Characterization of vapor grown (001) GaAs1−xPx layers by selective photo-etching

The technique of selective photo-etching known for GaAs was successfully applied to (001)GaAs_0.6P_0.4 and it can also be used for the characterization of phosphorus-rich GaAs_1?xP_x layers and for GaP. Using this technique misfit dislocations in GaAs_1?xP_x up to now mainly examined with the transmission electron microscope (TEM) in the GaAs_1?xP_x transition layer could be examined in a density range which is hardly accessible for observation with the TEM. Misfit dislocations are also observed in GaP and GaAs_1?xP_x layers when these are heavily doped with nitrogen. The dislocation density of GaAs_1?xP_x layers of constant composition is compared with predictions from a model of Abrahams et al. for the dislocation density of GaAs_1?xP_x as a function of the rate of grading. Within this model our results can only be explained when the asymmetry factor m between the length to distance ratio of misfit dislocations in the transition layer is about two orders of magnitude greater than the value previously derived from TEM studies of GaAs_1?xP_x layers.     

Characterization of the optical properties of LPE InxGa1−xAsyP1−y thin layers grown on InP

A series of In_xGa_1?xAs_yP_1?y single-crystal thin layers have been grown on an InP substrate in a vertical liquid phase epitaxy furnace with a rotating slide boat system. The optical properties of these LPE quaternary alloys lattice-matched to InP have been investigated mainly by photoluminescence and electroreflectance measurements. Photoluminescence spectra of In_xGa_1?xAs_y P_1?y epitaxial layers are dominated by a strong luminescence line due to band-edge emission. At low temperatures, around 4.2 K, we have observed complicated luminescence bands with many fine structures. Electroreflectance spectra for the LPE In_xGa_1?xAs_yP_1?y layers are sufficiently broad to fulfil the low-field condition, and the analysis enabled us to determine precisely the band gap energy.     

Light Emitting Diodes Fabricated from Liquid Phase Epitaxial InAs/InAsxP1‐x‐ySby/InAsx'P1‐x'‐y'Sby' and InAs/InAs1‐xSbx Multi‐Layers

Mid‐infrared light emitting diodes (LED) in 3‐5μm wavelength range have been fabricated from InAs/InAs_xP_1‐x‐ySb_y/InAs_x'P_1‐x'‐y'Sb_y' composition graded layer and InAs/InAsSb multilayers. The heterostructures were grown by liquid phase epitaxy (LPE) between 600 and 520°C. An output power of 3.1 mW at 11K and of 10 μW at 300 K have been obtained under a peak current of 100 mA (50 % duty ratio) from InAsSb multilayers. Recombination mechanisms for these diodes were studied by temperature‐dependent emission spectra using Fourier transform infrared (FTIR) measurement system with double modulation. The output powers of the LEDs decrease rapidly at temperatures above 153 K suggesting that nonradiative and Auger recombinations are the main limitation of the device performance at high temperatures.     

Nanolayer of the A2IIIB3VI (111) phase with ordered cation vacancies on GaAs(111) and InAs(111)

The surface of GaAs(111) and InAs(111) substrates has been investigated by transmission and scanning electron microscopy after thermal treatment in selenium vapor. A pseudomorphic growth of single-crystal phases of indium selenide In₂Se₃(111) and gallium selenide Ga₂Se₃(111) is found; these compounds are crystallized into a sphalerite lattice with ordered stoichiometric cation vacancies. A model of an atomic surface is proposed for the In₂Se₃(111) and Ga₂Se₃(111) structures. The reconstruction of the (√3 × √3)-R30° surface of GaAs(111) and InAs(111) after treatment in Se vapor is considered within this model.     

