压电扫描器对SPM电场加工的影响

利用扫描探针显微镜(SPM)能够实现纳米级电子器件和机械器件的加工．压电扫描器是SPM电场加工中的重要部件，它实现了针尖的移动，使得SPM可在样品表面生成氧化结构．该文着重探讨了单管式扫描器的结构以及压电陶瓷特性对SPM电场加工的影响，分析了多种误差来源，并给出了相应的解决方法，这有利于进一步改进纳米加工系统，提高电场加工的精度和重复性。     

应用SPM技术开展纳米切削加工

纳米科技发展和应用的一个重要问题是：解决纳米尺度上的操作,加工和控制,本文针对目前传统机械加工方法在纳米量级加工能力上存在的不足,以及利用SPM探针针尖进行纳米加工在工程应用中所面临的技术问题,提出应用SPM原理和技术,直接使用金刚石丸具进行材料的纳米量级去除加工方法。文中应用该方法对石墨以及金属材料进行了微去除加工实验,研究和考察了纳米切削加工时,切削形成和良好加工表面的形成,结果显示,这是一种好的纳米加工方法,既可作为材料加工过程的研究手段,又具有良好的实际应用前景。     

单电子晶体管及其SPM加工方法

在电子技术领域,高度集成化是人们不断追求的目标,纳米电子器件迎合了人们的这种需要,将逐步取代微电子器件成为芯片的主要单元。单电子器件以其高效、高功能、高速、低耗(可在常温下工作)、高集成化及经济可靠等优点受到了人们的广泛重视。纳米电子器件具有纳米量级,因而许多科研人员都致力于寻求一种良好的加工方法。SPM电场诱导氧化方法以其简单性和低成本越来越受到人们的广泛重视。主要介绍了单电子晶体管(SET)的结构及基本原理,着重介绍了大气状态下用SPM电场诱导氧化加工的制作原理。     

纳米电子器件与纳米电子技术

介绍了纳米电子器件与纳米电子技术的概念以及纳米电子器件的分类;综述了现有的光刻、外延、SPM、特种精细加工等相关的纳米电子器件制备与加工技术;阐述了纳米电子技术中急需解决的若干关键问题。     

电化学扫描探针显微镜在表面微/纳米加工的应用

概述了在固 /液界面微 /纳米加工中经常采用的三种电化学扫描探针显微镜 (EC SPM )技术 ,分别讨论了电化学扫描隧道显微镜 (EC STM )、电化学原子力显微镜 (EC AFM )和扫描电化学显微镜 (SECM )在应用于微 /纳米加工时的基本原理和各种方法 ,并综合比较和分析了这三种技术的优缺点     

基于SPM技术的表面纳米计量

用扫描探针显微镜(SPM)技术观察三维表面形态,可以达到纳米级甚至原子量级的分辨率,所以SPM技术在计量方面有着广阔的应用前景。20年来,人们采用各种理论和方法来提高SPM的精度和稳定性,以适应表面计量领域不断提出的新要求。本文在总结表面规范与建模、高分辨率和高时间稳定性测量、图像解释与表面重建、SPM误差和校准以及纳米对准技术等研究结果的基础上,对今后发展的趋势作了展望。     

FePt纳米粒子有序膜结构的SPM研究

采用化学合成方法制备了单分散的FePt磁性纳米粒子，通过对纳米粒子的操纵与排布制得了磁性纳米粒子单层膜和多层膜，并利用扫描探针显微技术(SPM)和X射线粉末衍射(XRD)考察了磁性纳米粒子膜中FePt纳米粒子的形貌、粒度分布和表面聚集状态。研究结果表明在磁性纳米粒子单层膜中，磁性纳米粒子分布均匀、排列紧密，且多层膜在膜累加方向是具有周期结构的有序组合体。     

扫描探针显微镜在纳米医学研究中的应用

扫描探针显微镜(SPM)的发明和发展,促进了纳米科技和纳米医学等新学科的诞生和发展.如今,SPM已经形成了一个庞大的、高度自动化的探针显微镜家族,在纳米科技和纳米医学研究中发挥着重要作用.     

