Effects of GaAs-spacer strain on vertical ordering of stacked InAs quantum dots in a GaAs matrix

Vertical ordering in stacked layers of InAs/GaAs quantum dots is currently the focus of scientific research because of its potential for optoelectronics applications. Transmission electron microscopy was applied to study InAs/GaAs stacked layers grown by molecular-beam-epitaxy with various thicknesses of GaAs spacer. Thickness dependencies of quantum dot size and their ordering were observed experimentally and, then, compared with the results of strain calculations based on the finite element method. The vertical ordering did occur when the thickness of the GaAs spacer was comparable with the dot height. The ordering was found to be associated with relatively large InAs dots on the first layer. Quantum dots tend to become larger in size and more regular in plane with increasing numbers of stacks. Our results suggest that the vertical ordering is not only affected by strain from the InAs dots on the lower layer, but by total strain configuration in the multi-stacked structure.     

Stacking number dependence of size distribution of vertically stacked InAs/GaAs quantum dots

Vertically stacked layer structure is useful for controlling the size distribution of quantum dots. The dependence of the size distribution of quantum dots on the stacking numbers is theoretically and experimentally investigated. We show that the size distribution of quantum dots decreases with increasing the stacking number, and it occurs drastically when the stacking number is changed from 1 to 2. The quantitative analysis on in-plane strain energy distribution is also performed for the explanation.     

Annealing behavior of InAs/GaAs quantum dot structures

We investigate the annealing behavior of InAs layers with different thicknesses in a GaAs matrix. The diffusion enhancement by strain, which is well established in strained quantum wells, occurs in InAs/GaAs quantum dots (QDs). A shift of the QD luminescence peak toward higher energies results from this enhanced diffusion. In the case of structures where a significant portion of the strain is relaxed by dislocations, the interdiffusion becomes negligible, and there is a propensity to generate additional dislocations. This results in a decrease of the QD luminescence intensity, and the QD peak energy is weakly affected.     

Temperature dependent optical properties of self-organized InAs/GaAs quantum dots

We report photoluminescence (PL), time-resolved PL, and PL excitation experiments on InAs/GaAs quantum dots (QDs) of different size as a function of temperature. The results indicate that both the inhomogeneous properties of the ensemble and the intrinsic properties of single QDs are important in understanding the temperature-dependence of the optical properties. With increasing temperature, excitons are shown to assume a local equilibrium distribution between the localized QD states, whereas the formation of a position-independent Fermi-level is prevented by carrier-loss to the barrier dominating thermally stimulated lateral carrier transfer. The carrier capture rate is found to decrease with increasing temperature and, at room temperature, long escape-limited ground state lifetimes of some 10 ps are estimated. PL spectra excited resonantly in the ground state transition show matching ground state absorption and emission, indicating the intrinsic nature of exciton recombination in the QDs. Finally, the PL excitation spectra are shown to reveal size-selectively the QD absorption, demonstrating the quantum-size effect of the excited state splitting.     

Tuning of electronic states in self-assembled InAs quantum dots using an ion implantation technique

We report the tunability of up to 150 meV of the ground state transition of self-assembled InAs quantum dots (QDs) using Mn ion implantation and subsequent annealing. Because of the exciton localization in the quantum dots, the photoluminescence efficiency (T=12K) of the quantum dot transition remains at 80% of its original value after implantation with a Mn dose of 1×10¹³ cm⁻²ions. Strong luminescence still remains at room temperature. At a high implantation dose (1×10¹⁵ cm⁻²) and rapid thermal annealing (700°C for 60s) about 25% of the QD luminescence intensity is recovered at T=12K.     

InAs/GaAs量子点材料和激光器

介绍了近年来长波长InAsG/aAs量子点材料的生长、结构性质和量子点激光器的研究进展。     

InAs/GaAs自组装量子点结构的能带不连续量

为确定异质结界面带阶,结合光致发光(PL)谱和深能级瞬态谱(DLTS)测量结果,利用有效质量近似理论,计算得到了InAs/GaAs自组装量子点结构的能带不连续量,其中导带不连续量ΔEc＝0.97 eV,价带不连续量ΔEv＝0.14 eV.     

Electron beam pre-patterning for site-control of self-assembled InAs quantum dots on Inp surfaces

A site control technique for individual InAs quantum dots (QDs) formed by self-assembling has been developed, using scanning electron microscope (SEM) assisted nano-deposition and metal organic vapor phase epitaxy (MOVPE). In a first step we characterize a device with randomly distributed InAs QDs on InP, using resonant tunneling and transmission electron microscopy (TEM). Secondly, we use nano-scale deposits, created at the focal point of the electron beam on an InP based heterostructure, as “nano growth masks”. Growth of a thin InP layer produces nano-holes above the deposits. The deposits are removed by oxygen plasma etching. When InAs is supplied on this surface, QDs are self-assembled at the hole sites, while no InAs dots are observed in the flat surface region. A vertical single electron tunneling device is proposed, using the developed technique.     

