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本文考虑到薄膜样品表面的多次反射,从理论上推导了光声信号的表达式.对α-Si:H薄膜和掺硫α-Si:H薄膜随入射光波长变化的吸收系数曲线进行了测定,并获得了光学带隙与掺硫浓度的关系. 相似文献
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用热弹性理论系统地分析了凝聚态物质的光声喇曼效应,分别导出了连续和脉冲激光泵浦下的光声喇曼信号表达式,并做了数值估算. 相似文献
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本文以有机薄膜Perylene:PS为增益介质,在透明导电薄膜ITO衬底上,实现了在光泵浦条件下光增益放大。观察到的放大自发发射峰位于478nm,光谱半高全宽为7nm。 相似文献
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Cerium dioxide thin film optical waveguides were fabricated by an RF magnetron sputtering process. The films were deposited on glass substrates and on silicon dioxide layers grown on silicon substrates. Optical loss measurements for the fabricated waveguides are reported. It is seen that the volume losses in the films were fairly high compared with the surface losses. 相似文献
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介绍了几种常见的硫系薄膜制备方法, 根据现有实验条件采用热蒸发法和磁控溅射法制备出Ge-Sb-Se三元体系硫系薄膜, 通过台阶仪测试薄膜的厚度和表面粗糙度, 计算出两种制备方法的成膜速率, 并通过X射线光电子能谱测试了两种制备方法所得薄膜与块体靶材组分的差别. 利用Z扫描技术和分光光度计测试了热蒸发法制备所得薄膜的三阶非线性性能和透过光谱, 计算出非线性折射率、非线性吸收系数和薄膜厚度等参数. 结果表明热蒸发法制备Ge-Sb-Se薄膜具有良好的物理结构和光学特性, 在集成光学器件方面很高的应用潜力. 相似文献
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用射频磁控溅射方法在SiO2衬底上制备ZnO薄膜。在室温下观测到了A、B激子吸收以及在19K下发现的A、B、C激子的反射表明所制备的ZnO薄膜具有很好的纤锌矿结构。我们获得了来自于电子空穴等离子体的受激发射。进一步研究我们发现由大量窄峰所组成的激光发射,窄峰的间距都为0.5nm左右。根据理论计算,产生激光发射的自成腔的长度为31.5 μm。我们认为ZnO薄膜中产生激光发射的自成腔的形成与其六角型结构有重要关系。 相似文献
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采用高频溅射方法制成Te-In-Sb系统的非晶态薄膜.系统的研究了不同组分薄膜的透射、反射谱,及其在结晶过程中的变化.用透射电镜研究了Te-In-Sb薄膜的结构和晶化过程.分析了组分对薄膜的吸收系数、介电常数、光学能隙等光学性质的影响.并由此综合评价了Te-In—Sb系统中比较适合作为光盘介质的组成. 相似文献
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The opto-electronic properties of molecular-beam-epitaxy (MBE)-grown ZnSSe thin films on indium-tin-oxide (ITO) glass substrates were investigated in this work. Ultraviolet (UV) photoresponsivity as high as 0.01 A/W and three orders of visible rejection power were demonstrated. The results of d.c. resistivity measurements revealed that the resistivity of the ZnSSe thin films decreased as the crystal size increases and reaches a value of 4.3 × 1011 Ω cm for a thin film grown at the optimized substrate temperature of 290°C. The results of a.c. impedance measurements performed in the frequency range of 40 to 4000 Hz further indicated that the impedance of this alloy thin film can provide a good match with the liquid crystal layer of a liquid crystal light valve for UV imaging applications. 相似文献
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针对光度测量数据中难以消除的系统误差对薄膜光学参数表征精度的负面影响,提出一种新型的误差处理技术。选取薄膜光谱系数对折射率和几何厚度的一阶偏导数,对大部分测量入射角满足符号相反或只有其中一个为零的条件的波段,剔除偏导数对全部测量入射角满足符号相同或同时为零条件的奇点波长附近波段,作为反演表征用的光度测量数据采集区域,以最小化光度测量系统误差引起的薄膜光学参数反演表征值相对真实值的偏差大小。通过数值模拟实验,对比研究了该技术对不同偏振光和不同测量入射角范围的适用性及实施技巧,以可复现的数值实验数据和合理的理论解释支持和验证了这种误差处理技术的可靠性。 相似文献
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针对多角度椭偏测量透明基片上薄膜厚度和光学参数时基片背面非相干反射光的影响问题,报道了利用椭偏透射谱测量等离子增强化学气相沉积法(PECVD)制备的a-Si:H薄膜厚度和光学参数的方法,分析了基片温度Ts和辉光放电前气体温度Tg的影响.研究表明,用椭偏透射法测量的a-Si:H薄膜厚度值与扫描电镜(SEM)测得的值相当,推导得到的光学参数与其他研究者得到的结果一致.该方法可用于生长在透明基片上的其他非晶或多晶薄膜.
关键词:
椭偏测量
透射法
光学参数
氢化非晶硅薄膜 相似文献
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M. Mekhnache A. Drici L. Saad Hamideche H. Benzarouk A. Amara L. Cattin J.C. Bernède M. Guerioune 《Superlattices and Microstructures》2011
ZnO thin films were deposited on glass, ITO (In2O3; Sn) and on ZnO:Al coated glass by spray pyrolysis. The substrates were heated at 350 °C. Structural characterization by X-ray diffraction (XRD) measurements shows that films crystallize in hexagonal structure with a preferential orientation along (0 0 2) direction. XRD peak-shift analysis revealed that films deposited on glass substrate (−0.173) were compressive, however, films deposited onto ITO (0.691) and on ZnO:Al (0.345) were tensile. Scanning electron microscopies (SEM) show that the morphologies of surface are porous in the form of nanopillars. The transmittance spectra indicated that the films of ZnO/ITO/glass and ZnO/ZnO:Al/glass exhibit a transmittance around 80% in the visible region. An empirical relationship modeled by theoretical numerical models has been presented for estimating refractive indices (n) relative to energy gap. All models indicate that the refractive index deceases with increasing energy band gap (Eg). 相似文献