拓扑绝缘体薄膜生长与栅电压调控输运特性研究

文章讨论了三维拓扑绝缘体制备和输运性质研究方面的进展情况.首先介绍了拓扑绝缘体体材料和薄膜的制备,并介绍了文章作者利用分子束外延方法,在硅表面以及高介电常数材料钛酸锶表面生长高质量拓扑绝缘体Bi2Se3薄膜的工作.然后介绍了拓扑绝缘体输运研究的现状,以及文章作者在栅电压调控拓扑绝缘体外延薄膜的化学势和输运性质方面的研究成果.     

《自然·物理》报道拓扑绝缘体/高温超导体近邻效应研究最新成果

清华大学物理系周树云研究组、陈曦/薛其坤研究组和清华大学高等研究院姚宏研究员,最近在拓扑绝缘体和高温超导体异质界面的超导近邻效应研究中取得重要进展.他们首次利用分子束外延（MBE）在高温超导体Bi2Sr2CaCu2O8＋d（BSCCO）上制备出高质量Bi2Se3拓扑绝缘体薄膜,     

Bi(110)薄膜在NbSe_2衬底上的扫描隧道显微镜研究

二维拓扑绝缘体因其特殊的能带结构带来的新奇物理性质,成为近年来凝聚态物理的研究热点.尤其是在引入超导电性之后,二维拓扑绝缘体中可能存在马约拉纳费米子(Majorana fermion),因此在量子计算方面具有重大应用前景.在Bi(111)薄膜被证实为二维拓扑绝缘体之后, Bi(110)薄膜引起了广泛关注,然而其拓扑性质还存在争议.本文利用分子束外延技术在室温低生长速率环境下成功制备出了高质量的单晶Bi(110)薄膜.通过扫描隧道显微镜测量发现,薄膜以约8个原子层厚度为分界,从双层生长转变为单层生长模式.结合隧道谱测量发现,在NbSe_2衬底上生长的Bi(110)薄膜因为近邻效应而具有明显的超导性质,但并未显示出拓扑边缘态的存在.此外,对薄膜中特殊的量子阱态现象也进行了讨论.     

磁性拓扑绝缘体中的量子化反常霍尔效应——无需外磁场的量子化霍尔效应

文章从平常霍尔效应出发,介绍了反常霍尔效应及其内秉物理机制,并在此基础上介绍了其量子化版本——量子化反常霍尔效应.然后从拓扑有序态的角度,重点讨论了量子化反常霍尔效应与量子霍尔效应、量子自旋霍尔效应、拓扑绝缘体等之间的区别与内在联系.最后介绍了通过在拓扑绝缘体(Bi2Se3,Bi2Te3和Sb2Te3)薄膜中掺杂过渡金属元素(Cr或Fe)实现量子化反常霍尔效应的方法.     

在预刻蚀的衬底上通过分子束外延直接生长出拓扑绝缘体薄膜的微器件

在利用光刻将拓扑绝缘体外延薄膜加工成微米尺寸结构的过程中,所用的各种化学物质会导致薄膜质量的下降.在实验中,通过在钛酸锶衬底上预先光刻出Hall bar形状的凸平台并以此为模板进行拓扑绝缘体(Bi x Sb1-x)2Te3薄膜的分子束外延生长,直接获得了薄膜的Hall bar微器件,从而避免了光刻过程对材料质量的影响.原子力显微镜和输运测量结果均显示该微器件保持了(Bi x Sb1-x)2Te3外延薄膜原有的性质.这种新的微器件制备方法有助于在拓扑绝缘体中实现各种新奇的量子效应,并可推广于其他外延生长的低维系统.     

拓扑绝缘体Bi_2Se_3中层堆垛效应的第一性原理研究

运用第一性原理方法,研究了拓扑绝缘体Bi_2Se_3块体和薄膜中的层堆垛对其结构、电子态、拓扑态和自旋劈裂的影响.发现不同的堆垛会引起Bi_2Se_3层间的相互作用,改变系统的中心对称性.块体的ABC和AAA堆垛都具有中心对称性和相似的能带结构.ABA堆垛破坏了体系的中心对称性,能带发生很大改变,并且产生了很大的能带自旋劈裂.用能带反转的方法判定体系的拓扑相,在不同堆垛的Bi_2Se_3块体中,考虑自旋轨道耦合时都发生了能带反转,因而具有不同堆垛的Bi2Se3仍是拓扑绝缘体.进一步研究了Bi_2Se_3薄膜中的堆垛效应,发现非中心对称的ABA堆垛在Bi_2Se_3薄膜中引起明显的自旋劈裂,并且提出和验证了用应变调控自旋劈裂的方法.     

