离子注入对聚合物材料表面改性的研究与应用进展

离子注入对聚合物材料表面改性有着独特的优越性,文中介绍离子注入技术在聚合物材料表面的力学性能、电学性能、光学性能、生物相容性能等方面改性的最新研究与应用进展。     

离子注入技术改性聚合物薄膜的研究进展

离子注入技术改性聚合物薄膜在电子及电器工程中有着巨大的潜在应用价值。综述了近年来聚合物薄膜经离子注入后在导电性能、光学性能、导磁性能及表面力学机械性能等方面的最新进展。分析了注入离子与聚合物相互作用的物理过程,并指出了该领域存在的问题及发展方向。     

离子注入技术改性聚合物薄膜的研究进展

离子注入技术改性聚合物薄膜在电子及电器工程中有着巨大的潜在应用价值。综述了近年来聚合物薄膜经离子注入后在导电性能,光学性能,导磁性能及表面力学机械性能等方面的最新进展。分析了注入离子与聚合物相互作用的物理过程,并指出了该领域存在的问题及发展方向。     

镁合金离子注入表面改性技术研究进展

离子注入是一种提高镁合金表面性能的重要处理技术。介绍了离子注入的改性原理,综述了该技术在提高镁合金表面硬度、耐磨性,改善耐蚀性、抗氧化性及生物医学性能等方面的应用,并展望了镁合金离子注入表面改性技术的发展方向和应用前景。     

离子注入表面摩擦学改性及其应用

离子注入可以改善材料表面的各种性质,而常温离子注入改性层太薄,工件表面的耐磨性及承载能力均较差,随着各种新的离子注入工艺的出现,摩擦学性能有较大的改善.本文从分析离子注入技术的特点着手,综述了离子注入对材料表面硬度、摩擦系数和耐磨性的影响及其作为表面摩擦学改性手段在航空航天、军事和机械等领域中的应用.     

聚醚醚酮薄膜的离子注入表面改性

聚醚醚酮(PEEK)是一种重要的工程塑料。本文采用离子注入的方法对聚醚醚酮进行表面改性,注入离子分别为Cu和Ag。离子的注入使PEEK表层形成了石墨相,同时样品的表面极性减小,与水的接触角增大,样品表面的力学性能也有显著提高。     

用离子注入技术实现金属表面的改性

给金属表面注入一定的高能离子，这些离子与金属中的元素以及真空气氛中的某些 元素在金属表面形成一种表面合金，借以改善金属表面的性能。本文通过大量的实验和 分析得知，在碳钢中分别注入N～＋和Ｔｉ～＋，在铝中注入Ｎ～＋，在钛中注入Ｍｏ～＋和Ｐo～+ 的表面耐磨性能的改善情况；在铁中注入 Ｔａ～＋和 Ｃｒ～＋，在钢中注入Ｃｒ～+＋Ｍｏ～+的表 面耐腐蚀性能的改善情况。本文提出用真空镀膜加离子注入的动态混合方法是金属表面 性能改善的一种颇有前途的新技术。     

离子注入纯Fe表面微观结构研究

本文应用透射电镜等方法对纯Ｆｅ中注入Ｎｉ＾＋，Ｍｏ＾＋，Ｂ＾＋及Ｎｉ＾＋＋Ｍｏ＾＋＋Ｂ＾＋起表面层微观结构变化进行了研究，同时对不同注入条件进行了计算机模拟计算。     

Engineering the tube size for an inner surface modification by plasma-based ion implantation

In order to apply the inner surface modification of the tube component by plasma-based ion implantation (PBII) technique, the tube size has been characterized by introducing a characteristic parameter - the critical radius of tube (CRT) to optimize the process parameters of a grid-enhanced PBII technique for the nitrogen ion implantation onto the inner surface of an Fe-Cr-Ni stainless steel tube under the process conditions, including the plasma density of central plasma source, the steady pulse voltage, the grid electrode radius, and the processing pressure. The temporal sheath dynamics of the ion matrix sheath on the inner surface of the tube component modified by PBII were demonstrated by the collisional fluid model using the equations of ion continuity and ion motion, Poisson’s equation, and Boltzmann’s relationship of electron to determine the effective range of the process parameters. The optimum process parameters were found by the effect factors of the CRT which was bounded by the two important process parameters, i.e. the ion implantation dose and the processing time, for the engineering practice due to the available dependence on the surface modification effect in suitable costs.     

