YBCO薄膜热稳定性和微结构的关系研究

我们已报道过YBa2Cu3O7-δ(YBCO)的过热现象并且对其过热的机制进行了研究[1～2] .在本文的工作中,主要研究了YBCO薄膜的微结构对于其过热行为的影响.通过高温金相显微镜对具有不同微结构的YBCO薄膜的不同的熔化行为进行了实时观测,并且用原子力显微镜(AFM)和X射线衍射仪(XRD)对这些具有不同品质的薄膜进行表征.结果表明, YBCO薄膜的微结构对于其过热度以及整个薄膜熔化的过程有很大的影响,高品质的薄膜具有低界面缺陷比率,由此导致了其在熔化过程中较高的过热度.本文同时在实时观测,AFM和XRD所得到实验结果的基础上,通过半共格界面能的理论很好的解释了YBCO薄膜在不同的微结构情况下体现出来熔化和过热行为的差异.     

YBCO薄膜热稳定性和微结构的关系研究

我们已报道过YBa2Cu3O7-δ（YBCO）的过热现象并且对其过热的机制进行了研究．在本文的工作中，主要研究了YBCO薄膜的微结构对于其过热行为的影响．通过高温金相显微镜对具有不同微结构的YB（的薄膜的不同的熔化行为进行了实时观测，并且用原子力显微镜（AFM）和X射线衍射仪（XRD）对这些具有不同品质的薄膜进行表征．结果表明，YBCO薄膜的微结构对于其过热度以及整个薄膜熔化的过程有很大的影响，高品质的薄膜具有低界面缺陷比率，由此导致了其在熔化过程中较高的过热度．本文同时在实时观测，AFM和XRD所得到实验结果的基础上，通过半共格界面能的理论很好的解释了YBCO薄膜在不同的微结构情况下体现出来熔化和过热行为的差异．     

插入二氧化铈薄膜提高MOD-YBa2Cu3O7-x厚膜超导性能的研究

YBa₂Cu₃O_7-x(YBCO)膜存在“厚度效应”: 随着厚度增加, YBCO薄膜的临界电流密度下降, 尤其是YBCO薄膜的厚度超过1 μm时, 它的临界电流密度急剧下降. 本文在YBCO薄膜之间引入极薄的二氧化铈(CeO₂)薄膜, 成功制备出结构为YBCO/YBCO/CeO₂/YBCO的超导厚膜. 所制备的厚度为2 μm的YBCO膜临界电流密度为1.36 MA/cm² (77 K, 自场), 其性能比相同厚度的纯YBCO膜有了较大幅度的提升. 研究表明CeO₂薄膜起到了传递织构、松弛应力的作用.     

面内和面外取向对RBa_2Cu_3O_z薄膜热稳定性影响的研究

采用高温金相显微镜,实时观察RBa2Cu3Oz(RBCO,R代表稀土元素)薄膜的熔化过程.结合X射线衍射(XRD)极图的分析,对不同面内取向和面外取向的RBCO薄膜熔化行为进行横向比较,研究了RBCO微结构对于其热稳定性的影响,并用半共格界面能理论很好地解释了XRD分析和实时观察熔化过程的实验结果.对不同面内取向YBa2Cu3Oz(YBCO)薄膜的研究结果表明,空气中0°晶粒的热稳定性优于45°晶粒;此外还研究了c轴取向的SmBa2Cu3Oz(SmBCO)薄膜的热稳定性,结果表明微量a轴晶粒对SmBCO薄膜的熔化行为以及其热稳定性有明显影响.     

掺杂Y2O3和BaCeO3提高MOD-YBCO超导性能的研究

本文通过在前驱液中添加过量钇盐和铈的有机盐,采用三氟乙酸盐-金属有机沉积法(TFA-MOD) 在铝酸镧单晶基体上制备了含有纳米氧化钇和纳米铈酸钡的YBCO薄膜. 与纯YBCO薄膜相比,掺杂Y₂O₃/BaCeO₃的YBCO膜的临界转变温度几乎保持不变,为91 K左右. 而掺杂Y₂O₃/BaCeO₃的YBCO膜的临界电流密度达到5.0 MA/cm² (77 K, 0T), 是纯YBCO膜临界电流密度的1.5倍.薄膜中的Y₂O₃和BaCeO₃可能在YBCO内部起到了 有效的钉扎磁通作用. 关键词： 钇钡铜氧薄膜 2O₃和纳米BaCeO₃')" href="#">纳米Y₂O₃和纳米BaCeO₃ 磁通钉扎 三氟乙酸盐-金属有机沉积     

