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1.
通过分析体全息光栅的读取过程,得到光折变晶体CuKNSBN的光电导在入射光强为5×104W/m2时的典型值为σph=3.01×10-10 A·m-2.实验得到光电导与入射光强是指数约为b=0.8的亚线性关系,从而得到满陷阱与空陷阱之密度比的定量表示式为(CCu+/CCu2+)=αIb-1.在观测的波长范围内,b随着波长缩短而增大.  相似文献   

2.
研究了MOCVD方法制备的非故意掺杂n型GaN薄膜的持续光电导现象.实验发现样品的光电导与入射光强有密切的关系,当入射光强由弱到强变化时,样品会依次出现正常持续光电导(PPC)、负光电导(NPC)和负持续光电导(NPPC)现象.据知,这是首次在一个样品中仅仅通过改变入射光强就可以依次产生以上现象的实验报道.通过系统的实验分析和理论研究认为,该现象形成的主要原因是材料中深能级电子陷阱和空穴陷阱共同作用的结果.  相似文献   

3.
研究了MOCVD方法制备的非故意掺杂n型GaN薄膜的持续光电导现象.实验发现样品的光电导与入射光强有密切的关系,当入射光强由弱到强变化时,样品会依次出现正常持续光电导(PPC)、负光电导(NPC)和负持续光电导(NPPC)现象.据知,这是首次在一个样品中仅仅通过改变入射光强就可以依次产生以上现象的实验报道.通过系统的实验分析和理论研究认为,该现象形成的主要原因是材料中深能级电子陷阱和空穴陷阱共同作用的结果.  相似文献   

4.
本文报道了利用超瑞利散射 (HRS)技术研究 7-羟基喹啉 (7HQ)的二阶非线性光学性质。采用波长为 10 6 4 nm、脉冲宽度为 35 ps的激光作激发光 ,观测其超散射光强与入射光强的关系 ,得到 7HQ的一阶超极化率为 3.2× 10 - 2 9esu。  相似文献   

5.
本文介绍了测量叶绿素d染料的各种参数的实验方法和实验结果。进行了下述四方面的研究。 1.叶绿素d可饱和吸收特性的测定。用叶绿素d Q调制的红宝石激光束,脉宽~10ns,光强范围5×10~5~1×10~8W/cm~2,测量激光束进入染料池前后的衰减与入射光强的关系。即染料透过率与入射光强的关系,通过作图求得叶绿素d在浓度为T=40%(透过率)时的饱和光强I_s≈1×10~7W/cm~2。 2.叶绿素d基态粒子恢复时间的测定。用叶绿素d可饱和吸收体锁模的红宝石激光脉冲系列和一个可变光学延迟装置对叶绿素d和隐花青染料的基态粒子恢复时间进行了  相似文献   

6.
用Z扫描技术研究Pd(mpo)2的非线性光学特性   总被引:2,自引:0,他引:2  
赵德林  郭胜利  曹天德 《中国激光》2004,31(12):445-1449
为了研究一种新型功能配合物材料Pd(mpo)2的非线性光学特性,把二甲基甲酰苯胺(DMF)溶剂稀释的Pd(mpo)2溶液(浓度为0.75×10-4mol/L)作为待测样品,采用脉冲宽度为7ns,波长为532nm的激光束,对该样品进行了Z-扫描实验,测量了Pd(mpo)2材料的非线性吸收和非线性折射系数。实验发现,当入射光强很小时,其非线性吸收系数β=(1.916±0.016)cm/Gw,非线性折射系数γ0=-(3.153±0.048)×10-5cm2/Gw,且β和|γ|随入射光强的增大而线性减少。合理地解释了Pd(mpo)2的非线性光学特性产生机理:非线性吸收来自于近共振双光子吸收,而非线性折射是由于近共振双光子吸收造成的折射加强。非线性吸收和非线性折射系数随光强的增大而线性减少是近共振双光子吸收引起粒子数重新布居的结果。  相似文献   

7.
本文阐述不同退火温度下获得的材料电学参数。选择合适的退火温度,可以得到性能优良的电学参数材料。同时较详细地列出了退火后的材料在低温(77K)和室温电阻率变化及光电导样品在低温(77K)和室温电阻值的变化对光电导探测器探测率的影响。电阻率相对变化在10倍左右的材料可以制得性能较好的光电导探测器样品,最高黑体探测率D_(bb)~*=2×10~(10)厘米·赫~(1/2)瓦~(-1)。  相似文献   

8.
利用BSO晶体的电光效应和光电导效应实现了光强的非线性调制,在0~25mW Ar~+激光入射情况下得到了类似于饱和吸收体的非线性透过率。  相似文献   

9.
光控调频效应的实验研究   总被引:4,自引:1,他引:3  
将双基区晶体管与一光电探测器件相结合首次实现了三端负阻器件的光控调频效应。得到每lux光强发迹频率2.0×10^5Hz和每lux光强改变频率2.8×10^5Hz的实验结果。  相似文献   

10.
各种组分的(Hg,Cd)Te灵敏高速光电二极管探测器已制成,用于1~3微米的光谱区。这些探测器工作于室温,量子效率为40~70%,比探测度由1.3微米波长的3×10~(11)厘米·赫~(1/2)/瓦到3微米波长的5×10~9厘米·赫~(1/2)/瓦。冷却光电二极管探测器可改进性能。在77°K下2.2微米波长的比探测度测得为2×10~(12)厘米·赫~(1/2)/瓦,接近背景限。对探测器-前置放大器组件进行了响应时间测量,用的是0.9、1.06及1.54微米的脉冲辐射。响应时间约为10毫微秒,似乎与波长无关,但受RC乘积和放大器频带宽的限制。若光电二极管接一频带很宽的放大器,脉冲响应就被RC之积限制到0.5毫微秒,并测得另一时间常数(约为5毫微秒),据说它是由储存的载流子的渡越时间决定的。  相似文献   

11.
DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.  相似文献   

12.
High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET > PDMAT > TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.  相似文献   

13.
In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal (200) (2d = 0.4027 nm) is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line(w), the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line(x), the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines(y), the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line(z) in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line(q) in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution(λ/△ 2) is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.  相似文献   

14.
From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.  相似文献   

15.
The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.  相似文献   

16.
The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.  相似文献   

17.
Today, micro-system technology and the development of new MEMS (Micro-Electro-Mechanical Systems) are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.  相似文献   

18.
This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel's.  相似文献   

19.
This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.  相似文献   

20.
An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.  相似文献   

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