冲击波加载下孔隙率对Pb_(0.99)(Zr_(0.95)Ti_(0.05))_(0.98)Nb_(0.02)O_3铁电陶瓷去极化性能的影响

制备了四种不同孔隙率的Pb0.99(Zr0.95Ti0.05)0.98Nb0.02O3铁电陶瓷,并研究了冲击波作用下孔隙率对陶瓷去极化性能的影响.研究表明:短路负载条件下陶瓷的放电波形不随孔隙的加入而改变,均为方波.多孔陶瓷的放电脉冲幅度较低,脉冲宽度较长.释放的电荷量随着孔隙率的增加而减小,与静态电滞回线测试结果一致.多孔陶瓷具有较低的冲击阻抗,改善了与封装介质的阻抗匹配.用Lysne模型拟合了材料在高电阻负载条件下的放电行为,并指出高电阻负载条件下材料的介电常数是静态介电常数的4—5倍,而且材料的介电常数随孔隙率的增加而减小.冲击波通过样品以后,电路的放电时间常数随着孔隙率的增大而增大.随着电阻的增大,样品负载电压增高,材料铁电-反铁电相变受到抑制,电流上升沿变缓,致密陶瓷出现了击穿现象.     

Pb(Zr0.53Ti0.47)O3/AlxGa1-xN/GaN异质结构的电容-电压特征

通过在调制掺杂Al0.22Ga0.78N/GaN异质结构上淀积Pb(Zr0.53Ti0.47)O3(PZT)铁电薄膜,我们发展了一种基于AlxGa1-xN/GaN异质结构的金属-铁电-半导体(MFS)结构.在高频电容-电压(C-V)特性测量中,发现Al0.22Ga0.78N/GaN异质界面二维电子气(2DEG)的浓度在-10V偏压下从1.56×1013cm-2下降为5.6×1012cm-2.由于PZT薄膜的铁电极化,在-10V偏压下可以观察到宽度为0.2V的铁电C-V窗口,表明在没有铁电极化方向反转的条件下,PZT/AlxGa1-xN/GaN MFS结构也能出现存储特性.因为2DEG带来的各种优点,可以认为AlxGa1-xN/GaN异质结构在以存储器为目标的MFS场效应晶体管中有重要应用.     

微秒脉冲电场下Pb_(0.99)(Zr_(0.95)Ti_(0.05))_(0.98)Nb_(0.02)O_3陶瓷击穿过程电阻变化规律

陶瓷作为应用非常广泛的一种材料,其电击穿问题一直是研究的重点和热点.由于击穿过程涉及热、光、电多场耦合效应,目前还没有一个普适的模型能够解释陶瓷击穿问题.针对此问题进行分析,实验中采用脉冲高压发生装置击穿陶瓷,通过对陶瓷击穿过程中等效电阻的研究,揭示了PZT95/5陶瓷样品体击穿和沿面闪络形成过程的异同.结果显示,在两种击穿模式下,陶瓷样品内部均会在40 ns左右形成导电通道,陶瓷等效电阻急剧下降至10~5?量级;然后体击穿与沿面闪络的导电通道以不同的速率继续扩展;电阻减小速率与导电通道上载流子的浓度有关,二者的等效电阻以不同速率减小,直至导电通道达到稳定.     

溶胶-凝胶法制备Pb(Zr1?xTix)O3复合梯度薄摸以及介电与热释电特性

"在Pt/Ti/SiO2/Si基片上用溶胶-凝胶法生长制备了PZT(Pb(Zr1-xTix)O3)复合梯度铁电薄膜． 薄膜最终结构由6层组成,"向上"梯度薄膜在Pt底电极上的第一层从PbZrO3开始,顶层是PZT(50/50),即第一层是PbZrO3,第二层PZT90/10 (10%Ti),第三层是PZT80/20,第四层PZT70/30,第五层PZT60/40,第六层PZT50/50．每一层与此相反的是"向下"梯度PZT薄膜．用X射线衍射、俄歇电子能谱和阻抗分析来研究梯度薄膜的结构与介电特性．600     

