添加Fe颗粒对SnBi钎料电迁移的影响

分别研究了SnBi钎料和添加0.1%的微米级Fe颗粒的SnBi复合钎料的电迁移现象。结果表明:随着通电时间的增加,SnBi钎料显微组织发生明显的粗化,白色的富Bi相尺寸不断增加,阳极和阴极IMC厚度呈现极性效应,抗拉强度变化明显。当添加Fe颗粒后,随着通电时间的增加,SnBi-Fe复合钎料的显微组织粗化不明显,阴极和阳极界面IMC厚度变化减缓,复合钎料接头的抗拉强度变化减缓。这表明Fe颗粒可以有效抑制SnBi钎料的电迁移。     

电迁移对石墨颗粒增强复合钎料接头组织的影响

研究了SnBi和SnBi+石墨复合钎料的电迁移性能,发现在SnBi复合钎料中添加石墨增强颗粒,导致该复合钎料的润湿性能降低,并且随着石墨含量的增加,其铺展系数越来越低。SnBi钎料在5A电流冲击下,晶粒首先在焦耳热的作用下粗化,随后在"电子风"的冲击下逐渐细化,从而硬度表现出先下降后上升的趋势。SnBi钎料在10A电流冲击下,由于电流较大,晶粒在"电子风"的冲击下逐渐细化,从而硬度表现出上升趋势。SnBi+石墨复合钎料在5和10A电流的作用下组织和力学性能变化均不明显,主要是由于石墨的加入提高了复合钎料的抗电迁移性能。     

电迁移对纳米石墨颗粒增强复合钎料接头组织的影响

研究了SnBi钎料和SnBi+Graphite复合钎料的电迁移性能。选取石墨含量为0.07wt%的SnBi复合钎料制成微型对接接头,选用5和10A两种电流水平及48、96和192 h三个时间水平,测试了Sn Bi钎料和SnBi+Graphite复合钎料的电迁移性能,借助于超景深显微镜对电迁移后试样的组织进行了观察,利用显微硬度对其力学性能进行了表征。实验结果表明:SnBi钎料在5A电流冲击下,晶粒首先在焦耳热的作用下粗化,随后在"电子风"的冲击下逐渐细化,从而硬度表现出先下降后上升的趋势;SnBi钎料在10A电流冲击下,由于电流较大,晶粒在"电子风"的冲击下逐渐细化,从而硬度表现出上升趋势;SnBi+Graphite复合钎料在5和10A电流的作用下组织和力学性能变化均不明显,主要是由于纳米石墨的加入提高了复合钎料的抗电迁移性能。     

金属间化合物的形成引发Sn-Bi晶须的生长

电流密度为3×103A/cm2和环境温度100℃的实验条件下,在Cu/共晶SnBi焊点/Cu焊点的阴极和阳极Cu基板上都发现了晶须的生长。经EDX检测可知,其成分为Sn-Bi的混合物。抛光后发现,大量的Cu6Sn5金属间化合物附着在Cu基板上。结果表明:随着通电时间的延长,SnBi钎料在电迁移的作用下发生了扩散迁移,在Cu基板上形成了薄薄的钎料层。在焦耳热和环境温度的作用下,钎料层中的Sn与Cu基板中的Cu反应生成了大量的Cu6Sn5金属间化合物。这些金属间化合物的形成导致在钎料层的内部形成了压应力。为了释放压应力,Sn-Bi钎料以晶须的形式被挤出。     

电迁移对Cu/Sn-58Bi-0.01CNTs/Cu焊点组织及可靠性的影响

选用直流稳压电源对Cu/Sn-58Bi-x CNTs/Cu(x=0,0.01)焊点的抗电迁移性能进行了测量,研究了不同通电时间下焊点的组织、界面IMC形貌及蠕变性能。结果表明:随着通电时间的增加,钎料焊点的显微组织均呈粗化的趋势,焊点界面IMC形貌均由扇贝状趋于平坦,厚度呈上升的趋势,钎料焊点的蠕变断裂寿命均降低。与同一通电时间的焊点阳极对比,焊点阴极附近的组织更为细小,界面IMC更薄;相较于同一通电时间的Sn-58Bi钎料焊点,Sn-58Bi-0.01CNTs复合钎料的焊点显微组织更为细小,界面IMC更薄,焊点的蠕变性能更优。     