铝型材挤压模具离子注入表面强化

铝型材热挤压模具的磨损、润滑和使用寿命短等问题直接影响着铝加工行业中铝产品的质量和厂家的经济效益。我院与广东兴发铝型材厂合作，将离子注入技术应用于铝型材生产，对铝型材挤压模具进行了表面改性处理。51只离子注入改性后的模具在线实验表明：模具总的中间使用寿命平均提高了140%，同时改善了铝型材的表面光洁度，减少了模具的拆卸、修整次数和降低了生产工人的劳动强度。     

Surface modification of PET membrane by ion implantation

Semicrystalline poly(ethylene terephtalate) (PET) foils were irradiated with N⁵⁺, O⁷⁺ and C³⁺ ions. Ions beams of 50 keV N⁵⁺, 70 keV O⁷⁺ and 30 keV C³⁺ were produced from the ECR ion source. The induced effects and wettability of ion-implanted membranes were investigated by means of the Fourier transform infrared spectroscopy (FTIR), atomic force microscopy (AFM) and by the contact-angle methods. FTIR measurements of the virgin and irradiated samples show the scission processes of main chains at the ethylene glycol residue. Various degradation processes known from photochemical degradation were also observed. The AFM observation revealed that the surface topography changes after irradiation. The contact-angle measurements showed that the PET membranes became significantly more hydrophilic after the ion irradiation.     

基于紫外-臭氧辐射的高分子材料表面改性研究进展

随着高分子复合材料的广泛应用,界面性能成为影响其综合表现的重要因素。紫外-臭氧辐射法(UVO)是一种简单经济的表面改性工艺,可激发高分子表面分子链,从而赋予其不同于本体性能的表面特性(如表面润湿性、与其他材料的界面相容性等),也为进一步的界面偶联提供反应位点。本文首先概述了国内外学者在电子、生物医疗等领域中采用UVO工艺改性不同种类高分子材料(聚酯类高分子材料、聚烯烃高分子材料、有机硅高分子材料、合成橡胶、纺织材料)表面的研究现状及相应研究成果;在此基础上,梳理了改性高分子材料表面与不同种类硅烷偶联剂(甲基丙烯酰氧基、环氧基、氨基、巯基硅烷偶联剂)的反应条件及复合材料界面性能;最后,对UVO工艺未来可能的应用空间进行了展望。     

低温等离子体对聚合物表面改性的研究

本文对低温等离子体作用在聚合物表面的机理做了简要介绍 ,指出这一过程有四种作用 :产生自由基 ,发生表面交联 ,引入极性官能团 ,表面变粗糙 ;对国内外利用等离子体对高分子材料的表面改性方法做了简要介绍 ,同时指出低温等离子体技术在各类高分子材料加工中的巨大应用前景。     

Material surface modification by pulsed ion beam

A new technique utilizing a high-power-density pulsed ion beam for modification of material surfaces is presented. The power density of the pulsed ion beam ranges between 10⁴ and 10⁷ wcm^–2, the kinetic energy is 1 to 5 KeV, the deposition energy is of the order of 1 to 10Jcm^–2 and the pulsed duration is about 60sec. The post-treatment samples were analysed using Auger electron spectroscopy, scanning electron microscopy, X-ray diffractometry, and Vicker's microhardness tester. It is found that the concentration of the injected particles has a Gaussian distribution. The thermal zone induced by the fast heating-cooling process forms a white-bright layer, indicating that there are new carbides and nitrides produced in the surface layer, which increases the microhardness of the surface.     

Structural modification of tantalum crystal induced by nitrogen ion implantation

This paper investigates the effect of nitrogen ion implantation on tantalum surface structure. In this experiment, nitrogen ions which had an energy of 30 keV and doses of 1 × 10¹⁷ to 10 × 10¹⁷ ions cm^?2 were used. X-ray diffraction analysis (XRD) was applied for both the metallic Ta substrate and the study of new structures that have been created through the nitrogen ion implantation. Atomic force microscopy (AFM) was also used to check the roughness variations prior to and also after the implantation phase. The experimental results show the formation of hexagonal tantalum nitride (TaN_0.43) in addition to the fact that by increasing the ion dose, the nitrogen atoms occupy more interstitial spaces in the target crystal. The nitride phase also seen for 3 × 10¹⁷ and 5 × 10¹⁷ ions cm^?2, while it disappeared for higher dose of 7 × 10¹⁷ and 1 × 10¹⁸ ions cm^?2. The FWHM of the dominant peak of tantalum nitride suggest the growth of the crystallite’s size, which is in agreement with the AFM results of the grains.