单轴压力下Ge2X2Te5(X=Sb,Bi)薄膜拓扑相变的第一性原理研究

随着拓扑绝缘体的发现, 材料拓扑物性的研究成为凝聚态物理研究的热点领域. 本文基于第一性原理计算, 研究了化合物Ge₂X₂Te₅ (X=Sb, Bi) 的块体结构和二维单层和双层薄膜结构的拓扑物性, 以及单双层薄膜在垂直方向单轴压力下的拓扑量子相变. 研究发现, A型原子序列排列的这两种化合物都是拓扑绝缘体, 其单层薄膜都是普通金属, 而双层薄膜都是拓扑金属, 单层和双层薄膜在单轴加压过程中都没有发生拓扑量子相变; 这两种化合物的B型原子序列的晶体是普通绝缘体, 其所对应的薄膜, Ge₂Sb₂Te₅单层是普通金属, 双层薄膜和Ge₂Bi₂Te₅的单层和双层薄膜均为普通绝缘体, 但是在单轴加压过程中B 型原子序列所对应的单层和双层薄膜都转变为拓扑金属.     

拓扑绝缘体/超导体异质结中的近邻效应

拓扑超导体自身具有对量子退相干天然的免疫性以及可编织性,这使得它在现代量子计算领域中受到了越来越多的重视,并且成为了下一代计算技术中最有希望的候选者之一。由于拓扑超导态在固有拓扑超导体中相当罕见,因此,当前大部分实验上的工作主要集中在由 s 波超导体与拓扑绝缘体之间通过近邻效应所诱导的拓扑超导体上。本论文中,我们回顾了基于拓扑绝缘体/超导体异质结的拓扑超导体的研究进展。在理论上,Fu 和 Kane 提出,通过近邻效应将 s 波超导体的能隙引入到拓扑绝缘体,可以诱导出拓扑超导电性。在实验上,我们也回顾了一些不同体系中的拓扑超导近邻效应的研究进展。文章的第一部分,我们介绍了一些异质结,包括：三维拓扑绝缘体 Bi2Se3和 Bi2Se3 与 s 波超导体NbSe2 以及 d 波超导体 Bi2Sr2CaCu2O8+δ 的异质结,拓扑绝缘体 Sn1−xPbxTe 与 Pb 的异质结,二维拓扑绝缘体 WTe2 与NbSe2 的异质结。此外,还介绍了 TiBiSe2 在 Pb 上的拓扑绝缘近邻效应。另一部分中,我们对基于拓扑绝缘体的约瑟夫森结进行了回顾,包括著名的基于 Fu-Kane 体系的拓扑绝缘体约瑟夫森结,以及基于约瑟夫森结的超导量子干涉器件。     

椭偏法测量拓扑绝缘体的复折射率

采用椭偏法测量了拓扑绝缘体Bi2Te3单晶的复折射率.运用经典的德鲁德和托克-洛伦兹模型分别对拓扑绝缘体的表面态和体态进行拟合,获得了其折射率和消光系数,并且分析了色散曲线的变化规律.实验结果表明:Bi2Te3拓扑绝缘体的体态具有类半导体特性(含带隙),折射率在近红外波段可达7以上;表面态具有类金属特性,厚度约为2.52nm.     

二维层状拓扑绝缘体材料的螺旋生长机理

<正>最近,中国科学技术大学微尺度物质科学国家实验室和化学与材料科学学院教授曾杰研究组在拓扑绝缘体二维层状纳米材料Bi2Se3的结构设计、合成与生长机理研究方面取得新进展。研究人员对Bi2Se3晶体的成核及生长进行了动力学调控,通过引入螺旋位错首次实现了二维层状材料的螺旋生长,将材料由分立的层状转变成连续性的螺旋条带,从而获得了一     

Robust surface state of intrinsic topological insulator Bi2Te2Se thin films: a first-principles study

Bi(2)Te(2)Se, a ternary tetradymite compound, has recently been identified to be a three-dimensional topological insulator. In this paper, we theoretically study the electronic structures of bulk and thin films of Bi(2)Te(2)Se employing spin-orbit coupling (SOC) self-consistently with density-functional theory. It is found that SOC plays an important role in determining the electronic properties of Bi(2)Te(2)Se. A finite bandgap opens up in the surface states of Bi(2)Te(2)Se thin films due to the hybridization of the top and bottom surface states of films. The intrinsic Bi(2)Te(2)Se thin films of three or more quintuple layers exhibit a robust topological nature of electronic structure with the Fermi energy intersecting the Dirac cone of the surface states only once between time-reversal-invariant momenta. These characteristics of Bi(2)Te(2)Se are similar to the topological behavior of Bi(2)Te(3), promising a variety of potential applications in nanoelectronics and spintronics.     

Ferromagnetism on a paramagnetic host background in cobalt-doped Bi_2Se_3 topological insulator

Cobalt-doped Bi2Se3topological insulators have been grown though melt-grown reaction. The Bi2Se3matrix is diamagnetic and doped sample is a superposition of ferromagnetism(FM) and paramagnetism(PM) behavior at low temperature. The values of MSmol, Hc, and Mr increase as the Co concentration increases. Two possible explanations have been proposed for the origin of ferromagnetism in Co-doped Bi2Se3. One is the magnetic ordering from nanoclusters of Co–Se compound in the crystals, and the other is Ruderman–Kittel–Kasuya–Yosida(RKKY) interaction between magnetic impurities.     

