Simulation of submicrometer metal–semiconductor–metal ultraviolet photodiodes on gallium nitride

Ultrafast metal–semiconductor–metal ultraviolet photodetectors on GaN with 0.3-μm finger width and spacing were fabricated and packaged with a specially designed fast circuit. The assembly was simulated using a distributed circuit approach with optical illumination at λ = 270 nm. The results from simulations showed a 30-ps response time at a low illumination level. At high illumination, the response time increases significantly due to the space-charge screening effect. This is the first theoretical simulation report of this effect in ultrafast ultraviolet photodetectors on GaN. Comparison of simulations and measurements was made in a wide range of optical energies, and a close agreement was achieved with a single energy-scaling factor.     

Planar 4H- and 6H-SiC p–n diodes fabricated by selective diffusion of boron

Graphite film was used as a protective and selective mask for realizing diffusion of boron in SiC. Secondary ion mass spectroscopy was employed to identify the diffusion profile in SiC. No significant difference between diffusion profiles in 4H-SiC and 6H-SiC was found. Planar p–n diodes with local p-type emitter regions were fabricated in 4H-SiC and 6H-SiC based on this process. The current density versus voltage (J–V) curves of the formed diodes exhibited good rectification characteristics. The 4H-SiC p–n diodes had much lower forward voltage drops and much less temperature dependence in comparison with 6H-SiC p–n diodes.     

MOCVD与MBE生长GaAs/AlGaAs量子阱材料的红外探测器特性比较

用金属有机物化学气相沉积法(MOCVD)生长GaAs/AlGaAs量子阱材料,并制成红外探测器.测量了材料的光致发光光谱和探测器的光电流响应光谱及其它光电特性,峰值波长7.9μm,响应率达到6×103V/W,与分子束外延法(MBE)生长的材料和相关器件进行了比较,MOCVD法可满足量子阱材料和器件的要求.     

AlGaN/GaN/InGaN对称分别限制多量子阱激光器的优化设计

采用一维传递矩阵法模拟计算了AlGaN/GaN/InGaN对称分别限制多量子阱激光器(发射波长为396.6nm)的波导特性.以光限制因子、阈值电流密度和功率效率作为优化参量,获得激光器的优化结构参数为:3周期量子阱In0.02Ga0.98N/In0.15Ga0.85N(10.5nm/3.5nm)作为有源层,90nm In0.1Ga0.9N为波导层,120周期Al0.25Ga0.75N/GaN(2.5nm/2.5nm)为限制层.     

AlGaN/GaN/InGaN对称分别限制多量子阱激光器的优化设计

采用一维传递矩阵法模拟计算了AlGaN/GaN/InGaN对称分别限制多量子阱激光器(发射波长为396.6nm)的波导特性.以光限制因子、阈值电流密度和功率效率作为优化参量,获得激光器的优化结构参数为:3周期量子阱In0.02Ga0.98N/In0.15Ga0.85N(10.5nm/3.5nm)作为有源层,90nm In0.1Ga0.9N为波导层,120周期Al0.25Ga0.75N/GaN(2.5nm/2.5nm)为限制层.     

Simulation and experimental results on the forward J–V characteristic of Al implanted 4H–SiC p–i–n diodes

In this work the forward J–V characteristics of 4H–SiC p–i–n diodes are analysed by means of a physics based device simulator tuned by comparison to experimental results. The circular devices have a diameter of 350 μm. The implanted anode region showed a plateau aluminium concentration of 6×10¹⁹ cm⁻³ located at the surface with a profile edge located at 0.2 μm and a profile tail crossing the n-type epilayer doping at 1.35 μm. Al atom ionization efficiency was carefully taken into account during the simulations. The final devices showed good rectifying properties and at room temperature a diode current density close to 370 A/cm² could be measured at 5 V. The simulation results were in good agreement with the experimental data taken at temperatures up to about 523 K in the whole explored current range extending over nine orders of magnitude. Simulations also allowed to estimate the effect of a different p⁺ doping electrically effective profile on the device current handling capabilities.     

p-GaN-i-GaN/AlGaN multiple-quantum well n-AlGaN back-illuminated ultraviolet detectors

The spectral response of back-surface-illuminated p-GaN-i-GaN/AlGaN multiplequantum well (MQW)-n-AlGaN ultraviolet (UV) photodetector is reported. The structure was grown by molecular-beam epitaxy on a c-plane sapphire substrate. A MQW is introduced into the active region of the device to enhance the quantum efficiency caused by the high absorption coefficient of the two-dimensional (2-D) system. Another advantage of using MQW in the active region is the ability to tune the cutoff wavelength of the photodetector by adjusting the well width, well composition, and barrier height. The zero-bias peak responsivity was found to be 0.095 A/W at 330 nm, which corresponds to 36% quantum efficiency from as-grown p-i-n GaN/AlGaN MQW devices. An anomalous effect, occurring in responsivity as a negative photoresponse in the spectra peaked at 362 nm because of poor ohmic contact to p-type GaN, was also observed. Etching the sample in KOH for 30 sec before fabrication removed the surface contaminants and improved the surface smoothness of the as-grown sample, resulting in significant improvement in the device performance, giving a peak responsivity of 0.12 A/W. The device has a quantum efficiency of 45% at 330 nm without the anomalous negative photocurrent.     

