基于25 nm FinFET结构的SRAM单粒子效应研究

对基于25 nm FinFET结构的SRAM单粒子效应进行研究。使用Synopsys Sentaurus TCAD仿真软件进行器件工艺校准,并对独立3D FinFET器件以及包含FinFET器件和HSpice模型的混合电路(如6管SRAM单元)进行单粒子瞬态仿真。通过改变重粒子入射条件,分析影响瞬态电流峰值、脉宽、漏极翻转阈值等参数的因素。研究发现,混合模型中,FinFET结构器件的漏极翻转阈值为0.023 MeV·cm²/mg,对未来基于FinFET结构的器件及电路结构的加固提出了更高的要求。     

基于TSV转接板的3D SRAM单粒子多位翻转效应

为了研究硅通孔(TSV)转接板及重离子种类和能量对3D静态随机存储器(SRAM)单粒子多位翻转(MBU)效应的影响,建立了基于TSV转接板的2层堆叠3D封装SRAM模型,并选取6组相同线性能量传递(LET)值、不同能量的离子(¹¹B与^4He、²⁸Si与¹⁹F、⁵⁸Ni与²⁷Si、⁸⁶Kr与⁴⁰Ca、¹⁰⁷Ag与⁷⁴Ge、¹⁸¹Ta与¹³²Xe)进行蒙特卡洛仿真。结果表明,对于2层堆叠的TSV 3D封装SRAM,低能离子入射时,在Si路径下,下堆叠层SRAM多位翻转率比上堆叠层高,在TSV(Cu)路径下,下堆叠层SRAM多位翻转率比Si路径下更大;具有相同LET值的高能离子产生的影响较小。相比2D SRAM,在空间辐射环境中使用基于TSV转接板技术的3D封装SRAM时,需要进行更严格的评估。     

Multi-Poisson process analysis of real-time soft-error rate measurements in bulk 65 nm and 40 nm SRAMs

Altitude and underground real-time soft error rate (SER) measurements on SRAM circuits have been analyzed in terms of independent multi-Poisson processes describing the occurrence of single events as a function of bit flip multiplicity. Applied for both neutron-induced and alpha particle-induced SERs, this detailed analysis highlights the respective contributions of atmospheric radiation and alpha contamination to multiple cell upset mechanisms. It also offers a simple way to predict by simulation the radiation response of a given technology for any terrestrial position, as illustrated here for bulk 65 nm and 40 nm SRAMs.     

Virtex FPGA抗单粒子翻转技术

SRAM型FPGA开发过程灵活,在航天领域有广泛的应用,但该系列FPGA易发生单粒子翻转事件,导致功能中断或信息丢失。配置刷新结合三模冗余能有效抑制单粒子翻转带来的影响。在详细讨论了配置刷新+三模冗余的基础上,提出了FPGA自主刷新+三模冗余的解决方案,保证FPGA抗单粒子性能的基础上提高了系统的资源利用率,经注错试验验证了方案可行性。     

CMOS SRAM单粒子翻转效应的解析分析

分析了影响ＣＭＯＳＳＲＡＭ单粒子翻转效应的时间因素,指出不能仅根据临界电荷来判断发生单粒子翻转效应与否,必须考虑器件的恢复时间、反馈时间和电荷收集过程．给出了恢复时间和反馈时间的计算方法,提出了器件抗单粒子翻转的加固措施．对电荷收集过程中截止管漏极电位的变化进行了分析,提出了临界电荷新定义,并给出了判断带电粒子入射能否导致器件发生单粒子翻转效应的方法     

CMOS SRAM单粒子翻转效应的解析分析

分析了影响CMOS SRAM单粒子翻转效应的时间因素,指出不能仅根据临界电荷来判断发生单粒子翻转效应与否,必须考虑器件的恢复时间、反馈时间和电荷收集过程.给出了恢复时间和反馈时间的计算方法,提出了器件抗单粒子翻转的加固措施.对电荷收集过程中截止管漏极电位的变化进行了分析,提出了临界电荷新定义,并给出了判断带电粒子入射能否导致器件发生单粒子翻转效应的方法.     

A 350 mV, 2 MHz, 16-kb SRAM with programmable wordline boosting in the 65 nm CMOS technology

Analog Integrated Circuits and Signal Processing - The paper presents an SRAM macro capable of working down to 350 mV with programmable wordline boosting feature. Wordline boosting allows...     

