Roll‐to‐roll manufacturing of electronics on flexible substrates using self‐aligned imprint lithography (SAIL)

Abstract— The manufacture of large‐area arrays of thin‐film transistors on polymer substrates using roll‐to‐roll (R2R) processes exclusively is being developed. Self‐aligned imprint lithography (SAIL) enables the patterning and alignment of submicron‐sized features on meter‐scaled flexible substrates in the R2R environment. SAIL solves the problem of precision interlayer registry on a moving web by encoding all the geometry information required for the entire patterning steps into a monolithic three‐dimensional imprint with discrete thickness modulation. The pre‐aligned multiple‐step mask structure maintains its alignment regardless of subsequent substrate distortion. Challenges are encountered in relation to the novel nature of using flexible substrates and building toolsets for the R2R processing. In this paper, methods of the SAIL process, the resulting active‐matrix backplanes, the trajectory of SAIL process development, and the remaining issues for production are presented.     

Flexible hybrid substrates of roll‐to‐roll manufacturing for flexible display application

A flexible hybrid substrate was developed and demonstrated for roll‐to‐roll (R2R) manufacturing. Layer‐by‐layer misalignment can be well controlled within 5 µm. Top‐gate amorphous InGaZnO thin‐film transistor was fabricated on the flexible hybrid substrate by R2R process for the first time. A 4.3‐in. segment‐type reflective Electro‐Phoretic Display (EPD) display was also demonstrated to show the R2R capability of flexible substrates.     

Development of rollable silicon thin‐film‐transistor backplanes utilizing a roll‐to‐roll continuous lamination process

Abstract— Rollable silicon thin‐film‐transistor (TFT) backplanes utilizing a roll‐to‐roll process have been developed. The roll‐to‐roll TFT‐backplane technology is characterized by a glass‐etching TFT transfer process and a roll‐to‐roll continuous lamination process. The transfer process includes high‐rate, uniform glass‐etching to transfer TFT arrays fabricated on a glass substrate to a flexible plastic film. In the roll‐to‐roll process, thinned TFT‐glass sheets (0.1 mm) and a base‐film roll are continuously laminated using a permanent adhesive. Choosing both an appropriate elastic modulus for the adhesive and an appropriate tension strength to be used in the process is the key to suppressing deformation of the TFT‐backplane rolls caused by thermal stress. TFT backplanes that can be wound, without any major physical damage such as cracking, on a roll whose core diameter is approximately 300 mm have been sucessfully obtained. Incorporating the TFT‐backplane rolls into other roll components, such as color‐filter rolls, will make it possible to produce TFT‐LCDs in a fully roll‐to‐roll manufacturing process.     

Roll‐to‐roll manufacturing considerations for flexible,cholesteric liquid‐crystal display (Ch‐LCD) media

Abstract— Roll‐to‐roll methods and equipment to manufacture a bistable, passively driven display media on a flexible substrate have been developed. Using continuous coating techniques and equipment, cholesteric liquid‐crystal droplets in a gelatin binder and a dark layer are simultaneously coated onto laser‐etched‐patterned transparent ITO conductors on a polymeric web. Second conductors are printed with a UV‐curable polymer thick‐film ink over the active display layers, followed by slitting and chopping to complete the manufacture of display media in a full roll‐to‐roll mode. Segmented‐ and matrix‐display media can be generated using these techniques. This paper will focus on the manufacturing considerations for producing matrix‐display media.     

Optical design and roll‐to‐roll fabrication process of microstructure film for wide viewing LCDs

We have developed a new microstructure film for wide viewing liquid crystal displays (LCDs). By attaching it to the surface of a conventional LCD, the viewing angle characteristics of LCD has drastically improved without causing a blur of the frontal image and a decrease in the contrast ratio under bright ambient light conditions. This film can be applied to various LC modes including twisted nematic and multidomain vertical alignment by changing its internal micrometer‐size 3D structure. Further, this film can be mass‐produced efficiently by self alignment roll‐to‐roll process.     

Optical filters for plasma‐display panels using organic dyes and conductive mesh layers by using a roll‐to‐roll etching process

Abstract— Optical filters with a high shielding capability against electromagnetic (EM) radiation for plasma‐display panels (PDPs) have been studied. We developed optical filters with high conductivity by utilizing a copper‐mesh layer, which was processed by using roll‐to‐roll photolithography and roll‐to‐roll etching. The copper‐mesh layer has a cross‐striped pattern with a surface resistance of 0.05Ω/□ and an opening ratio of approximately 93%. In combination with the copper‐mesh layer, organic dyes were applied to reduce the PDPs unfavorable emissions, such as near‐infrared light, and to control the transmission properties to improve the PDPs picture quality.     

Manufacture of organic transistors on large‐area flexible substrate using direct imaging exposure system by wet process suitable for roll‐to‐roll production

Organic thin‐film transistors (OTFTs) can be fabricated via a wet process and have exceptionally high flexibility. Therefore, production using the roll‐to‐roll (RtoR) method is expected. We succeeded in developing a new OTFT wet fabrication process adaptable to the RtoR process. Utilizing the electroless plating method for wiring formation, all materials can be formed in a wet process and can be patterned using the photolithography process. In addition, we succeeded in fabricating OTFT on an A4‐type flexible substrate using RtoR direct imaging exposure system.     

Recursive Bayesian state estimation method for run‐to‐run control in high‐mixed semiconductor manufacturing process

One of the challenges in semiconductor manufacturing processes is the state estimation of a high‐mix production system. The traditional algorithm consists of constructing a context matrix based on the product fabricating thread. The state of the context matrix is estimated using the Moore‐Penrose pseudo‐inverse method. Although the method works well, the context matrix is often singular. Taking an integrated moving average disturbance into consideration, a novel state estimation method is proposed in a high‐mix manufacturing scenario. Furthermore, the recursive Bayesian estimation is presented to obtain the estimations of states combined with a moving window and an analysis of variance model. As a result, the calculation of the inverse of the context matrix is avoided and the unobservability problem is addressed. Both simulated and industrial cases are presented to demonstrate the effectiveness of the proposed algorithm.