磷酸钙陶瓷颗粒微纳米结构对蛋白吸附的影响

用微波烧结和常规烧结方法分别制备了4种具有纳米和微米结构的磷酸钙陶瓷, 对陶瓷的相组成、 微观结构、 粒度分布、 比表面积、 孔径分布和表面Zeta电位进行了对比分析, 并进一步采用凝胶电泳法考察了陶瓷对牛血清白蛋白/溶菌酶双蛋白的吸附行为. 结果显示, 纳米陶瓷和常规陶瓷具有相似的相组成、 颗粒分布和表面Zeta电位, 但微孔结构、 比表面积和蛋白吸附差异明显. 纳米陶瓷具有较小的晶粒尺寸和更丰富的介孔结构, 使其能吸附更多的牛血清白蛋白和溶菌酶, 表明其具有更强的生物活性.     

UV-光固化光纤涂料的研制

本文采用环氧丙烯酸酯与聚氨酯丙烯酸酯共混聚合的方法制备出新型的UV-光固化光纤涂料,其主要性能较好.研究了基体组成、引发剂、稀释剂以及固化工艺对UV-固化光纤涂料的光固化速度的影响.通过实验发现,环氧丙烯酸酯与聚氨酯丙烯酸酯的配比为 4:6～6:4、稀释剂的含量不大于20%时固化速度较快、性能较好,同时固化时灯距与固化膜厚度对固化速度的影响较大.     

光固化3D打印聚酰亚胺研究进展

近年来,光固化3D打印技术因高精度、定制化、整体免装配以及快速制造等成形优点,用于解决聚酰亚胺(polyimide, PI)的微型精密、异形复杂及其功能结构一体化制造技术难题,受到了研究者的广泛研究和关注。基于光固化3D打印成形原理与PI的物理化学特性,发展了一系列光固化3D打印PI材料及其成形技术。本文归纳总结了光固化3D打印PI材料设计制备准则,重点介绍了立体光刻技术(SLA)、数字光处理技术(DLP)和紫外辅助直书写技术(UV-DIW)等光固化3D打印PI研究进展,最后通过光固化3D打印PI的应用和产业化现状提出研究发展对策。     

光固化阳离子活性稀释剂研究进展

随着光固化技术的发展,当前广泛使用的自由基光固化逐渐显示出一些弊端,与自由基光固化相比,阳离子光固化逐渐显示出其固有的优势,如体积收缩小、附着力强、无氧阻聚等。活性稀释剂作为阳离子光固化配方中的重要组成,对配方的固化及最终产品的机械物理性能具有显著影响,因此开发可快速固化的活性稀释剂具有重要的意义。本文介绍了阳离子活性稀释剂的作用原理及特点,并对其发展前景和方向进行了展望。     

基于改性亚麻仁油的有机/无机光固化膜的光固化机理及其反应性研究

用亚麻仁油和环戊二烯合成了改性亚麻仁油(NLO)光固化低聚物,其结构用红外光谱(FT-IR)进行了表征.基于改性亚麻仁油、巯基硅氧烷和光引发剂制备了有机/无机杂化光固化膜,对其光固化机理进行了分析,对无机粒子在改性亚麻仁油中的分布用AFM(原子力显微镜)进行了观测,建立了该有机/无机杂化体系的光固化模型.对杂化膜光固化反应性用Photo-差示扫描热分析仪(Photo-Differential Scanning Calorimeter)进行了测试,Photo-DSC测试结果表明:巯基硅氧烷能大大提高改性亚麻仁油体系光固化速率,环烯键对硫醇十分敏感.     

UV光固化热敏记录层机理的研究

以光固化丙烯酸酯树脂作为基体,硬脂酸、聚乙二醇硬脂酸酯等为添加物,制备了一种可逆热透明成像材料的UV光固化热敏记录层.利用DSC仪、偏光显微镜以及X射线衍射仪研究了添加的硬脂酸和聚乙二醇硬脂酸酯对UV光固化热敏层的作用机理.研究结果表明,硬脂酸和聚乙二醇硬脂酸酯结晶态与无定形态之间的转变是UV光固化热敏层发生白色浑浊态与透明态转变的直接原因,且两者的共同作用扩大了UV光固化热敏层的显透温度范围.另外,利用热分析仪对热塑性热敏层和光固化热敏层的耐热性作了比较.结果表明,UV光固化热敏层在升温过程中的热损失较热塑性的热敏层有明显降低.     