Liquid phase epitaxy of AlxGa1−xP on GaP and its application to double heterostructure light modulators

Single- and double-heterojunction structures of Al_xGa_1?xP/GaP were grown by liquid phase epitaxy and their opto-electronic properties were characterized. Using a starting growth temperature of 900°C, a background impurity level in undoped Al_0.5Ga_0.5P of 1 × 10¹⁶ cm^-3 (p-type) is obtained. The growth rate of Al_xGa_1?xP was very low. An almost intrinsic layer exists at the p-n Al_xGa_1?xP/GaP heterojunction interface due to the interdiffusion of the dopants. By using a rotating slide liquid phase epitaxial growth technique, we have made a high efficiency light modulator from a Al_xGa_1?xP/GaP double heterostructure. The employment of a dummy crystal resulted in very good reproducibility of the GaP waveguide layer thickness. Light is well confined in the GaP layer and a voltage difference, V_π, of 6 V is enough to obtain the phase difference, π, between TE and TM modes.     

Liquid phase epitaxial growth of Ga1−xAlxAs on channeled substrates

The growth mechanism of liquid phase epitaxial layers of Ga_1?xAl_xAs on preferentially etched GaAs substrates has been investigated. It has been found that enhanced diffusion of As atoms due to a local concentration gradient, which is set up by non-uniform growth at channels, plays a critical role in determining the growth morphology. The relation between growth morphology and growth conditions is discussed by using a simple growth model.     

Vapor growth of GaxAl1−xSb

The vapor growth of Ga_xAl_1?xSb was experimentally studied using a closed tube transport technique. In the closed tube process with iodine as a transport agent, Ga_xAl_1?xSb was successfully grown on (111) oriented GaSb substrates at a relatively low temperature. The composition of the grown layer depended primarily on that of the source, and had only a small graded region (<0.5 μm) between the substrate and the epitaxial layer. The growth rate was almost constant irrespective of the growth time, whenever the other growth parameters were unchanged.     

Facilitating growth of InAs–InP core–shell nanowires through the introduction of Al

InAs nanowires were grown on GaAs substrates by the Au-assisted vapour–liquid–solid (VLS) method in a gas source molecular beam epitaxy (GSMBE) system. Passivation of the InAs nanowires using InP shells proved difficult due to the tendency for the formation of axial rather than core–shell structures. To circumvent this issue, Al_xIn_1?xAs or Al_xIn_1?xP shells with nominal Al composition fraction of x=0.20, 0.36, or 0.53 were grown by direct vapour–solid deposition on the sidewalls of the InAs nanowires. Characterisation by transmission electron microscopy revealed that the addition of Al in the shell resulted in a remarkable transition from the VLS to the vapour–solid growth mode with uniform shell thickness along the nanowire length. Possible mechanisms for this transition include reduced adatom diffusion, a phase change of the Au seed particle, and surfactant effects. The InAs–AlInP core-shell nanowires exhibited misfit dislocations, while the InAs–AlInAs nanowires with lower strain appeared to be free of dislocations.     

Épitaxie en phase liquide des composés III–V sur substrat InP

The surface preparation and characterization of InP substrates have been studied. It is shown that a 1–3% bromine-methanol etching solution gives a smooth surface if 10 μm or more has been removed. Auger spectrometry detected some contamination of carbon and oxygen by the atmosphere during substrate preparation. The concentration of carbon impurities is less than in the case of GaAs. Liquid phase epitaxy of InP and Ga_xIn_1?xAs_1?yP_y was achieved by a slider technique. Equilibrium cooling, supercooling and step-cooling processes have been tried. It is demonstrated that misorientation from a (111) plane gives a “scale” structure, the orientation of which is exactly (111). Smooth LPE surfaces have been obtained with the supercooling and the step-cooling processes.     

Growth of InAs1–ySby solid solutions for obtaining decreased lattice mismatch in the InAs-GaSb (AlxGa1–nSb) system

This paper presents the results of investigation of the technological conditions of LPE growth of InAs_1–ySb_y solid solutions on InAs substrates. It is shown that the chosen regions of composition of InAs_1–ySb_y solid solutions and experimentally determined technological conditions allow the obtaining of InAs_1–ySb_y solid solutions with lattice parameter values close to those of the Al_xGa_1–xSb (0 ≦ x ≦ 0.2) solid solutions.     

