Structure and thermal conductivity of Gd2(TixZr1 − x)2O7 ceramics

The Gd₂(Ti_xZr_1 − x)₂O₇ (x = 0, 0.25, 0.50, 0.75, 1.00) ceramics were synthesized by solid state reaction at 1650 °C for 10 h in air. The relative density and structure of Gd₂(Ti_xZr_1 − x)₂O₇ were analyzed by the Archimedes method and X-ray diffraction. The thermal diffusivity of Gd₂(Ti_xZr_1 − x)₂O₇ from room temperature to 1400 °C was measured by a laser-flash method. The Gd₂Zr₂O₇ has a defect fluorite-type structure; however, Gd₂(Ti_xZr_1 − x)₂O₇ (0.25 ≤ x ≤ 1.00) compositions exhibit an ordered pyrochlore-type structure. Gd₂Zr₂O₇ and Gd₂Ti₂O₇ are infinitely soluable. The thermal conductivity of Gd₂(Ti_xZr_1 − x)₂O₇ increases with increasing Ti content under identical temperature conditions. The thermal conductivity of Gd₂(Ti_xZr_1 − x)₂O₇ first decreases gradually with the increase of temperature below 1000 °C and then increases slightly above 1000 °C. The thermal conductivity of Gd₂(Ti_xZr_1 − x)₂O₇ is within the range of 1.33 to 2.86 W m^− 1 K^− 1 from room temperature to 1400 °C.     

Structural study of Si1 − xGex nanocrystals embedded in SiO2 films

We have investigated the structural properties of Si_1 − xGe_x nanocrystals formed in an amorphous SiO₂ matrix by magnetron sputtering deposition. The influence of deposition parameters on nanocrystal size, shape, arrangement and internal structure was examined by X-ray diffraction, Raman spectroscopy, grazing incidence small angle X-ray scattering, and high resolution transmission electron microscopy. We found conditions for the formation of spherical Si_1 − xGe_x nanocrystals with average sizes between 3 and 13 nm, uniformly distributed in the matrix. In addition we have shown the influence of deposition parameters on average nanocrystal size and Ge content x.     

Titanium Interlayer Mediated Epitaxy of CoSi2 on Si1−xGex

Titanium Interlayer Mediated Epitaxy (TIME) has been shown to promote the formation of epitaxial CoSi₂ on Si (100). Similarities between Si and Si_1−xGe_x alloys have motivated a study of whether the TIME process could be successful in forming epitaxial CoSi₂ on Si_1−xGe_x. Titanium layers of varying thickness were deposited as interlayers between a Co layer and c-Si/Si_0.8Ge_0.2 grown epitaxially onto Si (100) to investigate their role in the formation of epitaxial CoSi₂ on Si_1−xGe_x alloys. The effect of Ti interlayer thickness on the orientation of CoSi₂ to the Si_1−xGe_x substrate, and the conditions under which a polycrystalline CoSi₂ film has been formed have been studied. It was found that Ti was beneficial in promoting epitaxy to the substrate in all cases. The experimental results indicate that with a Ti interlayer thickness of ∼ 50 Å, the formation of epitaxial CoSi₂ adjacent to the substrate was achieved, and pinhole formation was minimized. It was also observed that for increased interlayer thickness, Ti reacted with Si to form a titanium silicide.     

Enhanced ferromagnetic properties of multiferroic BiCoxFe1 − xO3 synthesized by hydrothermal method

The BiCo_xFe_1 − xO₃ samples have been successfully synthesized by hydrothermal process. The resulting products were characterized by X-ray powder diffraction (XRD), energy dispersive X-ray (EDS), differential thermal analysis (DTA), and physical property measurement system (PPMS).It was found that the magnetization of the obtained products was greatly enhanced by Co substituting for Fe ions. Furthermore, the value of magnetism of BiCo_xFe_1 − xO₃ samples can be adjusted by Fe doping concentration. DTA curve indicates the ferroelectric properties of the obtained BCFO samples are not affected by Co substitution. Therefore, it would be interesting to realize thin films with similar compositions and study their properties in the interest of device applications.     

Electrical properties of lead-free thick film NTC thermistors based on perovskite-type BaCoxCo2xBi1 − 3xO3

Lead-free thick film negative temperature coefficient (NTC) thermistors based on perovskite-type BaCo^II_xCo^III_2xBi_1 − 3xO₃ (x ≤ 0.1) were prepared by mature screen-printing technology. The microstructures of the thick films sintered at 720 °C were examined by X-ray diffraction and scanning electron microscopy. The electrical properties were analyzed by measuring the resistance-temperature characteristics. For the BaBiO₃ thick films, the room-temperature resistivity is 0.22 MΩ cm, while the room-temperature resistivity is sharply decreased to about 3 Ω cm by replacing of Bi with a small amount of Co. For compositions 0.02 ≤ x ≤ 0.1, the values of room-temperature resistivity (ρ₂₃), thermistor constant (B_25/85) and activation energy are in the range of 1.995-2.975 Ω cm, 1140-1234 K and 0.102-0.111 eV, respectively.     

