GaAs纳米线及GaAs/In_xGa_(1-x)As/GaAs纳米线径向异质结构的无催化选区生长的实验研究

利用无催化选区金属有机化学气相沉积(SA-MOCVD)法在GaAs(111)B衬底上分别制备了GaAs纳米线和GaAs/InxGa1-xAs/GaAs纳米线径向异质结构.系统地研究了生长条件对GaAs纳米线生长的影响.实验结果显示,GaAs纳米线的形貌和长度依赖于生长温度、AsH3的分压以及SiO2掩膜表面的圆孔直径.因此可以通过调节以上因素来得到高质量的GaAs纳米线.并且发现扩散是影响无催化选区生长GaAs纳米线的主要机理.微区光致发光谱(μ-PL)表明,GaAs/InxGa1-xAs/GaAs纳米线径向异质结构被成功合成,室温(300 K)下它的发光波长为913 nm.这些结果对于GaAs纳米线及其异质结构制备的进一步研究及其在光电子器件中的应用具有很好的参考价值.     

Si掺杂对GaAs纳米线发光特性的影响

采用分子束外延技术(MBE)在Si(111)衬底上生长了非掺杂和Si掺杂砷化镓(GaAs)纳米线(NWs)。通过扫描电子显微镜(SEM)证实了生长样品的一维性;通过X射线衍射(XRD)测试和拉曼光谱(Raman)证实了掺杂GaAs纳米线中Si的存在;通过光致发光(PL)研究了非掺杂和Si掺杂GaAs纳米线的发光来源,掺杂改变了GaAs纳米线的辐射复合机制。掺杂导致非掺杂纳米线中自由激子发光峰和纤锌矿/闪锌矿(WZ/ZB)混相结构引起的缺陷发光峰消失。     

Si掺杂对GaAs纳米线发光特性的影响EI北大核心CSCD

采用分子束外延技术(MBE)在Si(111)衬底上生长了非掺杂和Si掺杂砷化镓(GaAs)纳米线(NWs)。通过扫描电子显微镜(SEM)证实了生长样品的一维性;通过X射线衍射(XRD)测试和拉曼光谱(Raman)证实了掺杂GaAs纳米线中Si的存在;通过光致发光(PL)研究了非掺杂和Si掺杂GaAs纳米线的发光来源,掺杂改变了GaAs纳米线的辐射复合机制。掺杂导致非掺杂纳米线中自由激子发光峰和纤锌矿/闪锌矿(WZ/ZB)混相结构引起的缺陷发光峰消失。     

GaAs纳米线晶体结构及光学特性

采用分子束外延技术在N-型Si (111)衬底上利用自催化生长机制外延砷化镓(GaAs)纳米线,对生长的纳米线进行扫描电子显微镜测试,纳米线垂直度高,长度直径均匀度好.对纳米线进行光致发光(photoluminescence, PL)光谱测试,发现低温10 K下两个发光峰P1和P2分别位于1.493 eV和1.516 eV,推断可能是纤锌矿/闪锌矿(WZ/ZB)混相结构引起的发光以及激子复合引起的发光;随着温度升高,发现两峰出现红移,并通过Varshni公式拟合得到变温变化曲线.对纳米线进行变功率PL光谱测试,发现P1位置的峰位随功率增加而蓝移,而P2位置的峰位不变.通过拟合发现P1峰位与功率1/3次方成线性相关,判断可能是WZ/ZB混相结构引起的Ⅱ型发光;同时,对P2位置的峰位进行拟合,P2为激子复合发光.对纳米线进行拉曼光谱测试,从光谱图中发现GaAs WZ结构特有的E_2声子峰,因此证明生长出的纳米线为WZ/ZB混相结构,并通过高分辨透射电子显微镜更直观地观察到纳米线的混相结构.     

MOCVD自催化法在Si(100)衬底上生长InP/InGaAs核壳结构纳米线

采用自催化法,利用金属有机化学气相沉积技术,在Si(100)衬底上成功制备了InP/InGaAs核壳结构纳米线。通过扫描电子显微镜观察纳米线形貌,在核壳结构纳米线的顶端催化剂转化成了颗粒状晶体。利用X射线衍射和透射电子显微镜研究了InP纳米线上生长InGaAs外壳的过程,并应用X射线能量色散能谱仪对纳米线顶端进行了轴向和径向的线扫描,得到了纳米线上元素组分分布。催化剂的转化发生在制备InGaAs壳之前的升温过程中,且形成的晶体中含有合金成分。InGaAs壳的组分调整可以通过改变生长过程中生长源气体的流量来实现。     

InAs/GaAs和InAs/InxGa1-xAs/GaAs纳米线异质结构的生长研究

利用金辅助金属有机化学气相沉淀法(MOCVD)在GaAs(111)B衬底上分别制备了InAs/GaAs和InAs/In _{x Ga1-xAs/GaAs(0≤x≤1)纳米线异质结构.实验结果显示,直接生长在GaAs纳米线上的InAs纳米线生长方向杂乱或者沿着GaAs纳米线侧壁向衬底方向生长,生长的含有In x Ga1-xAs组分渐变缓冲段的InAs/In x Ga1-x关键词： 纳米线异质结构 xGa1-xAs')" href="#">InxGa1-xAs 组分渐变缓冲层 金属有机化学气相沉淀法}     

