MeV Al+ and Al2+ ions implantation in Si(100): surface roughness and defects in the bulk

This paper deals with the implantation of high-energy (1.0–3.0 MeV) atomic and molecular Al⁺ ions in Si(100) to a fluence of 5×10¹⁴ Al atoms/cm² at room temperature. The molecular effect, i.e. the increase of the displacement yield compared with the sum of the atomic yields, and the damage formation as well as defect behaviour after annealing have been investigated. A detailed experimental study has been made of the evolution of extended secondary defects which form during thermal anneals of Al⁺ or Al₂ ⁺ irradiated silicon. The samples have been examined using combined Rutherford backscattering and channeling experiments together with transmission electron microscopy observations. The surface structure of the implanted wafers has been measured by atomic force microscopy. The results for the implantation-induced roughness at the Si surface, resulting from Al⁺ or Al₂ ⁺ irradiation at the same energy/atom, total atomic fluence, flux rate, and irradiation temperature, are presented and discussed. Received: 19 August 1999 / Accepted: 20 October 1999 / Published online: 23 February 2000     

Thermally induced defect photoluminescence in hydrogenated amorphous silicon

The intrinsic defect photoluminescence of hydrogenated amorphous silicon (a-Si:H) films has been investigated at high intensities of optical pumping that lead to heating of the film. It has been revealed that, for short heating times, the intensity of the defect photoluminescence increases exponentially with an increase in the temperature with an activation energy of 0.85 eV, which is considerably higher than the activation energy (∼0.2 eV) determined from experiments on classical annealing. This and other experimental results on the temperature dependence of the intensity and kinetics of the defect photoluminescence have been explained in terms of the “hydrogen glass” model by thermally induced generation of intrinsic defects in amorphous silicon. The results of the calculations are in good agreement with the experimental data on the defect photoluminescence that reflects the formation and annihilation of defects for short heating times under optical excitation.     

Ar+, He+，S+离子轰击n-InP单晶表面的机理研究

通过X射线光电子能谱和低能电子衍射实验研究了10～180 eV的Ar⁺、 He⁺、S⁺离子轰击n-InP(100)表面, 发现S⁺离子轰击可以产生In-S组分,减轻离子轰击对表面的物理损伤.对于Ar⁺离子轰击后的表面,经过S⁺离子处理和加热过程以后,表面损伤得到了修复,最终得到了2×2的InP表面,进一步验证了S⁺离子对InP表面的修复作用.     

Variations of the local density of electron states and short-range order in amorphous hydrated silicon films

Ultrasoft x-ray spectroscopy methods have been used to observed a change in the energy distribution of the silicon valence states after annealing a-Si:H films at 500 °C. This change appears as three distinct maxima in the density of states 3.5, 7.2, and 10.2 eV above the top of the valence band, which indicates ordering of the a-Si:H structural network. The energy distance between the latter two maxima (E?E _v=7.2 and 10.2 eV) supports electron-diffraction data indicating a decrease in the silicon-silicon interatomic distance by 0.2 Å in comparison with the crystal. The presence of a third maximum (E?E _v=3.5 eV) is connected with the change in the hybridization of the s-p-functions of silicon with decrease of the coordination number.     

Electron-irradiated n+-Si as hole injection tunable anode of organic light-emitting diode

Traditionally, n-type silicon is not regarded as a good anode of organic light emitting diode (OLED) due to the extremely low hole concentration in it; however, when doped with Au element which acts as carrier generation centers, it can be, as shown in our previous work. In this study, we demonstrate a new kind of carrier generation centers in n⁺-type silicon, which are the defects produced by 5 MeV electron irradiation. The density of carrier generation centers in the irradiated n⁺-Si anode can be controlled by tuning the electron irradiation time, and thus hole injection current in the OLEDs with the irradiated n⁺-Si anode can be optimized, leading to their much higher maximum efficiencies than those of the OLEDs with non-irradiated n⁺-Si anode. For a green phosphorescent OLED with the irradiated n⁺-Si anode, the current efficiency and power efficiency reach up to 12.1 cd/A and 4.2 lm/W, respectively.     

