在蓝宝石衬底两个相反c面同时生长氮化镓薄膜的差异

运用金属有机气相外延设备,在蓝宝石衬底两个相反取向的c面上同时生长六方相氮化镓薄膜．对此进行了扫描电子显微镜、俄歇电子能谱、透射电子显微镜的分析和研究．发现这两个薄膜有许多不同之处．     

Influence of a Nanoporous Silicon Layer on the Practical Implementation and Specific Features of the Epitaxial Growth of GaN Layers on SiC/por-Si/c-Si Templates

Semiconductors - A set of structural and spectroscopic methods of diagnostics is used to study the influence of a nanoporous silicon (por-Si) transition layer on the practical implementation and...     

MBE AlGaN/GaN HEMT Heterostructures with Optimized AlN Buffer on Al2O3

Semiconductors - The effect of molecular-beam epitaxy (MBE) growth conditions on properties of AlN epitaxial layers was investigated resulting in determination of optimal substrate temperature and...     

Growth of GaN Layers on Si(111) Substrates by Plasma-Assisted Molecular Beam Epitaxy

Semiconductors - The studies of the growth kinetics of GaN layers grown on nitridated Si(111) substrates by plasmaassisted molecular beam epitaxy are presented. The nucleation and overgrowth of the...     

Si基氨化ZnO／Ga2O3薄膜制备GaN纳米线

利用射频磁控溅射法在Si(111)衬底上溅射ZnO中间层和Ga2O3薄膜，然后在管式炉中常压下通氨气对ZnO/Ga2O3薄膜进行氨化，高温下ZnO层在氨气气氛中挥发，而Ga2O3薄膜和氨气反应合成出GaN纳米线．X射线衍射测量结果表明利用该方法制备的GaN纳米线具有沿c轴方向择优生长的六角纤锌矿结构．利用扫描电子显微镜、透射电子显微镜、傅里叶红外透射谱、能量弥散谱及选区电子衍射观测并分析了样品的形貌、成分和晶格结构．研究发现ZnO层的挥发有利于Ga2O3和NH3反应合成GaN纳米线．     

Si基氨化ZnO/Ga2O3薄膜制备GaN纳米线

利用射频磁控溅射法在Si(111)衬底上溅射ZnO中间层和Ga2O3薄膜,然后在管式炉中常压下通氨气对ZnO/Ga2O3薄膜进行氨化,高温下ZnO层在氨气气氛中挥发,而Ga2O3薄膜和氨气反应合成出GaN纳米线.X射线衍射测量结果表明利用该方法制备的GaN纳米线具有沿c轴方向择优生长的六角纤锌矿结构.利用扫描电子显微镜、透射电子显微镜、傅里叶红外透射谱、能量弥散谱及选区电子衍射观测并分析了样品的形貌、成分和晶格结构.研究发现ZnO层的挥发有利于Ga2O3和NH3反应合成GaN纳米线.     

Photoelectric Properties of GaN Layers Grown by Plasma-Assisted Molecular-Beam Epitaxy on Si(111) Substrates and SiC/Si(111) Epitaxial Layers

Semiconductors - The photoelectric properties of GaN/SiC/Si(111) and GaN/Si(111) heterostructures grown by plasma-assisted molecular-beam epitaxy under the same growth conditions on identical...     

氨化Si基Ga2O3/Ta薄膜制备GaN纳米线

利用磁控溅射技术在Si衬底上制备Ga2O3/Ta薄膜,然后在900℃、氨气中退火合成了大量的一维单晶氮化镓纳米线.用X射线衍射、扫描电子显微镜、傅里叶红外吸收光谱、透射电子显微镜、选区电子衍射和光致发光谱对制备的氮化镓进行了表征.结果表明,制备的GaN纳米线是六方纤锌矿结构,其直径大约为50 nm,最大长度可达8 μm左右.室温下光致发光谱的测试发现了364 nm处有较强紫外发光峰.     