YBCO液相外延生长初始阶段的研究

通过液相外延生长的方法能制备高质量的YBa2Cu3O7-δ(YBCO)超导厚膜.利用高温金相显微镜,在大气气氛下实时观测了沉积在MgO基片上的YBCO薄膜熔化过程以及随后冷却过程中的液相外延生长初始阶段.通过对包晶分解过程的控制,留下部分微米级YBCO晶粒,并以此作为外延生长的种子.实验结果表明,通过包晶反应Y2BaCuO5+Liquid→YBa2Cu3O7-δ,能在这些剩余的YBCO晶粒周围快速外延生长出YBCO晶体.本文探讨了初始阶段的生长动力学以及外延生长取向问题.     

YBa2Cu3O7-δ/LaAlO3和Tl2Ba2CaCu2O8/LaAlO3高温超导薄膜内的应变对其微波表面电阻影响的研究

YBa₂Cu₃O_7-δ/LaAlO₃ (YBCO/LAO) 超导薄膜是通过热蒸发沉积方法制备的,实验中使用的Tl₂Ba₂CaCu₂O₈/LaAlO₃ (TBCCO/LAO) 超导薄膜是通过直流磁控溅射方法制备的.通过分析两片超导薄膜的XRD谱计算出了两片超导薄膜内的应变,ΔC_{关键词： YBCO/LAO TBCCO/LAO 超导薄膜 应变 表面电阻}     

YBa2Cu3O7-δ外延膜中的非线性光响应

实验结果表明，在连续波He-Ne激光(λ=0.63μm)照射下，YBa₂Cu₃O_7-δ(YBCO)外延膜在超导转变温度T_c以下附近温区的光响应行为，表现为辐射热效应和非辐射热效应同时存在，尤其当样品的R-T变化率dR/dT→0温区明显地表现为一种非平衡光响应行为，且随电流的变化呈非线性关系.基于上述实验事实，在光致准粒子激发假设下，对T_c附近YBCO薄膜中的非线性光响应机制进行了讨论；给出了光辐射 关键词：     

YBCO半导体薄膜及Bolometer特性

就Si为衬底的钇钡铜氧(分子式：Y₁Ba₂Cu₃O_7-δ ,δ≥05,简称YBCO)薄膜的半导体性质,及用于红外测辐射热计(Bolometer)的探 测性能进行了研究.通过测定温度电阻系数(TCR)和霍尔(Hall)系数,并采用XRD、拉曼散射 光谱等手段分析了YBCO半导体薄膜的微观结构和光谱响应特性,认为该薄膜是非制冷红外焦 平面的新型探测元材料. 关键词： YBCO半导体薄膜 测辐射热计 温度电阻系数     

常压MOCVD生长Ga2O3薄膜及其分析

以去离子水(H₂O)和三甲基镓(TMGa)为源材料,用常压MOCVD方法在蓝宝石(0001)面上生长出β-Ga₂O₃薄膜.用原子力显微镜(AFM)、X射线衍射(XRD)以及二次离子质谱(SIMS)实验表征Ga₂O₃外延膜的质量.在X射线衍射谱中有一个强的Ga₂O₃(102)面衍射峰,其半峰全宽(FWHM)为0.25°,表明该Ga₂O₃外延膜是(102)择优取向.在二次离子质谱中除了C、H、O和Ga原子外,没有观测到其他原子.     