Luminescence and magnetic resonance in post-hydrogenated microcrystalline silicon

We report photoluminescence, EPR and ODMR studies of plasma hydrogenated LPCVD microcrystalline silicon thin films. Apart from the dangling bond EPR resonance which is similar to that observed in a-Si : H, and possibly the emission at 1.3 eV, we find emission bands and resonance signals quite unlike those observed in normal c-Si and a-Si : H. We conclude that μc-Si : H cannot be regarded purely as crystallites of pure silicon embedded in a matrix of a-Si : H.     

Electron collisions with the BeH<Superscript>+</Superscript> molecular ion in the R-matrix approach

The R-matrix method is used to study electron collisions with the BeH⁺ molecular ion. The diatomic version of the UK Molecular R-matrix codes is used and a configuration-interaction calculation is first performed for the BeH⁺ target to obtain its potential energy curves for 19 lowest singlet and triplet states. Scattering calculations are then done to yield excitation and rotational excitation cross sections in the energy range 0 − 14 eV. Additionally we also obtain bound states of BeH and their quantum defects at the BeH equilibrium bond length 2.5369a ₀. Resonance positions and widths for Feshbach resonances in the e-BeH⁺ system are also obtained and presented at the equilibrium bond length 2.5369a ₀.     

Properties of magnesium silicate doped with chromium in porous silicon

Forsterite doped with Cr⁴⁺ ions is prepared in silicon-based structures according to a simple technique. These structures are of interest due to the characteristic luminescence in the near-IR range. Forsterite is synthesized by impregnation of porous silicon layers on n⁺-Si and p⁺-Si substrates with subsequent annealing in air. A photoluminescence response at a wavelength of 1.15 μm is observed at room temperature in porous silicon layers doped with magnesium and chromium for which the optimum annealing temperature is close to 700°C. The photoluminescence spectrum of porous silicon on the p⁺-Si substrate contains a broad band at a wavelength of approximately 1.2 μm. This band does not depend on the annealing temperature and the magnesium and chromium content and is most likely associated with the presence of dislocations in silicon. The experimental EPR data and eletrical properties of the structures are discussed. It is found that layers of pure porous silicon and chromium-doped porous silicon on n⁺-Si subtructures exhibit indications of discrete electron tunneling.     

Effect of Doping on the Properties of Hydrogenated Amorphous Silicon Irradiated with Femtosecond Laser Pulses

A comparative analysis of the effect of femtosecond laser irradiation on the structure and conductivity of undoped and boron-doped hydrogenated amorphous silicon (a-Si: H) is performed. It is demonstrated that the process of nanocrystal formation in the amorphous matrix under femtosecond laser irradiation is initiated at lower laser energy densities in undoped a-Si: H samples. The differences in conductivity between undoped and doped a-Si: H samples vanish almost completely after irradiation with an energy density of 150–160 mJ/cm².     

Electrically active defect annealing in neutron and in ion-damaged Si

Hall effect and electrical conductivity measurements of defect annealing in 1 ohm-cm n-type and 2 ohm-cm p-type silicon were made following neutron irradiation at ～50°C. Measurements were also made following 400-keV B¹¹ ion implantation into a 100 ohm-cm n-type Si substrate. As the neutron fluence is increased the electrical effects of the damage eventually outweigh those of the chemical dopants, and further changes in the electrical properties become small. Conversely, significant electrical recovery upon annealing begins only when the electrical effects of the remaining damage become comparable to those of the chemical dopants. This condition will occur at higher anneal temperatures for higher fluence irradiations. The neutron fluence dependence of the damage and the annealing is interpreted in terms of the neutron energy per cm³. E, spent in atomic processes divided by the number/cm³, N, of electrically active dopants. When E/N ≤ 0.5 keV the electrical measurements show that the predominant defect annealing occurs below 400°C. However, when E/N > 0.5 keV electrical measurements emphasize the annealing at temperatures > 400°C. After 500°C annealing, energy levels in neutron damaged Si are observed at E_v +0.1 and E_v +0.15 eV in p-type and at E_c -0.33 eV in n-type Si. Application of the E/N criteria to room temperature implant-doped Si predicts that the electrical effects will be dominated by lattice damage even if all the implanted ions are substitutional.     

