EDCA机制下实时业务多跳传输仿真分析

在AdHoc无线自组织多跳网络中,IEEE802.11e协议采用了增强型分布信道接入机制,用于为实时多媒体业务提供有效的QoS保证机制。简单介绍和对比了802.11分布式协调功能和802.11e增强型分布信道接入机制两种信道接入机制,并通过使用网络仿真软件OPNET,模拟了实时的视、音频业务在802.11分布信道接入机制和802.11e增强型分布信道接入机制信道接入机制下在不同网络负载下的性能并进行了仿真分析。     

基于M/G/1/K排队模型的IEEE802.11e EDCA性能研究

该文利用二维Markov链分析方法,提出了一种新的IEEE802.11e EDCA网络分析模型,该模型引入了空闲状态和不同接入等级的仲裁帧间隔(AIFS)的使用;利用Markov链状态转移图的Z域信号传递函数推导了MAC层平均服务时间的概率分布;结合M/G/1/K排队模型分析了增强分布式信道接入(EDCA)在非饱和和饱和负载下的性能。经过访真实验结果与数值分析结果的对比,验证了分析模型的准确性。分析结果表明:EDCA接入机制只为不同优先级业务提供QoS区分;不同优先级业务信道接入的不公平性是EDCA接入机制的特点。     

IEEE802.11e EDCA和CFB下饱和吞吐量分析

IEEE802.11eMAC草案规范对IEEE802.11无线局域网标准在QOS方面加以了补充。IEEE802.11e采用2种协调机制基于控制的综合协调可控信道接入方式HCCA和基于竞争的增强型分布式信道接入方式EDCA。主要评估EDCA和竞争空闲脉冲(contention-freeburst)CFB相结合时,在系统负载过载的情况下,改变性能参数后系统饱和吞吐量的变化,并分析系统性能参数对饱和吞吐量的影响,从而达到系统参数优化的作用。     

一种基于IEEE802.11EDCF的自适应能量调整算法

简述了IEEE802.11及IEEE802.11e的两种访问控制机制DCF和EDCF,提出了一种基于IEEE802.11 EDCF的自适应能量调整算法,并在NS2上进行了仿真实现.仿真实验结果表明,该算法能够根据分组的优先权水平和节点当前能量值动态调度信道接入,延长了全网的生存期.     

802.11b DCF协议和802.11e EDCA协议性能仿真与分析

使用NS-2(Network Simulator Version 2)仿真软件,选取平均峰值信噪比、封包平均时延和封包最大时延3个指标对802.11b DCF和802.11e EDCA协议的流媒体通信性能进行仿真,通过改变最大封包长度分析比较该参数对2个协议性能的影响,研究结果表明了802.11e EDCA协议在多媒体通信业务中的优越性。     

无线视频传输的跨层动态映射算法

在IEEE 802.11e EDCA机制和基于场景的马尔可夫链模型基础上,提出跨层动态映射算法来改善无线视频传输的服务质量（QoS）。根据视频帧的重要性和网络的负荷情况,将来自应用层的视频帧信息动态地映射到MAC层中合适的队列中去,并且采用网络仿真工具NS2进行仿真,来比较IEEE 802.11e EDCA机制以及跨层动态映射算法。仿真结果表明跨层动态映射算法能明显提高传输后的视频质量。     

新的改进IEEE 802.11 DCF性能的退避机制

分布式协调功能DCF是IEEE802.11标准最基本的媒体接入方法,它的核心是载波检测多址接入/冲突避免（CSMA/CA）机制,通过退避算法,减少碰撞的概率。提出了一种新的退避机制改进IEEE802.11DCF饱和吞吐量性能,建立了三维马尔可夫链网络模型详细研究分析,同时利用NS2对所提出的机制进行仿真,比较了改进后的802.11DCF饱和吞吐量与原802.11DCF的饱和吞吐量的大小,仿真结果证明了算法的准确有效。     

IEEE802.11无线局域网EDCF接入研究与仿真

分析了现有IEEE 802.11无线局域网的基本接入机制DCF(Distributed Coordination Function)对QoS(Quality of Service)技术支持的局限性,介绍了未来具有QoS保证的IEEE 802.11e标准采用的一种新的MAC层接入机制EDCF(Enhanced DCF).对EDCF的性能进行了仿真,并对比原有DCF的性能对仿真结果进行了分析.     

一种提高802.11无线Ad Hoc网络公平性的新机制-FFMA

实现多个数据流对无线信道的公平共享是802.11无线Ad Hoc网络中的一个重要议题,但802.11DCF机制在无线Ad Hoc网络中存在严重的公平性问题,甚至有可能出现单个节点或数据流独占信道而其他节点和数据流处于"饥饿"状态的情况.论文提出了一种新颖的保证数据流间公平性的MAC层接入机制FFMA(Flow rate-based Fair Medium Access),通过公平调度和公平竞争的方式,FFMA能够在数据流间公平地分配信道带宽资源.仿真结果表明,在无线Ad Hoc网络中,FFMA可以在保证信道吞吐量的前提下取得远优于802.11 DCF的数据流间的公平性.     

IEEE 802．11网络分析模型

IEEE 802.11在MAC层采用DCF作为主要的信道接入方式。本文分析了现有的几种802.11网络分析模型,其中B ianch i模型很好的描述了饱和状态下802.11 DCF的性能;X iao模型针对802.11e进行了多优先级的扩展,实现了EDCF的性能分析。最后介绍了一种新的分析模型,新模型同时考虑了业务优先级和内部调度算法,够较准确地描述网络性能。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.