Schottky solar cells on thin epitaxial silicon

Schottky solar cells fabricated on 10, 20 and 30 μm epitaxial silicon produce a current density ranging from about 10–22 mA/cm², depending on Si thickness and orientation, in close agreement with theoretically predicted data. These results are also in close agreement with recent data on p-n solar cells, using thin epitaxial silicon. Data reported herein predict that 10% efficient Schottky solar cells could be produced using about 20 μ of silicon on a suitable substrate. A 7.6% efficient Schottky solar cell on epitaxial silicon has been recently fabricated and tested using AM1 sunlight (100 mW/cm²).     

Cr-MIS solar cells using thin epitaxial silicon grown on poly-silicon substrates

Cr-MIS solar cells were fabricated on 18-30 µm epitaxial-Si layers grown on poly-Si substrates. Solar conversion efficiency values ranged from an average of 8.8% to 4.0% depending on choice of substrate. Nonuniformity of certain substrates led to low efficiency values. Interface state density > 5 × 10¹²/cm²-eV contributed to low Vocand high n-factor. Low minority carrier diffusion length caused Jscto drop to 60% of the optimum value. Substrates with imperfections caused an increase in dark current density by three orders of magnitude, which served to decrease photovoltaic response. The procedures given herein could lead to a low-cost solar cell for terrestrial applications.     

High‐rate deposition of epitaxial layers for efficient low‐temperature thin film epitaxial silicon solar cells

Low–temperature deposition of Si for thin‐film solar cells has previously been hampered by low deposition rates and low material quality, usually reflected by a low open‐circuit voltage of these solar cells. In contrast, ion‐assisted deposition produces Si films with a minority‐carrier diffusion length of 40 μm, obtained at a record deposition rate of 0.8 μm/min and a deposition temperature of 650°C with a prebake at 810°C. A thin‐film Si solar cell with a 20‐μm‐thick epitaxial layer achieves an open‐circuit voltage of 622 mV and a conversion efficiency of 12.7% without any light trapping structures and without high‐temperature solar cell process steps. Copyright © 2001 John Wiley & Sons, Ltd.     

Low-cost back contact silicon solar cells

Back-contacted solar cells offer multiple advantages in regard of reducing module assembling costs and avoiding grid shadowing losses. The investigated emitter-wrap-through (EWT) device design has an electrical connection of the front emitter and the rear emitter grid in form of small holes drilled into the crystalline silicon wafer. The obtained cell structure is especially suitable for low-cost base material with small minority carrier diffusion lengths. Different industrially applicable solar cell manufacturing processes for EWT devices are described and compared. The latest experimental results are presented and interpreted; the photocurrent is found to be distinctly increased. The relation between open circuit voltage and rear side passivation is discussed based on two-dimensional (2-D) computer simulations     

Simulation and implementation of a porous silicon reflector for epitaxial silicon solar cells

One of the main challenges in the ongoing development of thin film crystalline silicon solar cells on a supporting silicon substrate is the implementation of a long‐wavelength reflector at the interface between the epitaxial layer and the substrate. IMEC has developed such a reflector based on electrochemical anodization of silicon to create a multi‐layer porous silicon stack with alternating high and low porosity layers. This innovation results in a 1–2% absolute increase in efficiency for screenprinted epitaxial cells with a record of 13·8%. To reach a better understanding of the reflector and to aid in its continued optimization, several extensive optical simulations have been performed using an in‐house‐developed optical software programme. This software is written as a Microsoft Excel workbook to make use of its user‐friendliness and modular structure. It can handle up to 15 individual dielectric layers and is used to determine the influence of the number and the sequence of the layers on the internal reflection. A sensitivity analysis is also presented. A study of the angle at which the light strikes the reflector shows separate regions in the physical working of the reflector which include a region where the Bragg effect is dominant as well as a region where total internal reflection plays the largest role. The existence of these regions is proved using reflection measurements. Based on these findings, an estimate is made for the achievable current gain with an ideal reflector and the potential of epitaxial silicon solar cells is determined. Copyright © 2008 John Wiley & Sons, Ltd.     