多孔未极化Pb(Zr0.95Ti0.05)O3铁电陶瓷单轴压缩力学响应与相变

通过添加造孔剂的方法制备了四种不同孔隙率未极化PZT95/5铁电陶瓷. 采用非接触式的数字散斑相关性分析(digital image correltation, DIC)全场应变光学测量技术, 对多孔未极化PZT95/5 铁电陶瓷开展了单轴压缩实验研究, 讨论了孔隙率对未极化PZT95/5铁电陶瓷的力学响应与畴变、相变行为的影响. 多孔未极化PZT95/5铁电陶瓷的单轴压缩应力-应变关系呈现出类似于泡沫或蜂窝材料的三阶段变形特征, 其变形机理主要归因于畴变和相变的共同作用, 与微孔洞塌缩过程无关. 多孔未极化PZT95/5铁电陶瓷的弹性模量、压缩强度都随着孔隙率的增加而明显降低, 而孔隙率对断裂应变的影响较小. 预制的微孔洞没有改善未极化PZT95/5铁电陶瓷材料的韧性, 这是因为单轴压缩下未极化PZT95/5铁电陶瓷的断裂机理是轴向劈裂破坏, 微孔洞对劈裂裂纹传播没有起到阻碍和分叉作用. 准静态单轴压缩下多孔未极化PZT95/5铁电陶瓷畴变和相变开始的临界应力都随着孔隙率的增大而呈线性衰减, 但相变开始的临界体积应变却不依赖孔隙率.     

La调节Pb(Zr,Sn,Ti)O_3反铁电陶瓷的相变与电学性质

利用X射线衍射、弱场介电温度谱、强场极化强度研究了不同La含量(Pb1-xLa2x3)(Zr06Sn03Ti01)O3(000≤x≤012)(PLZSnT)陶瓷的相变与电学特性.实验发现,随La含量增大,室温下材料由铁电三方相(x=000)转变为反铁电四方相(003≤x≤009)和立方相(x=012).介电测试表明,La含量增大,反铁电→顺电相变温度降低,峰值介电常量减小.在x=006的PLZSnT三元相图中,反铁电四方相区扩大到Ti含量约为18at%,该系统反铁电陶瓷具有“窄、斜”型双电滞回线和“三电滞回线”;在高Zr、高Sn区,反铁电→顺电相变呈现弥散相变和介电频率色散特征,即反铁电极化弛豫现象.从ABO3钙钛矿结构的容忍因子(t)和反铁电相的结构特征出发,讨论了La对Pb(Zr,Sn,Ti)O3相变与电学性质的影响机理 关键词： 场诱相变 弛豫型反铁电体 介电性能 La调节Pb(Zr Sn Ti)O3     

冲击波作用下Pb(Zr_(0.95)Ti_(0.05))O_3铁电陶瓷去极化后电阻率动态特性

在冲击波压力作用下,极化Pb(Zr_(0.95)Ti_(0.05))O_3(PZT95/5)铁电陶瓷会发生铁电-反铁电相变失去极化,由于冲击波压力高、作用时间短,伴随材料去极化相变出现的瞬态电导特性难以准确测试.本文建立了新的实验方法,采用脉冲电容器作为冲击波加载铁电陶瓷脉冲电源的输出负载,在冲击波压力约3.5 GPa的实验中直接测得铁电陶瓷的漏电流,计算得到PZT95/5铁电陶瓷去极化后的电阻率,变化范围为2.2×10~4—3.5×10~4?·cm;在实验数据的基础上,建立了动态电阻模型,对冲击波传播过程中PZT95/5铁电陶瓷去极化后的电阻率进行了分析,初步揭示了冲击波作用下PZT95/5铁电陶瓷去极化后电阻率的动态特性.     

