Photo-quenched of the luminiscence signal in Co(II)-doped alumina prepared by the sol-gel method

Co(II)-doped alumina monoliths prepared by the sol-gel method were laser irradiated producing fluorescence. The intensity of this defect-induced fluorescence was exponentially reduced with the irradiation time to practically disappear. The rate the fluorescence intensity decays was modeled as a double exponential function of the irradiation time; the characteristic times associated with the decays are in the range of seconds. The suppression of the luminescence was associated with the local heating produced by the highly focused laser beam in a small area (≈ 2 μm in diameter) on the sample. This heating process reduces physical (grain boundaries and surface states) and chemical (oxygen vacancies) defects present in the sol-gel samples. Some residual fluorescence still remains after long periods of illumination. The characteristic times for alumina samples are compared with those obtained for other metal oxides prepared also by the sol-gel method.     

Boron-doped a-SiOx:H films prepared by photo-CVD technique

The optoelectronic and structural properties of p-type a-SiO_x:H films have been studied. The deposition parameters e.g. chamber pressure and diborane to silane ratio are optimized to get a film with dark conductivity (σ_d) 7.9×10⁻⁶ S cm⁻¹ and photoconductivity 9.3×10⁻⁶ S cm⁻¹ for an optical gap (E₀₄) of 1.94 eV. The decrease of optical gap accompanied by the increase of conductivity is due to less oxygen incorporation in the film, which is substantiated by the decrease of the intensity of SiO absorption spectra. The properties are very much effected by the chamber pressure and diborane to silane ratio.     

Structural and optical properties of TiO2:SnO2 thin films prepared by sol gel method

ABSTRACT

TiO₂:SnO₂ thin films were deposited on glass substrates, by using sol gel spin coating method with different ratio (3%, 5% and 7%) at 3200 rpm, to study their effect on different properties of TiO₂: SnO₂ thin films. The structural and optical properties of films have studied for different ratio. These deposited films have been characterized by various methods such as X-Ray Diffraction (XRD), Ultra Visible spectroscopy. The (XRD) can be used to identify crystal structure of as deposited films. The Transmission spectra have shown the transparent and opaque parts in the visible and UV wavelengths.