Microstructure of YBCO thin film and its effect on superheating

Previously, we have reported a superheating phenomenon of a YBa₂Cu₃O_x (YBCO) film and studied its mechanism. In this work, we investigated the influence of microstructure on the superheating of a YBCO thin film. Different melting behaviors were observed in situ from YBCO thin films with varied microstructures by using high-temperature optical microscopy (HTOM). These films with different degrees of crystallinity were also characterized by atomic force microscopy (AFM) and X-ray diffraction (XRD). It was found that the crystalline structure features of the seed film have a great influence on the degree of superheating and the melting behavior. A high-quality film with a low fraction of interface defects is believed to be responsible for the high superheating. On the basis of the experimental results from HTOM, AFM, and XRD, the melting and superheating behaviors associated with the film defect structure are well interpreted in terms of the semi-coherent interface-energy theory. PACS 68.35.Md; 68.47.Gh; 68.55.Ac     

LPE growth of PZNT film using superheating YBCO thin film as seed layer

A superheating YBa₂Cu₃O_7-δ (YBCO or Y123) thin film was applied as a seed layer to grow Pb[(Zn_1/3Nb_2/3)_0.91Ti_0.09]O₃ (PZNT) films by a liquid phase epitaxy (LPE) process. In the present work, the YBCO thin film underwent a growth temperature of 1050 °C, which was about 40 °C higher than its peritectic temperature. It is very interesting that the superheated YBCO seed film could be used to grow not only Nd_1+xBa_2-xCu₃O_7-δ (NBCO) films with similar compositions but also PZNT films with completely different compositions. The XRD analysis confirmed that the PZNT film grown on the YBCO seeded MgO substrate had a good epitaxial relationship of [100](001)_PZNT//[100](001)_YBCO//[100] (001)_MgO. Compared with the PZNT films directly grown on MgO substrates, the LPE PZNT film on YBCO/MgO presented a better surface morphology. It was found that the superheating YBCO seed film plays a crucial role for the LPE growth of PZNT in the process. Furthermore, the superheating mechanism was discussed in terms of thermodynamic theories as well. PACS 77.84.-s; 61.10.Nz; 68.37.Hk; 81.15.Lm; 82.45.Mp     

Superheating in liquid and solid phases during femtosecond-laser pulse interaction with thin metal film

Superheating of the liquid phase caused by non-equilibrium evaporation during femtosecond-laser processing of a thin metal film is investigated by adopting the wave hypothesis along with the two-temperature model. The simulation results show that the superheating in the liquid occurs shortly after the evaporation. For a 100-fs laser pulse of 0.7 J/cm², the maximum degree of superheating in liquid can reach 600 K. The superheating in solid can also be captured in the current model, which can be as high as 300 K. The effects of laser fluence, pulse duration and film thickness on the degree of superheating were studied. A higher laser fluence will increase the degree of superheating in liquid significantly but has little effect for the solid part. In the range adopted in the current work, the pulse duration has little effect on the degree of superheating in both liquid and solid phases.     

退火气压对Bi3.25La0.75Ti3O12铁电薄膜的微观结构和铁电性能的影响

采用sol-gel法在Pt/TiO₂/SiO₂/p-Si(100)衬底上制备了Bi_3.25La_0.75Ti₃O₁₂(BLT)铁电薄膜,研究了在750 ℃时不同退火气压(p_{O2:10^-4—3 atm)对薄膜微观结构和电学性能的影响.XRD和拉曼光谱结果表明在10^-4和3 atm氧气压下退火 关键词： 3.25}La_0.75Ti₃O₁₂')" href="#">Bi_3.25La_0.75Ti₃O₁₂ 铁电性能 sol-gel法 正交化度     

Effect of substrate temperature on the surface and interface oxidation of NiTi thin films

NiTi shape memory alloy thin films are deposited on pure Cu substrate at substrate ambient temperatures of 300 °C and 450 °C. The surface and interface oxidation of NiTi thin films are characterized by X-ray photoelectron spectroscopy (XPS). After a subsequent annealing treatment the crystallization behavior of the films deposited on substrate at different temperatures is studied by X-ray diffraction (XRD). The effects of substrate temperature on the surface and interface oxidation of NiTi thin films are investigated. In the film surface this is an oxide layer composed of TiO₂. The Ni atom has not been detected on surface. In the film/substrate interface there is an oxide layer with a mixture Ti₂O₃ and NiO in the films deposited at substrate temperatures 300 °C and 450 °C. In the films deposited at ambient temperature, the interface layer contains Ti suboxides (TiO) and metallic Ni.     