多波长飞秒激光激发下GaAs纳米线SHG特性研究

本文基于有限元法研究了直立生长于GaAs衬底的GaAs纳米线的光场响应和光场增强性质. 实验使用多个波长的飞秒激光脉冲激发GaAs纳米线, 测得了较高效率的二次谐波信号, 并首次使用宽带超连续飞秒脉冲 (1000–1300 nm) 在纳米线上获取了宽带、无杂散荧光噪声的二次谐波信号. 这种高效的二次谐波产生过程主要归因于纳米结构引起的局域场增强效应. 本文阐明了GaAs纳米线的二次谐波倍频特性, 这些结果对于其在纳米光学中的光器件、 光集成等领域的进一步研究和实际应用具有很好的参考价值. 关键词： GaAs纳米线 二次谐波 飞秒激光     

异质结型CuO/ZnO复合纳米线的制备及光催化性能

在室温下,通过溶液法在Cu衬底上制备了CuO纳米线,然后采用溶剂热法在CuO纳米线表面生长ZnO纳米颗粒以构建CuO/ZnO复合纳米线异质结构.利用扫描电镜、透射电镜、X射线衍射仪和X射线光电子能谱分析了样品的形貌、结构和元素组成.结果显示CuO/ZnO复合纳米线由ZnO纳米颗粒和CuO纳米线组成.在模拟太阳光照射下,...     

表面钝化效应对GaAs纳米线电子结构性质影响的第一性原理研究

纳米线表面存在大量的表面态,它们能够引起电子分布在纳米线表面,使得纳米线的电学性质对表面条件变得更加敏感,严重地制约器件的性能.表面钝化能够有效地移除纳米线的表面态,进而能够有效地优化器件的性能.采用基于密度泛函理论的第一性原理计算方法研究了表面钝化效应对GaAs纳米线电子结构性质的影响.考虑了不同的钝化材料,包括氢元素、氟元素、氯元素和溴元素.研究结果表明:具有小尺寸的GaAs裸纳米线的能带结构呈间接带隙特征,表面经过完全钝化后,转变为直接带隙特征;GaAs纳米线表面经过氢元素不同位置和不同比例钝化后,展示出不同的电学性质;表面钝化的物理机理是钝化原子与纳米线表面原子通过电荷补偿移除纳米线表面的电子态;与氢元素钝化相比,GaAs纳米线表面经过氟元素、氯元素和溴元素钝化后,带隙宽度较小,原因是氟元素、氯元素和溴元素在钝化过程中具有较小的电荷补偿能力,不能完全移除表面态.     

GaAs纳米线阵列太阳能电池的设计与优化

为了得到纳米线阵列太阳能电池的最优转换效率,通过仿真计算对GaAs轴向pin结纳米线阵列进行了结构优化.首先利用三维有限时域差分法分析了GaAs纳米线阵列的光吸收特性,并对其直径、密度等结构参量进行优化,优化后的GaAs纳米线阵列的光吸收率可达87.4%.在此基础上,利用Sentaurus软件包中的电学仿真模块分析了电池的电学性能,并根据光生载流子在纳米线中的分布,对轴向pin结结构进行优化,最终优化过的太阳能电池功率转换效率可达到17.6%.分析结果表明,通过钝化处理以降低GaAs纳米线的表面复合速率,可显著提升电池的功率转换效率,而通过减小纳米线顶端高掺杂区域的体积,可减少载流子复合损耗,从而提高电池效率.该研究可为制作高性能的纳米线太阳能电池提供参考.     

Stacking-faults-free zinc blende GaAs/AlGaAs axial heterostructure nanowires during vapor-liquid-solid growth

Pure zinc blende structure GaAs/AlGaAs axial heterostructure nanowires (NWs) are grown by metal organic chemical vapor deposition on GaAs(111) B substrates using Au-catalyzed vapor-liquid-solid mechanism.Al adatom enhances the influence of diameters on NWs growth rate.NWs are grown mainly through the contributions from the direct impingement of the precursors onto the alloy droplets and not so much from adatom diffusion.The results indicate that the droplet acts as a catalyst rather than an adatom collector.     

Growth and characterization of straight InAs/GaAs nanowire heterostructures on Si substrate

Vertical InAs/GaAs nanowire (NW) heterostructures with a straight InAs segment have been successfully fabricated on Si (111) substrate by using AlGaAs/GaAs buffer layers coupled with a composition grading InGaAs segment. Both the GaAs and InAs segments are not limited by the misfit strain induced critical diameter. The low growth rate of InAs NWs is attributed to the AlGaAs/GaAs buffer layers which dramatically decrease the adatom diffusion contribution to the InAs NW growth. The crystal structure of InAs NW can be tuned from zincblende to wurtzite by controlling its diameter as well as the length of GaAs NWs. This work helps to open up a road for the integration of high-quality III-V NW heterostructures with Si.     

