物TMGa,TMAl,TMIn和TMSb的MOVPE鉴定

利用我们研制的常压ＭＯＶＰＥ设备对国产ＴＭＧａ、ＴＭＡｌ、ＴＭＩｎ和ＴＭＳｂ进行了鉴定，为此分别生长了ＧａＡｓ、ＡｌＧａＡｓ、ＩｎＰ、ＧａＳｂ外延层和ＧａＡｓ／ＡｌＡｓ、ＧａＳｂ／ＩｎＧａＳｂ超晶格和ＧａＡｓ／ＡｌＧａＡｓ量子阱结构。表征材料纯度的７７Ｋ载流予迁移率分别达到ＧａＡｓ：μ＿ｎ＝５６６００ｃｍ￣２／Ｖ·ｓ，Ａｌ＿（０．２５）Ｇａ＿（０．７５）Ａｓ：μ＿ｎ＝５１６０ｃｍ￣２／Ｖ·ｓ，ＩｎＰ：μ＿ｎ＝６５３００ｃｍ￣２／Ｖ·ｓ，ＧａＳｂ：μ＿ｐ＝５０７６ｃｍ￣２／Ｖ·ｓ。由１０个周期的ＧａＡｓ／ＡｌＡｓ超晶格结构组成的可见光区布拉格反射器已观测到很好的反射光谱和双晶Ｘ射线回摆曲线上高达±２０级的卫星峰。ＧａＡｓ／Ａｌ＿（０．３５）Ｇａ＿（０．６５）Ａｓ量子阱最小阱宽为１０，在ｌｉＫ下由量子尺寸效应导致的光致发光峰能量移动为３９０ｍｅＶ，其线宽为１２ｍｅＶ。这些结果表明上述金属有机化合物已达到较高质量。     

940nm高功率列阵半导体激光器

利用分子束外延生长方法生长出ＩｎＧａＡｓ／ＧａＡｓ应变量子阱材料。利用该材料制作出的应变量子阱列阵半导体激光器准连续（５００μｓ,１００Ｈｚ）输出功率达到２７Ｗ（室温）,峰值波长为９３９￣９４１ｎｍ,并分析了影响列阵半导体激光器输出功率的因素。     

In(Ga)As自组织量子点激光器获重大突破

Ｉｎ(Ｇａ)Ａｓ/ＧａＡｓ量子点体系因其独特、优越的光电性质,成为替代目前ＩｎＰ基材料,制备光纤通讯用13μｍ长波长激光器的热门材料之一,引起各国科学家的高度重视。许多科研小组已投入很多的财力和物力进行这种激光器的研制与开发,迄今已有美国德克萨斯大学、日本Ｎ?..     

InGaAsP/InP有源时分光子交换器件

自行设计并研制成功了两种有源时分光子交换器件：ＩｎＧａＡｓＰ／ＩｎＰ ＥＭＰＢＨ双稳激光器ＩｎＧａＡｓＰ／ＩｎＰ ＭＱＷ ＤＣＰＢＨ双稳激光器，对这两种器件的部分性能作了简要报道。     

GaAs－InP复合材料的外延生长方法及金属半导体场效应晶体管器件制备

提出了一种新的生长过渡层的方法，并利用低压金属有机气相外延技术在ＩｎＰ衬底上生长出高质量ＧａＡｓ外延材料，用Ｘ射线双晶衍射测得５μｍ厚ＧａＡｓ外延层的（００４）晶面衍射半峰高宽（ＦＷＨＭ）低至１４０ａｒｃｓｅｃ。并制出ＧａＡｓ金属半导体场效应晶体管（ＭＥＳＦＥＴ），其单位跨导为１００ｍｓ／ｍｍ，可满足与长波长光学器件进行单片集成的需要。     

异质外延错向角的X射线精确测量方法

通过分析外延层与衬底之间存在错向角时的衍射圆锥，利用简明的衍射几何关系提出了一个测量外延层在衬底之间错向角的方法及相应的计算错向角的公式，同时提出了检验办法，设计了一个有两外延层的ＩｎＧａＡｓ／ＩｎＡｌＡｓ／ＩｎＰ样品，用高精度ｘ射线四晶衍射仪，对样品进行了衍射测量，并应用提出的方法精确地测出两个外延层各自与衬底之间的错向角以及两个外延层之间的错向角，所得结果和理论预期值完全一致，本文也指出，采用     