Pb(Zr,Sn,Ti)O_3反铁电陶瓷场诱相变性能的改进

为了获得场诱反铁电 (AFEt)—铁电 (FER)相变临界电场Ef 小、电滞ΔE小、场致应变x适当的反铁电陶瓷 ,对Pb(Zr ,Sn ,Ti)O3 采用Ba2 置换Pb2 ,同时在四方反铁电相AFEt—三方铁电FER 相界附近调节Ti/Sn比 ,来控制FER AFEt,AFEt 顺电相 (FEC)之间的相变温度TFA,TC,最终实现了对场诱相变参量 (Ef,ΔE)和反铁电工作温区 (ΔT =TC-TFA)的优化与调节 .获得了ΔE =0 85kV/mm ,Ef=1 6kV/mm ,x =0 1% - 0 2 %可用作开关致动器的新型反铁电陶瓷 .借助于X射线衍射、介电温谱、去极化电流谱、电滞回线等手段得到了这一系统AFEt/FER相界附近的温度 Ti含量相图 .     

Pb(Zr,Sn,Ti)O3反铁电陶瓷的低温相变扩散与极化弛豫

用弱场介电温谱、热释电流谱、强场电滞回线和变温X射线衍射谱研究了微量La掺杂Pb(Zr,Sn,Ti)O₃(PZST)反铁电(AFEt)陶瓷在-100—180℃温区内的结构与电学特性.弱场介电温谱显示,AFEt陶瓷在低温段(-100—50℃)呈现介电频率弥散(0.1—100kHz)和扩散型相变的特征,而变温X射线衍射谱却表明材料在这一温区内保持四方相结构;低温下经强场作用后,AFEt被诱导为亚稳三方铁电态,介电频率弥散消失.基于多元复杂化合物的组分起伏理论,讨论了PZST AFEt陶瓷 关键词： Pb(Zr Sn 3反铁电陶瓷')" href="#">Ti)O₃反铁电陶瓷 反铁电弛豫 相变 变温X射线衍射     

La,V共掺杂的Bi_4Ti_3O_(12)铁电薄膜的溶胶-凝胶法制备及性能测试

采用溶胶-凝胶(sol-gel)工艺在Pt/TiO2/SiO2/p-Si(100)衬底上制备出Bi4Ti3O12(BIT)和Bi3.25La0.75Ti2.97V0.03O12(BLTV)铁电薄膜,研究了La,V共掺杂对BIT薄膜的晶体结构和电学性能的影响.BIT薄膜为c轴择优取向,BLTV薄膜为随机取向,拉曼光谱分析表明V掺杂降低了TiO6(或VO6)八面体的对称性,也增强了Ti—O键(或V—O键)杂化.BLTV薄膜的剩余极化Pr为25.4μC/cm2,远大于BIT薄膜的9.2μC/cm2,表现出良好的铁电性能.疲劳、漏电流测试显示BLTV薄膜具有优良的抗疲劳特性和漏电流特性,表明La,V共掺杂能有效地降低薄膜中的氧空位.     

Modification of ferroelectric hysteresis in Pb(Nb,Zr,Ti)O3 thin films induced by CO2 adsorption

We report on the modification of ferroelectric hysteresis in Pb(Nb,Zr,Ti)O₃ thin films under the adsorption of CO₂ gas. The samples were exposed to the gas in ultra high vacuum while different voltages between the top (Ag) and bottom (Pt) electrodes were applied. After dosing, the samples were heated from room temperature at 1.8 K/s, and a mass spectrometer was used to detect the desorbed molecules. The effective molecular sticking was demonstrated by the appearance of the carbon Auger peak in the surface of the sample and by the presence of CO₂ in the desorption curves. After +(−) 9.9 V were applied to the bottom electrode during dosing, we found a shift of −0.52 (+0.58) μC/cm² in the remnant polarization. These evidences suggest the existence of a depolarizing field induced by molecular adsorption at the surface of the top electrode, and contribute to highlight the potential use of ferroelectric thin films as gas sensors.     

