A 1.5-ns cycle-time 18-kb pseudo-dual-port RAM with 9K logic gates

An 18-kb RAM with 9-kgate control logic gates operating during a cycle-time of 1.5 ns has been developed. A pseudo-dual-port RAM function is achieved by a two-bank structure and on-chip control logic. Each bank can operate individually with different address synchronizing the single clock. A sense-amplifier with a selector function reduces the reading propagation time. Bonded SOI wafers reduce the memory-cell capacitance, and this results in a fast write cycle without sacrificing α-particle immunity. The chip is fabricated in a double polysilicon self-aligned bipolar process using trench isolation. The minimum emitter size is 0.5×2 μm² and the chip size is 11×11 mm²     

A 5.8-ns 256-Kb BiCMOS TTL SRAM with T-Shaped bit line architecture

Presents a new bit line architecture named T-shaped bit line architecture (TSBA), which is suitable for high speed, high density, and/or large bit-wide configuration SRAMs. TSBA, utilizing orthogonal complimentary bit lines in parallel with the word lines, is the solution to bit line pitch constraint for direct bipolar column sensing. This TSBA is applied to a 256-Kb SRAM with a typical access time of 5.8 ns. To achieve access times below 6 ns, this SRAM employs a bipolar Darlington column sense amplifier, a hierarchical column decoding scheme, a data bus shielding layout combined with TSBA, and a 0.8-μm BiCMOS technology     

A 6-ns, 1.5-V, 4-Mb BiCMOS SRAM

A 0.3-μm 4-Mb BiCMOS SRAM with a 6-ns access time at a minimum supply voltage of 1.5 V has been developed. Circuit technologies contributing to the low-voltage, high-speed operations include: (1) boost-BiNMOS gates for address decoding circuits; (2) an optimized word-boost technique for a highly-resistive-load memory cell; (3) a stepped-down CML cascoded bipolar sense amplifier; (4) optimum boost-voltage detection circuits with dummies for boost-voltage generators     

A 5-ns GaAs 16-kb SRAM

A GaAs 4 K×4-b static-Ram (SRAM) with high speed and high reliability has been developed for practical systems. By adopting a novel basic circuit technique to the peripheral circuits, the RAM operates over a wide temperature range. By using a novel memory cell, the soft-error rate is reduced to less than that of commercial silicon emitter-coupled-logic (ECL) RAMs. Furthermore, by adopting a triple-level interconnection process, the chip area is reduced to 58% of that using a double-level one. The RAM operates at a single supply voltage of 1.8 V. At an ambient temperature of between 25 and 100°C, the RAM is guaranteed a 5.0-ns access time, 2.0-W power dissipation, and ±0.1-V supply voltage tolerance     

A 1.2-ns HEMT 64-kb SRAM

A 1.2-ns emitter-coupled-logic (ECL)-compatible 64-kb static RAM using 0.60-μm gate high-electron-mobility-transistor (HEMT) technology was developed. To achieve fast access time, the memory cell array was divided into sixteen 4-kb memory planes and a data-line equalization technique was adopted. The chip power consumption was suppressed to 5.9 W by using three power supply voltages (-1.0, -2.0, and -3.6 V) and a normally off (E/D) source-follower buffer for the word driver circuit. A new device fabrication technique, the HEMT double-etch-stop process, enabled the RAM to be fabricated in simple and fewer processing steps and reduced the chip dimensions to 7.4×6.5 mm     

A 3.8-ns 16 K BiCMOS SRAM

A 2 K×8-b, ECL 100 K compatible BiCMOS SRAM with 3.8-ns (-4.5 V, 60°) address access time is described. The precisely controlled bit-line voltage swing (60 mV), a current sensing method, and optimized ECL decoding circuits permit a reliable and fast readout operation. The SRAM features an on-chip write pulse generator, latches for input and output bits, and a full six-transistor CMOS cell array. Power dissipation is approximately 2 W, and the chip size is 3.9×5.9 mm². The SRAM was based on 1.2-μm BiCMOS, using double-metal, triple-polysilicon, and self-aligned bipolar transistors     

A 5-ns 1-Mb ECL BiCMOS SRAM

A 1-Mword×1-b ECL (emitter coupled logic) 10 K I/O (input/output) compatible SRAM (static random-access memory) with 5-ns typical address access time has been developed using double-level poly-Si, double-level metal, 0.8-μm BiCMOS technology. To achieve 5-ns address access time, high-speed X-address decoding circuits with wired-OR predecoders and ECL-to-CMOS voltage-level converters with partial address decoding function and sensing circuits with small differential signal voltage swing were developed. The die and memory cell sizes are 16.8 mm×6.7 mm and 8.5 μm×5.3 μm, respectively. The active power is 1 W at 100-MHz operation     

A soft-error-immune 0.9-ns 1.15-Mb ECL-CMOS SRAM with 30-ps 120 klogic gates and on-chip test circuitry

