电离层多源数据同化方法研究

多源数据同化是实现电离层天气现报和预报的重要途径.选择参数化电离层模型作为背景模型,基于地基全球卫星导航系统(Global Navigation Satellite System,GNSS)观测以及第二代气象/电离层气候卫星探测系统(Constellation Observing System for Meteorology Ionosphere and Climate 2,COSMIC 2)掩星测量,利用经验电离层模型NeQuick计算得到多源观测数据,结合水平和垂直方向分离的高斯型协方差矩阵及卡尔曼滤波方法实现了中国区域电离层多源数据同化反演.同化结果表明,多源数据同化方法能将观测资料有效地同化到背景模式中从而获得较好的同化结果.与背景模式相比,同化后得到的电离层总电子含量及电子密度误差均显著下降.     

基于地基GNSS和COSMIC掩星数据吸收的三维电离层电子密度重构方法

精确给出电离层的实时变化信息对现代通信和卫星导航等系统可靠应用具有非常重要的意义.为提高电离层经验模型电子密度的输出精度，提出了一种基于地基GNSS和COSMIC掩星数据吸收的三维电离层电子密度重构的新方法.以最新版国际参考电离层模型IRI-2016为背景模型，选择IG指数与Rz指数作为驱动量，采用Brent算法分两步实现了地基GNSS和COSMIC掩星数据的吸收.与欧洲区域8个垂测站实测数据的对比表明:数据吸收后模型重构的电离层N_mF₂的绝对平均误差和标准差分别下降了33%和29%；电离层h_mF₂的重构误差则分别下降了约55%和30%.对比结果验证了所提方法的精度和有效性.     

地基GNSS和天基掩星观测对全球电离层数据同化效果的影响分析

电离层的精确现报预报对装备系统效应减缓及空间科学研究均具有重要的应用价值. 地基GNSS和天基掩星是电离层数据同化最为重要的数据来源之一。通过观测系统仿真试验（observation system simulation experiments,OSSE）对四种不同的观测系统条件下的全球电离层数据同化效果进行了定量分析,数据同化的总电子含量（total electron content, TEC）及三维电子密度参量技术得分(skill score, SKS)的评估结果表明:1)观测构型对数据同化现报和预报精度均具有重要影响。2)仅仅同化地基GNSS数据,其同化的TEC精度相比背景模型会有较明显的改善,TEC现报、提前1 h预报、提前2 h预报和提前3 h预报的SKS分别为0.45、0.39、0.32和0.25;但电子密度的现报和预报结果相比背景模型的改善则相对有限,电子密度现报、提前1 h预报、提前2 h预报和提前3 h预报的SKS仅为0.05、0.04、0.03和0.02;通过融合掩星观测数据,其电子密度的精度会有明显提升。3)在掩星卫星数量较多且观测数据的覆盖性较好的条件下,仅同化掩星TEC观测数据就可以获得准确的TEC和电子密度现报与短期预报结果;大规模掩星星座的观测比仅利用地基GPS观测进行同化,其TEC现报、提前1 h预报、提前2 h预报和提前3 h预报的SKS分别提高了0.2、0.17、0.14和0.12;电子密度SKS分别提高了0.39、0.35、0.28和0.22,电子密度SKS的提升幅度要优于TEC。4) 现有的观测系统布局对中低纬区域的数据同化精度的提升效果要优于高纬区域;5) 随着预报时间的增加,数据同化的精度呈现下降的趋势. 随着未来微小卫星数量的快速增加,天基掩星观测将对电离层状态的精确表征产生不可估量的作用,相关研究可为我国天地基电离层观测系统的设计和构建提供技术参考.     

导航、电子对抗、制导

TN96 01041479奥斯特/GPS掩星与地面留达联合观测电离层电子密度的初步结果/张训械(中和阵完武汉物理与数学研究所波谱与原子分子物理国家重点实验室)弃全球定位系统一2000,25(3).一1一5文章给出了1 999年10月奥斯特ZGPS掩星与日本MU雷达和数字测高仪的联合观恻结果.奥斯特掩星反演得到的电子密度剖面与地面雷达观测的进行了比较,结果表明:天基和地基雷达观测的电子密度是一致的.文章还给出利用G PS的单频信号反演电离层电子密度剖面技术和3维射线追踪技术模拟掩星结果.图4参8(许)TN96〔)飞()414吕lj上海地区G PS/STORM试验与结果…     

基于COSMIC掩星观测的顶部电离层标高特征分析

顶部电离层是指F2层电子密度最大值所在高度以上的电离层区域。掩星观测能够提供地面到低轨卫星轨道高度处的整个电离层电子密度剖面,对于顶部电离层的研究具有重要作用。标高是构建顶部以上电离层电子密度剖面模型的重要参数。本文使用2007—2020年的气象、电离层和气候星座观测系统(Constellation Observing System for Meteorology, Ionosphere and Climate, COSMIC)掩星观测数据,提取有效电子密度剖面数据的顶部标高,分析了其随地方时、季节、经纬度和太阳活动水平的变化特性。结果表明：顶部标高具有明显的日变化和季节变化规律,并且表现出强烈的太阳活动依赖性;顶部标高在纬度上的变化强烈依赖于地方时,同时在东西经向上表现出明显的波状结构,且这种经度波状结构在南北半球具有不同的形态;顶部标高在夏季半球具有显著的东西经向差异,南半球夏季更为明显。     

