原子力显微镜与X射线光电子能谱对ITO表面改性的研究

采用氧气等离子体(OP)处理对氧化铟锡(ITO)薄膜进行表面改性,通过原子力显微镜(AFM)、X射线光电子能谱(XPS)和四探针等测试手段对薄膜样品进行表征,研究了OP处理对ITO表面性质的影响.实验结果表明OP处理有效去除了ITO表面的污染物,优化了ITO表面的化学组分,降低了ITO表面的粗糙度和方块电阻,改善了ITO的表面形态.与此同时,通过XPS监测研究了OP处理后ITO表面化学组分随老化时间的变化,结果显示经过优化的化学组分随老化时间增加而逐渐退化.另外,以OP处理后经过不同老化时间的ITO样品作为空穴注入电极,制备了有机电致发光器件(OELD),通过测试器件的电压-电流-亮度特性,进一步研究了ITO表面性质对于OELD光电性能的影响.     

射频等离子体改性工艺与氧化铟锡薄膜性能研究

采用正交实验方法研究了氧气等离子体表面改性中各工艺因素对ITO薄膜表面性质的影响,获得了IID表面改性的最佳工艺条件,并且通过XPS,AFM,透射光谱的分析以及薄膜表面接触角和方块电阻的测量,表征了优化工艺条件下氧气等离子体处理前后ITO薄膜的表面性质.结果表明,氧气等离子体处理降低了ITO表面的粗糙度和方块电阻,改善了ITO表面的化学组分和浸润性能.另外,以表面处理前后的ITO基片作为空穴注入电极,采用真空热蒸镀技术制备了有机薄膜电致发光(OTFEL)器件,并对器件的电流.电压.亮度特性以及电流效率进行了测试和分析,实验结果显示,氧气等离子体处理降低了启亮电压和驱动电压,提高了发光亮度和电流效率,有效地改善了OTFEL器件的光电性能.     

高流动性、强疏水性淀粉的制备及性能

采用干法改性处理技术对玉米淀粉进行改性处理,制备得到具有高流动性及强疏水性的玉米淀粉。通过活化指数、接触角、流动时间及休止角等指标,对改性前后玉米淀粉的流动性及疏水性进行评价。结果表明,经过改性处理,玉米淀粉由亲水性表面转变为强疏水性表面,并且改性后的玉米淀粉具有了良好的流动性。X射线衍射(XRD)测试结果表明,改性处理并没有改变玉米淀粉的结晶结构,只是改变玉米淀粉的表面性质。     

空气中介质阻挡放电对聚丙烯进行表面改性的研究

用大气压空气中介质阻挡放电(DBD)对聚丙烯(PP)薄膜进行表面改性.通过扫描电子显微镜(SEN)观察、接触角测量和X射线光电子能谱分析(XPS)等手段,研究了DBD等离子体处理前后PP膜的表面特性.实验结果表明,PP薄膜经DBD等离子体处理后,其表面结构变粗糙,且引入了极性基团,表面微观样貌和表面化学成分均发生变化.PP膜表面水接触角随着处理时间的增加而降低,且在处理8s时达到饱和值53°.对改性后的PP薄膜在空气中放置时的老化效应进行研究后发现,即使放置12天后其表面水接触角仍远低于改性前的值.     

化学改性聚氯代对二甲苯薄膜表面润湿性的研究

采用了一种自制的改性剂对聚氯代对二甲苯薄膜表面改性,研究了不同改性剂浓度以及反应时间对聚氯代对二甲苯薄膜表面改性效果的影响,用X射线荧光光谱(XRF)、X射线衍射仪(XRD)和扫描电子显微镜(SEM)研究了改性前后薄膜的表面特性.结果表明,改性剂浓度为1.5mol/L和反应处理时间为10min时处理效果最好,聚氯代对二甲苯薄膜表面与去离子水的接触角从未改性时的96.49°减小到改性后的67.5°,改性后的聚氯代对二甲苯薄膜表面能由未改性时的14.335mJ/m2提高到34.798mJ/m2,薄膜表面氯元素含量显著降低.     