TCOs for nip thin film silicon solar cells

Substrate configuration allows for the deposition of thin film silicon (Si) solar cells on non‐transparent substrates such as plastic sheets or metallic foils. In this work, we develop processes compatible with low T_g plastics. The amorphous Si (a‐Si:H) and microcrystalline Si (µc‐Si:H) films are deposited by plasma enhanced chemical vapour deposition, at very high excitation frequencies (VHF‐PECVD). We investigate the optical behaviour of single and triple junction devices prepared with different back and front contacts. The back contact consists either of a 2D periodic grid with moderate slope, or of low pressure CVD (LP‐CVD) ZnO with random pyramids of various sizes. The front contacts are either a 70 nm thick, nominally flat ITO or a rough 2 µm thick LP‐CVD ZnO. We observe that, for a‐Si:H, the cell performance depends critically on the combination of thin flat or thick rough front TCOs and the back contact. Indeed, for a‐Si:H, a thick LP‐CVD ZnO front contact provides more light trapping on the 2D periodic substrate. Then, we investigate the influence of the thick and thin TCOs in conjunction with thick absorbers (µc‐Si:H). Because of the different nature of the optical systems (thick against thin absorber layer), the antireflection effect of ITO becomes more effective and the structure with the flat TCO provides as much light trapping as the rough LP‐CVD ZnO. Finally, the conformality of the layers is investigated and guidelines are given to understand the effectiveness of the light trapping in devices deposited on periodic gratings. Copyright © 2008 John Wiley & Sons, Ltd.     

Novel porous silicon backside light reflector for thin silicon solar cells

High efficiencies of thin crystalline Si solar cells grown on highly doped substrates have been reported. We propose porous Si layers located near the interface of the active layer and the substrate to introduce an optical confinement into these cells. We report on the experimental proof of the principle for this novel type of back-surface reflector. Spectral reflectance measurements agree well with computer simulations. On the basis of this agreement, we calculate the enhancement of short-circuit current densities due to porous reflectors for textured and non-textured cells. These simulations are of particular relevance for multicrystalline Si cells on foreign substrates and for space cells. Copyright © 1998 John Wiley & Sons, Ltd.     

Passivating thin bifacial silicon solar cells for industrial production

A scheme for passivating thin multi‐crystalline silicon solar cells compatible to mass production is presented. Wafers with a thickness of 180 µm were processed into solar cells. The otherwise severe bowing has been avoided by reduced aluminium coverage on the rear surface. The process scheme includes a silicon nitride firing through step for conventional screen printed contacts, where a silicon nitride layer on the rear surface acts as surface passivation layer and enables a gain in efficiency of 0.6% [abs.]. Copyright © 2007 John Wiley & Sons, Ltd.     

Conformal films for light-trapping in thin silicon solar cells

The anti-reflection and light-trapping performance of thin silicon films deposited conformally on V-grooved substrates is investigated by ray-tracing for a wide range of groove angles and period widths. The tracing is done with incident light rays at angles representative of typical Sydney yearly illumination. Using a double-layer antireflection coating and a SiO₂/Ag reflector, the best result predicted was for asymmetric grooves, with a short-circuit current density of 35.2 mA/cm² for a deposited film thickness of 6μm, which is 96% of what could be achieved with a perfectly randomising cell of the same silicon volume per unit module area. For best results, the period of the texture should not be very much greater than the thickness of the film. Larger periods are useful if combined with partially randomising surfaces. In both cases, a mechanism that gives escaping rays a good chance of re-entering the silicon is responsible for the good performance. Performance is limited by glass reflection and the restriction of scatter to only two dimensions. New structures are proposed to overcome these limitations.     

