条形畴结构的FeCoAlON薄膜磁性的研究

用磁控射频溅射法制备了FeCoAlON薄膜, 研究了Al-O和N元素的添加对FeCo合金薄膜的软磁性的影响. 研究结果表明: 随着Al, O, N元素添加量的增加, 薄膜微结构从多晶转化到纳米晶再转化到非晶态, 薄膜表现为软磁性; 在N的含量较高时, 薄膜呈现条形畴结构, 本文对条形畴结构出现的机理和条件作了详细讨论, 并发现具有条形畴结构的薄膜的磁导率频率特性具有多峰共振的特点. 关键词： 铁钴基合金 薄膜 条形畴     

具有条纹磁畴结构的NiFe薄膜的制备与磁各向异性研究

具有条纹磁畴结构的磁性薄膜表现出面内转动磁各向异性,对于解决高频电子器件的方向性问题起着至关重要的作用.本文采用射频磁控溅射的方法,研究了NiFe薄膜的厚度、溅射功率密度、溅射气压等制备工艺参数对条纹磁畴结构、面内静态磁各向异性、面内转动磁各向异性、垂直磁各向异性的影响规律.研究发现,在功率密度15.6 W/cm~2与溅射气压2 mTorr(1 Torr=1.33322×102Pa)下生长的NiFe薄膜,表现出条纹磁畴的临界厚度在250 nm到300 nm之间.厚度为300 nm的薄膜比250 nm薄膜的垂直磁各向异性场增大近一倍,从而磁矩偏离膜面形成条纹磁畴结构,并表现出面内转动磁各向异性.高溅射功率密度可以降低薄膜出现条纹磁畴的临界厚度.在相同功率密度15.6 W/cm~2下生长300 nm的NiFe薄膜,随着溅射气压由2 mTorr增大到9 mTorr,NiFe薄膜的垂直磁各向异性场逐渐由1247.8 Oe(1 Oe=79.5775 A/m)增大到3248.0 Oe,面内转动磁各向异性场由72.5 Oe增大到141.9 Oe,条纹磁畴周期从0.53μm单调减小到0.24μm.NiFe薄膜的断面结构表明柱状晶的形成是表现出条纹磁畴结构的本质原因,高功率密度下低溅射气压有利于柱状晶结构的形成,表现出规整的条纹磁畴结构,高溅射气压会导致柱状晶纤细化,面内转动磁各向异性与面外垂直磁各向异性增强,条纹磁畴结构变得混乱.     

界面结构对Cu/Ni多层膜纳米压痕特性影响的分子动力学模拟

金属多层膜调制周期下降到纳米级时,其力学性质会发生显著改变. Cu-Ni晶格失配度约为2.7%,可以形成共格界面和半共格界面,实验中实现沿[111]方向生长的调制周期为几纳米且具有异孪晶界面结构的Cu/Ni多层膜,其力学性质发生显著改变.本文采用分子动力学方法对共格界面、共格孪晶界面、半共格界面、半共格孪晶界面等四种不同界面结构的Cu/Ni多层膜进行纳米压痕模拟,研究压痕过程中不同界面结构类型的形变演化规律以及位错与界面的相互作用,获取Cu/Ni多层膜不同界面结构对其力学性能的影响特征.计算结果表明,不同界面结构的样品在不同压痕深度时表现出的强化或软化作用机理不同,软化机制主要是由于形成了平行于界面的分位错以及孪晶界面的迁移,强化机制主要是由于界面对位错的限定作用以及失配位错网状结构与孪晶界面迁移时所形成的弓形位错之间的相互作用.     

退火温度对Cu:ZnO薄膜绿光发射的影响

利用溶胶-凝胶法在Si衬底上制备了不同退火温度的Cu:ZnO薄膜.利用X射线衍射(XRD)、X射线光电子能谱(XPS)、扫描电子显微镜和光致发光谱研究了样品的晶格结构、表面形貌、成分及其发光特性.结果表明:所有样品均具有高度的c轴择优取向,随着退火温度的升高,样品的结晶质量变好,样品的表面都被晶粒覆盖,强而稳定的绿光发射被观察到.绿光强度随退火温度的升高先增加后减小,发光中心位置不随退火温度的变化而改变,这样的绿光发射强而稳定.XRD和XPS结果表明,随退火温度的升高Cu2+还原为Cu+,导致Cu:ZnO薄膜形成的缺陷是VZn,所以绿光发射是由VZn引起的.Cu2+还原为Cu+时,Cu:ZnO薄膜中VZn浓度增加,使绿光发射强度增大.当退火温度超过800?C时,Cu2+的还原能力变差,绿光发射强度减弱.     