Coexistence properties of phase separation and CuPt-ordering in InGaAsP grown on GaAs substrates by organometallic vapor phase epitaxy

CuPt-ordering and phase separation were directly investigated in In_1-xGa_xAs_yP_1-y with a low arsenic content grown by organometallic vapor phase epitaxy on GaAs substrates. CuPt-ordering and phase separation in samples grown at the substrate temperatures of 630 and 690 °C were characterized by transmission electron diffraction and transmission electron microscopy. Although the immiscibility of InGaAsP was enhanced at the lower substrate temperature, the sample grown at 630 °C showed less phase separation than the 690 °C-grown sample. The degree of CuPt-ordering was significantly enhanced in the sample grown at 630 °C. The results demonstrated that the CuPt-ordering originating from surface reconstruction of P(2×4) suppressed the phase separation even in the miscibility gap. The detailed characterization of the phase separation clearly revealed a vertical composition modulation (VCM) in InGaAsP for the first time. The mechanism of the VCM formation is discussed based on the modulated-strain field on the surface.     

Effect of Mn concentration and growth temperature on nanostructures and magnetic properties of Ge1−xMnx grown on Si

The nanostructures and magnetic properties of Ge_1−xMn_x thin films grown on Si substrates by molecular beam epitaxy, with different nominal Mn concentrations (1−4%) and different growth temperatures, have been systematically investigated by transmission electron microscopy and superconducting quantum interference device. It was discovered that when Ge_1−xMn_x thin films were grown at 70 °C, with increase in Mn concentration, Mn-rich tadpole shaped clusters started to nucleate at 1% Mn and become dominate in the entire film at 4% Mn. While for the thin films grown at 150 °C, tadpoles was firstly seen in the film with 1% Mn and subsequently Mn-rich secondary precipitates became dominant. The magnetic properties show specific features, which are mainly related to the nature and amount of Mn-rich clusters/precipitates within these thin films.     

Elastic constants of Se1−xTex solid amorphous alloys — the role of tellerium

From the 15 MHz ultrasound velocity (shear and longitudinal) the elastic parameters (E, G, K) have been calculated, other than the Debye temperature θ_m in solid Se_1?xTe_x amorphous alloys in the temperature region containing the T_g range. Assisted by results of optical spectroscopy and by shear viscosity tests an analysis has been carried out to explain the role of tellurium in these alloys. We find a double action played through the covalent bonds in the inside of the copolymeric chains and between them by means of the Van der Waals forces. Other results, from the literature, have been taken into account to support our hypothesis.     

Specific features of formation and propagation of 60° and 90° misfit dislocations in GexSi1−x/Si films with x>0.4

The dislocation structure at the initial stage of relaxation of Ge_xSi_1−x films (x∼0.4–0.8) grown on Si (0 0 1) substrates tilted at 6° to the nearest (1 1 1) plane is studied. The use of Si substrates tilted away from the exact (0 0 1) orientation for epitaxial growth of Ge_xSi_1−x films (x≥0.4) allowed finding the basic mechanism of formation of edge dislocations that eliminate the mismatch stresses. Though the edge dislocations are defined as sessile dislocations, they are formed in accordance with the slipping mechanism proposed previously by Kvam et al. (1990). It is highly probable that a 60° misfit dislocation (MD) propagating by the slipping mechanism provokes the nucleation of a complementary 60° MD slipping in a mirror-like tilted plane (1 1 1). The reaction between these dislocations leads to the formation of an edge MD that ensures more effective reconciliation of the discrepancy. Comparative estimation of the slip velocities of the primary and induced 60° MDs and also of the resultant 90° MD is fulfilled. The slip velocity of the induced 60° MD is appreciably greater than the velocity of the primary 60° MD. Therefore, the induced MD “catches up” with the second front of the primary MD, thus forming a 90° MD propagating to both sides due to slipping of the 60° MDs forming it. The propagation velocity of the 90° MD is also greater than the slip velocity of a single 60° MD. For these reasons, 90° MDs under certain conditions that favor their formation and propagation can become the main defects responsible for plastic relaxation of GeSi films close to Ge in terms of their composition.     