Improvement of hydrogenated amorphous silicon germanium thin film solar cells by different p-type contact layer

In this study, we report an appreciably increased efficiency from 6% up to 9.1% of hydrogenated amorphous silicon germanium (a-SiGe:H) thin film solar cells by using a combination of different p-doped window layers, such as boron doped hydrogenated amorphous silicon (p-a-Si:H), amorphous silicon oxide (p-a-SiO_x:H), microcrystalline silicon (p-µc-Si:H), and microcrystalline silicon oxide (p-µc-SiO_x:H). Optoelectronic properties and the role of these p-layers in the enhancement of a-SiGe:H cell efficiency were also examined and discussed. An improvement of 1.62 mA/cm² in the short-circuit current density (J_sc) is attributed to the higher band gap of p-type silicon oxide layers. In addition, an increase in open-circuit voltage (V_oc) by 150 mV and fill factor (FF) by 6.93% is ascribed to significantly improved front TCO/p-layer interface contact.     

Increased photogeneration in thin silicon concentrator solar cells

Recent progress in silicon concentrator solar cells has resulted in several designs capable of 25-percent efficiency with one group reporting 28 percent under 14 W/cm²of incident power at 25°C. It has been shown that further improvement is possible by restricting the sunlight acceptance angle of the cell. In this letter, a practical implementation which is equivalent in its effect is proposed which results in an increased utilization of weakly absorbed near-bandgap light. This increased absorption is obtained by placing the cells in a cavity with a small entrance aperture. An analysis is given based upon work on the acceptance angle enhancements by Campbell and Green. The design is expected to improve the efficiencies of existing solar cells to 30 percent. If used in conjunction with previously proposed cell improvements, the efficiencies will be improved towards 33 percent, very near the limit efficiency of 36 percent. This design also has the effect of decreasing the differences in performance between the leading candidate concentrator cell designs and diminishing the dependence of the efficiencies on the cell texturization and bulk carrier lifetimes.     

Performance of front contact silicon solar cells under concentration

The first realization of a new type of silicon solar cell intended for operation at very high concentration, with all the contacts at its front face, is presented. Although the efficiencies achieved are not outstanding, the feasibility of the structure is proven by the fabrication of several thousands of cells with similar performance. Modeling has evidenced the main routes for improvement. Efficiencies close to 25% for a range of efficiencies from 80 to 560 suns are predicted as achievable for cells with state‐of‐the‐art technology and appropriate layout. Copyright © 2004 John Wiley & Sons, Ltd.     

p-Layer bandgap engineering for high efficiency thin film silicon solar cells

Spectroscopic ellipsometry (SE), high resolution transmission electron microscopy (HRTEM), atomic force microscopy (AFM) and optical transmittance measurements were used to study and establish a correlation between the open-circuit voltage (V_oc) of solar cells and the p-layer optical band gap (E_p). It is found that the ellipsometry measurement can be used as an inline non-destructive diagnostic tool for p-layer deposition in commercial operation. The analysis of ellipsometric spectra, together with the optical transmittance data, shows that the best p-layer appears to be very fine nanocrystallites with an E_p 1.95 eV. HRTEM measurements reveal that the best p-layer is composed of nanocrystallites ~9 nm in size. It is also found that the p-layer exhibits very good transmittance, as high as ~91.6% at ~650 nm. These results have guided us to achieve high V_oc value 1.03 V for thin film silicon based single junction solar cell.     

n-Doped-layer free amorphous silicon thin film solar cells fabricated with the CuMg alloy as back contact metal

The feasibility of using CuMg alloy as back contact metal for n⁺-doped-layer free a-Si:H thin film solar cell (TFSC) has been investigated in this work. The ohmic-contact characteristic has been achieved by using the CuMg alloy as back contact metal. The proposed structure showed the typical solar cell current-voltage (I-V) characteristic. An initial efficiency of 4.3% has been obtained with a open-circuit voltage V_oc = 0.79 V, short-circuit current J_sc = 13.4 mA/cm² and fill factor F.F. = 0.40. Furthermore, the experimental results also showed the CuMg alloy was suitable for the replacement of n⁺-doped-layer with the production cost reduction of a-Si:H TSFC.     