丙烯胺等离子体技术对聚碳酸酯聚氨酯的表面改性

利用丙烯胺等离子体表面修饰对聚碳酸酯聚氨酯材料进行改性研究,讨论了改性条件对材料表面亲水性和表面形态的影响,水接触角、扫描电镜(SEM)、X射线光电子能谱(XPS)测试结果表明,预处理气压、处理功率、放电时间对聚氨酯材料表面改性影响较大.经丙烯胺等离子体修饰后,材料表面的亲水性得到改善;表面形态由高度平整、光滑变为粗糙...     

大气压等离子体射流改性船体钢表面亲水性研究

在室温下,采用大气压等离子体射流对船体钢进行表面改性,通过水接触角测量、扫描电镜、X射线光电子能谱等分析测试方法研究了等离子体射流处理前后船体钢表面润湿性、表面形貌及化学特性的变化。研究结果表明,船体钢经大气压空气等离子体射流处理后在其表面引入了大量含氧基团,处理2s表面的水接触角就可以降到30°以下;处理后材料表面的亲水性受处理时间及放电电流的影响且在空气中放置时会出现老化效应,处理时间越长,老化效应越弱。     

废旧橡胶颗粒的表面改性及粘接性能

研究了次氯酸钠(Na Cl O)对废旧橡胶颗粒(GTR)的表面改性,得到了表面氧化和氯化的改性GTR颗粒(m GTR),并制备了废旧橡胶颗粒/聚氨酯(GTR/PU)复合材料。通过X射线光电子能谱、扫描电镜、接触角等手段对GTR进行了表征,研究了Na Cl O溶液在不同处理时间对GTR表面改性效果的影响。结果表明,通过Na Cl O溶液改性后,GTR表面的极性官能团数量增加、粗糙度增加、润湿性提高,最佳处理时间为10 min。改性后的GTR制备的复合材料力学性能及与钢板的粘接性能明显提高,与未改性GTR相比,10 min处理的GTR制备的复合材料拉伸强度提高36%,粘接强度提高127%。     

射频等离子体对纯钛表面的氨基化改性

采用射频辉光等离子体技术,以氮气与氨气的混合气体为气体源对纯钛进行处理。采用X射线光电子能谱对改性的样品表面成分进行分析,并讨论氨基化机理;采用表面接触角测试仪研究了处理时间、放置时间及保存方式对材料表面亲水性的影响。结果表明:经过氮气与氨气的混合气体等离子体改性后,材料表面存在氨基和氮钛化合物,处理90 min后,表面氨基含量高;改性后材料表面亲水性增加,但随放置时间的增加亲水性变差,在5 h内,改性钛片保存在氮气气氛中有利于亲水性的保持。     

基于等离子体氧化技术的医用钛材料亲水性表面制备研究

采用真空射频辉光放电技术对喷砂酸蚀工艺处理后的钛表面进行等离子体氧化工艺的优化研究,以用于牙种植体表面改性。以钛表面的接触角作为正交试验的参考指标,对等离子体氧化工艺进行优化。在试验范围内,优化的参数为:工作压力为6.5 Pa,O2/Ar=1(Ar=5 sccm),基板直流偏压为400 V,射频功率为200 W,氧化时间60 min。利用扫描电子显微镜、接触角测量仪及X射线光电子能谱仪研究了优化后的氧化膜对钛表面形貌、亲水性的影响以及其化学组成和价键状态。结果表明:优化工艺处理后,钛片表面保留了原有的多孔形貌,并获得了平均接触角低于10°的超亲水性表面,但随着暴露空气时间的增加,其接触角会增大;钛表面出现Ti4+和Ti3+离子,其中二者的比例基本相同。     