电迁移引发Cu/SnBi/Cu焊点组织形貌的演变

主要研究电流密度为5×103 A/cm2,室温和高温(100 ℃)条件下共晶SnBi焊点的电迁移特性.结果表明:室温条件通电465 h后,阳极界面处出现Bi的挤出,阴极界面处出现裂纹;而在高温条件下通电115 h后,组织形貌发生了很大的变化.高温加速了阴极钎料的损耗,导致电流密度在局部区域高度集中,从而产生更多的焦耳热,最终引发焊点的熔化.熔融状态下Sn原子与Cu反应,在基体形成大量块状的Cu6Sn5金属间化合物,严重降低焊点的可靠性.     

电导率测量法在共晶SnBi钎料的电迁移试验中的应用

电迁移过程中,焊点正负极处会分别出现"小丘"、"凹谷",空洞和裂纹等缺陷,这一系列显微组织的变化将对其电导率的变化有显著的影响.文中采用基于LabVIEWTM虚拟仪器的方法,搭建了应用于电迁移试验的电压信号采集系统,并将其应用于共晶SnBi焊点在电迁移试验过程中的数据采集试验.试验结果表明:电迁移数据采集系统具有实时性、高精度、高采样速率,并能够远程操控等优点;电迁移过程中,共晶SnBi焊点的电导率变化与电迁移试验的环境温度以及焊点内部显微组织的变化有关.     

熔融状态下共晶SnBi钎料的电迁移特性

研究电流密度为1.5×104 A/cm2时,共晶SnBi焊点的微观组织的演变.试验过程中应用Microview MVC2000图像采集卡对焊点形态的变化进行实时监控.通电仅110 s,焊点的局部区域开始熔化;130 s后达到完全熔融的状态.结果表明:通电10 min后,焊点的阳极附近形成了大量的块状Bi相,而在阴极则以细条形的Bi相为主.然而抛光后发现,阴极和阳极的微观组织保持一致,钎料基体内出现了大量的Bi的小颗粒形成的聚集,阴极界面出现了空洞.通电30 min后,共晶组织的均匀分布已经被打乱.阳极附近出现了Bi的聚集,而且阳极界面的IMC层比阴极界面的IMC层厚.     

纳米Ag颗粒对Sn-58Bi无铅钎料组织及焊点可靠性的影响

研究了纳米Ag颗粒对Sn-58Bi钎料焊点微观组织、界面金属间化合物、铺展性能以及力学性能的影响。结果表明:添加Ag颗粒可以细化焊点组织,复合钎料的组织随Ag颗粒含量的增加呈先细化后粗化的趋势;Ag颗粒的添加使界面金属间化合物的厚度增大,复合钎料的界面金属间化合物的厚度随Ag颗粒含量的增加而增加;Ag颗粒的添加可以改善钎料的铺展性能,复合钎料的铺展性能随Ag颗粒含量的增加呈先增大后减小的趋势;适量Ag颗粒的添加可以改善焊点的拉伸性能,随着Ag颗粒含量的增加复合钎料焊点的拉伸性能呈先上升后下降的趋势;Ag的最佳添加量0.5%(质量分数)。     

微连接用碳基纳米颗粒增强无铅复合钎料的研究新进展

综合评述含碳纳米管、石墨烯纳米片等碳基纳米颗粒增强微连接用无铅复合钎料的研究现状,介绍了碳纳米管、石墨烯纳米片、富勒烯、金属改性碳纳米管(石墨烯纳米片)等增强相对无铅钎料和钎焊接头组织与性能的影响。简述了无铅复合钎料的制备方法、熔化特性、导电性、润湿性、力学性能和无铅复合钎料焊点可靠性等,指出了碳基纳米颗粒增强无铅复合钎料存在的问题、解决措施及发展趋势。     

Retarding the electromigration effects to the eutectic SnBi solder joints by micro-sized Ni-particles reinforcement approach