基于环硼氮烷的高陶瓷产率SiBCN先驱体的合成与性能

聚合物先驱体转化法作为制备SiBCN陶瓷及其复合材料的重要途径,具有成型温度低、产物结构和组成可控等优点.设计合成合适的聚合物先驱体是提高陶瓷产率和性能的关键因素之一,本文采用三氯环硼氮烷(TCB)与乙炔基氯化镁进行反应,合成了乙炔基环硼氮烷,进而与二氯硅烷和二氯甲基乙烯基硅烷进行共氨解反应,制备了聚硼硅氮烷先驱体(PBSZ)并进行了高温裂解.采用综合热分析(TG-DSG)对其陶瓷化过程进行了分析,并采用XRD和SEM对陶瓷化产物的结构进行了表征.PBSZ在室温下是液态,易溶于二氯甲烷和氯仿等溶剂,可加工性优良.基于PBSZ先驱体的SiBCN陶瓷产率超过80%;陶瓷化产物在1400℃以下为无定形状态,在1500℃可形成由α-Si3N4,β-Si3N4,h-BN和SiO2晶体结构组成的陶瓷;陶瓷产物表面致密平整且具有优异的热稳定性和氧化性能,表明聚硼硅氮烷(PBSZ)有望成为高陶瓷产率和高性能陶瓷的重要先驱体.     

环境空气中臭氧的催化消除

在涂有γ-Al2O3的蜂窝陶瓷上担载贵金属,以过渡金属氧化物作助剂,通过改变助剂含量及焙烧温度,寻找较佳的催化剂组成和制备条件,对活性较好的nM/MnO2/γ-Al2O3-蜂窝陶瓷和MnO2/C进行了较详细的考察.     

陶瓷颜料的成份剖析

陶瓷颜料一般系金属氧化物以一定晶系单矿物形式按一定配比组成。由于组成复杂,其分析既可借鉴于岩矿分析法,又要考虑其本身特点。由于陶瓷颜料含贵金属,样品用HF-HNO_2不能溶解完全,但碱熔样品制备的溶     

精细化工实验课程教学改革与实践:可陶瓷化阻燃EVA复合材料的制备与性能研究*

结合科研课题及实验教学经验,设计了题为“可陶瓷化阻燃EVA复合材料的制备与性能研究”的精细化工实验课教学项目。该实验以乙烯-醋酸乙烯酯共聚物(EVA)为基材,以叶腊石粉(PL)和磷酸盐玻璃粉(GD)为陶瓷化填料(CF),以有机蒙脱土(OMMT)为抗熔滴剂,以三聚氰胺氰尿酸盐(MCA)为阻燃剂,制备可陶瓷化阻燃EVA复合材料。实验优化了影响阻燃效果、陶瓷强度和复合材料力学性能的因素,确定了合适的配方组成等内容。本精细化工实验课结合了科研内容,能激发学生主动参与实验设计并自主探索科学的兴趣,有利于培养学生的创新能力和解决实际问题的能力。     

巯基/乙烯基硅氮烷紫外光固化的研究

利用原位红外跟踪技术和光-示差扫描量热技术研究了不同类型多官能巯基化合物与乙烯基硅氮烷的紫外光聚合动力学过程.结果表明,巯基化合物官能度越高,聚合反应速率越高,但最终转化率越低.巯基丙酸酯类化合物比烷基硫醇类化合物更易与乙烯基硅氮烷反应.在较低温度下,反应温度对聚合反应的影响较弱,反应活化能约为2.3kJ/mol,而较高反应温度下反应速率偏离Arrhenius方程.     

紫外光固化巯基-乙烯基硅氮烷共聚物热解研究

采用TGA-MS,FTIR和TGA-DTA等分析手段,研究了多元巯基化合物-乙烯基硅氮烷预聚物组成的紫外光固化体系制备的聚合物陶瓷前驱体共聚物在氮气中的热解机理和动力学.结果表明,裂解主要发生在280~430℃,430~560℃和560℃以上3个阶段,明确了各阶段主要发生的化学反应,发现硫元素主要是以H2S和SO2逸出.采用Vachuska-Voboril和Friedman法对不同巯基官能度和不同巯基化合物用量的共聚物热解动力学参数计算表明,增加巯基化合物官能度,第一阶段的热解反应活化能和反应级数相应增大;改变巯基化合物用量使得初始的热解活化能降低,并导致最终陶瓷收率降低.巯基与乙烯基摩尔比分别为2∶1和1∶3的共聚物的热解表观活化能(0.05≤α≤0.65时)分别为175~195 kJ/mol和95~118 kJ/mol.     