在线紫外辐照辅助沉积柔性ITO薄膜的研究

显示技术正朝着柔性化、超薄化方向发展,低温制备柔性ITO薄膜已经成为一大趋势.本文在射频磁控溅射过程中,引入在线紫外辐照,室温条件下在有机衬底上制备柔性ITO薄膜的工艺,其最低方块电阻为5Ω,电阻率为2.5×10 -4Ω·cm,透光率为92%,远远优于未采用紫外辐照制备的柔性ITO薄膜.我们用四探针测试仪、分光光度计、原子力显微镜、X射线衍射仪等测试仪器,对未采用和采用在线紫外辐照制备的薄膜进行测试,分析探讨了紫外线辐照对薄膜的光电性能、表面形貌和生长取向的影响.研究结果表明:在紫外线的照射下,ITO薄膜表面形貌得到改善,晶界缺陷减少,生长更均匀,致密度更好,在降低薄膜电阻率的同时,提高了薄膜在可见光区的透射率,在紫外辐照下,ITO薄膜更趋于〈222〉的择优取向,且平均晶粒尺寸变大,结晶度提高,宏观表现为薄膜的电阻率降低.     

On the structure and surface chemical composition of indium-tin oxide films prepared by long-throw magnetron sputtering

Structures and surface chemical composition of indium tin oxide (ITO) thin films prepared by long-throw radio-frequency magnetron sputtering technique have been investigated. The ITO films were deposited on glass substrates using a 20 cm target-to-substrate distance in a pure argon sputtering environment. X-ray diffraction results showed that an increase in substrate temperature resulted in ITO structure evolution from amorphous to polycrystalline. Field-emission scanning electron microscopy micrographs suggested that the ITO films were free of bombardment of energetic particles since the microstructures of the films exhibited a smaller grain size and no sub-grain boundary could be observed. The surface composition of the ITO films was characterized by X-ray photoelectron spectroscopy (XPS). Oxygen atoms in both amorphous and crystalline ITO structures were observed from O 1 s XPS spectra. However, the peak of the oxygen atoms in amorphous ITO phase could only be found in samples prepared at low substrate temperatures. Its relative peak area decreased drastically when substrate temperatures were larger than 200 °C. In addition, a composition analysis from the XPS results revealed that the films deposited at low substrate temperatures contained high concentration of oxygen at the film surfaces. The oxygen-rich surfaces can be attributed to hydrolysis reactions of indium oxides, especially when large amount of the amorphous ITO were developed near the film surfaces.     

原子氧处理减小多晶PZT-PMN薄膜漏电流的实验研究

漏电流是铁电薄膜应用过程中的关键问题。本文通过磁控溅射法制备了结晶性能良好的铌镁锆钛酸铅(PZT-PMN)铁电薄膜,并在室温下用原子氧对其进行处理,研究了原子氧对PZT-PMN薄膜表层微观结构和漏电流的影响。实验结果表明:经原子氧处理后的PZT-PMN薄膜,①表面粗糙度下降且有非晶层形成;②表层有大量的氧原子进入;③漏电流密度减小了大约一个数量级,外加电压为2.5 V时,未处理样品的漏电流密度为3×10-5A/cm2,处理样品的漏电流密度降为4.5×10-6A/cm2。原子氧对PZT-PMN薄膜内部晶界、缺陷的钝化是薄膜漏电流减小的原因。     

Oxygen plasma treatment effects of indium-tin oxide in organic light-emitting devices

The effects of oxygen plasma treatment on the surface properties of indium-tin oxide (ITO) substrates and its aging were investigated by X-ray photoelectron spectroscopy (XPS), contact angle, surface energy and polarity measurements. Experimental results demonstrate that the oxygen plasma treatment improves the stoichiometry of the surface and enhances the ITO wetting, so as to improve the surface properties of ITO substrates, due to the introduction of oxygen and the partial removal of hydrocarbon contaminants from the ITO surfaces. With the increment of aging time, however, the improved ITO surface properties are observed to tend to decay. Furthermore, the aging effect of treated ITO substrates on the performance of organic light-emitting devices (LEDs) was studied with respect to the driving voltage, brightness and efficiency. It is found that the device performance is subjected to the ITO surface properties and the ITO substrates aged for various times result in significant differences in electrical and optical characteristics which become worse as the aging time increases. The results indicate that the performance of organic LEDs is closely related to the surface properties of ITO substrates and the interface characteristics of ITO/organic layer.     