Preparation and Characterization of SnS:Bi Thin Films

Thin films based on Sn-S compounds are currently of great interest because of their potential applications in optoelectronic devices including solar cells. In this work, SnS:Bi thin films are prepared using a novel procedure based on sulfurization of their metallic precursors, varying the Bi content. The effect of the synthesis conditions on the optical properties, phase, and chemical composition of the SnS:Bi thin films was studied through spectral transmittance, X-ray diffraction, and X-ray photoelectron spectroscopy. It was established from transmittance measurements that the optical gap of the deposited films varies between 1.27 and 1.37 eV depending on the Bi content. The analysis revealed that the SnS:Bi thin films grow with a mixture of several phases which include SnS, Sn₂S₃ SnS₂, and Bi₂S₃, depending on the Bi concentration. The studies also revealed that the conductivity type of the SnS:Bi films depends on the Bi content in the SnS lattice.     

Spin polarization and transport of surface states in the topological insulators Bi2Se3 and Bi2Te3 from first principles

We investigate the band dispersion and the spin texture of topologically protected surface states in the bulk topological insulators Bi2Se3 and Bi2Te3 by first-principles methods. Strong spin-orbit entanglement in these materials reduces the spin polarization of the surface states to ～50% in both cases; this reduction is absent in simple models but of important implications to essentially any spintronic application. We propose a way of controlling the magnitude of spin polarization associated with a charge current in thin films of topological insulators by means of an external electric field. The proposed dual-gate device configuration provides new possibilities for electrical control of spin.     

Robustness of topologically protected surface states in layering of Bi2Te3 thin films

Bulk Bi2Te3 is known to be a topological insulator. We investigate surface states of Bi2Te3(111) thin films of one to six quintuple layers using density-functional theory including spin-orbit coupling. We construct a method to identify topologically protected surface states of thin film topological insulators. Applying this method to Bi2Te3 thin films, we find that the topological nature of the surface states remains robust with the film thickness and that the films of three or more quintuple layers have topologically nontrivial surface states, which agrees with experiments.     

Terahertz response and colossal Kerr rotation from the surface states of the topological insulator Bi2Se3

We report the THz response of thin films of the topological insulator Bi2Se3. At low frequencies, transport is essentially thickness independent showing the dominant contribution of the surface electrons. Despite their extended exposure to ambient conditions, these surfaces exhibit robust properties including narrow, almost thickness-independent Drude peaks, and an unprecedentedly large polarization rotation of linearly polarized light reflected in an applied magnetic field. This Kerr rotation can be as large as 65° and can be explained by a cyclotron resonance effect of the surface states.     

Electrically Tunable Wafer-Sized Three-Dimensional Topological Insulator Thin Films Grown by Magnetron Sputtering

Three-dimensional(3 D) topological insulators(TIs) are candidate materials for various electronic and spintronic devices due to their strong spin-orbit coupling and unique surface electronic structure.Rapid,low-cost preparation of large-area TI thin films compatible with conventional semiconductor technology is the key to the practical applications of TIs.Here we show that wafer-sized Bi_2 Te_3 family TI and magnetic TI films with decent quality and well-controlled composition and properties can be prepared on amorphous SiO_2/Si substrates by magnetron cosputtering.The SiO_2/Si substrates enable us to electrically tune(Bi_(1-x)Sb_x)_2 Te_3 and Cr-doped(Bi_(1-x)Sb_x)_2 Te_3 TI films between p-type and n-type behavior and thus study the phenomena associated with topological surface states,such as the quantum anomalous Hall effect(QAHE).This work significantly facilitates the fabrication of TI-based devices for electronic and spintronic applications.     

Improved photovoltaic effects in Mn-doped BiFeO_3 ferroelectric thin films through band gap engineering

As a low-bandgap ferroelectric material, BiFeO_3 has gained wide attention for the potential photovoltaic applications,since its photovoltaic effect in visible light range was reported in 2009. In the present work, Bi(Fe, Mn)O_3thin films are fabricated by pulsed laser deposition method, and the effects of Mn doping on the microstructure, optical, leakage,ferroelectric and photovoltaic characteristics of Bi(Fe, Mn)O_3 thin films are systematically investigated. The x-ray diffraction data indicate that Bi(Fe, Mn)O_3 thin films each have a rhombohedrally distorted perovskite structure. From the light absorption results, it follows that the band gap of Bi(Fe, Mn)O_3 thin films can be tuned by doping different amounts of Mn content. More importantly, photovoltaic measurement demonstrates that the short-circuit photocurrent density and the open-circuit voltage can both be remarkably improved through doping an appropriate amount of Mn content, leading to the fascinating fact that the maximum power output of ITO/BiFe_(0.7)Mn_(0.3)O_3/Nb-STO capacitor is about 175 times higher than that of ITO/BiFeO_3/Nb-STO capacitor. The improvement of photovoltaic response in Bi(Fe, Mn)O_3 thin film can be reasonably explained as being due to absorbing more visible light through bandgap engineering and maintaining the ferroelectric property at the same time.