热处理温度对ZnO：Al薄膜性能的影响

利用溶胶-凝胶技术在玻璃衬底上制备了ZnO:Al薄膜,表征了薄膜的结构、光透过和光致发光特性,探讨了热处理温度对薄膜晶体结构和光学性质的影响.结果表明,在热分解温度400 ℃和退火温度600 ℃时,ZnO:Al薄膜的C轴择优取向明显,透过率较高.在热处理温度400 ℃情况下,激发波长340 nm的光致发光谱中有三个发光中心,紫外发光强度随退火温度的升高先升高后下降,500 ℃时发光强度最强.其它两个发光峰的强度随退火温度的升高而降低甚至消失.激发波长不同,ZnO:Al薄膜的发光中心和强度均发生变化.     

热处理温度对ZnO∶Al薄膜性能的影响

利用溶胶-凝胶技术在玻璃衬底上制备了ZnO∶Al薄膜,表征了薄膜的结构、光透过和光致发光特性,探讨了热处理温度对薄膜晶体结构和光学性质的影响.结果表明,在热分解温度400 ℃和退火温度600 ℃时,ZnO∶Al薄膜的C轴择优取向明显,透过率较高.在热处理温度400 ℃情况下,激发波长340 nm的光致发光谱中有三个发光中心,紫外发光强度随退火温度的升高先升高后下降,500 ℃时发光强度最强.其它两个发光峰的强度随退火温度的升高而降低甚至消失.激发波长不同,ZnO∶Al薄膜的发光中心和强度均发生变化.     

热处理对制备辉光放电聚合物薄膜结构及光学性能的影响

利用低压等离子体聚合技术制备了约5 μm的辉光放电聚合物薄膜, 将所制备的样品放入热处理炉中通入氩气保护, 分别在280 ℃, 300 ℃, 320 ℃, 340 ℃进行热处理. 对热处理后的样品采用傅里叶变换红外吸收光谱(FT-IR)分析了不同热处理温度对薄膜结构的影响. 对CH振动区进行了分峰高斯拟合, 定量的分析了个官能团的变化. 利用紫外可见光谱仪分析了热处理前后薄膜在紫外–可见光区域内光学透过率及光学带隙的变化. 结果表明: 随着热处理温度的升高,薄膜中H含量减少, 薄膜中甲基相对含量减少, 而双键、芳香环结构相对含量增加, 在600 nm以后的可见光区, 薄膜的透过率减小. 薄膜光透过率的截止波长红移, 光学带隙减小. 关键词： 热处理 薄膜结构 等离子体聚合 光学性能     

Cu元素对Cu(In,Ga)Se_2薄膜及太阳电池的影响

Cu元素成分对Cu(In,Ga)Se2(简称CIGS)薄膜材料的电学性质及其电池器件性能有很重要的影响.本文利用蒸发法制备了贫Cu和富Cu的CIGS吸收层(0.7Cu/(Ga+In)1.15)及相应的电池器件.扫描电镜和Hall测试发现,富Cu材料的结构特性(晶粒大、结晶状态好)和电学特性(电阻率低、迁移率高等)优于贫Cu材料,而性能测试表明贫Cu器件的效率优于富Cu器件.变温性能测试分析表明,贫Cu器件的主要复合路径是体复合,激活能与CIGS禁带宽度相当;富Cu器件的主要复合路径是界面复合,其激活能远小于CIGS禁带宽度,这大大降低了开路电压Voc,从而降低了电池效率.最后利用蒸发三步法制备了体材料稍富Cu表面贫Cu的CIGS吸收层,降低了短路电流和开路电压的损失,获得了超过15%的电池效率.     

热处理温度对化学镀磁性ICF玻璃靶丸特性的影响

 在300,700和1 000 ℃温度下,对化学镀Ni-P合金涂层后的磁性ICF玻璃靶丸进行热处理,通过X射线衍射仪（XRD）、扫描电子显微镜（SEM）和振动样品磁强计（VSM）对热处理后化学镀ICF玻璃靶丸的结构、形貌和磁性能进行了表征。结果表明：化学镀ICF玻璃靶丸经过热处理后,Ni-P涂层晶化为晶态合金层,涂层的组成颗粒直径和磁性能随着热处理温度的升高而不断增加,可望用于磁悬浮实验研究。     

Influence of annealing temperature on the formation, microstructure and magnetic properties of spinel nanocrystalline cobalt ferrites

Nanocrystalline cobalt ferrites were synthesized by a simple, general, one-step sol–gel auto-combustion method. An interpretation based on the measurement of the adiabatic flame temperature and the amounts of gas evolved during reaction had been proposed for the nature of combustion. The influence of annealing temperatures on the magnetic properties was investigated. The microstructure was characterized by means of X-ray diffractometer (XRD) and transmission electron microscopy (TEM). It was found that the particle size and magnetic properties of the as-prepared ferrite samples showed strong dependence on the annealing temperature. The coercivity initially increased and then decreased with increasing annealing temperature whereas the particle size and saturation magnetization continuously increased.     