Rate mechanisms of a novel thiol-ene photopolymerization reaction

A novel thiol-ene photopolymerization reaction involving copolymerization of tetrathiol monomer with vinyl silazane is experimentally characterized and is modeled successfully. The overall polymerization rate is found to be controlled by the ratio of the propagation to chain transfer kinetic parameters. The polymerization rate of this mixture, in the presence of added photoinitiator, is approximately first order in ene functionality and is independent of thiol functional group concentration. Initiation rates in this system, when cured utilizing a light centered around 365 nm light, and in the presence of no added photoinitiator, are shown to be proportional to the ene monomer concentration. When the mixture is polymerized utilizing light centered at 254 nm light, and without photoinitiator, the initiation rates are proportional to the thiol monomer concentrations. This novel reaction scheme is further utilized to form ultra rapidly polymerizable polymer derived ceramic structures with high aspect ratios.     

乙烯基硅氮烷-巯基共聚物热裂解研究

采用红外(FTIR)、热失重, 热分析以及质谱联用(TGA-DTA-MS)、X射线衍射仪(XDR)、能谱仪对紫外光固化乙烯基硅氮烷-巯基共聚体系的热裂解行为进行了分析和表征. 结果表明: 300～500 ℃为聚合物裂解反应的主要温度范围. 裂解过程会逸出多种小分子气体, 其中体系中的S元素可能主要是以H2S和SO2和噻吩类的形式逸出; 最终质量保持率为55.3 wt%; 热裂解转化物表观密度出现先下降后上升的趋势, 最终达到2.09 g•cm－3; 在保温2 h的条件下, 热裂解转化物在1400 ℃下生成少量Si3N4晶体, 在1600 ℃下, 热裂解转化物晶体质量组成为m(SiO2)∶m(Si3N4)∶m(SiC)＝3∶26∶71, 结晶度达到91.3%.     

Photocaged pendent thiol polymer brush surfaces for postpolymerization modifications via thiol‐click chemistry

In this work, a postpolymerization surface modification approach is reported that provides pendent thiol functionality along the polymer brush backbone using the photolabile protection chemistry of both o‐nitrobenzyl and p‐methoxyphenacyl thioethers. Poly(2‐hydroxyethyl methacrylate) (pHEMA) brushes were synthesized via surface‐initiated atom transfer radical polymerization, after which the pHEMA hydroxyl groups were esterified with 3‐(2‐nitrobenzylthio)propanoic acid or 3‐(2‐(4‐methoxyphenyl)‐2‐oxoethylthio)propanoic acid to provide the photolabile protected pendent thiols. Addressing the protecting groups with light not only affords spatial control of reactive thiol functionality but enables a plethora of thiol‐mediated transformations with isocyanates and maleimides providing a modular route to create functional polymer surfaces. This concept was extended to block copolymer brush architectures enabling the modification of the chemical functionality of both the inner and outer blocks of the block copolymer surface. © 2012 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2013     

UV‐Irradiation Cured Organic‐inorganic Hybrid Nanocomposite Initiated by Ethoxysilane‐modified Multifunctional Polymeric Photoinitiator through Sol‐gel Process

The UV‐cured organic‐inorganic hybrid nanocomposite (nano‐Si‐m‐PI) was prepared through the photopolymerization of acrylic resin initiated by ethoxysilane‐modified multifunctional oligomeric photoinitiator (Si‐m‐PI). The esterification reaction of 2‐hydroxy‐4′‐(2‐hydroxyethoxy)‐2‐methylpropiophenone (Irgacure 2959) with thioglycolic acid, and the following addition reactions with dipentaerythritol hexaacrylate and then 3‐aminopropyltriethoxysilane were carried out for preparing the Si‐m‐PI. The Si‐m‐PI exhibits the similar UV absorption and molar extinction coefficient with Irgacure 2959. The photoinitiating activity study by photo‐DSC analysis showed that the Si‐m‐PI possesses high photopolymerization rate at the peak maximum (R_p^max) and final unsaturation conversion (P^f) in the cured hybrid films. From the scanning electron microscope (SEM) observation, the SiO₂ nanoparticles dispersed uniformly in the formed nano‐Si‐m‐PI, whereas the aggregation of nanoparticals occurred in nano‐Irg, which was prepared through the photopolymerization of acrylic resin initiated by Irgacure 2959. Moreover, compared with the UV‐cured pure polymer and nano‐Irg, the nano‐Si‐m‐PI showed remarkably enhanced thermal stability and mechanical properties.     