Correlation of crystal structure and microwave dielectric properties for Zn(Ti1−xSnx)Nb2O8 ceramics

The correlation of crystal structure and microwave dielectric properties for Zn(Ti_1−xSn_x)Nb₂O₈ ceramics were investigated. The Zn(Ti_1−xSn_x)Nb₂O₈ ceramics contained ZnTiNb₂O₈ and an unknown Columbite-type phase. The columbite structure phase with increasing degree of ordering led to decrease of dielectric constant, increase of Qf and τ_f. The ZnTiNb₂O₈ with decreasing cation valence led to increase of τ_f. The typical values were: ? = 30.88, Qf = 43,500 GHz, τ_f = −54.32 × 10⁻⁶/ °C.     

Effect of LaNiO3 electrodes and lead oxide excess on chemical solution deposition derived Pb(Zrx,Ti1 − x)O3 films

The effects of LaNiO₃ (LNO) and Pt electrodes on the properties of Pb(Zr_x,Ti_1 − x)O₃ (PZT) films were compared. Both LNO and PZT were prepared by chemical solution deposition (CSD) methods. Specifically, the microstructure of LNO and its influence on the PZT properties were studied as a function of PbO excess. Conditions to minimize the Pyrochlore phase and porosity were found. Remnant polarization, coercive field and fatigue limit were improved in the PZT/LNO films relative to the PZT/Pt films. Additionally, the PZT crystallization temperature over LNO was 500 °C, about ~ 50 °C lower than over Pt. The crystallization temperature reported here is amongst the lowest values for CSD-based PZT films.     

Preparation and characterization of CuIn1 − xGaxSe2 − ySy thin film solar cells by rapid thermal processing

This paper describes the synthesis and characterization of CuIn_1 − xGa_xSe_2 − yS_y (CIGSeS) thin-film solar cells prepared by rapid thermal processing (RTP). An efficiency of 12.78% has been achieved on ~ 2 µm thick absorber. Materials characterization of these films was done by SEM, EDS, XRD, and AES. J-V curves were obtained at different temperatures. It was found that the open circuit voltage increases as temperature decreases while the short circuit current stays constant. Dependence of the open circuit voltage and fill factor on temperature has been estimated. Bandgap value calculated from the intercept of the linear extrapolation was 1.1-1.2 eV. Capacitance-voltage analysis gave a carrier density of 4.0 × 10¹⁵ cm^− 3.     

Composition dependent thermoelectric properties of sintered Mg2Si1−xGex (x = 0 to 1) initiated from a melt-grown polycrystalline source

Fabrication of Mg₂Si_1−xGe_x (x = 0-1.0) was carried out using a spark plasma sintering technique initiated from melt-grown polycrystalline Mg₂Si_1−xGe_x powder. The thermoelectric properties were evaluated from RT to 873 K. The power factor of Mg₂Si_1−xGe_x with higher Ge content (x = 0.6-1.0) tends to decrease at higher temperatures, and the maximum value of about 2.2 × 10^− 5 Wcm^− 1K^− 2 was observed at 420 K for Mg₂Si and Mg₂Si_0.6Ge_0.4. The coexistence of Si and Ge gave rise to a decrease in the thermal conductivity in the Mg₂Si_1−xGe_x. The values close to 0.02 Wcm^− 1K^− 1 were obtained for Mg₂Si_1−xGe_x (x = 0.4-0.6) over the temperature range from 573 to 773 K, with the minimum value being about 0.018 Wcm^− 1K^− 1 at 773 K for Mg₂Si_0.4Ge_0.6. The maximum dimensionless figure of merit was estimated to be 0.67 at 750 K for samples of Mg₂Si_0.6Ge_0.4.     

Cd1−xMnxTe thin films deposited by close-spaced sublimation for application in solar cells

High-quality Cd_1−xMn_xTe polycrystalline films with (1 1 1) preferred orientation were deposited by close-spaced sublimation (CSS) method. The XRD and optical absorption analysis indicated that the band gap of the film was about 1.6 eV. The as-grown Cd_1−xMn_xTe films exhibit quite low photovoltaic performance when used to make cells with CdS as the hetero-junction partner. The effect of various post-deposition treatments with vapors of chlorine-containing materials (CdCl₂ and/or MnCl₂), in Ar or H₂/Ar ambient, on the properties of Cd_1−xMn_xTe cells was studied.     