Low dark current and internal gain mechanism of GaN MSM photodetectors fabricated on bulk GaN substrate

Metal-semiconductor-metal ultraviolet photodetectors are fabricated on low-defect-density homoepitaxial GaN layer on bulk GaN substrate. The dislocation density of the homoepitaxial layer characterized by cathodoluminescence mapping technique is ∼5 × 10⁶ cm⁻². The photodetector with a high UV-to-visible rejection ratio of up to 1 × 10⁵ exhibits a low dark current of <2 pA at room temperature under 10 V bias. The photo-responsivity of the photodetector gradually increases as a function of applied bias, resulting in a photodetector quantum efficiency exceeding 100% at above medium bias. The photo-responsivity also shows a dependence on the incident optical power density and illumination conditions. The internal gain mechanism of the photodetector is attributed to photo-generated holes trapped at the semiconductor/metal interface as well as high-field-induced image-force lowering effect.     

InGaN/GaN多量子阱纳米线发光二极管制备及研究

用SiO2纳米图形层作为模板在以蓝宝石为衬底的n-GaN单晶层上制备了InGaN/GaN多量子阱纳米线,并成功实现了其发光二极管器件(LED).场发射扫描电子显微镜(FESEM)的测量结果表明,InGaN/GaN多量子阱纳米线具有光滑的表面形貌和三角形的剖面结构.室温下阴极射线荧光谱(CL)的测试发现了位于461 nm...     

生产型GaN MOCVD(6片机)设备中的压力控制技术

反应室压力控制稳定是保证工艺重复性和陡峭界面生长的关键之一。分析了影响压力控制精度的主要因素,介绍了采用软件、硬件结合的方法,通过闭环压力控制、差压控制、高精度流量控制和补偿气路设计等技术手段,实现高精度压力稳定性和无扰动气体切换,首次在国产生产型GaN-MOCVD(6片机)设备上生长出高质量的多量子阱蓝光LED外延材料。     

双波长多量子阱激光器设计与计算机辅助分析

采用模拟计算,结合实验数据,初步设计了通过GaAs隧道结联接的650nm/780nm双波长多量子阱（MQW）激光器。分别对650nm、780nmMQW有源区部分进行模拟,计算得出激光器的横向模式特性、近场分布和远场发散角。对激光器折射率导引结构侧向模式进行了定性分析,得出实现理想侧模的条件。     

Junction Temperature Measurements and Thermal Modeling of GaInN/GaN Quantum Well Light-Emitting Diodes

We present a junction temperature analysis of GaInN/GaN quantum well (QW) light-emitting diodes (LEDs) grown on sapphire and bulk GaN substrate by micro-Raman spectroscopy. The temperature was measured up to a drive current of 250 mA (357 A/cm²). We find better cooling efficiency in dies grown on GaN substrates with a thermal resistance of 75 K/W. For dies on sapphire substrates we find values as high as 425 K/W. Poor thermal performance in the latter is attributed to the low thermal conductivity of the sapphire. Three-dimensional finite-element simulations show good agreement with the experimental results, validating our thermal model for the design of better cooled structures.     

InGaN/GaN multi-quantum-well-based light-emitting and photodetective dual-functional devices

In this study, we fabricated and characterized an InGaN/GaN multi-quantum-well (MQW)-based p-n junction photodetector (PD) for voltage-selective light-emitting and photo-detective applications. The photode-tector exhibits a cutoff wavelength at around 460nm which is close to its electroluminescence (EL) peak position. The rejection ratio was determined to be more than three orders of magnitude. Under zero bias, the responsivity of the device peaks at 371 nm, with a value of 0.068 A/W, corresponding to a 23% quantum efficiency.The overall responsivity gradually rises as a function of reverse bias, which is explained by the enhanced photocarrier collection efficiency.     

生长停顿改善MOCVD生长InGaN/GaN多量子阱的特性

利用金属有机物化学气相淀积(MOCVD)生长了InGaN/GaN多量子阱(MQWs)结构,研究了生长停顿对InGaN/GaN MQWs特性的影响.结果表明,采用生长停顿,可以改善MQWs界面质量,提高MQWs的光致发光(PL)与电致发光(EL)强度;但生长停顿的时间过长,阱的厚度会变薄,界面质量变差,不仅In组分变低,富In的发光中心减少,而且会引入杂质,致使EL强度下降.     

GaN基蓝光LED的多量子阱结构优化

基于量子阱结构中载流子遂穿势垒原理,使用APSYS软件模拟不同条件下具有不同垒高、垒宽及阱宽的发光二极管（LED）的I-V特性、光强和内量子效率（IQE）的变化,发现自发发射光谱存在红移现象。通过与传统LED的多量子阱（MQW）参数比较发现,当阱宽为2 nm、垒宽为4 nm、垒中In含量为0.08和驱动电流为20mA时...     

InGaN/GaN multiple quantum well green light-emitting diodes prepared by temperature ramping

High-quality InGaN/GaN multiple-quantum well (MQW) light-emitting diode (LED) structures were prepared by a temperature-ramping method during metal-organic chemical-vapor deposition (MOCVD) growth. Two photoluminescence (PL) peaks, one originating from well-sensitive emission and one originating from an InGaN quasi-wetting layer on the GaN-barrier surface, were observed at room temperature (RT). The observation of high-order double-crystal x-ray diffraction (DCXRD) satellite peaks indicates that the interfaces between InGaN-well layers and GaN-barrier layers were not degraded as we increased the growth temperature of the GaN-barrier layers. With a 20-mA and 160-mA current injection, it was found that the output power could reach 2.2 mW and 8.9 mW, respectively. Furthermore, it was found that the reliability of the fabricated green LEDs prepared by temperature ramping was also reasonably good.