65 nm体硅工艺NMOS中单粒子多瞬态效应的研究

针对NMOS场效应晶体管由重离子辐射诱导发生的单粒子多瞬态现象,参考65 nm体硅CMOS的单粒子瞬态效应的试验数据,采用TCAD仿真手段,搭建了65 nm体硅NMOS晶体管的TCAD模型,并进一步对无加固结构、保护环结构、保护漏结构以及保护环加保护漏结构的抗单粒子瞬态效应的机理和能力进行仿真分析。结果表明,NMOS器件的源结和保护环结构的抗单粒子多瞬态效应的效果更加明显。     

A new asymmetric 6T SRAM cell with a write assist technique in 65 nm CMOS technology

A new asymmetric 6T-SRAM cell design is presented for low-voltage low-power operation under process variations. The write margin of the proposed cell is improved by the use of a new write-assist technique. Simulation results in 65 nm technology show that the proposed cell achieves the same RSNM as the asymmetric 5T-SRAM cell and 77% higher RSNM than the standard 6T-SRAM cell while it is able to perform write operation without any write assist at V_DD=1 V. Monte Carlo simulations for an 8 Kb SRAM (256×32) array indicate that the scalability of operating supply voltage of the proposed cell can be improved by 10% and 21% compared to asymmetric 5T- and standard 6T-SRAM cells; 21% and 53% lower leakage power consumption, respectively. The proposed 6T-SRAM cell design achieves 9% and 19% lower cell area overhead compared with asymmetric 5T- and standard 6T-SRAM cells, respectively. Considering the area overhead for the write assist, replica column and the replica column driver of 2.6%, the overall area reduction in die area is 6.3% and 16.3% as compared with array designs with asymmetric 5T- and standard 6T-SRAM cells.     

Low cost and highly reliable radiation hardened latch design in 65 nm CMOS technology

As a consequence of technology scaling down, gate capacitances and stored charge in sensitive nodes are decreasing rapidly, which makes CMOS circuits more vulnerable to radiation induced soft errors. In this paper, a low cost and highly reliable radiation hardened latch is proposed using 65 nm CMOS commercial technology. The proposed latch can fully tolerate the single event upset (SEU) when particles strike on any one of its single node. Furthermore, it can efficiently mask the input single event transient (SET). A set of HSPICE post-layout simulations are done to evaluate the proposed latch circuit and previous latch circuits designed in the literatures, and the comparison results among the latches of type 4 show that the proposed latch reduces at least 39% power consumption and 67.6% power delay product. Moreover, the proposed latch has a second lowest area overhead and a comparable ability of the single event multiple upsets (SEMUs) tolerance among the latches of type 4. Finally, the impacts of process, supply voltage and temperature variations on our proposed latch and previous latches are investigated.     

SRAM激光微束单粒子效应实验研究

结合器件版图,通过对2 k SRAM存储单元和外围电路进行单粒子效应激光微束辐照,获得SRAM器件的单粒子翻转敏感区域,测定了不同敏感区域单粒子翻转的激光能量阈值和等效LET阈值,并对SRAM器件的单粒子闭锁敏感度进行测试.结果表明,存储单元中截止N管漏区、截止P管漏区、对应门控管漏区是单粒子翻转的敏感区域;实验中没有测到该器件发生单粒子闭锁现象,表明采用外延工艺以及源漏接触、版图布局调整等设计对器件抗单粒子闭锁加固是十分有效的.     

静态存储器的抗单粒子翻转效应研究

空间环境中存在大量的高能带电粒子,空天导弹自身的电子器件将会受到高能粒子的冲击影响,从而产生单粒子效应。研究分析了静态储存器在空间环境中最常发生的单粒子效应-单粒子翻转,采用修正海明码实现一个检错纠错模块,该模块可以检测数据存储单元的两位错误,检测定位并纠正数据存储单元的一位错误。通过仿真分析及计算,该方案可以很大程度上降低单粒子翻转效应对静态存储器的影响,具有很强的实用意义。     

DSP处理器单粒子翻转率测试系统的研制

航天器及其内部元器件在太空中会受到单粒子效应(SEE)带来的威胁,因此航天用电子器件在装备前必须进行抗SEE能力的测试评估。针对传统测试方法存在的测试系统程序容易在辐照过程崩溃、统计翻转数不准确、单粒子闩锁(SEL)辨别不清晰和忽略内核翻转统计等问题,设计了一种测试系统,通过片外加载与运行程序从而减少因辐照导致片内程序异常的现象;通过片外主控电路统计被测电路翻转数使统计翻转结果准确;通过主控电路控制被测电路时钟供给排除因频率增加导致电流过大而误判发生SEL的情况;通过内核指令集统计内核翻转数。实验结果表明,该测试系统可以实时全面地监测数字信号处理器(DSP)的SEE,并有效防止辐照实验器件(DUT)因SEL而失效。     

Advanced backside failure analysis in 65 nm CMOS technology

Due to reducing size of elementary devices, increasing number of metallization levels and decreasing of power supply voltage, the debug and failure analysis of advanced CMOS designs requires the implementation of specific backside sample preparation methodologies and backside measurement flow.This paper describes the diagnosis and backside failure analysis flow implemented to successfully debug a flip-flop cell designed in 65 nm CMOS technology.     