Controlling temperature coefficient of resistivity in La1−xSrxMnO3 ceramics

We propose La_1−xSr_xMnO₃ as a new lead-free and ruthenium-free conductive oxide used for thick film resistors. The temperature coefficient of resistivity (TCR) of the La_1−xSr_xMnO₃ was controlled systematically by changing the composition x. The TCR behavior depended on the change of the crystal symmetries and the average valence of Mn ions. The highest value of 9356 ppm/°C was obtained at the x = 0.35. Zero TCR was realized around 0.200 < x < 0.225 and 0.45 < x < 0.50, where the critical x values were related to the characteristic change from Mott-insulator to metallic behavior. The systematical controlling TCR and the zero TCR are the first to be demonstrated for conductive oxide.     

Luminescence properties of Eu ions doped in Y2−xGdxO3 thin films grown by pulsed laser deposition method

Luminescence properties of Y_2−xGd_xO₃:Eu³⁺ (x = 0 to 2.0) thin films are investigated by site-selective laser excitation spectroscopy. The films were grown by pulsed laser deposition method on SiO₂ (100) substrates. Cubic phase Y₂O₃ and Gd₂O₃ and monoclinic phase Gd₂O₃ are identified in the excitation spectrum of the ⁷F₀ → ⁵D₀ transition of Eu³⁺. The emission spectra of the ⁵D₀ → ⁷F_J (J = 1 and 2) transition from individual Eu³⁺ centers were obtained by tuning the laser to resonance with each excitation line. The excitation line at around 580.60 nm corresponds to the line from Eu³⁺ with C₂ site symmetry of cubic phase. New lines at 578.65 and 582.02 nm for the C_S sites of Gd₂O₃ with monoclinic phase are observed by the incorporation of Gd in Y₂O₃ lattice. Energy transfer occurs between Eu³⁺ ions at the C_S sites and from Eu³⁺ ions at the C_S sites to those at the C₂ site in Y_2−xGd_xO₃.     

The deposition and optical properties of Ge1−xCx thin film and infrared multilayer antireflection coatings

The effects of deposition parameters on the deposition rate, microstructure, and composition of Ge_1−xC_x thin films prepared by plasma enhanced chemical vapor deposition were studied and the films' infrared optical properties were investigated. The results show that the carbon content of these films increases as the precursor gas flow ratio of CH₄:GeH₄ increases, while the infrared refractive index of these films decreases from 4 to 2. The deposition rate increases with the radio-frequency power and reaches a constant value when the power goes above 60 W. Ge_1−xC_x/diamond-like carbon infrared antireflection coatings were prepared, and the transmittance of the coatings in the band of 8 to 14 μm was 88%, which is superior to that of Zinc Sulfide substrate by 14%.     

Photocatalytical water decomposition on visible light-driven solid-solution compounds K4Ce2Ta10−xNbxO30 (x = 0-10)

A series of single phase solid-solution K₄Ce₂Ta_10−xNb_xO₃₀ (x = 0-10) photocatalysts were synthesized by conventional high temperature solid state reaction. Their UV-vis diffuse reflectance spectra showed their absorbance edges shifted to long wavelength zone consistently with the increase of the amount of Nb for substituting Ta in these compounds, and the onsets of absorbance edges ranging from about 540 nm to 690 nm, corresponding to bandgap energy of 1.8-2.3 eV. These series of photocatalysts possess appropriate band gap (ca. 1.8-2.3 eV) and chemical level to use solar energy to decompose water into H₂, and the photocatalytical activities under visible light (λ > 420 nm) demonstrated that the activities decreased correspondingly with the increase of the amount of Nb in these compounds, which is regarded as the result of the differences of their band structures. Furthermore, the photocatalytical activities and the photophysical properties of these visible light-driven photocatalysts K₄Ce₂Ta_10−xNb_xO₃₀ (x = 0-10) were bridged by the first principle calculation based on Density Functional Theory with General Gradient Approximation and Plane-wave Pseudopotential methods.     

Influence of Se on the electron mobility in thermal evaporated Bi2(Te1−xSex)3 thin films

Thermoelectric solid solutions of Bi₂ (Te_1−xSe_x)₃ with x = 0, 0.2, 0.4, 0.6, 0.8 and 1 were grown using the Bridgman technique. Thin films of these materials of different compositions were prepared by conventional thermal evaporation of the prepared bulk materials. The temperature dependence of the electrical conductivity σ, free carriers concentration n, mobility μ_H, and seebeck coefficient S, of the as-deposited and films annealed at different temperatures, have been studied at temperature ranging from 300 to 500 K. The temperature dependence of σ revealed an intrinsic conduction mechanism above 400 K, while for temperatures less than 400 K an extrinsic conduction is dominant.The activation energy, ΔE, and the energy gap, E_g, were found to increase with increasing Se content. The variation of S with temperature revealed that the samples with different compositions x are degenerate semiconductors with n-type conduction. Both, the annealing and composition effects on Hall constant, R_H, density of electron carriers, n, Hall mobility, μ_H, and the effective mass, m^∗/m₀ are studied in the above temperature range.     