Nano-engineering approaches to self-assembled InAs quantum dot laser medium

A number of nano-engineering methods are proposed and tested to improve optical properties of a laser gain medium using the self-assembled InAs quantum dot (QD) ensemble. The laser characteristics of concern include higher gain, larger modulation bandwidth, higher efficiency at elevated temperatures, higher thermal stability, and enhanced reliability. The focus of this paper is on the management of QD properties through design and molecular beam epitaxial growth and modification of QD heterostructures. This includes digital alloys as high-quality wide-bandgap barrier; under- and overlayers with various compositions to control the dynamics of QD formation and evolution on the surface; shape engineering of QDs to improve electron-hole overlap and reduce inhomogeneous broadening; band engineering of QD heterostructures to enhance the carrier localization by reduction of thermal escape from dots; as well as tunnel injection from quantum wells (QWs) to accelerate carrier transfer to the lasing state. Beneficial properties of the developed QD media are demonstrated at room temperature in laser diodes with unsurpassed thermal stability with a characteristic temperature of 380 K, high waveguide modal gain >50 cm⁻¹, unsurpassed defect tolerance over two orders of magnitude higher than that of QWs typically used in lasers, and efficient emission from a two-dimensional (2-D) photonic crystal nanocavity.     

Optical characterisation of MOVPE grown vertically correlated InAs/GaAs quantum dots

Structures with vertically correlated self-organised InAs quantum dots (QDs) in a GaAs matrix were grown by the low-pressure metal-organic vapour phase epitaxy (MOVPE) and characterised by different microscopic techniques. Photoluminescence in combination with photomodulated reflectance spectroscopy were applied for characterisation of QDs structures. We show that combination of both methods allows detecting optical transitions originating both from QDs and wetting (separation) layers, which can be than compared with those obtained from numerical simulations. On the basis of obtained results, we demonstrate that photoreflectance spectroscopy is an excellent tool for characterisation of QDs structures wetting layers and for identification of spacer thicknesses in vertically stacked QDs structures.     

Effects of growth interruption on the evolution of InAs/InP self-assembled quantum dots

We investigated the change in the structural and optical properties of InAs/InP quantum structures during growth interruption (GI) for various times and under various atmospheres in metalorganic chemical vapor deposition. Under AsH₃ + H₂ atmosphere, the mass transport for the 2D-to-3D transition was observed during the GI. Photoluminescence peaks from both quantum dots (QDs) and quantum wells were observed from the premature QD samples. The fully developed QDs showed the two distinct temperature regimes in the PL peak position, full width at half maximum (FWHM) and wavelength-integrated peak intensity. The two characteristic activation energies were obtained from the InAs/InP QDs: ∼10 meV for intra-dot excitation and 90 ∼ 110 meV for the excitation out of the dots, respectively. It was also observed that the QD evolution kinetics could be suppressed in PH₃ + H₂ and H₂ atmospheres. The proper control of GI time and atmosphere might be a useful tool to further improve the properties of QDs.     

GaAs基长波长InAs耦合量子点材料的分子束外延生长

系统介绍了利用分子束外延方法在纯GaAs材料上生长InAs/GaAs耦合量子点结构。讨论了生长温度和上下两层量子点中InAs的淀积量对于材料发光性质和表面形貌的影响。通过优化生长参数,得到了室温发光波长在1.436μm,FWHM为27meV的耦合量子点材料。第二层量子点的密度在910⁹到1.410¹⁰cm^-2之间。耦合量子点结构为拓展GaAs基材料在量子功能器件应用中的发光波长提供了新的途径。     

GaAs-based long-wavelength InAs bilayer quantum dots grown by molecular beam epitaxy

Molecular beam epitaxy growth of a bilayer stacked InAs/GaAs quantum dot structure on a pure GaAs matrix has been systemically investigated.The influence of growth temperature and the InAs deposition of both layers on the optical properties and morphologies of the bilayer quantum dot（BQD） structures is discussed.By optimizing the growth parameters,InAs BQD emission at 1.436μm at room temperature with a narrower FWHM of 27 meV was demonstrated.The density of QDs in the second layer is around 9×10⁹ to 1.4×10¹⁰ cm^-2. The BQD structure provides a useful way to extend the emission wavelength of GaAs-based material for quantum functional devices.     

Investigation of the effect of growth interruption on the formation of InAs/GaAs quantum dot superlattice near the InAs critical thickness

Two kinds of superlattices (i) with and (ii) without growth interrupt (GI) after deposition of 1.77 monolayers (ML) of InAs on GaAs (0 0 1) were grown by solid-source molecular beam epitaxy (MBE) and assessed by transmission electron microscopy (TEM) techniques, double crystal X-ray diffraction (DCXRD) and photoluminescence (PL) measurements in order to gain an understanding of the structural and compositional properties. In case (i) formation of coherent dislocation free self-organized quantum dots (SOQDs) with 2.8-3.2 nm height and 13-16 nm lateral size was observed, whereas in case (ii) no quantum dots had formed. In order to better understand the implication of growth interruption for the formation mechanism, highly localised assessment of the composition of the QD was carried out via atomic resolution Z-contrast imaging and electron energy loss spectroscopy (EELS).     