Helium irradiation-induced defects in deformed 316L stainless steel

Well-annealed 316L stainless steel was first cold rolled to 10% and 20% reductions in thickness and then irradiated by 50 keV He⁺ to a dose of 1 × 10²⁰ He⁺/m² at room temperature. Thermal desorption spectroscopy was used to investigate the helium desorption behaviour at different helium trapping states. The results showed that high-density dislocations had stronger inhibitory effect for helium desorption at temperatures from 800 to 1200 K. Positron annihilation Doppler broadening spectroscopy measurements were used to investigate the distribution of helium irradiation-induced defects. The S–E and ΔS–E plots clearly demonstrated that the helium irradiation-induced defects were trapped and restricted in motion by dislocations. The interaction between dislocations and helium irradiation-induced defects in deformed 316L stainless steel was investigated.     

Time-resolved defect production and annealing during electron-beam processing of silicon

In (100)p-Si radiation damage was produced by implanting B⁺ ions with an energy of 80keV, 90keV and 1.6MeV. The specimens were annealed by scanned electronbeam irradiation (20keV, 1–2mAcm^–2). The formation, evolution and annihilation of defects during the irradiation process were investigated by employing DLTS and RBS measuring techniques. The results show a minimum of defect concentration and an efficiency of the electrical activation of B higher than 80% at an annealing time of 4.5 s. For irradiation times longer than 5 s it becomes evident, that the crystal surface acts as source of defects and contributes to an increase in defect concentration.     

渐变带隙氢化非晶硅锗薄膜太阳能电池的优化设计

利用一维微电子-光电子结构分析软件(AMPS-1D)在AM1.5G(100 mW/cm2)、室温条件下模拟和比较了有、无渐变带隙氢化非晶硅锗(a-SiGe:H)薄膜太阳能电池的各项性能.计算结果表明:渐变带隙结构电池具有较高的开路电压(V oc)和较好的填充因子(FF),转换效率(E ff)比非渐变带隙电池提高了0.477%.研究了氢化非晶硅(a-Si:H)、氢化非晶碳化硅(a-SiC:H)和氢化纳米晶硅(nc-Si:H)三种不同材料的窗口层对a-SiGe:H薄膜太阳能电池性能的影响.结果显示:在以nc-Si:H为窗口层的电池能带中,费米能级E F已经进入价带,使得窗口层电导率及电池开路电压有所提高,又由于ITO与p-nc-Si:H的接触势垒较低,使得接触处的电场降低,更有利于载流子的收集.另一方面,窗口层与a-SiGe:H薄膜之间存在较大的带隙差,在p/i界面由于能带补偿作用形成了价带势垒(带阶)?E v,阻碍了空穴的迁移,因此我们在p/i界面引入缓冲层,使得能带补偿作用得到释放,更有利于空穴的迁移和收集,得到优化后单结渐变带隙a-SiGe:H薄膜结构太阳能电池的转换效率达到了9.104%.     

Simulation of doping and primary radiation damage to the SiC(111) surface under bombardment by Si<Subscript><Emphasis Type="Italic">N</Emphasis></Subscript> atomic and cluster ions (<Emphasis Type="Italic">N</Emphasis> = 1, 5, and 60) using classical molecular dynamics

The features of the cascade of atomic collisions, the spatial distribution of dopes, and primary radiation damage in a near-surface region of cubic silicon carbide under bombardment by Si _N ions and clusters (N = 1, 5, and 60) in the case of the same energy per one atom of the particle-projectile (200 and 1000 eV/atom) are studied in this paper. The study is carried out using classical molecular dynamics. As a result, several features of the low-energy implantation of polyatomic clusters in SiC(111) are revealed, namely, a relatively weak effect of the size of the implanted cluster on the distribution of ranges of incorporated atoms, a low degree of nonlinear effects at the cascade and postcascade stages, and formation of amorphous regions in the target during cluster implantation.     