Pb(Zr0.53Ti0.47)O3 thin films with different thicknesses obtained at low temperature by microwave irradiation

Pb(Zr_0.53Ti_0.47)O₃ (PZT) thin films with different thicknesses (99-420 nm) were prepared on Pt(1 1 1)/Ti/SiO₂/Si(1 0 0) substrates by sol-gel method and films were annealed at 450 °C for 30 min using a single-mode cavity of 2.45 GHz microwaves. X-ray diffraction analysis indicated that the pyrochlore phase was transformed to the perovskite phase at above 166 nm films. The grain sizes were increased, surface roughnesses were decreased, and electrical properties were improved with film thickness. The leakage current density was 9 × 10⁻⁸ A/cm² at an applied electrical field of 100 kV/cm. The ohmic and field-enhanced Schottky emission mechanisms were used to explain leakage current behavior of the PZT thin films. These results suggest that microwave annealing is effective for obtaining low temperature crystallization of thin films with better properties.     

A comparative study of fibre-textured and epitaxial Nb-doped Pb(Zr0.53Ti0.47)O3 thin films on different substrates

Fibre-textured and epitaxial Nb-doped Pb(Zr_0.53Ti_0.47)O₃ (PNZT) thin films were grown on the different substrates by a sol-gel process. The [1 0 0]- and [1 1 1]-fibre-textured polycrystalline PNZT films were obtained on platinized silicon substrates by introducing PbO and TiO₂ seeding layers, while the [0 0 1]- and [1 1 1]-oriented epitaxial PNZT films were formed directly on Nb-doped SrTiO₃ (Nb:STO) single-crystal substrates with (1 0 0) and (1 1 1) surfaces, respectively. The preferential orientation and phase structure of the fibre-textured and epitaxial PNZT films, as well as their influences on the electrical properties were investigated. Higher remnant polarization (P_r) and piezoelectric coefficient (d₃₃) were obtained for the epitaxial PNZT films on Nb:STO substrates than that for the fibre-textured ones on platinized silicon substrates. For both fibre-textured and epitaxial cases, the PNZT films with [1 0 0]/[0 0 1] orientations show higher piezoelectric responses than [1 1 1]-oriented ones, whereas better ferroelectric properties can be obtained in the latter. The intrinsic and extrinsic contributions were discussed to explain the difference in electrical properties for differently oriented fibre-textured and epitaxial PNZT films on different substrates.     

铌镁酸铅-钛酸铅铁电阴极电子发射特性

研究了铌镁酸铅-钛酸铅铁电材料的铁电、介电性能对阴极发射阈值电压的影响, 以及铁电阴极发射电流与激励脉冲电压和抽取电压之间的关系, 并分析了其发射机理. 结果表明, 室温介电常数高、极化强度变化量大的弛豫铁电体0.9Pb(Mg_1/3Nb_2/3)O₃-0.1PbTiO₃具有较小的发射阈值电压; 铁电阴极电子发射与快极化反转和等离子体的形成有关; 由极化反转所致电子发射的自发射电流随激励脉冲电压的增大呈幂律增长关系, 其发射电流开始于激励脉冲电压的下降沿; 在抽取电压较大时, 发射电流随抽取电压的增大呈线性增长关系, 说明大电流主要取决于抽取电压; 其发射电流开始于激励脉冲电压的上升沿, 与“三介点”处的场增强效应和等离子体的形成有关; 当抽取电压为2500 V 时, 得到的发射电流幅值为210 A, 相应的电流密度为447 A/cm².     