Survey of material options and issues for thin film silicon solar cells

The high production cost of thick high-efficiency crystalline silicon solar cells inhibits widespread application of photovoltaic devices whereas the most developed of thin film cell technologies, that based on amorphous silicon, suffers inherent instability and low efficiency. Crystalline thin-film silicon solar cells offer the potential for a long-term solution for low cost but high-efficiency modules for most applications. This paper reviews the progress in thin-film silicon solar cell development over the last two decades, including progress in thin-film crystal growth, device fabrication, novel cell design, new material development, light trapping and both bulk and surface passivation. Quite promising results have been obtained for both large-grain (>100 μm) polycrystalline silicon material and the recently developed microcrystalline silicon materials. A novel multijunction solar cell design provides a new approach to achieving high-efficiency solar cells from very modest quality and hence low-cost material. Light trapping is essential for high performance from thin-film silicon solar cells. This can be realized by incorporating an appropriate texture on the substrate surface. Both bulk and surface passivation is also important to ensure that the photogenerated carriers can be collected effectively within the thin-film device. © 1998 John Wiley & Sons, Ltd.     

Environmental assessment of thin silicon solar cells from pilot production

Following the earlier demonstration of the performance capabilities of 4-mil silicon solar cells and the feasibility of using these cells on large flexible arrays of space vehicles, more than a thousand 4-mil cells have been fabricated in pilot production by four routes. The various types of cells that have been evaluated had solderless evaporated titanium-silver contacts in both a conventional and wraparound configuration, solderless evaporated titanium-silver contacts "overplated" with a layer of copper-gold, and solderless plated mickel-copper-gold contacts in a conventional and wraparound configuration. Both 1-by-2-cm and 2-by-2-cm, n on p cells have been manufactured from 1 and 10 Ω . cm boron-doped silicon. In every case, satisfactory production yields have been achieved. The above cells have been subjected to environmental conditions aimed at studying the effects of high-ambient humidity on the cell contacts during "shelf life" prior to launch and the degradation in performance from electron and proton irradiation encountered during long-term spiral transfer orbits to synchronous altitude. Specifically the problem of low-energy "synchronous altitude" proton irradiation of exposed bar and back contacts and the protection afforded by various forms of coatings has been investigated.     

Polycrystalline silicon solar cells from recrystallized plasma deposited thin films

Large grain polycrystalline silicon films are produced by a two step process involving plasma deposition of microcrystalline silicon films on a substrate, separation from the substrate, and subsequent grain enhancement of the silicon films. The effects of doping and substrate temperature during deposition on the solar cell conversion efficiency are investigated. Effects of ppm level molybdenum contamination from the substrate, and silicon microstructure after grain enhancement, on solar cell efficiency parameters are also investigated. Solar cells with efficiencies of up to 10.1% under AM1 illumination, were fabricated on these silicon films.     

Theoretical comparison of conventional and multilayer thin silicon solar cells

Thin solar cells based on low-quality silicon are assessed for a range of possible material parameter values and device structures. Device thickness is freely optimized for maximum efficiency for a range of doping densities and numbers of junctions, le ading to results differing markedly from previous investigations. Modelling of conventional and multilayer structures in this paper indicates little difference in efficiency potential on low-lifetime (<50 ns) crystalline silicon layers. Moderate effici encies (>15%) are possible given adequate light trapping. Conventional structures (single and double junction cells) are superior if excellent light trapping is assumed. Thicker multilayer structures are advantageous in the case of poor light trapping or surface passivation. In an optimized cell in low-quality silicon, increasing the number of junctions allows a high current to be maintained, but at the cost of a reduced voltage and fill factor caused by increased junction recombination. Formidable pra ctical difficulties are likely to be encountered to realize the theoretical performances discussed.     

非晶硅薄膜太阳能电池应用开发新进展

非晶硅（ａ－Ｓｉ）薄膜太阳能电池是取之不尽的洁净能源－太阳能的光电元（组）件。文章详述了ａ－Ｓｉ薄膜太阳能电池的工艺优势，市场开发状况，可能应用领域，存在问题和展望。