A soft-error-immune, 0.9-ns address access time, 2.0-ns read/write cycle time, 1.15-Mb emitter coupled logic (ECL)-CMOS SRAM with 30-ps 120 k ECL and CMOS logic gates has been developed using 0.3-μm BiCMOS technology. Four key developments ensuring good testability, reliability, and stability are on-chip test circuitry for precise measurement of access time and for multibit parallel testing, a memory-cell test technique for an ECL-CMOS SRAM, a highly stable current source with a simple design using a current mirror, and a soft-error-immune memory cell using a silicon-on-insulator (SOI) wafer. These techniques will be especially useful for making the ultrahigh-speed, high-density SRAM's used as cache and control storages in mainframe computers     

A 1-V operating 256-kb full-CMOS SRAM

A 1-V operating 256-kb full-CMOS SRAM to be used in 1.5-V battery-based applications is presented. A reference word line and address transition detection (ATD) are used as timing control techniques to achieve adjustable timing of critical signals with a 1.5-V battery. The key circuit of the pulse sequence block is the ATD pulse generator circuit. The authors use a newly modified Schmitt trigger delay circuit. To reduce supply line noise in the chip, they needed to lower the peak of bit-line charge-up current. This was done by applying a divided word-line technique and a newly adopted staggered bit-line equalizing pulse technique. The design used a single-polysilicon and double-aluminum process with a full-CMOS memory cell of 8.5 μm×12.8 μm. The chip size is 6.0 mm×9.0 mm     

A 2-ns cycle, 3.8-ns access 512-kb CMOS ECL SRAM with a fullypipelined architecture

The authors describe a 512 K CMOS static RAM (SRAM) with emitter-coupled-logic (ECL) interfaces which has a 2-ns cycle time and a 3.8-ns access time, both of which are valid for random READ/WRITE operations. The CMOS technology and the physical organization of the chip are briefly discussed, and the pipelined architecture of the chip is described. Detailed measurements of internal chip waveforms demonstrating 2-ns cycle time operation are presented. The impact of wire RC delays on performance is discussed. Circuit examples that demonstrate the implementation of the pipelined architecture are included. Measurements of operating margins, access time, and cycle time are outlined     

A 4-ns 4K×1-bit two-port BiCMOS SRAM

The authors introduce a two-port BiCMOS static random-access memory (SRAM) cell that combines ECL-level word-line voltage swings and emitter-follower bit-line coupling with a static CMOS latch for data storage. With this cell, referred to as a CMOS storage emitter access cell, it is possible to achieve access times comparable to those of high-speed bipolar SRAMs while preserving the high density and low power of CMOS memory arrays. The memory can be read and written simultaneously and is therefore well-suited to applications such as high-speed caches and video memories. A read access time of 3.8 ns at a power dissipation of 520 mW has been achieved in an experimental 4K×1-bit two-port memory integrated in a 1.5-μm 5-GHz BiCMOS technology. The access time in this prototype design is nearly temperature-insensitive, increasing to only 4 ns at a case temperature of 100°C     

A 1.5-V full-swing BiCMOS logic circuit

A BiCMOS logic circuit applicable to sub-2-V digital circuits has been developed. A transiently saturated full-swing BiCMOS (TS-FS-BiCMOS) logic circuit operates twice as fast as CMOS at 1.5-V supply. A newly developed transient-saturation technique, with which bipolar transistors saturate only during switching periods, is the key to sub-2-V operation because a high-speed full-swing operation is achieved to remove the voltage loss due to the base-emitter turn-on voltage. Both small load dependence and small fan-in dependence of gate delay time are attained with this technique. A two-input gate fabricated with 0.3-μm BiCMOS technology verifies the performance advantage of TS-FS-BiCMOS over other BiCMOS circuits and CMOS at sub 2-V supply     

An 8-ns 1-Mbit ECL BiCMOS SRAM with double-latch ECL-to-CMOS-level converters

The design and performance of a high-speed 1 M*1-bit SRAM with ECL I/O are described. The 6.5*16.5-mm/sup 2/ chip was fabricated with a 0.8- mu m BiCMOS process technology. A modified double-word-line (MDWL) structure and a bit-line peripheral circuitry with normally-on bit-line equalization circuit are used to achieve high-speed read operation. The read speed is further enhanced by a novel ECL-to-CMOS-level converter with a double-latch configuration. The converter dissipates no DC current and contributes to low power consumption together with an automatic power-saving function, utilizing the address transition detection (ATD) technique. The access time is typically 8 ns, and the active power is 500 mW at 50 MHz.<>     

优化阵列结构的5 ns 32 kb CMOS SRAM及其外围电路

设计了一个地址有效时间为５ｎｓ的３２ｋｂ（２ｋ×１６位）ＣＭＯＳ静态随机存储器。设计中采用优化的阵列结构、分段字线译码,以达到１．７５ｍＷ／ＭＨｚ的低功耗;采用位线平衡技术、高速两级敏感放大器及可预置电压的数据输出缓冲,以提高存储器的读写频率。同时,利用两级敏感放大器的层次式结构降低数据线的电压幅度,进一步降低了功耗。     