Optical and hydrophilic properties of Cr doped TiO2-SiO2 nanostructure thin film

Cr doped TiO₂-SiO₂ nanostructure thin film on glass substrates was prepared by a sol-gel dip coating process. X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) were used to characterize the structural and chemical properties of the films. A UV-vis spectrophotometer was used to measure the transmittance spectra of the thin film. The hydrophilicity of the thin film during irradiation and storage in a dark place was measured by a contact angle analyzer. The results indicated that Cr doping has a significant effect on the transmittance and super-hydrophilicity of TiO₂-SiO₂ thin film.     

Electrochemical and structural properties of MoO3–V2O5 nanocomposite thin film electrodes for lithium rechargeable batteries

We have investigated the electrochemical properties of V₂O₅-based thin film electrodes as a function of the amount of MoO₃ by means of X-ray diffraction (XRD), X-ray photoemission spectroscopy (XPS), and transmission electron microscopy (TEM). XRD results show that the V₂O₅-based thin film electrodes give an amorphous characteristic. XPS results reveal the formation of V₂O₅ and MoO₃ phases. TEM results show that MoO₃ dots (5–30 nm in size) are embedded in the amorphous V₂O₅ matrix. It is further shown that cells fabricated with the MoO₃–V₂O₅ nanocomposite thin film electrodes give better cycling performance than those made with the single V₂O₅ thin film electrodes. A possible explanation for the MoO₃ nano-dot dependence on the cycling performance of the V₂O₅-based thin film electrodes is described.     

Sodium beta-alumina thin films as gate dielectrics for A1GaN/GaN metal-insulator-semiconductor high-electron-mobility transistors

<正>Sodium beta-alumina（SBA） is deposited on AlGaN/GaN by using a co-deposition process with sodium and Al₂O₃ as the precursors.The X-ray diffraction（XRD） spectrum reveals that the deposited thin film is amorphous.The binding energy and composition of the deposited thin film,obtained from the X-ray photoelectron spectroscopy（XPS） measurement,are consistent with those of SBA.The dielectric constant of the SBA thin film is about 50.Each of the capacitance-voltage characteristics obtained at five different frequencies shows a high-quality interface between SBA and AlGaN.The interface trap density of metal-insulator-semiconductor high-electron-mobility transistor（MISHEMT） is measured to be（3.5～9.5）×10¹⁰ cm^-2·eV^-1 by the conductance method.The fixed charge density of SBA dielectric is on the order of 2.7×10¹² cm^-2.Compared with the AlGaN/GaN metal-semiconductor heterostructure high-electronmobility transistor（MESHEMT）,the AlGaN/GaN MISHEMT usually has a threshold voltage that shifts negatively. However,the threshold voltage of the AlGaN/GaN MISHEMT using SBA as the gate dielectric shifts positively from—5.5 V to—3.5 V.From XPS results,the surface valence-band maximum（VBM-E_F） of AlGaN is found to decrease from 2.56 eV to 2.25 eV after the SBA thin film deposition.The possible reasons why the threshold voltage of AlGaN/GaN MISHEMT with the SBA gate dielectric shifts positively are the influence of SBA on surface valence-band maximum （VBM-E_F）,the reduction of interface traps and the effects of sodium ions,and/or the fixed charges in SBA on the two-dimensional electron gas（2DEG）.     

Structural and magnetic properties of bulk and thin films of Mg0.95Mn0.05Fe2O4

We present here a comparative study on structural and magnetic properties of bulk and thin films of Mg_0.95Mn_0.05Fe₂O₄ ferrite deposited on two different substrates using X-ray diffraction (XRD) and dc magnetization measurements. XRD pattern indicates that the bulk sample and their thin films exhibit a polycrystalline single phase cubic spinel structure. It is found that the film deposited on indium tin oxide coated glass (ITO) substrate has smaller grain size than the film deposited on platinum coated silicon (Pt–Si) substrate. Study of magnetization hysteresis loop measurements infer that the bulk sample of Mg_0.95Mn_0.05Fe₂O₄ and its thin film deposited on Pt–Si substrate shows a well-defined hysteresis loop at room temperature, which reflects its ferrimagnetic behavior. However, the film deposited on ITO does not show any hysteresis, which reflects its superparamagnetic behavior at room temperature.