Growth of high-crystallinity uniform GaAs nanowire arrays by molecular beam epitaxy

The self-catalyzed growth of Ga As nanowires(NWs) on silicon(Si) is an effective way to achieve integration between group III–V elements and Si. High-crystallinity uniform Ga As NW arrays were grown by solid-source molecular beam epitaxy(MBE). In this paper, we describe systematic experiments which indicate that the substrate treatment is crucial to the highly crystalline and uniform growth of one-dimensional nanomaterials. The influence of natural oxidation time on the crystallinity and uniformity of Ga As NW arrays was investigated and is discussed in detail. The Ga As NW crystallinity and uniformity are maximized after 20 days of natural oxidation time. This work provides a new solution for producing high-crystallinity uniform III–V nanowire arrays on wafer-scale Si substrates. The highly crystalline uniform NW arrays are expected to be useful for NW-based optical interconnects and Si platform optoelectronic devices.     

Growth of Pure Zinc Blende GaAs Nanowires: Effect of Size and Density of Au Nanoparticles

Pure zinc blende GaAs nanowires were grown by metal organic chemical vapor deposition on GaAs（111）B substrates via Au catalyzed vapor-liquid-solid mechanism. The diameter, size distribution, and density of Au particles can be changed by varying the Au film thickness. We find that the grown nanowires are of rod-like shapes and pure zinc blende structure; moreover, the growth rate depends on the density of Au particles and it is independent of its diameters. It can be concluded that the nanowire was grown with main contributions from the direct impingement of vapor species onto the Au-Ga droplets and contributions from adatom diffusion can be negligible. The results indicate that the droplet acts as a catalyst rather than an adatom collector.     

Photoluminescence properties of GaAs nanowire ensembles with zincblende and wurtzite crystal structure

Self‐standing III–V nanowires (NWs) are promising building blocks for future optoelectronic devices such as LEDs, lasers, photodetectors and solar cells. In this work, we present the results of low temperature photoluminescence (PL) characterization of GaAs NWs grown by Au‐assisted molecular beam epitaxy (MBE), coupled with the transmission electron microscopy (TEM) structural analysis. PL spectra contain exci‐ ton peaks from zincblende (ZB) and wurtzite (WZ) crystal structures of GaAs. The peaks are influenced by the quantum confinement effects. PL bands corresponding to the exciton emission from ZB and WZ crystal phases are identified, relating to the PL peaks at 1.519 eV and 1.478 eV, respectively. The obtained red shift of 41 meV for WZ GaAs should persist in thin NWs as well as in bulk materials. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Growth by molecular beam epitaxy and electrical characterization of GaAs nanowires

We report on structural and electrical properties of GaAs nanowires (NWs) grown by molecular beam epitaxy (MBE) on GaAs and SiO₂ substrates using Au as growth catalyst. Au–Ga particles are observed on the top of the NWs by transmission electron microscopy (TEM). In most of the observed cases, individual particles contain two Au–Ga compositions, in particular orthorhombic AuGa and β′ hexagonal Au₇Ga₂. The wires grown on GaAs are regularly shaped and tidily oriented on both (1 0 0) and (1 1 1)B substrates. TEM also reveals that the NWs have a wurtzite lattice structure. Electrical transport measurements indicate that nominally undoped NWs are weakly n-type while both Be- and Si-doped wires show p-type behaviour. The effect of the lattice structure on impurity incorporation is briefly discussed.     

Structural evolution of self‐assisted GaAs nanowires grown on Si(111)

GaAs nanowires are grown on Si(111) by self‐assisted molecular beam epitaxy, and the ratio between wurtzite and zinc‐blende phases is determined as function of nanowire length using asymmetric X‐ray diffraction. We show that under the applied growth conditions, nanowires grow in both phases during the initial stage of growth, whereas the zinc‐blende content increases with growth time and dominates in long nanowires. Compared to the zinc‐blende units, the vertical lattice parameter of the wurtzite segments is 0.7% larger, as measured by the positions of respective diffraction peaks. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Optical properties of undoped,Be-doped,and Si-doped wurtzite-rich GaAs nanowires grown on Si substrates by molecular beam epitaxy

The photoluminescence (PL) of undoped, Si-doped, and Be-doped GaAs nanowires (NWs) grown on Si substrates by molecular beam epitaxy was investigated. PL peaks of the undoped and Be-doped NWs were observed at higher energies than the bandgap energy of GaAs bulk. According to X-ray diffraction analysis, the blue-shift is attributed to the wurtzite-rich GaAs NW structure. Impurity-related peaks were observed in the undoped NWs and the impurity was Si that diffused via interaction with the adatoms on the Si surface during the growth. A slight bandgap narrowing of the Be-doped GaAs NWs was observed from their PL spectra. The Si-doped NWs showed a very broad PL peak due to a larger density of Si-related defects originating from the heavy doping level. The dependence of the PL peaks of the NWs on temperature was also investigated.