High temperature annealing effect on structural and magnetic properties of Ti/Ni multilayers

High temperature annealing effect on structural and magnetic properties of Ti/Ni multilayer (ML) up to 600 °C have been studied and reported in this paper. Ti/Ni multilayer samples having constant layer thicknesses of 50 Å each are deposited on float glass and Si(1 1 1) substrates using electron-beam evaporation technique under ultra-high vacuum (UHV) conditions at room temperatures. The micro-structural parameters and their evolution with temperature for as-deposited as well as annealed multilayer samples up to 600 °C in a step of 100 °C for 1 h are determined by using X-ray diffraction (XRD) and grazing incidence X-ray reflectivity techniques. The X-ray diffraction pattern recorded at 300 °C annealed multilayer sample shows interesting structural transformation (from crystalline to amorphous) because of the solid-state reaction (SSR) and subsequent re-crystallization at higher temperatures of annealing, particularly at ≥400 °C due to the formation of TiNi₃ and Ti₂Ni alloy phases. Sample quality and surface morphology are examined by using atomic force microscopy (AFM) technique for both as-deposited as well as annealed multilayer samples. In addition to this, a temperature dependent dc resistivity measurement is also used to study the structural transformation and subsequent alloy phase formation due to annealing treatment. The corresponding magnetization behavior of multilayer samples after each stage of annealing has been investigated by using Magneto-Optical Kerr Effect (MOKE) technique and results are interpreted in terms of observed micro-structural changes.     

Influence of annealing temperature on microstructure and optical properties of sol-gel derived tungsten oxide films

Tungsten oxide (WO₃) thin films have been extensively studied for their interesting physical properties and a variety of potential applications in electrochromic devices. In order to explore the possibility of using these in electrochromic devices, a preliminary and thorough study of the optical properties of the host materials is an important step. Based on this, the influence of annealing temperature on the structural, surface morphological, optical and electrochromic properties has been investigated in the present work. The host material, WO₃ films, has been prepared from an ethanolic acetylated peroxotungstic acid sol containing 5 wt.% oxalic acid dehydrate (OAD) by sol-gel technique. The monoclinic structure and textured nature change of the films with the temperature increasing have been investigated by X-ray diffraction analysis. The surface morphology evolution of the films has been characterized by SEM. The shift in absorption edge towards the higher wavelength region observed from optical studies may be due to the electron scattering effects and the optical band filling effect that reveals the crystallization of the film. The amorphous film shows better optical modulation (ΔT = 76.9% at λ = 610 nm), fast color-bleach kinetics (t_c ∼ 4 s and t_b ∼ 9 s) and good reversibility (Q_b/Q_c = 90%), thereby rendering it suitable for smart window applications.     

Effect of magnetic field annealing on microstructure and magnetic properties of FePt films

FePt (20 nm) films were annealed in a magnetic field (along the normal direction of the films) at a temperature around the Curie temperature of L1₀ FePt. The influence of magnetic filed annealing on texture and magnetic properties of FePt films were investigated. The results indicate that preferential (0 0 1) orientation and perpendicular anisotropy can be obtained in L1₀ FePt films by using magnetic field annealing around the Curie temperature of L1₀ FePt. This is one of the potential methods to obtain (0 0 1) orientation and thus to improve the perpendicular anisotropy in FePt films.     

Influence of annealing process on magnetic properties and Barkhausen noise of the Fe-W-B amorphous alloy

The study of structural changes followed by measuring of structure sensitive magnetic properties as the energy of total and stress induced anisotropy, the coercive field, the demagnetizing factor and the Barkhausen noise parameters of the as-cast and annealed Fe_81.4 W_2.6B₁₆ amorphous alloy was performed. The investigated structural changes were connected with the temperature range within which the Fe_81.4W_2.6B₁₆ amorphous alloy was characterized by the soft magnetic properties.     