Pb(Zr_(0.4)Ti_(0.6))O_3电子结构的第一性原理研究

采用基于密度泛函理论的赝势平面波方法计算了Pb(Zr0.4Ti0.6)O3五层超晶胞的顺电相和铁电相的电子结构.由态密度、电子密度和能带结构的计算结果发现顺电相下钛氧八面体Ti-O6和锆氧八面体Zr-O6在铁电相中分裂为由1个O1离子和4个O2离子组成的金字塔结构Ti-O5和Zr-O5;与顺电相相比,铁电相中钛离子的3d电子和氧离子的2p电子存在更强的轨道杂化,这种杂化降低了离子间的短程排斥力,使得具有铁电性的四方结构更为稳定,而且钛离子与氧离子的相互作用对于铁电相Pb(Zr0.4Ti0.6)O3沿c轴自发极化的贡献大于锆离子与氧离子的相互作用;由电子密度的分布可推断立方结构的Pb-O键呈现离子键特征,而铁电相下Pb-O键则有较大的共价成分,铅离子与氧离子的这种轨道杂化对Pb(Zr0.4Ti0.6)O3的铁电性起重要作用.所得结果对深入理解Pb(Zr0.4Ti0.6)O3铁电性的微观机理具有参考价值.     

Structure evolution and stoichiometry control of Pb(Zr, Ti)O3 thick films fabricated by electrospray assisted vapour deposition

Well-crystallized and stoichiometric Pb(Zr, Ti)O₃ (PZT) films, typically ∼5 μm thick, with pure perovskite-type rhombohedral structures have been successfully prepared via an electrospray assisted vapour deposition (ESAVD) method. Control of the deposition temperature within a narrow range of 300-400 °C resulted in films with the most desirable phases. PZT films with close stoichiometric match with the expected composition ratio and uniform element distribution were obtained by adding the appropriate levels of excess Pb in the precursor solutions. The annealed films were uniform, dense, compact and adherent to the substrates. The dielectric constant, ?_r, and loss tangent, tan δ, of the fabricated PZT films measured at 10 kHz were 442 and 0.09, respectively. The ESAVD deposited PZT films showed a remanent polarization, P_r, of 15.3 μC/cm² and coercive field, E_c, of 86.7 kV/cm. These results demonstrate the clear potential of the ESAVD method as a promising technique for the fabrication of thick PZT films.     

Controllable microstructures and multiferroic properties of Pb(Zr0.53Ti0.47)O3-CoFe2O4 composite films

1-3 and 2-2 types Pb(Zr_0.53Ti_0.47)O₃-CoFe₂O₄ (PZT-CFO) composite films with controllable microstructures, consisted by CFO nanopillar embedded in PZT matrix and PZT-CFO gratings respectively, have been fabricated on Pt/Ti/SiO₂/Si substrates by combining lithography technology and pulsed laser deposition. X-ray diffraction confirms that the films are well crystallized under optimized postannealing conditions. Scanning electron microscope reveals that the periodic microstructures can be well controlled. Especially, intrinsic room temperature ferroelectric and ferrimagnetic behaviors are observed simultaneously. The structure-properties relationship is discussed. Our results may provide an alternative method to design and prepare multiferroic composite films with controllable microstructures.     

不同衬底上Pb(Zr0.52Ti0.48)O3择优取向铁电薄膜的制备和研究

通过MOD法在Si(100)和Pt(111)/Ti/SiO₂/Si基片上制备出LaNiO₃ ( LNO)薄膜.再通过修 正的Sol-gel法，在Pt(111)/Ti/SiO₂/Si,LNO/Si(100)和LNO/Pt/Ti/SiO_{2< /sub>/Si三种衬底上 制备出具有择优取向的Pb(Zr0.52Ti0.48)O3铁电薄膜. 经XRD分析表明，L NO薄膜具有(100)择优取向的类钙钛矿结构；PZT薄膜均具有钙钛矿结构，且在Pt(111)/Ti/S iO2/Si衬底上的薄膜以(110)择优取向，在LNO/Pt/Ti/SiO2/Si和LN O/Si(100)衬底上的 薄膜以(100)择优取向.经场发射SEM分析和介电、铁电性能测试表明，在LNO/Si和LNO/Pt/Ti /SiO2/Si衬底上的PZT薄膜的平均粒径、介电常数以及剩余极化强度均比以Pt/T i/SiO2/Si为衬底的薄膜大. 关键词： 3}薄膜')" href="#">LaNiO₃薄膜 PZT铁电薄膜 择优取向 剩余极化强度