980nm InGaAs／GaAs／AlGaAs应变量子阱激光器

报导了脊形波导ＩｎＧａＡｓ／ＧａＡｓ／ＡｌＧａＡｓ应变量子阱激光器的特性和实验结果，激光器阀值电流最低为９ｍＡ，典型值为１５ｍＡ，线性输出光功率大地１２０ｍＷ，微分量子效率典型值为６０％，５０℃，８０ｍＷ恒定功率条件下老化实验结果表明；该条件下激光器寿命超过１０００小时。     

Mid-Infrared Emission From InAs Quantum Dots Grown by Metal–Organic Vapor Phase Epitaxy

We have demonstrated mid-infrared emission from the self-assembled InAs quantum dots grown on InP substrate by metal-organic vapor phase epitaxy using low toxic tertiarybutylarsine and tertiarybutylphosphine as group V sources in pure nitrogen ambient. Emission wavelength of the InAs quantum dots has been extended to mid-infrared region by embedding the InAs quantum dots in graded In_xGa_1-xAs matrix layers. When compared with that of the InAs quantum dots grown on lattice matched In_0.53Ga_0.47As/InP matrix, emission wavelength of the InAs quantum dots red shifted by up to 370 nm when embedded the InAs quantum dots in graded In_0.53rarr0.8Ga_0.47rarr0.2As barriers. The longest emission wavelength of >2.35 mum from the self-assembled InAs quantum dot structure has been measured at 77 K. The full-width at half-maximum of the photoluminescence emission spectrum of the InAs quantum dots is as narrow as 25.5 meV. The results achieved would be promising to high performance mid-infrared quantum dot lasers on InP substrate     

Designing spatial correlation of quantum dots: towards self-assembled three-dimensional structures

Buried two-dimensional arrays of InP dots were used as a template for the lateral ordering of self-assembled quantum dots. The template strain field can laterally organize compressive (InAs) as well as tensile (GaP) self-assembled nanostructures in a highly ordered square lattice. High-resolution transmission electron microscopy measurements show that the InAs dots are vertically correlated to the InP template, while the GaP dots are vertically anti-correlated, nucleating in the position between two buried InP dots. Finite InP dot size effects are observed to originate InAs clustering but do not affect GaP dot nucleation. The possibility of bilayer formation with different vertical correlations suggests a new path for obtaining three-dimensional pseudocrystals.     

InP(001)基衬底上自组织生长InAs量子点(线)的光学性质研究

在InP(001)基衬底上用分子柬外延方法生长InAs纳米结构材料，通过衬底的旋转与否及混合生长模式，得到了两种InAs量子点和量子线，并研究了量子点、线的光学性质，结果表明，两种方式都可生长出较强发光的量子点(线)；由量子点排列构成的量子线的光致发光光谱呈现出多峰结构，分析和理论计算表明这是InAs量子线上各量子点在垂直方向上不同高度分布和非连续性而造成的。     

InAs自组织量子点(线)的制备和表征

在InP(001)基衬底上用分子束外延方法生长了InAs纳米结构材料，通过改变生长方式，得到了InAs量子点和量子线。根据扫描电镜和透射电镜观测结果的分析，认为衬底旋转时浸润层三角形状的台阶为InAs量子线的成核提供了优先条件，停止衬底旋转时InAlAs缓冲层沿[11^-0]方向分布的台阶促使InAs优先形成量子点。讨论了量子点和量子线的形成机理。     

Self-assembling InAs and InP quantum dots for optoelectronic devices

Stranski–Krastanov growth in molecular beam epitaxy allows the preparation of self assembling InAs and InP quantum dots on GaAs and Ga_0.52In_0.48P buffer layers, respectively. InAs dots in GaAs prepared by slow growth rates and low temperature overgrowth provide intense photoluminescence at the technologically important wavelength of 1.3 μm at room temperature. Strain induced vertical alignment, size modification and material interdiffusion for stacked dot layers are studied. A blue shift of the ground state transition energy is observed for the slowly deposited stacked InAs dots. This is ascribed to enhanced strain driven intermixing in vertically aligned islands. For very small densely stacked InP and InAs dots the reduced confinement shift causes a red shift of the ground state emission. The InP quantum dots show intense and narrow photoluminescence at room temperature in the visible red spectral range. First InP/Ga_0.52In_0.48P quantum dot injection lasers are prepared using threefold stacked InP dots. We observe lasing at room temperature in the wavelength range between 690–705 nm depending on the size of the stacked InP dots.     