Surface modification and characterization of indium–tin oxide for organic light-emitting devices

We used various treatment methods such as ethanol treatment, sodium hydroxide solution treatment, sulfur acid treatment, and oxygen plasma treatment to modify the surface of indium–tin oxide (ITO) substrates for organic light-emitting devices (OLEDs). The surface properties of the treated ITO substrates were characterized by atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), contact angle, surface energy measurements, four-point probe, X-ray Diffraction (XRD) and ultraviolet-visible spectrophotometer. The results showed that the ITO surface properties were closely related to the treatment methods, and the oxygen plasma is more efficient than other treatments as it leads to smoother surface, better surface stoichiometry, higher work function and surface energy, lower sheet resistance, and higher transmission of the ITO substrates. Moreover, small molecular organic light-emitting devices (SMOLEDs) using different treated ITO substrates as anodes were fabricated and investigated. It was found that surface treatment of ITO substrates has influence upon the injection current, the turn-on voltages of light emission, luminance, efficiency and lifetime. Oxygen plasma treatment on the ITO substrate yields the highest performance of SMOLEDs due to the improvement of interface formation and electrical contact of the ITO substrate with the small molecular material blend in the SMOLEDs.     

Microstructure-Property relationships in thin film ITO

Polycrystalline tin-doped indium oxide (ITO) thin films were prepared by pulsed laser deposition (PLD) with an ITO (In₂O₃-10 wt.% SnO₂) target and deposited on borosilicate glass substrates. By changing independently the deposition temperature and the oxygen pressure, a variety of microstructures were deposited. These different microstructures were mainly investigated not only by transmission electron microscopy (TEM) with cross-section and plan-view electron micrographs, but also by scanning electron microscopy (SEM), atomic force microscopy (AFM) and X-ray diffraction. Composition changes in ITO thin films grown under different deposition conditions were characterized by energy dispersive X-ray spectroscopy (EDX). The optical and electrical properties were studied respectively by UV-visible spectrophotometry and a four-point probe. The best compromise in terms of high transmittance (T) in the visible range and low resistivity (ρ) was obtained for films deposited between 0.66 and 2 Pa oxygen pressure (P_O2) at 200 °C substrate temperature (T_s). The influence of P_O2 and T_s on the microstructure and ITO film properties is discussed.     

溅射功率和氧分压对ITO薄膜光电性能的影响研究

采用直流反应磁控溅射法制备了氧化铟锡(ITO)透明导电薄膜,通过四探针、紫外可见分光光度计、X射线衍射(XRD)、霍尔效应仪、扫描电镜(SEM)等对薄膜样品进行了表征,研究了溅射功率和氧分压对ITO薄膜微观结构和光电性能的影响,结果表明:溅射功率对ITO的光电性能影响较小,沉积速率随着溅射功率的增大而加快;随着氧分压的升高,载流子浓度降低,霍尔迁移率先增大后减小,电阻率逐渐增大。在优化的工艺条件下,制备了在可见光区平均透过率达85%、电阻率为1×10-4Ω.cm的光电性能优良的ITO薄膜。     

能量过滤磁控溅射技术制备ITO薄膜及其特性研究

采用磁控溅射(DMS)和能量过滤磁控溅射(EFDMS)技术在玻璃衬底上制备ITO透明导电薄膜。利用扫描电子显微镜、原子力显微镜、X射线衍射、紫外-可见分光光度计、四探针电阻仪、椭偏光谱仪等对薄膜的性能进行表征和分析,初步探讨了EFDMS技术的成膜机理。研究发现与DMS技术相比,EFDMS技术可有效降低薄膜的表面粗糙度,并且薄膜光电性能有一定改善。     

Noncontact characterization of sheet resistance of indium-tin-oxide thin films by using a near-field microwave microprobe

The sheet resistance of indium-tin-oxide (ITO) thin films with different microstructures and morphologies was measured by using a near-field scanning microwave microprobe (NSMM). The NSMM system was coupled to a dielectric resonator with a distance regulation system at an operating frequency f = 5.2-5.5 GHz. ITO thin films with different microstructures and morphology were characterized by X-ray diffraction and atomic force microscopy. As the sheet resistance increased, the intensity ratio of the (222) to the (400) diffraction peak increased and the surface roughness increased.