Electromigration (EM) has become one of the reliability concerns to the electronic solder joint due to its increasing capacity to bear the high current density (10⁴ A/cm²). Although the failure induced by EM can trigger a large void across the entire cathode interface, no effective solutions are presented throughout years of effort on this problem. Here, the composite solder joints are addressed to demonstrate their potential roles on solving the EM issue in the eutectic SnBi solder joints. Micro-sized Ni particles were selected to intentionally add into the solder matrix due to their extensive application as a barrier layer in the under-bump-metallization (UBM) of flip chip solder joints. The ultimate results illustrated that the Ni particles can react with Sn to form the cluster-type Sn-Ni intermetallic compounds (IMCs) inside the solder matrix after the first reflow. Accordingly, the phase segregation of Sn and Bi was significantly inhibited during the current stressing, demonstrating the Sn-Ni IMCs can act as the obstacles to obstruct the movement of dominant diffusion entity (Bi atoms/ions) along the phase boundaries.     

结构变化对Cu/Sn-58Bi/Cu微焊点电迁移行为和组织演变的影响

利用SEM观察、聚焦离子束(FIB)微区分析和有限元模拟对比研究了直角型和线型Cu/Sn-58Bi/Cu微焊点在高电流密度下(1.5×10~4A/cm~2)的电迁移行为,从原子扩散距离和微区域电阻变化及阴阳极物相变化的角度研究了焊点结构变化对电迁移影响的机理.结果表明,2种焊点通电112和224 h后均发生了Bi向阳极迁移并聚集及Sn在阴极富集的现象;直角型焊点阳极由于Bi聚集后膨胀而产生压应力进而导致小丘状凸起和微裂纹出现,而阴极存在拉应力引发凹陷和微裂纹,且沿界面呈非均匀变化.微区组织分析表明,电迁移作用下焊点内部Bi原子的扩散速度大于Sn原子的扩散速度.观察分析和模拟结果还表明,具有结构不均匀性的直角型焊点中电子流易向电阻较小区域聚集而产生电流拥挤效应,这是引起直角型焊点电迁移现象严重的根本原因.     

电迁移对低银无铅微尺度焊点力学行为的影响

研究了电迁移条件下不同电流密度(0.63~1.0×104 A/cm2)和通电时间(0~48 h)对低银无铅Sn-Ag-Cu微尺度焊点的拉伸力学行为的影响. 结果表明,电迁移导致了低银无铅微尺度焊点的抗拉强度显著降低,并且随着电流密度的增加或通电时间的延长,焊点的抗拉强度均呈下降趋势;同时电迁移还导致焊点的拉伸断裂模式发生明显变化,在经历高电流密度或长时间通电的电迁移后,焊点在服役条件下会发生由韧性断裂向脆性断裂的转变. 此外含银量高的微尺度焊点的抗电迁移性能更强.     

Electromigration performance of Pb-free solder joints in terms of solder composition and joining path

The electromigration (EM) performance of Pb-free solder joints is investigated in terms of solder composition (Sn-0.5Cu vs. Sn-1.8Ag) and joining path to Cu vs. Ni(P) under bump metallization (UBM). In the double-sided joints of Ni(P)/solder/Cu, the micro-structure of solder joints and the interfacial intermetallic compound (IMC) layers are significantly affected by solder composition and joining path. The as-reflowed microstructure of Sn-0.5Cu joints consists of small columnar grains with thin IMC layers at both UBM interfaces, independent of the joining path, while Sn-1.8Ag joints have a few large grains of low-angle grain boundaries with thick IMC layers when joined first to Ni(P) UBM, but a few 60° twins with thin IMC layers when joined first to Cu UBM. The EM stressing under high current densities at 150°C reveals that Sn-1.8Ag joints have a superior lifetime compared to Sn-0.5Cu joints. In addition, the EM lifetime of Sn-1.8Ag joints reflowed first on Ni(P) UBM is the longest among four groups of the solder joints examined.     