Etch modeling for model-based optical proximity correction for 65 nm node

With the continuous reduction of layout dimension, critical dimension control becomes more and more tricky. Being one contribution of critical dimension variation, etch bias correction needs to get more accurate. The correction by rule-based optical proximity correction, which only takes into account the distance to the facing outer and inner edges, is reaching its limit at 65 nm node. Indeed, its found to be not accurate enough in some particular configurations.Thus, applying etch correction by model-based optical proximity correction looks like a good solution. The etch bias to correct for can be approximated by a function of the local density, obtained by convoluting the design with Kernels. However, it is found to be still not accurate enough in some configurations if the Kernels used for etch modeling are symmetrical, as for optical part. In this study, several etch models are tested to correct etch bias variations of poly layer patterning for 65 nm node.     

SRAM型FPGA单粒子翻转测试及加固技术研究

SRAM型FPGA空间应用日益增多,只有针对其特点设计相应的单粒子试验的测试程序才能系统、准确地获取该类芯片的单粒子翻转特性,为抗辐射加固设计提供依据.阐述了单粒子翻转的静态和动态的测试方法.静态测试包括硬件设计和配置位回读程序的设计;动态测试主要针对CLB(配置逻辑单元)和BRAM(块存储器)两部分进行了相应的软件测...     

一种65 nm CMOS低功耗加固SRAM单元

提出了12管低功耗SRAM加固单元。基于堆叠结构,大幅度降低电路的泄漏电流,有效降低了电路功耗。基于两个稳定结构,可以有效容忍单粒子翻转引起的软错误。Hspice仿真结果表明,与相关加固结构相比,该结构的功耗平均下降31.09%,HSNM平均上升19.91%,RSNM平均上升97.34%,WSNM平均上升15.37%,全工作状态下均具有较高的静态噪声容限,表现出优秀的稳定性能。虽然面积开销平均增加了9.56%,但是,读时间平均下降14.27%,写时间平均下降18.40%,能够满足高速电子设备的需求。     

面向航空环境的多时钟单粒子翻转故障注入方法

随着新型电子器件越来越多地被机载航电设备所采用,单粒子翻转(Single Event Upset, SEU)故障已经成为影响航空飞行安全的重大隐患。首先,针对由于单粒子翻转故障的随机性,该文对不同时刻发生的单粒子翻转故障引入了多时钟控制,构建了SEU故障注入测试系统。然后模拟真实情况下单粒子效应引发的多时间点故障,研究了单粒子效应对基于FPGA构成的时序电路的影响,并在线统计了被测模块的失效数据和失效率。实验结果表明,对于基于FPGA构建容错电路,采用多时钟沿三模冗余(Triple Modular Redundancy, TMR) 加固技术可比传统TMR技术提高约1.86倍的抗SEU性能;该多时钟SEU故障注入测试系统可以快速、准确、低成本地实现单粒子翻转故障测试,从而验证了SEU加固技术的有效性。     

粒子入射条件对28nm SRAM单元单粒子电荷共享效应影响的TCAD仿真研究

利用器件仿真工具TCAD,建立28 nm体硅工艺器件的三维模型,研究了粒子入射条件和器件间距等因素对28 nm体硅工艺器件单粒子效应电荷共享的影响规律。结果表明,粒子LET值增大、入射角度的增大、器件间距的减小和浅槽隔离(STI)深度的减少都会增加相邻器件的电荷收集,增强电荷共享效应,影响器件敏感节点产生的瞬态电流大小;SRAM单元内不同敏感节点的翻转阈值不同,粒子LET值和入射角度的改变会对SRAM单元的单粒子翻转造成影响;LET值和粒子入射位置变化时,多个SRAM单元发生的单粒子多位翻转的位数和位置也会变化。     

基于定向故障注入的SRAM型FPGA单粒子翻转效应评估方法

介绍了一种基于定向故障注入的SRAM型FPGA单粒子翻转效应评估方法。借助XDL工具,该方法解析了Virtex-4 SX55型FPGA的帧地址与物理资源之间的对应关系;将电路网表中的资源按模块分组,利用部分重构技术分别对电路整体及各分组相关的配置帧进行随机故障注入,以评估电路整体及其子模块的抗单粒子翻转能力;按模块分组对电路分别进行部分三模冗余(TMR)加固和故障注入实验,以比较不同加固方案的效果。实验结果表明:电路的抗单粒子翻转能力与其功能和占用的资源有关;在FPGA资源不足以支持完全TMR的情况下,该方法可以帮助设计者找到关键模块并进行有效的电路加固。