Annealing temperature effect on microstructure,magnetic and microwave properties of Fe-based amorphous alloy powders

Fe₇₄Ni₃Si₁₃Cr₆W₄ amorphous alloy powders were annealed at different temperature (T) for 1.5 h to fabricate the corresponding amorphous and nanocrystalline powders. The influences of T on the crystalline structure, morphology, magnetic and microwave electromagnetic properties of the resultant samples were investigated via X-ray diffraction, scanning electron microscopy, vibrating sample magnetometer and vector network analyzer. The results show that the powder samples obtained at T of 650 °C or more are composed of lots of ultra-fine α-Fe(Si) grains embedded in an amorphous matrix. When T increases from 350 to 750 °C, the saturated magnetization and coercivity of the as-annealed powder samples both increase monotonously whereas the relative real permittivity shows a minimal value and the relative real permeability shows a maximal value at T of 650 °C. Thus the powder samples annealed at 650 °C show optimal reflection loss under −10 dB in the whole C-band. These results here suggest that the annealing heat treatment of Fe-based amorphous alloy is an effective approach to fabricate high performance microwave absorber with reasonable permittivity and large permeability simultaneously via adjusting T.     

时效时间对FeNiAlTa形状记忆合金组织结构和性能的影响

本文以 Fe_59.5Ni₂₈Al_11.5Ta₁ 形状记忆合金为研究对象, 采用金相显微镜、X 射线衍射仪、扫描电镜、能谱仪和压力试验机等研究了轧制后不同时 效时间处理对该合金组织结构和性能的影响. 结果表明, 随着时效的进行, γ’ 相和 β’ 相的相继析出, 强化了奥氏体基体. 综合伪弹性曲线看出, 随着时效时间的增加, 600 ℃时效态合金的应力诱发马氏体临界应力先减小后增大, 合金的抗压强度、可恢复的应变和硬度都先增大后减小, 合金的残余应变则先减小后增大, 时效时间为 60 h 时, 合金的抗压强度最大, 到达1306 MPa, 此时合金的可恢复形变最大, 达到14.9%, 合金的硬度也最大, 合金的残余应变相对最小. 但随着时效时间的延长, 合金的最大应变逐渐减小, 合金塑性逐渐减小. Fe_59.5Ni₂₈Al_11.5Ta₁ 形状记忆合金的性能与沉淀相的颗粒大小、分布、体积分数等因素有关. 关键词： 59.5Ni₂₈Al_11.5Ta₁')" href="#">Fe_59.5Ni₂₈Al_11.5Ta₁ 时效处理 伪弹性 硬度     

退火温度对ZnO薄膜结构和发光特性的影响

采用反应射频磁控溅射法在 Si(100)基片上制备了高c轴择优取向的ZnO薄膜，研究了退火温度对ZnO薄膜的晶粒尺度、应力状态、成分和发光光谱的影响，探讨了ZnO薄膜的紫外发光光谱和可见发光光谱与薄膜的微观状态之间的关系.研究结果显示,在600—1000℃退火温度范围内，退火对薄膜的织构取向的影响较小，但薄膜的应力状态和成分有比较明显的变化.室温下光致发光光谱分析发现，薄膜的近紫外光谱特征与薄膜的晶粒尺度和缺陷状态之间存在着明显的对应关系；而近紫外光谱随退火温度升高所呈现的整体峰位红移是各激子峰相对比例变 关键词： ZnO薄膜 退火 光致发光 射频反应磁控溅射 可见光发射     

退火温度对溅射铝膜结构与电性能的影响

采用直流磁控溅射方法成功地制备了Al膜,研究了退火温度对Al膜表面形貌、晶体结构、应力、择优取向及反射率的影响。研究表明：不同退火温度的薄膜晶粒排布致密而光滑,均方根粗糙度小。XRD测试表明：不同温度退火的铝膜均成多晶状态,晶体结构为面心立方,退火温度升高到400 ℃时,Al膜的应力最小达0.78 GPa,薄膜平均晶粒尺寸由18.3 nm增加到25.9 nm;随着退火温度的升高,(200)晶面择优取向特性变好。薄膜紫外-红外反射率随着退火温度的升高而增大。     

退火温度对溅射铝膜结构与电性能的影响

 采用直流磁控溅射方法成功地制备了Al膜,研究了退火温度对Al膜表面形貌、晶体结构、应力、择优取向及反射率的影响。研究表明：不同退火温度的薄膜晶粒排布致密而光滑,均方根粗糙度小。XRD测试表明：不同温度退火的铝膜均成多晶状态,晶体结构为面心立方,退火温度升高到400 ℃时,Al膜的应力最小达0.78 GPa,薄膜平均晶粒尺寸由18.3 nm增加到25.9 nm;随着退火温度的升高,(200)晶面择优取向特性变好。薄膜紫外-红外反射率随着退火温度的升高而增大。