A 6-ns cycle 256-kb cache memory and memory management unit

A 6-ns cycle, 7.7-ns access cache memory and memory management unit (CAMMU) chip has been developed. The circuit includes two 5-ns 128-kb cache memories, two 4-ns 64-entry fully associative translation lookaside buffers (TLBs), two 4-ns 64-line tag RAMs, comparators, registers, and control logic. The TLB design contains a line encoder and valid bits with flash clear. Timing control allows read, write, associative accesses, and invalid search accesses with identical timings. The two caches time-share data input and sense amplifier circuits for improved density, and they are pipelined to allow a new access to start before the previous access is complete     

A 256-kb 65-nm Sub-threshold SRAM Design for Ultra-Low-Voltage Operation

Low-voltage operation for memories is attractive because of lower leakage power and active energy, but the challenges of SRAM design tend to increase at lower voltage. This paper explores the limits of low-voltage operation for traditional six-transistor (6T) SRAM and proposes an alternative bitcell that functions too much lower voltages. Measurements confirm that a 256-kb 65-nm SRAM test chip using the proposed bitcell operates into sub-threshold to below 400 mV. At this low voltage, the memory offers substantial power and energy savings at the cost of speed, making it well-suited to energy-constrained applications. The paper provides measured data and analysis on the limiting effects for voltage scaling for the test chip     

A 7-ns/850-mW GaAs 4-kb SRAM with little dependence on temperature

A GaAs 1 K×4-kb SRAM designed using a novel circuit technology is described. To reduce the temperature dependence and the scattering of the access time, it was necessary to increase the signal voltage swing and to reduce the leakage current in access transistors of unselected memory cells. In the 4-kb SRAM, source-follower circuits were adopted to increase the voltage swing, and the storage nodes of unselected memory cells were raised by about 0.6 V to reduce the subthreshold leakage current in the access transistors. The 4-kb SRAM was fabricated using 1.0-μm self-aligned MESFETs with buried p-layers beneath the FET regions. A maximum address access time of 7 ns and a power dissipation of 850 mW were obtained for the galloping test pattern at 75°C. Little change in the address access time was observed between 0 and 75°C     

A 0.65-ns, 72-kb ECL-CMOS RAM macro for a 1-Mb SRAM

An ultrahigh-speed 72-kb ECL-CMOS RAM macro for a 1-Mb SRAM with 0.65-ns address-access time, 0.80-ns write-pulse width, and 30.24-μm ² memory cells has been developed using 0.3-μm BiCMOS technology. Two key techniques for achieving ultrahigh speed are an ECL decoder/driver circuit with a BiCMOS inverter and a write-pulse generator with a replica memory cell. These circuit techniques can reduce access time and write-pulse width of the 72-kb RAM macro to 71% and 58% of those of RAM macros with conventional circuits. In order to reduce crosstalk noise for CMOS memory-cell arrays driven at extremely high speeds, a twisted bit-line structure with a normally on MOS equalizer is proposed. These techniques are especially useful for realizing ultrahigh-speed, high-density SRAM's, which have been used as cache and control storages in mainframe computers     

A 1.5-ns 32-b CMOS ALU in double pass-transistor logic

Describes circuit techniques for fabricating a high-speed adder using pass-transistor logic. Double pass-transistor logic (DPL) is shown to improve circuit performance at reduced supply voltage. Its symmetrical arrangement and double-transmission characteristics improve the gate speed without increasing the input capacitance. A carry propagation circuit technique called conditional carry selection (CCS) is shown to resolve the problem of series-connected pass transistors in the carry propagation path. By combining these techniques, the addition time of a 32-b ALU can be reduced by 30% from that of an ordinary CMOS ALU. A 32-b ALU test chip is fabricated in 0.25-μm CMOS technology using these circuit techniques and is capable of an addition time of 1.5 ns at a supply voltage of 2.5 V     

A 1.5-V differential cross-coupled bootstrapped BiCMOS logic forlow-voltage applications

Two new bipolar complementary metal-oxide-semiconductor (BiCMOS) differential logic circuits called differential cross-coupled bootstrapped BiCMOS (DC²B-BiCMOS) and differential cross-coupled BiCMOS (DC²-BiCMOS) logic are proposed and analyzed. In the proposed two new logic circuits, the novel cross-coupled BiCMOS buffer circuit structure is used to achieve high-speed operation under low supply voltage. Moreover, a new bootstrapping technique that uses only one bootstrapping capacitor is adopted in the proposed DC²B-BiCMOS logic to achieve fast near-full-swing operation at 1.5 V supply voltage for two differential outputs. HSPICE simulation results have shown that the new DC²B-BiCMOS at 1.5 V and the new DC²-BiCMOS logic at 2 V have better speed performance than that of CMOS and other BiCMOS differential logic gates. It has been verified by the measurement results on an experimental chip of three-input DC²B-BiCMOS XOR/XNOR gate chain fabricated by 0.8 μm BiCMOS technology that the speed of DC²-BiCMOS at 1.5 V is about 1.8 times of that of the CMOS logic at 1.5 V. Due to the excellent circuit performance in high-speed, low-voltage operation, the proposed DC²B-BiCMOS and DC²-BiCMOS logic circuits are feasible for low-voltage, high-speed applications