Shape and size control of InAs/InP (113)B quantum dots by Sb deposition during the capping procedure

The role of Sb atoms present on the growth front during capping of InAs/InP (113)B quantum dots (QDs) is investigated by cross-sectional scanning tunnelling microscopy, atomic force microscopy, and photoluminescence spectroscopy. Direct capping of InAs QDs by InP results in partial disassembly of InAs QDs due to the As/P exchange occurring at the surface. However, when Sb atoms are supplied to the growth surface before InP capping layer overgrowth, the QDs preserve their uncapped shape, indicating that QD decomposition is suppressed. When GaAs(0.51)Sb(0.49) layers are deposited on the QDs, conformal growth is observed, despite the strain inhomogeneity existing at the growth front. This indicates that kinetics rather than the strain plays the major role during QD capping with Sb compounds. Thus Sb opens up a new way to control the shape of InAs QDs.     

Scanning gate imaging of quantum dots in 1D ultra-thin InAs/InP nanowires

We use a scanning gate microscope (SGM) to characterize one-dimensional ultra-thin (diameter ≈ 30 nm) InAs/InP heterostructure nanowires containing a nominally 300 nm long InAs quantum dot defined by two InP tunnel barriers. Measurements of Coulomb blockade conductance versus backgate voltage with no tip present are difficult to decipher. Using the SGM tip as a charged movable gate, we are able to identify three quantum dots along the nanowire: the grown-in quantum dot and an additional quantum dot near each metal lead. The SGM conductance images are used to disentangle information about individual quantum dots and then to characterize each quantum dot using spatially resolved energy-level spectroscopy.     

Mechanisms of molecular beam epitaxy growth in InAs/InP nanowire heterostructures

InAs/InP axial nanowire heterostructures were grown by the Au-assisted vapour-liquid-solid method in a gas source molecular beam epitaxy system. The nanowire crystal structure and morphology were investigated by transmission electron microscopy for various growth conditions (temperature, growth rate, V/III flux ratio). Growth mechanisms were inferred from the InAs and InP segment lengths as a function of the nanowire diameter. Short InAs segment lengths were found to grow by depletion of In from the Au particle as well as by direct impingement, while longer segments of InAs and InP grew by diffusive transport of adatoms from the nanowire sidewalls. The present study offers a way to control the lengths of InAs quantum dots embedded in InP barriers.     

Transformation of self-assembled InAs/InP quantum dots into quantum rings without capping

Transformation of self-assembled InAs quantum dots (QDs) on InP(100) into quantum rings (QRs) is studied. In contrast to the typical approach to III--V semiconductor QR growth, the QDs are not capped to form rings. Atomic force micrographs reveal a drastic change from InAs QDs into rings after a growth interruption in tertiarybutylphosphine ambient. Strain energy relief in the InAs QD is discussed and a mechanism for dot-to-ring transformation by As/P exchange reactions is proposed.     

Structural characterization of GaSb-capped InAs/GaAs quantum dots with a GaAs intermediate layer

GaSb incorporation to InAs/GaAs quantum dots is considered for improving the opto-electronic properties of the systems. In order to optimize these properties, the introduction of an intermediate GaAs layer is considered a good approach. In this work, we study the effect of the introduction of a GaAs intermediate layer between InAs quantum dots and a GaSb capping layer on structural and crystalline quality of these heterostructures. As the thickness of the GaAs intermediate layer increases, a reduction of defect density has been observed as well as changes of quantum dots sizes. This approach suggests a promising method to improve the incorporation of Sb to InAs heterostructures.