Crystallization and local order of bulk AsxTe1−x glasses

The crystallization and the local order of the bulk As_xTe_1?x (0.2 ? × ? 0.8) glasses have been investigated by DSC, X-ray and Mössbauer methods. During the crystallization a metastable phase has been observed between 0.35 ? × ? 0.5 and it was identified as fcc AsTe. The local surrounding of these As_xTe_1?x glasses characterized by the ¹²⁵Te Mössbauer measurements were compared with those of the stable monoclinic As₂Te₃, hexagonal Te and metastable fcc AsTe.     

Ga and In incorporation rates in Ga1−xInxAs growth by chemical beam epitaxy

GaAs, InAs and Ga_1?xIn_xAs layers were grown by chemical beam epitaxy (CBE) using triethylgallium, trimethylindium and tertiarybutylarsine as precursors for Ga, In and As, respectively. The growth rate during the homoepitaxial growth of GaAs and InAs, deduced from the frequency of reflection high-energy electron diffraction intensity oscillations, was used to calibrate the incorporation rates for the III elements. The In content of the Ga_1?xIn_xAs layers was measured by Rutherford backscattering spectrometry and compared with the value predicted from the above calibration data; while the measured In mole fraction is close to the predicted value for the samples grown for low In to Ga flux ratios (x<0.2), the In incorporation is enhanced for larger values of this ratio. The results obtained on layers grown at different substrate temperatures show that In mole fraction is almost constant at growth temperatures in the range 400–500 °C, but a strong dependence on the substrate temperature has been found outside this range. The above results, not observed for samples grown by solid source molecular beam epitaxy, indicate that some interaction between Ga and In precursors at the sample surface could take place during the growth by CBE.     

Infrared studies of Se-based polynary chalcogenide glasses (III): YxZxSxSe100−3x (Y = Ge,As; Z = As,Te)

The infrared (IR) absorption spectra for Y_xZ_xS_xSe_100?3x glasses (Y = Ge, As; Z = As, te), with x = 2.5 and 5.0, are measured in the wavenumber region 700-60 cm^?1 at room temperature. These IR spectra are qualitatively explained by comparing with the IR spectra of the binary and ternary glasses. In Ge_xAs_xS_xSe_100?3x glasses (x ? 5.0), the main spectral features are explained by both spectra of the two ternary glasses Ge_xS_xSe_100?2x and As_xS_xSe_100?2x. In Ge_xS_xTe_xSe_100?3x glasses (x ? 5.0), the main spectral features are well explained by both spectra of the two ternary glasses Ge_xS_xSe_100?2x and Ge_xTe_xSe_100?2x. On the other hand, main spectral features in As_xS_xTe_xSe_100?3x glasses (x ? 5.0) are well explained by both spectra of the ternary glasses As_xS_xSe_100?2x and the binary glasses Se_100?xTe_x. In these glasses with low concentrations (x ? 5.0) some chemical bonds are confirmed and some structural units estimated.     

The effect of annealing on the surface morphology of strained and unstrained InxAl1−xN thin films

In_xAl_1−xN is a particularly useful group-III nitride alloy because by adjusting its composition it can be lattice matched to GaN. Such lattice-matched layers may find application in distributed Bragg reflectors (DBRs) and high electron mobility transistors (HEMTs). However, compared with other semiconducting nitride alloys, In_xAl_1-xN has not been researched extensively. In this study, thin In_xAl_1−xN epilayers were grown by metal-organic vapour phase epitaxy (MOVPE) on GaN and Al_yGa_1−yN layers. Samples were subjected to annealing at their growth temperature of 790 °C for varying lengths of time, or alternatively to a temperature ramp to 1000 °C. Their subsequent surface morphologies were analysed by atomic force microscopy (AFM). For both unstrained In_xAl_1−xN epilayers grown on GaN and compressively strained epilayers grown on Al_yGa_1−yN, surface features and fissures were seen to develop as a consequence of thermal treatment, resulting in surface roughening. It is possible that these features are caused by the loss of In-rich material formed on spinodal decomposition. Additionally, trends seen in the strained In_xAl_1−xN layers may suggest that the presence of biaxial strain stabilises the alloy by suppressing the spinode and shifting it to higher indium compositions.     