先驱体转化法制备Si-B-N-C陶瓷纤维及表征

以聚硼硅氮烷为先驱体, 经熔融纺丝、不熔化处理及氮气中高温热解、烧结得到Si-B-N-C陶瓷纤维. 利用元素分析、FTIR、XRD、高温热重分析等手段对Si-B-N-C纤维的组成、结构以及高温稳定性和抗氧化性等进行了表征. 结果表明, 纤维主要由Si3N4, BN和SiC等相组成, 其室温抗拉强度为2.1 GPa, 弹性模量为230 GPa, 具有很好的非晶稳定性和高温抗氧化性, 惰性气氛中可保持非晶至1700 ℃, 空气中加热至1100 ℃以下时无增重, 在1100-1400 ℃温度范围内增重约3.3％.     

Synthesis and Evaluation of Thiol Polymers

Thiol polymer, which is known as a reactive and functional polymer, is synthesized and evaluated quantitatively by the modified Ellman method. The synthesis was accomplished by 1) hydrolysis of an isothiouronium salt that is the adduct of 4‐chloromethylstyrene (CMS) homopolymer or CMS‐styrene (St) copolymer with thiourea; 2) hydrolysis of a precursor copolymer made from 4‐vinylbenzyl N‐ethyldithio‐carbamate (VBEC) and St or N‐vinyl‐2‐pyrrolidone (NVP); 3) solvolysis of an iminium salt polymer obtained from the reaction of CMS‐NVP copolymer with N,N‐dimethylthioformamide (TDMF). When a higher thiol content is desired, more severe hydrolysis conditions are required which however, also increase the loss of thiol. Hence, it is clear that the best synthesis of thiol polymers is Method 3. A quantitative yield of functional thiol polymer is obtained by this method, and the product is soluble in DMSO, DMF, and CHCI_3.     

Promising oxonitridosilicate phosphor host Sr3Si2O4N2: synthesis, structure, and luminescence properties activated by Eu2+ and Ce3+/Li+ for pc-LEDs

A novel oxonitridosilicate phosphor host Sr(3)Si(2)O(4)N(2) was synthesized in N(2)/H(2) (6%) atmosphere by solid state reaction at high temperature using SrCO(3), SiO(2), and Si(3)N(4) as starting materials. The crystal structure was determined by a Rietveld analysis on powder X-ray and neutron diffraction data. Sr(3)Si(2)O(4)N(2) crystallizes in cubic symmetry with space group Pa ?3, Z = 24, and cell parameter a = 15.6593(1) ?. The structure of Sr(3)Si(2)O(4)N(2) is constructed by isolated and highly corrugated 12 rings which are composed of 12 vertex-sharing [SiO(2)N(2)] tetrahedra with bridging N and terminal O to form three-dimensional tunnels to accommodate the Sr(2+) ions. The calculated band structure shows that Sr(3)Si(2)O(4)N(2) is an indirect semiconductor with a band gap ≈ 2.84 eV, which is close to the experimental value ≈ 2.71 eV from linear extrapolation of the diffuse reflection spectrum. Sr(3-x)Si(2)O(4)N(2):xEu(2+) shows a typical emission band peaking at ~600 nm under 460 nm excitation, which perfectly matches the emission of blue InGaN light-emitting diodes. For Ce(3+)/Li(+)-codoped Sr(3)Si(2)O(4)N(2), one excitation band is in the UV range (280-350 nm) and the other in the UV blue range (380-420 nm), which matches emission of near-UV light-emitting diodes. Emission of Sr(3-2x)Si(2)O(4)N(2):xCe(3+),xLi(+) shows a asymmetric broad band peaking at ~520 nm. The long-wavelength excitation and emission of Eu(2+) and Ce(3+)/Li(+)-doped Sr(3)Si(2)O(4)N(2) make them attractive for applications in phosphor-converted white light-emitting diodes.     

Thiol‐ene photopolymerization of polymer‐derived ceramic precursors

The liquid, ceramic precursor monomer VL20 was copolymerized with a thiol monomer in a traditional radical thiol‐ene photopolymerization. Polymerization occurred via addition of the thiol functional group to the vinyl silazane functional group in a 1:1 ratio consistent with a step‐growth polymerization. Gelation occurred at a high conversion of functional groups (70%) consistent with an average molecular weight and functionality of 560 and 1.7, respectively, for VL20 monomers. Initiatorless photopolymerization of the thiol‐VL20 system also occurred upon irradiation at either 365 or 254 nm. © 2004 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 42: 1752–1757, 2004