在SPM通用平台上开发特殊功能扫描探针显微镜

SPM通用平台是一套扫描探针显微镜开发工具系统，它提供了一种开发生产SPM新的思路和方法，使SPM成为通用、开放、兼容的仪器体系。本文介绍了SPM通用平台的原理、指标和在其上扩展扫描隧道显微镜、原子力显微镜等功能模块的方法，以及智能型SPM通用平台的研究思路。     

纳米机械加工与材料表面性质研究

纳米科技的发展和应用涉及纳米器件的加工、制作以及加工表面特征、性质和功能等研究。获得能够控制在微小区域的纳米加工技术手段、能对不同材料进行纳米加工以及能对过程和加工表面进行检测分析等是十分重要的。本文结合扫描探针显微镜和金刚石超精密加工技术，对金刚石纳米切削展开实验研究。实验表明，结合扫描探针显微技术直接使用金刚石刃具进行材料的纳米量级机械加工，能够适应对不同材料微去除加工的要求，可同时对加工表面、机械加工机理以及表面的加工力学性能等进行综合研究，是一种良好的纳米加工方法。     

电子束纳米加工技术研究现状

纳米科学技术是８０年代后期发展起来面向２１世纪的高新技术，纳米加工技术是制造量子微结构的主导技术。电子束纳米加工推动着微细加工技术的研究向着分子、原子量级的纳米层次发展。本文重点介绍电子束纳米曝光技术的研究现状及发展前景。     

Embedded nano channels fabricated by non-selective reverse contact UV nanoimprint lithography technique

In this work, a novel nanofabrication technique is presented, namely “Reverse contact Ultraviolet Nanoimprint Lithography” (RUVNIL). It is based on reverse nanoimprint lithography and ultraviolet contact lithography. It provides flexibility in building complex three-dimensional structures allowing selective imprint over pre-patterned surfaces with or without residual layer in opposition to what is often encountered in the normal NIL process. We have investigated and optimized the imprinting parameters that are required for three-dimensional nanofabrication and applied it to the fabrication of nano-fluidic channels. This lithography technique is a very promising process for three-dimensional nanofabrication.     

Micro- and nanofabrication processes for hybrid synthetic and biological system fabrication

The application of micro- and nanofabrication processes to the development of hybrid synthetic and biological systems may enable the production of new devices such as controllable transporters, gears, levers, micropumps, or microgenerators powered by biological molecular motors. However, engineering these hybrid devices requires fabrication processes that are compatible with biological materials such as kinesin motor proteins and microtubules. In this paper, the effects of micro- and nanofabrication processing chemicals and resists on the functionality of casein, kinesin, and microtubule proteins are systematically examined to address the important missing link of the biocompatibility of micro- and nanofabrication processes needed to realize hybrid system fabrication. It is found that both casein, which is used to prevent motor denaturation on surfaces, and kinesin motors are surprisingly tolerant of most of the processing chemicals examined. Microtubules, however, are much more sensitive. Exposure to the processing chemicals leads to depolymerization, which is partially attributed to the pH of the solutions examined. When the chemicals were diluted in aqueous buffers, a subset of them no longer depolymerized microtubules and in their diluted forms still worked as resist removers. This approach broadens the application of micro- and nanofabrication processes to hybrid synthetic and biological system fabrication.     

基于SEM纳米级电子束曝光机的快速束闸设计

基于扫描电镜(SEM)的纳米级电子束曝光系统能够以较低成本满足科研单位对纳米加工设备的需求。在电子束曝光系统中,需要快速束闸控制电子束通断以实现纳米图像的多场曝光。从安装位置、机械结构和驱动器等方面讨论快速束闸的设计。     