Stable Temperature Characteristics of InAs／GaAs Quantum Dots at Long Wavelength Emission

The time-resolved photoluminescence and steady photoluminescence (TRPL and PL) spectra on self-assembled InAs/GaAs quantum dots (QDs) are investigated. By depositing GaAs/InAs short period superlattices (SLs), 1. 48μm emission is obtained at room temperature. Temperature dependent PL measurements show that the PL intensity of the emission is very steady. It decays only to half as the temperature increases from 15 K to room temperature, while at the same time, the intensity of the other emission decreases by a factor of 5 orders of magnitude. These two emissions are attributed to large-size QDs and short period superlattices (SLs), respectively. Large-size QDs are easier to capture and confine carriers, which benefits the lifetime of PL, and therefore makes the emission intensity insensitive to the temperature.     

InAs自组织生长量子点的电子俘获势垒

成功地用深能级瞬态谱（ＤＬＴＳ）研究了ＩｎＡｓ自组织生长的量子点电学性质，获得２．５原子层ＩｎＡｓ量子点电子基态能级在ＧａＡｓ导带底下约０．１３ｅＶ，该量子点在荷电状态发生变化时伴随有晶格弛豫，对应俘获势垒为０．３２ｅＶ．本工作也证明可以把量子点类比深中心进行研究．     

基于石墨烯/铟砷量子点/砷化镓异质结新型光电探测器

研究了一种石墨烯/铟砷量子点/砷化镓界面形成的异质结探测器的暗电流特性以及光电响应性质.虽然石墨烯具有很高的电子迁移率,但受限于较低的光子吸收率,使其在光电探测领域的应用受到了限制.而半导体量子点具有量子效率高,光吸收能力强等独特优点.于是利用石墨烯-砷化铟量子点-砷化镓异质结结构制备了一种新型光电探测器.并对该探测器的响应率、I-V特性曲线、暗电流特性、探测率、开关比等关键性能进行了研究.其在637 nm入射光情况下的响应率、探测率以及开关比可分别达到为17. 0 m A/W、2. 3×10~(10)cm Hz~(1/2)W~(-1)和1×10~3.而当入射光为近红外波段的940纳米时,响应率进一步增加到了207 m A/W.同时,还证实了该器件的暗电流、肖特基势垒高度和理想因子对温度的都具有较高的依赖性都较强.     

Increasing the quantum efficiency of InAs/GaAs QD arrays for solar cells grown by MOVPE without using strain‐balance technology

Research into the formation of InAs quantum dots (QDs) in GaAs using the metalorganic vapor phase epitaxy technique is presented. This technique is deemed to be cheaper than the more often used and studied molecular beam epitaxy. The best conditions for obtaining a high photoluminescence response, indicating a good material quality, have been found among a wide range of possibilities. Solar cells with an excellent quantum efficiency have been obtained, with a sub‐bandgap photo‐response of 0.07 mA/cm² per QD layer, the highest achieved so far with the InAs/GaAs system, proving the potential of this technology to be able to increase the efficiency of lattice‐matched multi‐junction solar cells and contributing to a better understanding of QD technology toward the achievement of practical intermediate‐band solar cells. Copyright © 2016 John Wiley & Sons, Ltd.     

Nano-patterning and growth of self-assembled quantum dots

Different techniques for the preparation of patterned GaAs substrates for subsequent overgrowth are presented, including focused ion beam direct writing and laser holography followed by wet chemical or dry etching. GaAs-based buffer layers were grown on the patterns and consequently covered with self-assembled quantum dots (QDs). The effect of a strained InGaAs layer grown directly on the patterned substrates and its influence on QD formation and ordering is shown. The dot density, lateral distribution and size distribution of the dots are measured using atomic force microscopy. A comparison of the growth of QDs on patterned and unpatterned substrates indicates that on patterned substrates a higher QD density at the same InAs deposition can be achieved.     

InAs/GaAs多层堆垛量子点激光器的激射特性

利用固态源分子束外延技术，按S-K模式生长出五层堆垛InAs/GaAs量子点（QD）微结构材料. 用这种QD材料制成的激光器，内光学损耗为2.1cm-1，透明电流密度为15±10 A/cm2. 对于条宽100μm，腔长2.4mm的激光器（腔面未经镀膜处理），室温下基态激射的波长为108μm，阈值电流密度为144A/cm2，连续波光功率输出达2.67W（双面），外量子效率为63%，特征温度为320K. 研究了QD激光器翟激射特性，并对结果作了讨论.