Microfabrication of dilute magnetic semiconducting Ti1−xCoxO2 films using photosensitive sol-gel method

Photosensitive Ti_1−xCo_xO₂ gel films are prepared by chemical modification with benzoylacetone, and then their Fourier transform infrared spectra and ultraviolet visible spectra are measured. Results show that the chelate rings of benzoylacetone with Ti ions are formed in the Ti_1−xCo_xO₂ gel films. With irradiation of UV light, the chelate rings are photolyzed, which leads to a change of the solubility of the Ti_1−xCo_xO₂ gel films in methanol. Based on this, the micro-patterns of Ti_1−xCo_xO₂ gel films are obtained. After the patterned gel films are dried at 200 °C and are fired at 550 °C for 1 h, negative patterned Ti_1−xCo_xO₂ inorganic films are obtained. The Ti_1−xCo_xO₂ films have an anantase structure and exhibit a room temperature ferromagnetic property.     

Structure and negative thermal expansion of Pb1 −xBixTiO3

Pb_1-xBi_xTiO₃ (x = 0.0-0.1) compounds were prepared to study the unique dopant effect of bismuth in PbTiO₃. Their thermal expansions and structures were investigated by high-temperature X-ray diffraction and X-ray Rietveld method. The results indicated that Bismuth substitution evidently weakened the tetragonality of PbTiO₃ solid solution, but increased the spontaneous polarization. Both the enhanced spontaneous polarization and the decreased tetragonality led to small volume shrinkage with temperature rising, where the average volumetric thermal expansion coefficient changed from − 1.99 × 10^− 5/°C for pure PbTiO₃ to − 0.56 × 10^− 5/°C for Pb_0.90Bi_0.10TiO₃. The Curie point of Pb_1 − xBi_xTiO₃ was slightly raised compared to PbTiO₃ and permitted one to use it in a wide temperature range.     

Crystal structure and ferroelectric properties of Ca(Cu3−xMx)Ti4O12 (M = Fe and Ni) ceramics

M-substituted Ca(Cu_3−xM_x)Ti₄O₁₂ (CCMTO) ceramics, where M = Fe and Ni, were synthesized and the influence of M substitutions for Cu on the crystal structure and ferroelectric properties of CCMTO ceramics were investigated in this study. From the variations in the lattice parameters of CCMTO ceramics, the solubility limit of Ni substitution for Cu in CaCu_3−xNi_xTi₄O₁₂ (CCNTO) ceramics was x = 0.2, whereas that of CaCu_3−xFe_xTi₄O₁₂ (CCFTO) ceramics was x = 0.05. The crystal structural analysis of CCMTO ceramics revealed that the single phase of CCMTO ceramics belongs to the I23 non-centrosymmetric space group of I23; as a result, the P_r and E_c values of CCFTO ceramics at x = 0.05 were 1.8 μC/cm² and 40 kV/cm, respectively. The ferroelectric behavior of CCMTO ceramics by the M substitutions for Cu may be related to the displacement of a Ti⁴⁺ cation in the TiO₆ octahedra and tilting of the Ti–O–Ti angle because of the non-centrosymmetric space group.     

Composition dependence of optical constants in ferroelectric Ba(Ti1 − x,Nix)O3 thin films by optical transmittance technique

Ba(Ti_1 − x,Ni_x)O₃ ferroelectric thin films with perovskite structure are prepared on fused quartz substrates by a sol-gel process. Optical transmittance measurements indicate that Ni-doping has an obvious effect on the energy band structure of BaTiO₃. It has been found that the refractive index n, extinction coefficient k, and band gap energy E_g of the films are functions of the film composition. The E_g of Ba(Ti_1 − x,Ni_x)O₃ decreases approximately linearly as the Ni content increases, which is attributed to the decline of conduction band energy level with increasing the Ni content. On the other hand, n and k both increase linearly with increasing the Ni content because of the increase of packing density. These results indicate that thin films might have potential applications in BaTiO₃-based thin-film optical devices.     

Enhancing epitaxial SixC1 − x deposition by adding Ge

In this work, a possible way to enhance the epitaxial growth of metastable, tensile strained Si_xC_1 − x layers by the addition of germanium is demonstrated. During ultra-high vacuum chemical vapor deposition growth, the co-mixing of germane to the Si_xC_1 − x precursors was found to enhance the growth rate by a factor of ~ 3 compared to the growth of pure Si_xC_1 − x. Furthermore, an increase of the amount of substitutional incorporated carbon has been observed. Selective Si_xGe_yC_{1 − x − y} deposition processes utilizing a cyclic deposition were developed to integrate epitaxial tensile strained layers into source and drain areas of n-channel transistors.