Formation of GaN Nanowires by Ammoniating Ga2O3 Films Deposited on Oxidized Al Layers on Si Substrate

Large quantities of gallium nitride（GaN） nanowires have been prepared via ammoniating the Ga2O3 films deposited on the oxidized aluminum layer at 950℃ in a quartz tube. The nanowires have been confirmed as crystalline wurtzite GaN by X-ray diffraction, X-ray photoelectron spectrometry scanning electron microscope and selected-area electron diffraction. Transmission electron microscope （TEM） and scanning electron microscopy（SEM） reveal that the nanowires are amorphous and irregular, with diameters ranging from 30 nm to 80 nm and lengths up to tens of microns. Selected-area electron diffraction indicates that the nanowire with the hexagonal wurtzite structure is the single crystalline. The growth mechanism is discussed briefly.     

Optical properties of the Si-doped GaN/Al2O3 films

Morphological and optical studies of the Si-doped GaN films (doping level N _Si = 1.5 × 10¹⁹ cm^?3) grown by vapor-phase epitaxy from metalorganic compounds on a sapphire substrate oriented along the c axis are conducted. For the grown GaN films, the following characteristics are obtained: energy of electron transition E ₀, absorption coefficient α, refractive index n, and frequencies of transverse and longitudinal optical lattice vibrations characteristic of the crystalline GaN films.     

Mg预处理蓝宝石衬底法制备的Zn极性ZnO外延薄膜的结构研究

通过分子束外延法在经Mg预处理的蓝宝石衬底上制备了ZnO单晶薄膜,利用高分辨透射电镜、电子全息和X射线能谱对该薄膜的结构进行了细致的研究.结果表明,在蓝宝石衬底上预沉积一层很薄的Mg层,可以生长均匀Zn极性的ZnO外延薄膜.ZnO/MgO/蓝宝石的界面非常清晰锐利,同时在界面处可以观察到大约3个原子层的MgO.预沉积的Mg薄层对随后ZnO的极性选择起了关键性作用.     

Al2O3／TiB2和Al2O3／TiB2／SiCW陶瓷材料氧化层的显微结构分析

用Ｘ射线衍射，扫描电子显微镜和透射电镜／能谱仪分析了Ａｌ２Ｏ３／ＴｉＢ２和Ａｌ２Ｏ３／ＴｉＢ２／ＳｉＣＷ陶瓷材料在１３００℃氧化３０小时后氧化层的相组成及显著结构。     

Characteristics of Al/sub 2/O/sub 3//AllnN /GaN MOSHEMT

InAlN/GaN is a new heterostructure system for HEMTs with thin barrier layers and high channel current densities well above 1 A/mm. To improve the leakage characteristics of such thin-barrier devices, AlInN/GaN MOSHEMT devices with a 11 nm InAlN barrier and an additional 5 nm Al₂O₃ barrier (deposited by ALD) were fabricated and evaluated. Gate leakage in reverse direction could be reduced by one order of magnitude and the forward gate voltage swing increased to 4 V without gate breakdown. Compared to HEMT devices of similar geometry, no degradation of the current gain cutoff frequency was observed. The results showed that InAlN/GaN FETs with high channel current densities can be realised with low gate leakage characteristics and high structural aspect ratio by insertion of a thin Al₂O ₃ gate dielectric layer     

Effect of Nitridation on the Regrowth Interface of AlGaN/GaN Structures Grown by Molecular Beam Epitaxy on GaN Templates

AlGaN/GaN structures were regrown on GaN templates using plasma- assisted molecular beam epitaxy (PA-MBE). Prior to the regrowth, nitridation was performed using nitrogen plasma in the MBE chamber for different durations (0?min to 30?min). Direct-current measurements on high-electron-mobility transistor devices showed that good pinch-off characteristics and good interdevice isolation were achieved for samples prepared with a 30-min nitridation process. Current?Cvoltage measurements on Schottky barrier diodes also revealed that, for samples prepared without nitridation, the reverse-bias gate leakage current was approximately two orders of magnitudes larger than that of samples prepared with a 30-min nitridation process. The improvement in the electrical properties is a result of contaminant removal at the regrowth interface which may be induced by the etching effect of nitridation.     