镶嵌在氧化硅薄膜中纳米晶硅的可见光荧光谱与发光机制的研究

采用对非晶氧化硅薄膜退火处理方法，获得纳米晶硅与氧化硅的镶嵌结构．室温下观察到峰位为2.40eV光致发光．系统地研究了不同退火温度对薄膜的Raman谱、光荧光谱及光电子谱的影响．结果表明，荧光谱可分成两个不随温度变化的峰位为1.86和2.30eV的发光带．Si2p能级光电子谱表明与发光强度一样Si⁴⁺强度随退火温度增加而增加．Si平均晶粒大小为4.1—8.0nm，不能用量子限制模型解释蓝绿光的发射．纳米晶硅与SiO₂界面或SiO₂中与氧有关的缺陷可能是蓝绿光发射的主要原因 关键词：     

Perturbation of atomic energy levels by a metal surface

The energy level shifts of one-electron atomic particles H, He⁺, Li⁺⁺, etc. which interact with a metal surface have been investigated. In the approximation of image charges, an operator describing perturbations of atomic levels has been obtained. By numerically solving the Schro dinger equation, we have calculated energy levels of H(1s), H*(n=2), and C⁵⁺(n) as functions of the distance between an atom and surface. Asymptotic behavior of atomic levels at large distances from the surface has been studied. The linear Stark effect for excited states, which was earlier mentioned by A. V. Chaplik, has been found and investigated in detail. Zh. éksp. Teor. Fiz. 116, 236–256 (July 1999)     

Muonium/muonic hydrogen formation in atomic hydrogen

The muonium/muonic hydrogen atom formation in μ^±−H collisions is investigated, using a two-state approximation in a time dependent formalism. It is found that muonium cross-section results are similar to the cross-section results obtained for positronium formation in e⁺-H collision. Muonic hydrogen atom formation cross-sections in μ^--H collision are found to be significant in a narrow range of energy (5 eV–25 eV).     

Electrical and structural properties of the swift heavy ion irradiated Au/n-GaAs schottky barrier diodes

Abstract

Au/n-GaAs Schottky Barrier Diodes (SBDs) have been fabricated on LEC grown silicon doped (100) GaAs single crystals. The SBDs were irradiated using high energy (120 MeV) silicon ion with fluences of 1 × 10 ¹¹ and 1 × 10¹² ions/cm². Current-Voltage (I-V) characteristics of unirradiated and irradiated diodes were analyzed. The change in the reverse leakage current increases with increasing ion fluence. This is due to the irradiation induced defects at the interface and its increase with the fluence. The diodes were annealed at 573 and 673 K. to study the effect of annealing. The rectifying behavior of the irradiated (fluence of 1 × 10¹² ions/cm¹²) SBDs improves upon as the annealing temperature increases and is attributed to the in situ self-annealing during irradiation. Scanning Electron Microscopic analysis was carried out on the irradiated samples to delineate the projected range and to observe defects.     

Investigation of silicon doped by zinc ions with a large dose

The formation of nanoparticles in СZn-Si(100) implanted with ⁶⁴Zn⁺ ions using a dose of 5 × 10¹⁶ cm^–2 and an energy of 50 keV at room temperature with subsequent thermal processing in oxygen at temperatures ranging from 400 to 900°C is studied. The surface topology is investigated with scanning electron (in the secondary emission mode) and atomic force microscopes. The structure and composition of the near-surface silicon layer are examined using a high-resolution transmission electronic microscope fitted with a device for energy dispersive microanalysis. An amorphized near-surface Si layer up to 130 nm thick forms when zinc is implanted. Amorphous zinc nanoparticles with an average size of 4 nm are observed in this layer. A damaged silicon layer 50 nm thick also forms due to radiation defects. The metallic zinc phase is found in the sample after low-temperature annealing in the range of 400–600°C. When the annealing temperature is raised to 700°C, zinc oxide ZnO phase can form in the near-surface layer. The complex ZnO · Zn₂SiO₄ phase presumably emerges at temperatures of 800°C or higher, and zinc-containing nanoparticles with lateral sizes of 20–50 nm form on the sample’s surface.     

Observation of fine structure in the photoluminescence spectrum of an Er3+ ion in an amorphous silicon matrix

A multicomponent Stark structure corresponding to a 4I _13/2→4I _15/2 transition in the 4f ¹¹ shell of Er³⁺ ions is observed in hydrogenated amorphous silicon (a-Si:H) subjected to low-temperature (150 °C) anneal. The observation of narrow, strong components indicates that the erbium ions form a highly ordered local surrounding (Er-O-Si nanoclusters) in the labile, disordered structural network of a-Si:H. Pis’ma Zh. éksp. Teor. Fiz. 70, No. 12, 780–783 (25 December 1999) Deceased.