微量元素对无铅焊点电迁移性能的改善

电迁移现象已经成为电子组装焊技术中最受关注的问题之一.焊点在高电流密度下的服役可靠性与焊点钎料成分有关.通过对比分析五种SnAgCu基无铅焊点在高电流密度下的服役表现,分析了添加微量元素对于电迁移现象的影响规律.结果表明,焊球承受一定电流作用之后,阴极金属间化合物（IMC）分解,铜焊盘受侵蚀,阳极形成大量脆性化合物Cu6Sn5;根据IMC层的厚度变化,Sn3.0Ag0.5Cu的抗电迁移性能优于低银钎料;向低银钎料中加入微量元素Bi和Ni后,晶粒得到了明显的细化,界面IMC层较薄,其抗电迁移的能力得到了明显的改善.     

Electromigration in solder joints and solder lines

Electromigration may affect the reliability of flip-chip solder joints. Eutectic solder is a two-phase alloy, so its electromigration behavior is different from that in aluminum or copper interconnects. In addition, a flipchip solder joint has a built-in currentcrowding configuration to enhance electromigration failure. To better understand electromigration in SnPb and lead-free solder alloys, the authors prepared solder lines in v-grooves etched on Si (001). This article discusses the results of those tests and compares the electromigration failure modes of eutectic SnPb and SnAgCu flip-chip solder joints along with the mean-timeto-failure.     

应力对SnPb基复合钎料钎焊接头蠕变性能的影响

采用搭接面积为1mm^2的单搭接钎焊接头，研究了恒定温度下，应力对纳米颗粒增强的SnPb基复合钎料钎焊接头的蠕变寿命的影响。结果表明，纳米颗粒增强的SnPb基复合钎料的蠕变抗力优于传统SnPb钎料。同时钎焊接头的蠕变寿命随应力增加而降低，且应力对复合钎料钎焊接头蠕变寿命的影响较传统63Sn37Pb钎料明显。     

微焊点Cu/SAC305/Cu固-液界面反应及电迁移行为

研究了电迁移过程中Cu/Sn-3.0Ag-0.5Cu/Cu微焊点界面金属间化合物（IMC）的生长演变机制,分析了电载荷作用下固-液电迁移与固-固电迁移的区别. 结果表明,固-液电迁移过程中,随着加载时间的延长,两极IMC层厚度均增厚,且阳极IMC层厚度增长速率比阴极大;阴极侧IMC晶粒径向尺寸一直增大,轴向尺寸呈先增大后减小的变化规律,阳极侧IMC晶粒的尺寸在轴向与径向均增大;加载过程中,阳极IMC晶粒尺寸始终大于阴极;与固-固电迁移相比,固-液电迁移后,阴极侧,焊点IMC形貌更规则,且表面光滑度提高;阳极侧,固-固扩散时界面IMC晶粒形貌为多边形球状,而固-液扩散时界面IMC形貌为多边形柱状.     

Creep behavior on Ag particle reinforced SnCu based composite solder joints

1 Introduction The EU had issued the WEEE mandate that aimed to prohibit the use of SnPb solders by 2006. Under the pressure of legislation and trade competitions, large electronic manufacturers and research institutes studied substitutes for SnPb solders…     

The effect of pre-aging on the electromigration of flip-chip SnAg solder joints

The effect of pre-aging on electromigration is investigated in this study using flip-chip SnAg solder joints. The solder joints were pre-aged at 170°C for 1 h, 3 h, 5 h, 10 h, 25 h, and 50 h, and then they were subjected to electromigration tests of 0.9 A at 150°C. It was found that the average failure time increased about three times when the joints were pre-aged for 3 h to 25 h. But it decreased when the joints were overaged. It is proposed that the major contributor to the prolonged failure time may be the densification of the nickel and copper under-bump metallization (UBM) and the solder due to the aging treatment. The pre-aging treatment at 170°C may stabilize the microstructure of the solder. The vacancies in the solder were annihilated during the heat treatment, causing a slower diffusion rate. In addition, the UBM structure became denser after the pre-aging process. Thus, the denser UBM structure may lead to slower consumption rates of the nickel and copper layers, resulting in the enhancement of electromigration resistance.