Metamorphic InAs(Sb)/InGaAs/InAlAs nanoheterostructures grown on GaAs for efficient mid-IR emitters

High-efficiency semiconductor lasers and light-emitting diodes operating in the 3–5?μm mid-infrared (mid-IR) spectral range are currently of great demand for a wide variety of applications, in particular, gas sensing, noninvasive medical tests, IR spectroscopy etc. III-V compounds with a lattice constant of about 6.1?Å are traditionally used for this spectral range. The attractive idea to fabricate such emitters on GaAs substrates by using In(Ga,Al)As compounds is restricted by either the minimum operating wavelength of ～8?μm in case of pseudomorphic AlGaAs-based quantum cascade lasers or requires utilization of thick metamorphic In_xAl_1-xAs buffer layers (MBLs) playing a key role in reducing the density of threading dislocations (TDs) in an active region, which otherwise result in a strong decay of the quantum efficiency of such mid-IR emitters. In this review we present the results of careful investigations of employing the convex-graded In_xAl_1-xAs MBLs for fabrication by molecular beam epitaxy on GaAs (001) substrates of In(Ga,Al)As heterostructures with a combined type-II/type-I InSb/InAs/InGaAs quantum well (QW) for efficient mid-IR emitters (3–3.6?μm). The issues of strain relaxation, elastic stress balance, efficiency of radiative and non-radiative recombination at T?=?10–300?K are discussed in relation to molecular beam epitaxy (MBE) growth conditions and designs of the structures. A wide complex of techniques including in-situ reflection high-energy electron diffraction, atomic force microscopy (AFM), scanning and transmission electron microscopies, X-ray diffractometry, reciprocal space mapping, selective area electron diffraction, as well as photoluminescence (PL) and Fourier-transformed infrared spectroscopy was used to study in detail structural and optical properties of the metamorphic QW structures. Optimization of the growth conditions (the substrate temperature, the As₄/III ratio) and elastic strain profiles governed by variation of an inverse step in the In content profile between the MBL and the InAlAs virtual substrate results in decrease in the TD density (down to 3?×?10⁷ cm^?2), increase of the thickness of the low-TD-density near-surface MBL region to 250–300?nm, the extremely low surface roughness with the RMS value of 1.6–2.4?nm, measured by AFM, as well as rather high 3.5?μm-PL intensity at temperatures up to 300?K in such structures. The obtained results indicate that the metamorphic InSb/In(Ga,Al)As QW heterostructures of proper design, grown under the optimum MBE conditions, are very promising for fabricating the efficient mid-IR emitters on a GaAs platform.     

Characterization of defects in GaP and GaAsP graded heterojunctions by transmission electron microscopy

Misfit dislocations are observed in graded heterojunctions GaAs_1?xP_x by electron microscopy. Results are in agreement with previous work concerning the nature of the dislocations (Lomer and 60° dislocations) and their density dependence on the phosphorus gradient. The discussion concerns the formation of Lomer dislocations and the possibility of reducing the density of inclined dislocations which reach the surface of the epitaxial layer. GaP substrates, S-doped, are examined by transmission electron microscopy. Numerous defects such as Frank loops, perfect loops, helical dislocations and precipitates are observed. A GaP homoepitaxial layer realized on this substrate is free from these defects but exhibits stacking faults. A zinc diffusion does not produce additional defect but a 1000 Å thick amorphous layer is observed a at the surface.