UHV STM nanofabrication: progress, technology spin-offs, andchallenges

A brief review of scanned probe nanofabrication is presented followed by an in-depth discussion of ultrahigh vacuum (UHV) scanning tunneling microscope (STM) nanofabrication on hydrogen passivated silicon surfaces. In this latter case the UHV STM functions as a nanolithography tool by selectively desorbing hydrogen from silicon surfaces. Patterns of clean Si, down to atomic dimensions, are achieved as well as detailed information about the H-desorption mechanisms. At higher sample voltages direct electron stimulated desorption occurs, whereas, at lower voltages, vibrational heating of the Si-H bond leads to desorption. The chemical contrast between clean and H-passivated silicon enables a wide variety of spatially selective nanoscale chemical reactions. Results are presented in which these templates are used for selective oxidation, nitridation, and metallization by chemical vapor deposition. An unexpected byproduct of this research was the discovery that deuterium is about two orders of magnitude more difficult to desorb from silicon than hydrogen. This served as the basis for the idea of treating CMOS transistors with deuterium to reduce their susceptibility to hot carrier degradation effects. Tests have now shown that the lifetimes of CMOS transistors increase by factors of 10 to 50 when deuterium treatment is substituted for the traditional hydrogen processing     

Nanostructure fabrication

Quantum transport effects have been explored in semiconductors using a two-dimensional electron gas confined by lateral nanostructures. Once the lateral sizes and the layer thickness are reduced to be smaller than the phase coherence length of the electrons in the material, quantum effects become pronounced; it is this aspect of nanofabrication that is considered. The structures defined by a number of different methods are considered and the techniques required to make them are described. Special electron beam lithography systems and processes and a range of focused ion beam techniques and processing methods designed specifically for nanofabrication are discussed. After defining the types of structures used to investigate the physics, the physical phenomena explored with them are considered briefly     

Specialized electron beam nanolithography for EUV and X-ray diffractive optics

Diffraction of electromagnetic radiation remains a viable method for manipulation and focusing of extreme ultraviolet and X-ray wavelengths where the optical properties preclude significant phase shift without attenuation. As the wavelength becomes smaller, the characteristic dimensions needed for effective utilization of diffraction proportionally shrink, placing significant demands on the half-pitch of the diffractive structure. State-of-the-art nanofabrication technology is then required. Additionally, line placement over the entire grating, zone plate lens, or other diffractive element requires an accuracy on the order of a small fraction of a linewidth over the entire structure. This places a heavy burden on the alignment and calibration of the pattern-generating tool. In the case of zone plate lenses, smooth curved geometric elements are required. Specialized techniques for electron beam lithography have been developed to meet these demands, which diverge from the technology used to meet the challenges encountered in mask making and electronic circuit research. The techniques are in four areas: on axis calibration, beam placement, subpixel image processing for overlay, and smooth generation of arc shapes. Using the ensemble of these specialized techniques, high-resolution electron beam lithography nanofabrication has been used to successfully make diffractive structures with linewidths approaching 10 nm and near diffraction limited optical performance.     

Application of quantum-based devices: trends and challenges

Revolutionary nanofabrication techniques and trends have opened the way to fabricating quantum wells, quantum wires and quantum dots that may provide the basic building blocks for future nanoelectronic and mesoscopic (quantum) device technologies. Furthermore, these trends lead to new opportunities for realizing quantum-based information processing devices but many challenges must be addressed and intensive international basic research is essential for the full exploitation of these revolutionary devices     

Advanced AAO Templating of Nanostructured Stimuli‐Responsive Polymers: Hype or Hope?

Nanostructures play a significant role in introducing distinctive functionality to materials. A synergistic combination of nanofabrication techniques with material properties holds great promise in creating smart biomimetic structures. An advanced preparation technique to fabricate complex and sophisticated hierarchical polymeric nanostructure templates via anodized alumina oxide membranes is highlighted. Moreover, nanostructures made of responsive polymers activated by environmental stimuli offer a huge potential in a wide range of applications by enhancing their responsiveness. The current state of research on novel nanostructures fabrication by integrating anodic aluminum oxide with stimuli‐responsive polymers is presented, with an emphasis on the underlying actuation mechanism in terms of application. Furthermore, the potential direction for future research is discussed.