Synthesis and photoluminescence of Y2O3:Yb3+–Er3+ nanofibers

The influence of the solvent ratio in the hydrothermal synthesis of co-doped Y₂O₃:Yb³⁺–Er³⁺, via CTAB complex, is presented. The nanophosphors for two different ethanol/water solvent ratios, 1:1 and 1:3, shown the following features: the samples exhibit cubic phase, TEM image of the sample synthesized using a 1:3 solvent ratio shows a homogeneous nanofibers morphology in opposition with the sample obtained from a 1:1 solvent ratio which reveals different morphologies prevailing big irregular particles. In both cases the absorption spectra are similar as well as the upconversion emission. These results suggest that the solvent ratio plays an important role in the morphology and on the luminescence properties of the nanostructured materials.     

Effect of substrate smoothness on the microstructure of YBa9n2Cu3O7−x/Y2O3/YBa2Cu3O7−x trilayers

Transmission electron microscopy was used to analyze the microstructure of YBa₂Cu₃O_7−x/Y₂O₃/YBa₂Cu₃O_7−x trilayer structures deposited by off-axis sputtering on MgO substrates with varying degrees of roughness. Substrate surface hillocks with a peak-to-valley height of about 4.5 nm were found to contribute to strain that extended through the film and disrupted the smoothness of the Y₂O₃ layer. In some cases, these hillocks served as nucleation sites for yttria precipitates. Such defects may seriously jeopardize the realization of weak-link Josephson junctions.     

Flat band voltage modulation of AlGaN/GaN MOS capacitor with stacked Al2O3/La2O3 high dielectric structures

AlGaN/GaN metal-oxide-semiconductor (MOS) capacitor structures using atomic layer deposited high-dielectric-constant (High-k) Al₂O₃/La₂O₃ bilayer films as dielectric have been investigated using high-frequency capacitance-voltage measurement. The stable thickness and uniform surface morphology of the bilayer films with different La/Al deposition cycle ratio (La/Al ratio) were observed after rapid thermal annealing by spectroscopic ellipsometry and atomic force microscopy, respectively. We have found that with a decrease of the La/Al ratio, the dipole layer observed by X-ray photoelectron spectroscopy at Al₂O₃/La₂O₃ interfaces is close to the surface of semiconductor and the flat band voltage shifts to the negative direction. Furthermore, the dramatic drop in dielectric constant of the films as La/Al ratio decrease was caused by the formation of La(OH)₃ in La₂O₃. Finally, the reason for the flat band voltage shifts, which is based on the dielectric constant of Al₂O₃ and La₂O₃ comprising the position of dipole layer in the dielectric films, is proposed.     

氨化Si基Ga2O3/Co薄膜合成GaN纳米线及其表征

采用磁控溅射技术先在Si衬底上制备Ga2O3/Co薄膜,然后在950"C下流动的氨气中进行氨化反应制备GaN纳米棒.应用X射线衍射、扫描电镜、傅里叶红外吸收光谱、选区电子衍射和高分辨透射电子显微镜对样品进行表征.结果表明,采用此方法得到了六方纤锌矿结构的GaN单晶纳米棒.观察发现纳米棒表面光滑.并讨论了GaN纳米棒的生长机制.     

氨化Si基Ga2O3/Co薄膜合成GaN纳米线及其表征

采用磁控溅射技术先在Si衬底上制备Ga2O3/Co薄膜,然后在950"C下流动的氨气中进行氨化反应制备GaN纳米棒.应用X射线衍射、扫描电镜、傅里叶红外吸收光谱、选区电子衍射和高分辨透射电子显微镜对样品进行表征.结果表明,采用此方法得到了六方纤锌矿结构的GaN单晶纳米棒.观察发现纳米棒表面光滑.并讨论了GaN纳米棒的生长机制.     

在复合衬底γ-Al2O3/Si(001)上生长GaN

采用分子束外延(MBE)生长方法,使用γ-Al2O3材料作为新型过渡层,在Si(∞1)衬底上获得了没有裂纹的GaN外延层,实验结果表明使用γ-Al2O3过渡层有效地缓解了外延层中的应力.通过生长并测试分析几种不同结构的外延材料,研究了复合衬底γ-Al2O3/Si(001)生长GaN情况,得到了六方相GaN单晶材料,实现了GaN c面生长.预铺薄层Al及高温AlN层可以提高GaN晶体质量,低温AlN缓冲层可以改善GaN表面的粗糙度.为解决Si(001)衬底上GaN的生长问题提供了有益的探索.