一种联合地基GNSS和测高仪数据的电离层层析成像新算法

电离层层析成像(computerized ionospheric tomography, CIT)技术是获取区域大范围电离层三维结构非常重要的手段之一. 针对单独使用地基GNSS进行三维CIT的不足,提出了一种联合地基GNSS和测高仪数据的三维CIT方法,其综合了测高仪探测电离层垂直分辨率较高和地基GNSS水平分辨率较高的优点,以测高仪数据驱动更新IRI模型,将更新后的IRI模型作为背景电离层模型,再利用改进的代数重建迭代(algebraic reconstruction technique, ART)算法结合地基GNSS TEC数据进行CIT;基于IGS、中国陆态网地基GNSS台站及全球电离层无线电观测网（global ionospheric radio observatory, GIRO）测高仪数据实现了中国及周边区域三维CIT,分别采用Madrigal TEC数据和中国区域独立的测高仪数据对CIT获取的TEC和电子密度进行评估. TEC精度评估结果表明,CIT算法的TEC平均误差和标准差相比IRI模型及CODE GIM数据均有明显降低;电子密度评估结果表明,单纯依赖地基GNSS进行CIT可以提升f_oF₂的精度但无法有效提升h_mF₂的精度,而联合测高仪数据后,电离层f_oF₂和h_mF₂的重构精度均有明显提升,其中h_mF₂的平均误差和标准差从20.6 km和16.5 km下降为14.8 km和11.7 km,说明测高仪数据对CIT垂直分辨率的提升作用明显.     

基于BDS/GPS数据的中国及周边地区电离层暴层析成像研究

随着我国BDS的逐步建成,其在电离层监测上的应用也在逐步拓展. 凭借卫星类型多样性的特点,BDS卫星数据在电离层监测上可能比GPS卫星带来更多的优势,但能否改进电离层层析成像结果仍值得进一步研究. 文中基于GPS数据电离层层析算法,把BDS中的地球同步轨道（geosynchronous orbit, GEO）卫星、倾斜地球同步轨道（inclined geosynchronous orbit, IGSO）卫星和中轨轨道（medium earth orbit, MEO）卫星数据与GPS数据融合,对2017-09-07—09电离层暴期间中国及周边地区（15～55°N, 70～140°E）上空电离层进行重构. 首先借助SA418和WU430测高仪数据分别讨论了单星座（GPS）与双星座（GPS+BDS）层析对电子密度反演的精度结果;其次对2017-09-08两个扰动最强烈时段的电离层成像结果,包括电子密度剖面图与总电子含量（total electron content, TEC）分布图进行深入研究. 研究结果表明:BDS卫星数据不仅可以改进垂向精度,还可以提高对电离层异常结构的反演精度,融合了BDS数据的电离层层析技术能较为准确地重构出本次电离层暴期间出现在中低纬度的等离子体泡.     

山基GPS掩星观测数据在电波到达角计算中的应用

在福建省太姥山和浙江鹤顶山开展了GPS掩星观测实验并成功获取山基掩星观测数据, 对掩星事件进行了分析和统计; 阐述了利用山基掩星观测数据计算大气折射指数和电波弯曲角的原理和算法, 基于山基反演数据与欧洲中期天气预报中心(European centre for medium-range weather forecasts, ECMWF)数据构建电波传播的直接折射模型和一次反射模型来计算任意两点之间的电波到达角.结果表明:山基反演数据计算的大气折射率剖面反演准确度在95%以上, 在1 km下的近距离计算中基于山基反演数据的直接折射模型优于一次反射模型, 山基反演数据的电波到达角模型优于ECMWF数据模型, 文中创建的两种电波到达角计算模型对模拟两点之间的电波传播路径和真实电波信号的调整接收具有重要指导意义.     

天地基综合观测的东日本大地震电离层异常分析

介绍了地震电离层前兆的主要特性,并给出了掩星电离层电子密度峰值位置的标高估计技术。利用天地基电离层观测数据,综合分析了2011年3月11日日本9.0级大地震发生前的电离层异常变化,发现地震前3天内电离层f0F2异常扰动、相对垂直总电子含量(VTEC)扰动以及电子密度峰值处标高(Hs)增加等多种异常现象。分析了地磁活动和太阳活动等因素后,认为其可能与地震有一定关联,表明电离层异常变化对于地震短期预报具有重要参考意义。     

一种近实时全球电离层数据同化和预报系统的构建与实现

电离层天气变化正成为目前空间天气预报最重要的内容之一,建立一个可靠的、精确的电离层特征参量现报和预报系统对空间科学研究及军民用无线电信息系统保障均具有重要价值。基于国际GNSS服务组织(International GNSS Service, IGS)的地基GNSS和全球电离层无线电观测站(Global Ionospheric Radio Observatory, GIRO)数字测高仪的实时数据,以国际参考电离层(International Reference Ionosphere, IRI)模型为背景模型,采用高斯-马尔可夫-限带卡尔曼滤波同化技术,结合超大规模矩阵稀疏存储与处理方法,在云计算平台上构建完成了近实时全球电离层数据同化和预报系统(near-Real-Time Global Ionospheric Data AssiMilation and forecasting system, RT-GIDAM)。该系统具备了全球电离层TEC和电子密度的近实时(延时约5 min)、较高空间(5°×2.5°)和时间分辨率(15 min)的同化和预报功能,可为空间物理研究及相关无线电系统应用...     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.